CN101441369A - Liquid crystal display device - Google Patents

Abstract

The present invention relates to liquid crystal display device capable of improving transmittance characteristics of an electrode forming slit. Each of the pixels includes at least a pair of substrates that is arranged opposite each other with a liquid crystal layer disposed therebetween; and a common electrode and a pixel electrode that are disposed on one substrate of the pair of substrates with an insulating film disposed therebetween so as to drive liquid crystal molecules of the liquid crystal layer. An electrode of the common electrode and the pixel electrode that is disposed closer to the liquid crystal layer has a slit having a predetermined tilt angle with respect to a longitudinal direction of each of the pixels and opposite outer edges that are in parallel to the slit.

Description

Liquid crystal indicator

Technical field

The present invention relates to liquid crystal indicator, relates in particular to the liquid crystal indicator that transmissivity is improved.

Background technology

As the liquid crystal indicator that can obtain high-contrast and Wide-angle, the known liquid crystal indicator that makes liquid crystal adopt and the orientation of liquid crystal molecule be controlled with respect to the electric field of 2 transparency carrier horizontal direction, promptly, by FFS (Fringe-Field Switching, fringe field switching) pattern, IPS (In-Plain Switching, plane internal switch) pattern are carried out the liquid crystal indicator of work.In this liquid crystal indicator,, set the both sides of the pixel electrode of supplying with shows signal and the common electrode of supplying common potential at side's transparency carrier.

If about this liquid crystal indicator is that the situation of FFS pattern describes, then for example, in pixel electrode alternately configured in parallel a plurality of wire portion and slit, pixel electrode and common electrode, by dielectric film relatively to dispose.Liquid crystal molecule is corresponding to the frictional direction institute initial orientation of alignment films.Then, if apply shows signal at pixel electrode, then the electric field that extends corresponding to the common electrode that extends the lower floor in slit in wire portion from pixel electrode, promptly with respect to the electric field of transparency carrier horizontal direction, the direction of orientation of control liquid crystal molecule.Carry out optical control by this liquid crystal molecule, carry out white and show or black display.

; liquid crystal indicator as the FFS pattern; for example; proposed to have the fringe field switching mode LCD of following formation: subtend disposes the 1st and the 2nd transparent insulation substrate within a predetermined distance by the liquid crystal layer that comprises a plurality of liquid crystal molecules; and on the 1st transparency carrier, form many grid buses and data bus and unit picture element is configured with matrix form with limiting; at cross part place thin film transistor (TFT) is set, will be disposed at the constituent parts pixel by the counter electrode that transparent conductive body constitutes with them; Comprise making and form the slit, a plurality of top of fringing field and slit, bottom and aforementioned counter electrode together with counter electrode and insulate mutually and be disposed at the constituent parts pixel, by the long limit with pixel is that the predetermined inclination that the center becomes symmetry is arranged, and, the pixel electrode (for example, referring to patent documentation 1) that constitutes by transparent conductive body.

[patent documentation 1] spy open the 2002-182230 communique (the 1st page, Fig. 3)

; in the conventional example of above-mentioned patent documentation 1 record; setting OBL pixel electrode with grid bus and data bus institute area surrounded; disclose at this pixel electrode and formed situation parallel to each other with respect to a plurality of slits of the minor face run-off the straight that parallels with the grid bus; have center with the length direction of pixel electrode with formation and become the slit, top at pitch angle of symmetric relation and the situation in slit, bottom; though can transmissivity be improved by the slit; but because pixel electrode forms oblong-shaped; form slit with respect to the minor face run-off the straight with respect to this; so, have the open question that reduces because of this part transmissivity because of the electrode part of subtend outer peripheral edges residual right angle trigonometry shape between slit and neighboring of short brink.

Summary of the invention

Therefore, the present invention, the open question that is conceived to above-mentioned conventional example has been done, and purpose is to provide the liquid crystal indicator of the transmissivity raising that can make the electrode that forms the slit.

In order to achieve the above object, liquid crystal indicator among the present invention, be characterized as: make the pixel that forms display part, comprise at least seize liquid crystal layer on both sides by the arms and relatively to a pair of substrate, seize common electrode and pixel electrode that the liquid crystal molecule to the foregoing liquid crystal layer that dielectric film disposes drives on both sides by the arms with being arranged at the square substrate of one of aforementioned a pair of substrate; The electrode of the foregoing liquid crystal layer side among aforementioned common electrode and the aforementioned pixel electrode has length direction with respect to the aforementioned pixel slit of predetermined angular that tilted, and has the subtend outer peripheral edges that parallel with this slit.

Thus, have the subtend outer peripheral edges that parallel with the slit because form apertured electrode among common electrode and the pixel electrode, so the profile of electrode can be formed the parallelogram shape, because do not have unnecessary electrode part, so the transmissivity of pixel is improved in the subtend outer peripheral edges that parallel with the slit.

And the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned slit forms the parallelogram shape in the comparison of the length direction in this slit of the electrode of foregoing liquid crystal layer side in the inner part to outer peripheral edges.

Thus, because the electrode of liquid crystal layer side forms the parallelogram shape, so can easily form exposed mask when the electrode layer film being carried out etching in order to form this electrode.

And then the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned slit prolongs until one of the subtend outer peripheral edges of the length direction in this slit of the electrode of foregoing liquid crystal layer side side and this electrode becomes pectination.

Thus, electrode becomes pectination because an end in slit prolongs until one of the subtend outer peripheral edges of the length direction side in slit side, so be compared to the situation that electrode is formed the parallelogram shape transmissivity is improved.

And the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned slit forms a plurality of on the electrode of foregoing liquid crystal layer side parallel to each other.

Thus, a plurality of because the slit forms parallel to each other, so the transmissivity of pixel is improved.

Further, the liquid crystal indicator among the present invention is characterized as: in above-mentioned, lateral electrode portion at least a portion does not set with grid line overlaid ground in the electrode of foregoing liquid crystal layer side.

Thus, because lateral electrode portion at least a portion of the electrode of liquid crystal layer side does not set with grid line overlaid ground, so by lateral electrode portion with form than the great electric field of lower electrode of the electricity of liquid crystal layer side, can control the liquid crystal molecule between lateral electrode portion and the grid line, the transmissivity in the pixel is further improved.

And the liquid crystal indicator among the present invention is characterized as: in above-mentioned, lateral electrode portion at least a portion and thread cast-off overlaid ground set in the electrode of foregoing liquid crystal layer side.

Thus, make at least a portion be configured by lateral electrode portion and thread cast-off to the electrode of liquid crystal device side, the end that can make the slit can make the transmissivity in the pixel further improve near thread cast-off with overlapping each other.

And then the liquid crystal indicator among the present invention is characterized as: in above-mentioned, be formed at the slit of the electrode of foregoing liquid crystal layer side, form with respect to the frictional direction predetermined oblique angle.

Thus, because the slit forms with respect to the frictional direction predetermined oblique angle, so the sense of rotation of the liquid crystal molecule of liquid crystal layer is stablized.

And then the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned slit uses the mask that is formed with expansion slit portion to form at the position that disclination took place.

Thus, because use the mask that is formed with expansion slit portion to form, become circular-arc and suppressing to disclination so can suppress the shape in slit at the position that disclination took place in slit.

And the liquid crystal indicator among the present invention is characterized as: aforementioned slit uses the mask that is formed with expansion electrode portion to form at the position that disclination took place of peristome side.

Thus, when making electrode form pectination, because use at this position that disclination took place of peristome side to be formed with the mask of expansion electrode portion and to carry out, become circular-arc shape so can suppress the length direction end of peristome, can suppress disclination.

And, liquid crystal indicator among the present invention, be characterized as: make the pixel that forms display part, comprise at least seize liquid crystal layer on both sides by the arms and relatively to a pair of substrate, seize common electrode and pixel electrode that the liquid crystal molecule to the foregoing liquid crystal layer that dielectric film disposes drives on both sides by the arms with being arranged at the square substrate of one of aforementioned a pair of substrate; The electrode of the foregoing liquid crystal layer side among aforementioned common electrode and the aforementioned pixel electrode, have with respect to tilted at least one pair of slit in slit of predetermined angular of frictional direction and form the relation ground that angle that the length direction in the length direction of aforementioned pixel in the zone and aforementioned slit forms becomes the supplementary angle and dispose, and aforementioned pair of slits form one of regional square slit form in the zone form the neighboring of regional opposition side with the opposing party slit and the length direction in this slit forms substantially parallel.

Thus, because the electrode of the foregoing liquid crystal layer side among common electrode and the aforementioned pixel electrode, have with respect to tilted at least one pair of slit in slit of predetermined angular of frictional direction and form the relation ground that angle that the length direction in the length direction of aforementioned pixel in the zone and aforementioned slit forms becomes the supplementary angle and dispose, and aforementioned pair of slits form one of regional square slit form in the zone form the neighboring of regional opposition side with the opposing party slit and the length direction in this slit forms substantially parallel.So can make the profile of electrode form the trapezoidal shape that many slits constitute, because do not have unnecessary electrode part, so the transmissivity of pixel is improved in the subtend outer peripheral edges that parallel with the slit that form apertured electrode.

And the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned pair of slits form the zone separately in, the slit that is formed at the electrode of foregoing liquid crystal layer side forms a plurality of parallel to each other.

Thus, the slit form the zone separately in because be formed at the slit of the electrode of liquid crystal layer side form parallel to each other a plurality of, so the transmissivity that forms the zone in each slit is improved.

And then the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned slit prolongs until one of the subtend outer peripheral edges of the length direction in this slit of the electrode of foregoing liquid crystal layer side side, and this electrode becomes pectination.

Thus, because electrode becomes pectination, so transmissivity is further improved.

And the liquid crystal indicator among the present invention is characterized as: in above-mentioned, the aforementioned pair of slits that sets 1 electrode in aforementioned pixel forms the zone.

Thus,, constitute, so interregionally also can dwindle the interval between them and transmissivity is improved even form in pair of slits to be formed with the electrode that many slits that pair of slits forms the zone constitute because make electrode corresponding to a pixel.

Further, liquid crystal indicator among the present invention, be characterized as: in above-mentioned, form the peripheral edge portion in zone in a side slit of the electrode that is formed with aforementioned slit, form the active control part that the voltage that puts on one of aforementioned pixel electrode and pixel electrode side is controlled.

Thus, form active control part,, the transmissivity of pixel integral body is improved so this active control part can be configured active control part in the bight of pixel because the square slit of one of electrode that constitutes in many slits forms the outer peripheral edges in zone.

And, liquid crystal indicator among the present invention, be characterized as: in above-mentioned, form the zone, form in the zone with the slit adjacent to side's pixel of the opposing party's pixel adjacent to the slit adjacent to the opposing party's pixel of side's pixel among the pixel of the orientation in aforementioned slit, both sides' slit becomes and sets abreast.

Thus, because parallel the becoming in slit that makes the adjacent slit of adjacent pixels form the zone sets abreast,, can form continuous in the pixel of slit orientation so can stride adjacent to forming parallel slit between the pixel of slit orientation.

And then the liquid crystal indicator among the present invention is characterized as: form regional boundary position in aforementioned pair of slits, set grid line from gate signal to the grid of the active control part that the voltage that puts on pixel electrode is controlled that supply with.

Thus,, active control part is configured, the pixel region that many slits constitute can be designed to minimum so can utilize the converter section of the slit direction that transmissivity descends because the pair of slits in pixel forms the active control part of interregional configuration.

And the liquid crystal indicator among the present invention is characterized as: in above-mentioned, aforementioned active control part is crooked and intersect 2 times with aforementioned grid line.

Thus, intersect 2 times with grid line because active control part is crooked, so can reduce thin film transistor (TFT) the formation zone area and but to make the ratio of viewing area be that aperture opening ratio improves.

Description of drawings

Fig. 1 is the vertical view of the liquid crystal indicator of expression the 1st embodiment of the present invention.

Fig. 2 is the sectional view on the A-A of Fig. 1.

Fig. 3 is the vertical view of the pixel electrode of presentation graphs 1.

Fig. 4 is that expression is applied to the vertical view of the peristome formation of the 1st embodiment with mask.

Fig. 5 is the figure of details of the correction transparent figure portion of presentation graphs 4.

Fig. 6 is the vertical view of the pixel electrode of expression the 2nd embodiment of the present invention.

Fig. 7 is the vertical view of the liquid crystal indicator of expression the 3rd embodiment of the present invention.

Fig. 8 is the vertical view of the pixel electrode of presentation graphs 7.

Fig. 9 is that expression is applied to the vertical view of the peristome formation of the 3rd embodiment with mask.

Figure 10 is the figure that the expression peristome forms the details of the non-transparent figure of the correction portion that uses mask.

Figure 11 is the vertical view of other formations of expression thin film transistor (TFT).

Figure 12 is the vertical view of the liquid crystal indicator of expression the 4th embodiment of the present invention.

Figure 13 is the sectional view on the A-A of Figure 12.

Figure 14 is the vertical view of the pixel electrode of expression Figure 12.

Figure 15 is that expression is applied to the vertical view of the peristome formation of the 4th embodiment with mask.

Figure 16 is the vertical view of the liquid crystal indicator of expression the 5th embodiment of the present invention.

Figure 17 is the sectional view of Figure 16.

Figure 18 is the vertical view of the pixel electrode of expression Figure 16.

Figure 19 is the vertical view of expression the 6th embodiment liquid crystal indicator of the present invention.

Figure 20 is the vertical view of the pixel electrode of expression Figure 19.

Figure 21 is that expression is applied to the vertical view of the peristome formation of the 6th embodiment with mask.

The explanation of symbol

1 ... liquid crystal indicator, 2 ... display part, 3 ... pixel, 4 ... grid line, 5 ... thread cast-off, 10 ... backlight, 11 ... the 1st polarization plates, 12 ... the 1st transparency carrier, 13 ... buffer film, 14 ... active layer, 15 ... gate insulating film, 16 ... interlayer dielectric, 17 ... leak 18 ... the source, 19 ... the source electrode, 20 ... passivating film, 21 ... planarization film, 22 ... common electrode, 23 ... dielectric film, 24 ... pixel electrode, 25 ... alignment films, 26 ... liquid crystal layer, 27 ... color filter, 28 ... alignment films, 29 ... the 2nd transparency carrier, 30 ... the 2nd polarization plates, TR ... thin film transistor (TFT), S1, S2 ... the slit, 31,32 ... the subtend outer peripheral edges, 33,34 The subtend outer peripheral edges, 35～38 ... lateral electrode portion, 39 ... link electrode part, 40 ... the transistor counter electrode, 100 ... peristome forms and uses mask, 112 ... non-transparent figure portion, 113,114 ... basic transparent figure portion, 115～118 ... proofread and correct the transparent figure portion that uses, 200 ... peristome forms and uses mask, 212 ... non-transparent figure portion, 213,214 ... basic transparent figure portion, 215,217 ... proofread and correct with non-transparent figure portion, 216,218 ... proofread and correct the transparent figure portion that uses

Embodiment

Below, embodiments of the present invention are described based on accompanying drawing.

Fig. 1 is the vertical view that expression applies the present invention to be undertaken by the FFS pattern of common-black type the embodiment under the situation of liquid crystal indicator of work, and in the accompanying drawings, 1 is liquid crystal indicator, and display part 2 is configured to a plurality of pixels 3 rectangularly to constitute.In Fig. 1, the one part of pixel 3 of display part 2 only is shown.

Display part 2, as be shown in Fig. 1 ground, to form with the directions X be horizontal direction, be the rectangular-shaped of vertical direction with the Y direction, along this horizontal direction, many the grid lines 4 of supplying with pixel selection signal keep predetermined space to dispose, and the thread cast-off 5 of vertically, supplying with shows signal keeps predetermined space to dispose.Also have, the horizontal direction of display part 2 is set at: watching under the situation of display part 1 by the polarization sunglasses, becoming parallels with the absorption axes of this polarization sunglasses.

The pixel region configuration pixel 3 of being surrounded with these grid lines 4 and thread cast-off 5.In each pixel 3, be provided in pixel form the zone upper left bight make grid line 4 become the thin film transistor (TFT) TR of gate electrode.

And, pixel 3, as be shown in the sectional view ground of Fig. 2, become sandwich construction, has the 1st transparency carrier 12 that constitutes by glass etc. that below backlight 10, is formed with the 1st polarization plates 11 in subtend, formation buffer film 13 on the 1st transparency carrier 12, this above buffer film 13 configuration constitute thin film transistor (TFT) TR with Fig. 1 see U word shape with the formed active layer 14 of polysilicon, cover this active layer 14 ground configuration gate insulating film 15.

Subtend at gate insulating film 15 makes that above active layer 14 passing active layer 14 ground for 2 times disposes grid line and become double-gate structure.And gate insulating film 15 and grid line 4 are covered with interlayer dielectric 16.On this interlayer dielectric 16, configuration is by contact hole CH1 thread cast-off 5 that is connected with the leakage 17 of thin film transistor (TFT) TR and the source electrode 19 that is connected with source electrode 18 by contact hole CH2.

These thread cast-offs 5 and source electrode 19 are covered with passivating film 20, form planarization film 21 on this passivating film 20.Also have, passivating film 20 may not need, and also can omit.

On planarization film 21, relative with source electrode 19 to position configuration have the common electrode 22 of peristome 22a.This common electrode 22 for example forms as whole facial mask in the demonstration effective coverage of configuration pixel 3, in the zone that does not dispose pixel 3, by contact hole (not shown), is connected with the common electrode line (not shown) of supplying with common potential.And, both can form the band shape that is parallel to grid line or thread cast-off ground one-tenth row, also can every pixel all connect with electrode wires together.

And, on common electrode 22, dispose pixel electrodes 24 by dielectric film 23.This pixel electrode 24 is connected with source electrode 19 by peristome 22a, planarization film 21 and the passivating film 20 formed contact hole CH3 that pass dielectric film 23, common electrode 22.

And pixel electrode 24 is covered with alignment films 25, and the frictional direction of this alignment films 25 is set at: becoming parallels with the axis of homology of the 1st polarization plates 11.

And, the 2nd transparency carrier 29 that below the top of alignment films 25 is configured in by the liquid crystal layer 26 with liquid crystal molecule M, has color filter 27 and alignment films 28.At this, the frictional direction of alignment films 28 has the frictional direction identical with aforesaid alignment films 25.And the liquid crystal molecule M of liquid crystal layer 26 is corresponding to the even orientation of the frictional direction institute initial orientation of alignment films 25 and 28, institute.

And then configuration has and the 1st polarization plates 11 the 2nd polarization plates 30 of the axis of homology of quadrature mutually on the 2nd transparency carrier 29.

And, alignment films 25 and 28 frictional direction, as be shown in Fig. 3 ground, consistent with horizontal direction (directions X).Pixel electrode 24, as be shown in Fig. 3 ground becomes so-called single slit and constitutes: have only tilted OBL a plurality of slit S1 of predetermined angle theta s1 of frictional direction with respect to alignment films 25 and 28 and keep predetermined space L1 to be formed on the vertical direction abreast.

And, pixel electrode 24 forms subtend outer peripheral edges 31 and 32 as the minor face that parallels with slit S1, forms the two ends, the left and right sides that link these subtend outer peripheral edges 31 and 32 and extend the subtend outer peripheral edges 33 and 34 and have a profile of parallelogram shape on the long long limit as a comparison of vertical direction in the position that the slit S1 from vertical direction both ends side only leaves preset distance L2.

At this, each slit S1, as be shown in Fig. 2 ground, be the peristome that is used for applying voltage and liquid crystal molecule M being driven between as pixel electrode 24 by dielectric film 23 formed upper electrodes and common electrode 22 by consequent electric field as lower electrode.Because it is a plurality of that slit S1 forms in vertical direction abreast, so the transmissivity of pixel 3 is improved.

And each slit S1, its tiltangle s1 are set at big+5 degree～+ 15 degree, the preferred value of degree approximately greatly+5 for example made an appointment with of frictional direction with respect to alignment films 25 and 28 for the liquid crystal molecule M sense of rotation that does not make liquid crystal layer 26 becomes uncertain.

And each slit S1 makes the both ends of its length direction, with respect to subtend in the subtend outer peripheral edges 33 and 34 of the pixel electrode 24 at their both ends only preset distance L3 become medially and form.The result, pixel electrode 24, have following formation: with the lateral electrode portion 35 that forms subtend outer peripheral edges 31 and 32 and 36 and form the lateral electrode portion 37 and 38 and become the parallelogram shape of subtend outer peripheral edges 33 and 34, lateral electrode portion 37 and 38 are linked with the binding electrode part 39 that form slit S1.

This pixel electrode 24 when graphical, exists because photo-mask process and bight become slightly the situation with the shape of fillet.In order to do one's utmost to avoid this fillet, if be used in the figure of patterned mask, become the figure of having considered the dipped beam effect, then this fillet can be suppressed degree for ignoring.

And, as be shown in Fig. 1 ground, by the lateral electrode portion 35 of pixel electrode 24 makes their part be configured with thread cast-off 5 with overlapping each other to overlooking at least, the end that can make slit S1 can make the transmissivity in the pixel 3 further improve near thread cast-off 5.And, by being configured, the lateral electrode portion 35 of pixel electrode 24 and grid line 4 make their non-overlapping copies, can be by lateral electrode portion 35 and electric field as the common electrode 22 of the lower electrode that forms greatlyyer than pixel electrode 24, liquid crystal molecule M between lateral electrode portion 35 and the grid line 4 is controlled, the transmissivity in the pixel 3 is further improved.

If work to liquid crystal indicator 1 with above-mentioned formation, describe with reference to Fig. 2, then under electric field does not result from cut-off state between common electrode 22 and the pixel electrode 24, the liquid crystal molecule M institute of liquid crystal layer 26 is orientation evenly, its long axis direction is parallel with the axis of homology of the 1st polarization plates 11 for example.At this moment, the light of the backlight 10 by 11 straight line polarizations of the 1st polarization plates carries out transmission and is incident in the 2nd polarization plates 30 liquid crystal layer 26 with the polarization axle of original state.But, this light because its polarization axle with the axis of homology of the 2nd polarization plates 30 quadrature mutually, so absorb by the 2nd polarization plates 30.Promptly say, become black display (normal black).

On the other hand, under electric field resulted from conducting state between common electrode 22 and the pixel electrode 24, corresponding to this electric field, the major axis of the liquid crystal molecule M of liquid crystal layer 26 essentially horizontally was rotated with respect to the 1st transparency carrier 12.At this moment, the light of the backlight 10 by 11 straight line polarizations of the 1st polarization plates becomes elliptic polarization by the birefringence in the liquid crystal layer 26, is incident in the 2nd polarization plates 30.Among this elliptic polarization, the corresponding to component of the axis of homology of outgoing and the 2nd polarization plates 30 becomes white and shows.

At this moment, because the subtend outer peripheral edges 31 of the lateral electrode portion 35 of pixel electrode 24 and 36 and 32 parallel ground and form with slit S1, make the outer of pixel electrode 24 form OBL situation so be compared to, the transmissivity of each pixel 3 is improved in lateral electrode portion 35 and the unnecessary surplus of 36 generations.

Also have,, undertaken under the situation of work,, supply with the different shows signal of polarity at each pixel electrode 24 with each adjacent pixel 3 of vertical direction by what is called row inversion driving disposing each pixel 3 of pixel electrodes 24.Therefore, exist because the demonstration that the intermediate treatment of different shows signal can not get expecting, in the situation of the boundary vicinity generation poor display of those pixels 3.Though for fear of this problem, can make with each pixel electrode 24 of each adjacent pixel 3 of vertical direction and do one's utmost to leave, if will leave the decline that distance obtains then causes transmissivity too greatly.

Therefore, preferably: the distance of the subtend outer peripheral edges of side's pixel electrode 24 31 and the subtend outer peripheral edges 32 of the opposing party's pixel electrode 24, for 2 times of the scope of the rotation that obtains expecting by electric field with the liquid crystal molecule M in the outside of the subtend outer peripheral edges 31 of pixel electrode 24 and 32 equate, than its big slightly scope.For example, if with among each adjacent pixel electrode 24, the neighboring 31 of side's pixel electrode 24, with the distance of the neighboring 32 of the opposing party's pixel electrode 24 be D1, then be 5 μ m＜D1＜15 μ m, be 7 μ m＜D1＜10 μ m as suitable example.

Also have, in above-mentioned the 1st embodiment, if the end shape of slit S1 has fillet, then there be the zone of the sense of rotation of liquid crystal molecule M, take place to become black display and the disclination of the phenomenon that transmissivity descends as the zone that should become the white demonstration originally with respect to the direction generation counter-rotating of expection.In order to suppress the generation of this disclination, the end shape of slit S1 need not be with fillet ground to form, and as the mask that uses in photo-mask process for this reason, the peristome electrode that uses as be shown in Fig. 4 forms mask 100.

This peristome electrode forms mask 100, with respect to non-transparent figure portion 112, form basic transparent figure portion 114 in the position of slit S1 in the subtend of pixel electrode 24, and then make basic transparent figure portion's 114 expansions at the position of the generation disclination of basic transparent figure portion 114 and form the correction that suppresses of disclination with transparent figure 116 and 118 corresponding to the shape of slit S1.

At this, the part of the generation disclination of basic transparent figure portion 114, as the 1st above-mentioned embodiment ground, favouring positive dirction with respect to frictional direction at slit S1 is under the anticlockwise situation, when the central point with slit S1 is the XY origin, is the length direction in slit with the directions X, when being the Width in slit with the Y direction, becomes the bight of the 2nd quadrant and the 4th quadrant.Also have, favouring negative direction with respect to frictional direction at slit S1 is under the clockwise situation, and disclination takes place the bight at the 1st quadrant and the 3rd quadrant in above-mentioned XY coordinate system.

Proofread and correct with transparent figure portion 116, as amplify diagram ground with Fig. 5, making basic transparent figure portion 114 become to spread over shape ground in the non-transparent figure portion 112 to be communicated in basic transparent figure portion 114 and forms, is that X-axis for example 45 is spent the triangular pattern portion 120 that for example forms right angled isosceles triangle that favours the narrow banded figure portion 119 of width that counter clockwise direction prolongs and be formed at the extended end of this band shape figure portion 119 and constituted to be communicated in basic transparent figure portion 114 with respect to its length direction.

At this, the width dimensions B of banded figure portion 119 and set forr a short time to the prolongation size C of the leading section of triangular pattern portion 120 than the width dimensions A of basic transparent figure portion 114 from the end of basic transparent figure portion 114.

If lift one of the size example, then when the gap width S with the pixel electrode after being formed at etching 24 is about 4.0 μ m, can make the width dimensions A of basic transparent figure portion 114 is about 3.4 μ m, in this case, can make the prolongation size C that proofreaies and correct with transparent figure portion 116 is about 1.75 μ m, and making width dimensions B is about 1.4 μ m.

In the liquid crystal indicator of high-resolution, the width dimensions A of basic transparent figure portion 114 is set at the minimum dimension near the limit of resolution of exposure equipment more.Thereby usually, the peristome electrode forms the minimum dimension of the figure of mask, diminishes even exceed the resolution ground of exposure device, and also can't expose is size, the shape of expection.Here, by utilizing the dipped beam effect, can access the following fine pattern of resolution of exposure device.This is based on: by at the fundamental figure portion periphery near the limit of the resolution of exposure device, the shape of having considered diffraction of light etc., the correction figure portion of size are set, can proofread and correct the shape of the periphery of fundamental figure portion, and form the figure of the above precision of the resolution of exposure device.Though in the example of Fig. 4, only in basic transparent figure portion 114, because the limit of the resolution of exposure device, exposure figure is in the end of its length direction, become circular-arc, but proofread and correct with transparent figure portion 116 by being provided with, can proofread and correct, become quite exposure figure near rectangle to circular-arc shape.

Thereby,,, can set forr a short time than the minimum dimension of basic transparent figure portion 114 so proofread and correct size with transparent figure portion 116 because utilize the dipped beam effect.In above-mentioned example, if the resolution of exposure device is about 3 μ m, then can make the minimum dimension of basic transparent figure portion 114 become big about 3.4 μ m of about 3 μ m, make the minimum dimension of proofreading and correct with transparent figure portion 116 become little about 1.4 μ m of 3 μ m than the resolution of exposure device than the resolution of exposure device.

So the peristome electrode forms mask 100, can adopt following mask: according to the manufacture method of general exposed mask, make the minimum dimension of basic transparent figure portion 114 become the allowed band of the resolution of exposure device, in the end of the length direction of basic transparent figure portion 114, for correction that the little size with the resolution that exceeds exposure device is set with transparent figure portion 116 and form transparent figure.

And though about proofreading and correct usefulness transparent figure portion 118, detailed icon also omits, and forms and proofread and correct the identical shaped of usefulness transparent figure portion 116 line symmetries.

If use the peristome electrode with above-mentioned formation to form mask 100 and expose, then light is by basic transparent figure portion 114 and proofread and correct with transparent figure portion 116,118, and the photonasty resist that exposes.If this photonasty resist of exposure, then because its characteristic changes, so by adopting suitable developer solution, can remove exposed portion, the photonasty resist forms peristome by the shape identical with basic transparent figure portion 114 on the photonasty resist thus.By so adopting the photonasty resist that forms peristome, pixel electrode is carried out etching with the transparent conductive material film, formation has the pixel electrode 24 corresponding to the slit S1 of the shape of the peristome of photonasty resist.

Next, the 2nd embodiment of the present invention is described about Fig. 6.

The 2nd embodiment is as follows: select with the pitch angle that is formed at the slit S1 of pixel electrode 24 by the frictional direction to alignment films 25 and 30, and make because in the patterned restriction during fabrication, the figure of the end of slit S1 becomes circular-arc, extend the angle of the direction of the electric field that the common electrode of the lower floor of slit S1 extends and frictional direction and different in electrode part from pixel electrode, there be the zone of the sense of rotation of liquid crystal molecule M with respect to the direction generation counter-rotating of expection, the zone that should become the white demonstration originally becomes black display and the phenomenon of transmissivity decline, be that disclination reduces, improve the transmissivity of pixel.

That is, in the 2nd embodiment, as be shown in Fig. 6 ground, alignment films 25 and 30 frictional direction have tiltangle r with respect to horizontal direction (directions X).This tiltangle r for example for about+20 degree～+ 50 degree, is preferably degree approximately+30.The axis of homology of the 1st polarization plates 11 for example is parallel to this frictional direction.

At the pixel electrode 24 with parallelogram or substantially parallel tetragonal shape, configuration has the parallelogram that is made of long limit E1 and minor face E2 or many slit S1 of substantially parallel tetragonal shape parallel to each other.The long limit of the pixel electrode 24 of parallelogram is parallel to the vertical direction of display part 2.The long limit E1 of slit S1 is with respect to the tiltangle s of the horizontal direction of display part 1, for the sense of rotation of the liquid crystal molecule M that do not make liquid crystal layer 26 becomes uncertain, sets than greatly for example about+5 degree of tiltangle r～+ 15 degree of frictional direction, preferably big approximately 5 spends.

On the other hand, slit S1 minor face E2 sets greatlyyer and littler than (θ r+90 °) than the tiltangle s of long limit E1 with respect to the tiltangle e of horizontal direction.That is, in pixel electrode 24, in the end of slit S1, an Aac of corner portion becomes the peristome of acute angle.

And the subtend outer peripheral edges 31 and 32 of the short brink of pixel electrode 24 have tiltangle s with respect to horizontal direction.That is, the subtend outer peripheral edges 31 of pixel electrode 24 and 32 parallel with the long limit E1 of slit S1.These subtend outer peripheral edges 31 and 32 and subtend outer peripheral edges 33 and 34 vertically intersect with acute angle.That is, at position that subtend outer peripheral edges 31 and subtend outer peripheral edges 34 intersect and the position that intersects of subtend outer peripheral edges 32 and subtend outer peripheral edges 33 have the bight C of acute angle.

Also have, when pixel electrode 24 being carried out when graphical, there are owing to the dipped beam effect of photo-mask process slightly the situation with fillet in the bight C of the outer peripheral edges of pixel electrode 24 and the bight Aac of slit S1.In order to do one's utmost to avoid this fillet, if be used in the figure of patterned mask, become the figure of having considered above-mentioned dipped beam effect, then this fillet can be suppressed degree for ignoring.

If according to the 2nd embodiment, then pixel electrode 24, because near the bight Aac that becomes acute angle of slit S1, the counter-rotating of the sense of rotation of liquid crystal molecule M is difficult to take place, so can suppress disclination.Also have, because near the other end of slit S1, just the counter-rotating of the sense of rotation of liquid crystal molecule M did not take place originally, so disclination does not take place.

And then, the zone along subtend outer peripheral edges 31 and 32 of pixel electrode 24, because parallel with the long limit E1 of slit S1, so not at minor face E2 along the area configurations slit S1 of subtend outer peripheral edges 31 and 32, because the counter-rotating of the sense of rotation of liquid crystal molecule M can not take place in this zone, so disclination does not take place.And then, because the subtend outer peripheral edges 31 by pixel electrode 24 and 32 and be disposed at the electric field of the common electrode 22 in its outside, the angle that this regional liquid crystal molecule M is rotated can with pixel 3 in identical, so can become the zone that is used to show.Thus, the disclination in pixel 3 integral body is reduced, improve transmissivity.

Pixel electrode 24 under this situation in the end of slit S1 is along in the end of subtend outer peripheral edges 33 and 34, because the end of slit S1 and with the distance of subtend outer peripheral edges 33 and 34 nearest parts must be predetermined distance in the formation of electrode material, so if becoming predetermined situation with the distance that makes nearest part compares, then the end of slit S1 is away from subtend outer peripheral edges 33 and 34.

Because the surplus of the end of this pixel electrode 24, transmissivity is reduced, so especially in the subtend outer peripheral edges 33 of pixel electrode 24 and 34 1 sides comparison under outer peripheral edges 31 and 32 long situations, the position increase of disclination takes place.That is, the transmissivity in pixel 3 integral body significantly descends.With respect to this, in the present embodiment, because the tiltangle s of slit S1 is bigger than the tiltangle r of frictional direction, so can make the end of slit S1 of the end of pixel electrode 24 so and the subtend outer peripheral edges 33 of pixel electrode 24 and 34 distance become near.Thereby, can suppress the decline of above-mentioned transmissivity.

Next, the 3rd embodiment of the present invention is described about Fig. 7 and figure.

In the 3rd embodiment, make pixel electrode form pectination.

Promptly, in the 3rd embodiment, as be shown in Fig. 7 and Fig. 8 ground, the lateral electrode portion 38 on the right side of the pixel electrode 24 in not forming aforesaid the 1st embodiment and pixel electrode 24 form to have the pectination and aforesaid Fig. 1 and the same formation of Fig. 3, add prosign at the counterpart with Fig. 1 and Fig. 3, its detailed description is omitted.

If according to the 3rd embodiment, then become the pixel electrode 24 of pectination because not forming the lateral electrode portion 38 of the pixel electrode 24 in the 1st embodiment, so do not form the end in slit 1, transmissivity is improved.

In the 3rd embodiment, in order not make disclination take place also must not have the pixel electrode 24 that fillet ground forms pectination at end shape, as the mask that in photo-mask process for this reason, uses, use as be shown in Fig. 9, the peristome electrode forms mask 200.

This peristome electrode forms mask 200, with respect to non-transparent figure portion 212, form basic transparent figure portion 214 in the position of slit S1 in the subtend of pixel electrode 24, and then dwindle basic transparent figure portion 214 at the position of the generation disclination of basic transparent figure portion 214 and make the correction that suppresses of disclination is formed the correction that suppresses transparent figure portion 218 to disclination with non-transparent figure portion 216 and basic transparent figure portion's 214 expansions corresponding to the shape of slit S1.

At this, the position of the generation disclination of basic transparent figure portion 114, as the 3rd above-mentioned embodiment ground, favouring positive dirction with respect to frictional direction at slit S1 is under the anticlockwise situation, when the central point with slit S1 is the XY origin, is the length direction in slit with the directions X, when being the Width in slit with the Y direction, becomes the bight D of the 2nd quadrant and the 4th quadrant.Also have, favouring losing side with respect to frictional direction at slit S1 is under the clockwise situation, and disclination takes place the bight at the 1st quadrant and the 3rd quadrant in last XY coordinate system.

Proofread and correct with non-transparent figure portion 216, as amplify diagram ground with Figure 10, be linked to non-transparent figure portion 212 and form non-transparent figure portion 212 and expand shape in basic transparent figure portion 214, if in other words then dwindle the shape of basic transparent figure portion 214, to be linked to non-transparent figure portion 212 with respect to its length direction be X-axis for example 45 degree favour the narrow banded non-transparent figure portion 219 of the width that counterclockwise prolongs, constitute with the non-transparent figure of the triangle that for example the forms right angled isosceles triangle portion 220 of the extended end that is formed at the non-transparent figure of this band shape portion 219.

At this, the width dimensions I of banded non-transparent figure portion 219 and set forr a short time to the prolongation size J of the leading section of the non-transparent figure of triangle portion 220 than the width dimensions H of non-transparent figure portion 212 from the end of non-transparent figure portion 212.

If lift one of the size example, then when the width with the elongated electrode part of the pixel electrode after being formed at etching 24 be that the width dimensions W of line is when being about 3.0 μ m, can make the width dimensions H of non-transparent figure portion 212 is about 3.6 μ m, in this case, can to make the prolongation size J that proofreaies and correct with non-transparent figure portion 216 be about 1.5 μ m, make width dimensions I is about 1.4 μ m.

About Fig. 4 and Fig. 5 as previously mentioned, by utilizing only luminous effect, can access the following fine pattern of resolution of exposure device, in the example of Figure 10, only in basic transparent figure portion 214 or non-transparent figure portion 212, because the limit of the resolution of exposure device, exposure figure is circular-arc in the end of its length direction, by meticulous correction being set with non-transparent figure portion 216, circular-arc shape is proofreaied and correct, can become the exposure figure that quite approaches rectangle.

Thereby,,, can set forr a short time than the minimum dimension of basic transparent figure portion 214 or non-transparent figure portion 212 so proofread and correct size with non-transparent figure portion 216 because utilize the dipped beam effect.In above-mentioned example, if the resolution of exposure device is about 3 μ m, then can make the minimum dimension of basic transparent figure portion 214 become big about 3.6 μ m of about 3 μ m, make the minimum dimension of proofreading and correct with non-transparent figure portion 216 become little about 1.4 μ m of 3 μ m than the resolution of exposure device than the resolution of exposure device.

So the peristome electrode forms mask 200, can adopt following mask: according to the manufacture method of general exposed mask, make the minimum dimension of basic transparent figure portion 214 become the allowed band of the resolution of exposure device, in the end of the length direction of basic transparent figure portion 214, for correction that the little size with the resolution that exceeds exposure device is set with transparent figure portion 216 and form transparent figure portion.

And, about proofreading and correct with transparent figure portion 218, have with the correction of aforesaid Fig. 4 and Fig. 5 with the same formation of transparent figure portion 118.

Though in the 3rd embodiment, the situation that becomes pectination about the pixel electrode 24 that makes aforesaid the 1st embodiment is illustrated, and is not limited thereto, and also can make the pixel electrode of aforesaid the 2nd embodiment become pectination.

Next, the 4th embodiment of the present invention is described based on accompanying drawing.

Figure 12 is the vertical view that expression applies the present invention to be undertaken by the FFS pattern of common-black type the embodiment under the situation of liquid crystal indicator of work, in the accompanying drawings, the 1st, liquid crystal indicator is configured to a plurality of pixels 3 rectangular and constitutes display part 2.In Figure 12, the one part of pixel 3 of display part 2 only is shown.

Display part 2, as be shown in Figure 12 ground, to form with the directions X be horizontal direction, be the rectangular-shaped of vertical direction with the Y direction, along this horizontal direction, many the grid lines 4 of supplying with pixel selection signal keep predetermined space to dispose, and the thread cast-off 5 of vertically, supplying with shows signal keeps predetermined space to dispose.Also have, the horizontal direction of display part 2 is set at: watching under the situation of display part 1 by the polarization sunglasses, becoming parallels with the absorption axes of this polarization sunglasses.

The pixel region configuration pixel 3 of being surrounded with these grid lines 4 and thread cast-off 5.In each pixel 3, be provided in pixel form the zone upper left bight make grid line 4 become the thin film transistor (TFT) TR of gate electrode.

And, pixel 3, as be shown in the sectional view ground of Figure 13, become sandwich construction, has the 1st transparency carrier 12 that constitutes by glass etc. that below backlight 10, is formed with the 1st polarization plates 11 in subtend, formation buffer film 13 on the 1st transparency carrier 12, this above buffer film 13 configuration constitute thin film transistor (TFT) TR with Figure 12 be seen as U word shape with the formed active layer 14 of polysilicon, cover this active layer 14 ground configuration gate insulating film 15.

Subtend at gate insulating film 15 makes that above active layer 14 passing active layer 14 ground for 2 times disposes grid line 4 and become double-gate structure.And gate insulating film 15 and grid line 4 are covered with interlayer dielectric 16.On this interlayer dielectric 16, configuration is by contact hole CH1 thread cast-off 5 that is connected with the leakage 17 of thin film transistor (TFT) TR and the source electrode 19 that is connected with source 18 by contact hole CH2.

These thread cast-offs 5 and source electrode 19 cover with passivating film 20, form planarization film 21 on this passivating film 20.Also have, passivating film 20 may not need, and also can omit.

On planarization film 21, relative with source electrode 19 to position configuration have the common electrode 22 of peristome 22a.This common electrode 22 for example forms as whole facial mask in disposing the demonstration effective coverage of pixel 3, in the zone that does not dispose pixel 3, by contact hole (not shown), is connected with the common electrode line (not shown) of supplying with common potential.And, both can form the band shape that is parallel to grid line or thread cast-off ground one-tenth row, also can every pixel all connect with electrode wires together.

And, on common electrode 22, dispose pixel electrodes 24 by dielectric film 23.This pixel electrode 24 is connected with source electrode 19 by peristome 22a, planarization film 21 and the passivating film 20 formed contact hole CH3 that pass dielectric film 23, common electrode 22.

And pixel electrode 24 is covered with alignment films 25, and the frictional direction of this alignment films 25 is set at: becoming parallels with the axis of homology of the 1st polarization plates 11.

And, the 2nd transparency carrier 29 that below the top of alignment films 25 is configured in by the liquid crystal layer 26 with liquid crystal molecule M, has color filter 27 and alignment films 28.At this, the frictional direction of alignment films 28 has the frictional direction identical with aforesaid alignment films 25.And the liquid crystal molecule M of liquid crystal layer 26 is corresponding to the frictional direction institute initial orientation of alignment films 25 and 28, evenly be orientated.

And then configuration has and the 1st polarization plates 11 the 2nd polarization plates 30 of the axis of homology of quadrature mutually on the 2nd transparency carrier 29.

And, alignment films 25 and 28 frictional direction, as be shown in Figure 14 ground, consistent with horizontal direction (directions X).Pixel electrode 24, as be shown in Figure 14 ground becomes a pair of the 1st slit that the central portion that has at the length direction of pixel 3 has laterally zygomorphic seam shape and forms the double slit crack that regional A1 and the 2nd slit form regional A2 and constitute.

The 1st slit forms regional A1, has only tilted OBL many slit S1 of predetermined angular+θ s1 of frictional direction with respect to alignment films 25 and 28 and keeps predetermined space L1 to be formed at vertical direction abreast.

And the 2nd slit forms regional A2, has only tilted OBL many slit S2 of predetermined angular-θ s1 of frictional direction with respect to alignment films 25 and 28 and keeps predetermined space L1 to be formed at vertical direction abreast.

Thereby the 1st slit forms regional A1 and the 2nd slit forms regional A2, and the relation ground that the angle that makes the length direction of the length direction of pixel 3 and slit S1 and S2 form becomes the supplementary angle disposes.

And, pixel electrode 24, make neighboring 31 that the 1st slit forms regional A1 side become the minor face ground that parallels with slit S1 and form, make neighboring 32 that the 2nd slit forms regional A2 side become the minor face ground that parallels with slit S2 and form in the position that the slit S2 from the most peripheral side only leaves preset distance L2 in the position that the slit S1 from the most peripheral side only leaves preset distance L2.

And, pixel electrode 24, formation becomes the two ends, the left and right sides that individually link neighboring 31 and 32 respectively and prolongs in the subtend outer peripheral edges 33 and 34 on the long long limit of vertical direction along thread cast-off 5, forms trapezoidal shape by each neighboring 31～34.

At this, it is peristome that the 1st slit forms each slit S1 and the S2 that regional A1 and the 2nd slit form regional A2, is the peristome that is used for applying voltage and by consequent electric field liquid crystal molecule M being driven between as pixel electrode 24 by dielectric film 23 formed upper electrodes and the common electrode 22 as lower electrode.At each gap area A1 and A2, be formed at vertical direction (Y direction) abreast by making a plurality of slit S1 and S2, the transmissivity at each gap area A1 and A2 is improved.

And, the 1st slit forms the slit S1 of regional A1, its pitch angle+θ s1 is set at respect to greatly for example about+5 degree of the frictional direction of alignment films 25 and 28～+ 15 degree for the sense of rotation of the liquid crystal molecule M that do not make liquid crystal layer 26 becomes uncertain, preferred big approximately+values of 5 degree.

And, the 2nd slit forms the slit S2 of regional A2, its pitch angle-θ s1 also becomes uncertain for the sense of rotation of the liquid crystal molecule M that do not make liquid crystal layer 26, is set at little for example about-5 degree of frictional direction～-15 degree with respect to alignment films 25 and 28, preferably approximately little-5 values of spending.

And each slit S1 and S2 make the both ends of its length direction, with respect to subtend in the subtend outer peripheral edges 33 and 34 of the pixel electrode 24 at their both ends only preset distance L3 become medially and form.The result, pixel electrode 24, have following formation: with the lateral electrode portion 35 and 36 that forms subtend outer peripheral edges 31 and 32, with the lateral electrode portion 37 that forms subtend outer peripheral edges 33 and 34 and 38 and become trapezoidal shape, lateral electrode portion 37 and 38 are linked with the binding electrode part 39 that form slit S1 and S2.

And then, the 1st slit forms slit S1 and the S2 that regional A1 and the 2nd slit form regional A2 boundary position, make that linking electrode part 39 in the position of lateral electrode portion 37 forms on overlaid ground each other,, form the slit S3 that the end is opened wide to neighboring 34 in these lateral electrode portion 38 sides.

This slit S3, because the resolution of photo-mask process, as be shown in Figure 14 ground, slit S1 and S2 with respect to the pitch angle+θ s1 of frictional direction and-θ s1 is little and under the situation that gap width is narrow, can become the shape that 34 sides are opened wide in the neighboring, and pitch angle+θ s1 and-θ s1 is big and under the situation that gap width is wide, then can become the shape of stopping up lateral electrode portions 38 side ends with lateral electrode portion 38.

This pixel electrode 24 when graphical, exists because photo-mask process and bight become slightly the situation with the shape of fillet.In order to do one's utmost to avoid this fillet, if be used in the figure of patterned mask, become the figure of having considered the dipped beam effect, then this fillet can be suppressed degree for ignoring.

And the bight, lower-left that forms regional A2 in the 2nd slit of pixel electrode 24 forms aforesaid thin film transistor (TFT) TR.

And, as be shown in Figure 12 ground, by the lateral electrode portion 35 of pixel electrode 24 makes their part be configured with thread cast-off 5 with overlapping each other to overlooking at least, the end that can make slit S1 can make the transmissivity in the pixel 3 further improve near thread cast-off 5.And, be configured with grid line 4 by lateral electrode portion 35 pixel electrode 24 with making their non-overlapping copies, can control the liquid crystal molecule M between lateral electrode portion 35 and the grid line 4 by lateral electrode portion 35 and as the electric field of the common electrode 22 of the lower electrode that forms greatlyyer, the transmissivity in the pixel 3 is further improved than pixel electrode 24.

If action to liquid crystal indicator 1 with above-mentioned formation, describe with reference to Figure 13, then under electric field does not result from cut-off state between common electrode 22 and the pixel electrode 24, the liquid crystal molecule M of liquid crystal layer 26 evenly is orientated, its long axis direction, for example the axis of homology with the 1st polarization plates 11 parallels.At this moment, the light of the backlight 10 by 11 straight line polarizations of the 1st polarization plates carries out transmission and is incident in the 2nd polarization plates 30 liquid crystal layer 26 with original polarization axle.But, this light, because the axis of homology of its polarization axle and the 2nd polarization plates 30 quadrature mutually, so absorb by the 2nd polarization plates 30.That is, become black display (normal black).

On the other hand, under electric field resulted from conducting state between common electrode 22 and the pixel electrode 24, corresponding to this electric field, the major axis of the liquid crystal molecule M of liquid crystal layer 26 essentially horizontally was rotated with respect to the 1st transparency carrier 12.At this moment, the light of the backlight 10 by 11 straight line polarizations of the 1st polarization plates becomes elliptic polarization by the birefringence in the liquid crystal layer 26, is incident in the 2nd polarization plates 30.Among this elliptic polarization, with the corresponding to component of the axis of homology of the 2nd polarization plates 30 by outgoing, become white and show.

At this moment, because the neighboring 31 and 32 of the lateral electrode portion 35 of pixel electrode 24 and 36 parallels ground respectively and forms with slit S1 and S2, so be compared to the profile that makes pixel electrode 24 is that OBL situation does not produce unnecessary surplus in lateral electrode portion 35 and 36, and the transmissivity of each pixel 3 is improved.

And, because thin film transistor (TFT) TR becomes the double-gate structure that grid line 4 passes active layer 14 for twice, so can reduce thin film transistor (TFT) the formation zone area and but to make the ratio of viewing area be that aperture opening ratio improves.

Also have,, undertaken under the situation of work,, supply with the different shows signal of polarity at each pixel electrode 24 with each adjacent pixel 3 of vertical direction by what is called row inversion driving disposing each pixel 3 of pixel electrodes 24.Therefore, exist demonstration that the intermediate treatment owing to different shows signal can not get expecting, in the situation of the boundary vicinity generation poor display of those pixels 3.For fear of this problem, do one's utmost to separate though can make with each pixel electrode 24 of each adjacent pixel 3 of vertical direction,, if separating distance is obtained the too big decline that then causes transmissivity.

Therefore, preferably: the distance of the subtend outer peripheral edges of side's pixel electrode 24 31 and the subtend outer peripheral edges 32 of the opposing party's pixel electrode 24, for 2 times of the scope of the rotation that obtains expecting by electric field with the liquid crystal molecule M in the outside of the subtend outer peripheral edges 31 of pixel electrode 24 and 32 equate, than its big slightly scope.For example, if with among each adjacent pixel electrode 24, the neighboring 31 of side's pixel electrode 24, with the distance of the neighboring 32 of the opposing party's pixel electrode 24 be D1, then be 5 μ m＜D1＜15 μ m, be 7 μ m＜D1＜10 μ m as suitable example.

Also have, in above-mentioned the 4th embodiment, if the end shape of slit S1 and S2 has fillet, then there be the zone of the sense of rotation of liquid crystal molecule M, take place to become black display and the disclination of the phenomenon that transmissivity descends as the zone that should become the white demonstration originally with respect to the direction generation counter-rotating of expection.In order to suppress the generation of this disclination, the end shape of slit S1 and S2 need not be with fillet ground to form, as the mask that in photo-mask process for this reason, uses, use as be shown in Figure 15, the peristome electrode forms mask 100.

This peristome electrode forms mask 100, form basic transparent figure portion 113 corresponding to the shape of slit S1 in the subtend of pixel electrode 24 forms regional A1 in the 1st slit position based on the mask of Fig. 4 of being used for the 1st embodiment, form basic transparent figure portion 114 in subtend forms regional A2 in the 2nd slit position, form the correction that suppresses of disclination with transparent figure portion 115,116 and 117,118 corresponding to the shape of slit S2.

At this, the part of the generation disclination of basic transparent figure portion 113, because the 1st slit forms the slit S1 of regional A1, favour square i.e. counter clockwise direction with respect to frictional direction, so when the central point with slit S1 is the XY origin, is the length direction in slit with the directions X, when being the Width in slit with the Y direction, becomes the bight of the 2nd quadrant and the 4th quadrant.And, the part of the generation disclination of basic transparent figure portion 114, because the 2nd slit forms the slit S2 of regional A2, favouring negative direction with respect to frictional direction is clockwise direction, so become the bight E of the 1st quadrant and the 3rd quadrant in above-mentioned XY coordinate system.

Each proofreaies and correct the transparent figure portion that uses, and uses transparent figure portion similarly to constitute with the correction of the Fig. 5 that is used for the 10th embodiment, and detailed size is set and also can similarly be used.

Expose if use the peristome electrode with above-mentioned formation to form mask 100, then light is by basic transparent figure portion 113,114 and proofread and correct with transparent figure portion 115～118, and the photonasty resist that exposes.If this photonasty resist of exposure, then because its characteristic changes, so, can remove exposed portion by adopting suitable developer solution, thus, the photonasty resist forms peristome by the shape identical with basic transparent figure portion 114 on the photonasty resist.By so adopting the photonasty resist that forms peristome, pixel electrode is carried out etching with the transparent conductive material film, formation has corresponding to the slit S1 of the shape of the peristome of photonasty resist and the pixel electrode 24 of S2.

Below, the 5th embodiment of the present invention is described about Figure 16 and Figure 17.

The 5th embodiment is at the boundary portion formation thin film transistor (TFT) TR of the 1st slit A1 of formation portion and the 2nd A2 of slit formation portion.

Promptly, in the 5th embodiment, as be shown in Figure 16 ground, the boundary portion that forms regional A1 and the 2nd A2 of slit formation portion except the 1st slit of the pixel electrode in pixel 3 24 forms thin film transistor (TFT) TR and has and the same formation of aforesaid the 4th embodiment the counter-rotating about the direction that is pixel electrode 24 in thread cast-off 5 adjacent pixels 3 along the vertical direction, and with the additional prosign of the counterpart of Fig. 1, its detailed description is omitted.

In the 5th embodiment, the 1st slit form regional A1 and the 2nd slit form each the slit S1 of regional A2 and S2 pitch angle+θ s1 and-absolute value of θ s1 sets for than the big angle of aforementioned the 4th embodiment.

And, form boundary position slit S1 ' and S2 ' that regional A1 and the 2nd slit form regional A2 in the 1st slit, as amplify diagram ground with Figure 18, be V word shape with its lateral electrode portion 37 side be connected to forms, and lateral electrode portion 38 stops up in the position of only leaving the distance L 5 bigger than distance L 2 from this lateral electrode portion 38, forms transistor counter electrode portion 40.

And, as being shown in Figure 17 ground, subtend forms the active layer 14 that is seen as U word shape with Figure 16 in the downside of transistor counter electrode portion 40, and 8 ground of leakage 17 and source that make grid line 4 pass this active layer 14 for twice form the thin film transistor (TFT) TR that double grid constitutes.The source electrode 18 of this thin film transistor (TFT) TR is electrically connected on transistor counter electrode portion 40 by contact hole CH2, source electrode 19, contact hole CH3.

If according to the 5th embodiment, then by form the boundary position that regional A1 and the 2nd slit form regional A2 in the 1st different slit of the vergence direction of slit S1 and S2, form relative with thin film transistor (TFT) TR to transistor counter electrode portion 40, and make this transistor counter electrode portion 40, as be shown in Figure 17 ground, be connected in the source 18 of thin film transistor (TFT) TR, active layer 14 ground that cross this thin film transistor (TFT) TR for 2 times set grid line 4, as be shown in Figure 16 ground, the central portion ground that can cross the above-below direction of 1 pixel 3 sets grid line 4, can make pixel 3 minimized designs.

And, become double-gate structure by making thin film transistor (TFT) TR as described above, can make the formation miniaturization, can make the 1st slit form regional A1 and the 2nd slit and form between regional A2 narrowly, pixel 3 is further minimized.

And then, because adjacent pixel electrodes about 24 counter-rotatings, so 3 of adjacent pixels, slit S1 or S2 become consecutive abreast state, because become seamless state, so the transmissivity of 3 of adjacent pixels is improved 3 of pixels.

Below, the 6th embodiment of the present invention is described about Figure 19 and Figure 20.

In the 6th embodiment, pixel electrode is formed pectination.

Promptly, in the 3rd embodiment, as be shown in Figure 19 and Figure 20 ground, lateral electrode portion 38 except the right side that do not form the pixel electrode 24 in aforesaid the 4th embodiment, and pixel electrode 24 forms and has outside the pectination and aforesaid Figure 12 and the same formation of Figure 14, add prosign at the counterpart with Figure 12 and Figure 14, its detailed description is omitted.

If according to the 6th embodiment, then because do not form the lateral electrode portion 38 of the pixel electrode 24 in the 4th embodiment, and become the pixel electrode 24 of pectination, so do not form the end of slit S1, transmissivity is improved.

In the 6th embodiment, the pixel electrode 24 of pectination takes place also must not form with fillet ground at end shape in order not make disclination, as the mask that in photo-mask process for this reason, uses, use as be shown in Figure 21, peristome electrode formation mask 200.

This peristome electrode forms mask 200, form basic transparent figure portion 213 and 214 based on the mask of Figure 15 of being used for the 4th embodiment in the position corresponding to slit S1 and S2 of pixel electrode 24, make the correction that suppresses of disclination is expanded with non-transparent figure portion 215,216 and basic transparent figure portion 213,214 and formed the correction that suppresses usefulness transparent figure portion 217,218 to disclination corresponding to the shape of slit S1 and S2.

At this, the position of the generation disclination of basic transparent figure portion 213, as the 4th above-mentioned embodiment ground, favouring positive dirction with respect to frictional direction as S ground 1, slit is under the anticlockwise situation, when the central point with slit S1 is the XY origin, is the length direction in slit with the directions X, when being the Width in slit with the Y direction, becomes the bight D of the 2nd quadrant and the 4th quadrant.And the position of the generation disclination of basic transparent figure portion 214 is under the clockwise situation favouring negative direction with respect to frictional direction as S2 ground, slit, becomes the bight of the 1st quadrant and the 3rd quadrant in above-mentioned XY coordinate system.

Proofread and correct the transparent figure portion that uses, use transparent figure portion similarly to constitute with the correction of the Figure 10 that is used for the 3rd embodiment, detailed size is set and also can similarly be used.

Though in the 6th embodiment, the situation that becomes pectination about the pixel electrode 24 that makes aforesaid the 4th embodiment is illustrated, and is not to be defined in this, also can make the pixel electrode of aforesaid the 5th embodiment become pectination.

Also have, though in above-mentioned the 1st～the 3rd embodiment, length direction about the slit S1 of pixel electrode 24 is illustrated with respect to the situation that frictional direction favours positive dirction, but is not to be defined in this, also can favour negative direction with respect to frictional direction.

And, though in above-mentioned the 1st～the 3rd embodiment, be disposed at liquid crystal molecule M side about pixel electrode 24 among common electrode 22 and the pixel electrode 24, the situation that forms slit S1 is illustrated, but be not to be defined in this, common electrode 22 is disposed under the situation of liquid crystal molecule M side,, is forming slit S1 at common electrode 22 and get final product as long as replace pixel electrode 24.

Also have, though in above-mentioned the 4th～the 6th embodiment, be disposed at liquid crystal molecule M side about pixel electrode 24 among common electrode 22 and the pixel electrode 24, the 1st slit that formation has slit S1 and a S2 forms the situation that regional A1 and the 2nd slit form regional A2 and is illustrated, but be not to be defined in this, common electrode 22 is disposed under the situation of liquid crystal molecule M side, as long as replace plain electrode 24, form the 1st slit at common electrode 22 and form regional A1 and the 2nd slit and form regional A2 and get final product with slit S1 and S2.

And, though in above-mentioned the 1st～the 6th embodiment, form U word shape about the active layer 14 that makes thin film transistor (TFT) TR, the situation that making grid line 4 cross these active layer 14 ground twice becomes double-gate structure is illustrated, but be not to be defined in this, as be shown in Figure 11 ground, can make active layer 14 form linearity yet, forming position branch with active layer 14 corresponding to this at grid line is two strands branching portion 300, becomes the double-gate structure that grid line 4 crosses active layer 14 for twice.

Further, though in above-mentioned the 1st～the 6th embodiment, the situation of carrying out work by the FFS pattern of common-black type about pixel 3 is illustrated, but is not to be defined in this, also can use the present invention about the liquid crystal indicator that carries out work by the FFS pattern of normally white.Under this situation, as long as change the relation of the axis of homology, alignment films 25 and 28 the frictional direction of the 1st polarization plates 11 and the 2nd polarization plates 30 corresponding to normally white.

Claims (17)

1. liquid crystal indicator is characterized in that:

Make the pixel that forms display part, comprise at least seize liquid crystal layer on both sides by the arms and relatively to a pair of substrate, seize common electrode and pixel electrode that the liquid crystal molecule to the foregoing liquid crystal layer that dielectric film disposes drives on both sides by the arms with being arranged at the square substrate of one of aforementioned a pair of substrate;

The electrode of the foregoing liquid crystal layer side among aforementioned common electrode and the aforementioned pixel electrode has length direction with respect to the aforementioned pixel slit of predetermined angular that tilted, and has the subtend outer peripheral edges that parallel with this slit.

2. liquid crystal indicator according to claim 1 is characterized in that:

Aforementioned slit forms the parallelogram shape in the comparison of the length direction in this slit of the electrode of foregoing liquid crystal layer side in the inner part to outer peripheral edges.

3. liquid crystal indicator according to claim 1 is characterized in that:

Aforementioned slit prolongs until one of the subtend outer peripheral edges of the length direction in this slit of the electrode of foregoing liquid crystal layer side side, and this electrode becomes pectination.

4. liquid crystal indicator according to claim 1 is characterized in that:

Aforementioned slit forms a plurality of on the electrode of foregoing liquid crystal layer side parallel to each other.

5. liquid crystal indicator according to claim 1 is characterized in that:

Lateral electrode portion at least a portion does not set with grid line overlaid ground in the electrode of foregoing liquid crystal layer side.

6. liquid crystal indicator according to claim 1 is characterized in that:

Lateral electrode portion at least a portion and thread cast-off overlaid ground set in the electrode of foregoing liquid crystal layer side.

7. liquid crystal indicator according to claim 1 is characterized in that:

Be formed at the slit of the electrode of foregoing liquid crystal layer side, form with respect to the frictional direction predetermined oblique angle.

8. liquid crystal indicator according to claim 1 is characterized in that:

Aforementioned slit uses the mask that is formed with expansion slit portion to form at the position that disclination took place of peristome side.

9. liquid crystal indicator according to claim 3 is characterized in that:

Aforementioned slit uses the mask that is formed with expansion electrode portion to form at the position that disclination took place.

10. liquid crystal indicator is characterized in that:

Make the pixel that forms display part, comprise at least seize liquid crystal layer on both sides by the arms and relatively to a pair of substrate, seize common electrode and pixel electrode that the liquid crystal molecule to the foregoing liquid crystal layer that dielectric film disposes drives on both sides by the arms with being arranged at the square substrate of one of aforementioned a pair of substrate;

In the electrode of the foregoing liquid crystal layer side among aforementioned common electrode and the aforementioned pixel electrode, have with respect to tilted at least one pair of slit in slit of predetermined angular of frictional direction and form the relation ground that angle that the length direction in the length direction of aforementioned pixel in the zone and aforementioned slit forms becomes the supplementary angle and dispose, and aforementioned pair of slits form one of regional square slit form in the zone form the neighboring of regional opposition side with the opposing party slit and the length direction in this slit forms substantially parallel.

11. liquid crystal indicator according to claim 10 is characterized in that:

Aforementioned pair of slits form the zone separately in, the slit that is formed at the electrode of foregoing liquid crystal layer side forms a plurality of parallel to each other.

12. liquid crystal indicator according to claim 10 is characterized in that:

Aforementioned slit prolongs until one of the subtend outer peripheral edges of the length direction in this slit of the electrode of foregoing liquid crystal layer side side, and this electrode becomes pectination.

13. liquid crystal indicator according to claim 10 is characterized in that:

In aforementioned pixel, set aforementioned pair of slits and form the zone.

14. liquid crystal indicator according to claim 13 is characterized in that:

Form the peripheral edge portion in zone in an aforementioned side slit, form the active control part that the voltage that puts on aforementioned pixel electrode is controlled.

15. liquid crystal indicator according to claim 10 is characterized in that:

Form the zone, form in the zone with the slit adjacent to side's pixel of the opposing party's pixel adjacent to the slit adjacent to the opposing party's pixel of side's pixel among the pixel of the orientation in aforementioned slit, both sides' slit becomes and sets abreast.

16. liquid crystal indicator according to claim 15 is characterized in that:

Form regional boundary position in aforementioned pair of slits, set grid line from gate signal to the grid of the active control part that the voltage that puts on pixel electrode is controlled that supply with.

17. liquid crystal indicator according to claim 16 is characterized in that:

Aforementioned active control part is crooked and intersect 2 times with aforementioned grid line.

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