CN101349549B - System for measuring high temperature moire interference deformation - Google Patents
System for measuring high temperature moire interference deformation Download PDFInfo
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- CN101349549B CN101349549B CN2008101198052A CN200810119805A CN101349549B CN 101349549 B CN101349549 B CN 101349549B CN 2008101198052 A CN2008101198052 A CN 2008101198052A CN 200810119805 A CN200810119805 A CN 200810119805A CN 101349549 B CN101349549 B CN 101349549B
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- 238000012360 testing method Methods 0.000 claims abstract description 43
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Abstract
A high temperature moire interference deformation measuring system belongs to the technical field of optical measurement mechanics, engineering material, component deformation and displacement testing. The invention is formed by an optical maser, a light splitting coupler, a high temperature furnace, a six-dimension adjustable bracket and a moire interference optical path system. The measuring system can realize the high precision timing measuring for u and v displacement fields under the high temperature condition, and uses the green light illumination to avoid the hot radiation red light from affecting the measurement, and realizes the automatic measurement of a displacement field inside a surface through an optical switch, and solves the observing window design of the high temperature furnace through a cross form split double-layer silica glass, and simultaneously uses a lens with 600 lights/mm optical grating, long focus and great diameter as a field lens, thereby increasing the measuring object distance, reducing the affect of high temperature to the measuring system, and increasing the fringe resolution factor. The problem that tested element in the high temperature furnace is difficult to regulate is solved through the six-dimension adjustable bracket and the regulation of the moire interference optical path system. The system has convenient usage and high measuring sensitivity.
Description
Technical field
A kind of system for measuring high temperature moire interference deformation belongs to optical measurement mechanics, construction material, the deformation of member and displacement measurement technical field.
Background technology
In recent years along with science and technology development, the application of material under hot conditions more and more widely, as the high-temperature pipe of generating plant, thermofin of aerological sounding or the like.Therefore the mechanical property of exosyndrome material under hot conditions just becomes the emphasis and the focus of present stage research, just becomes the matter of utmost importance that this research need solve and how to obtain the distortion situation of material under hot conditions.Conventional deformation measurement method mainly comprises electrical measurement method and measuring method two big classes.The electrical measurement method mainly is to realize by strain ga(u)ge, its measuring accuracy height, but because strain ga(u)ge need be from sticking with glue on the test specimen surface, and it measures temperature variation relatively more responsively, so electric measuring method is difficult for realizing the accurate measurement under the hot conditions.Measuring method adopts non-cpntact measurement, can reduce the influence of temperature to measuring, so the deformation measurement under the hot conditions adopts measuring method usually.Method of testing commonly used in the measuring method is exactly the moire interference method.
The moire interference method mainly is based on principle of optical interference, by on the test specimen surface interference of light taking place, obtains interference fringe, analyzes the whole field deformation of object from interference fringe.The moire interference method is measured highly sensitive, can obtain the deformation information of the whole audience.The moire interference system of present existing relatively more accurate name mainly contains the 2 D phase shift watering interferometer (Chinese patent application 200510025444.1) of the two-dimentional moire interferometer of Photomechanics Co., the intelligent moire interferometer of University Of Tianjin (Chinese patent application 94118741.1), Shanghai 711 research institutes and the multifunction three-dimensional displacement laser interferometry system (Chinese patent application 200410000005.0) of Tsing-Hua University.These systems have mainly realized u based on the ultimate principle of moire interference, the measurement of two displacement fields of v, wherein the multifunction three-dimensional displacement laser interferometry system combines moire interference method and two kinds of measuring systems of electronic speckle pattern interferometry method, has realized the measurement of three-D displacement field.But these systems are primarily aimed at the routine measurement exploitation, its image-forming range is near, and the temperature field is bigger to measuring the light path influence, and the adjusting support generally links to each other with the test specimen loading frame, in high temperature measurement,, can't directly mediate to the test specimen position because the test specimen loading frame is arranged in high temperature furnace.The material deformation that these reasons have caused existing measuring system can't directly apply under the hot conditions is measured.
Summary of the invention
The purpose of this invention is to provide a kind of system for measuring high temperature moire interference deformation, can realize the real-time measurement of the in-plane displacement field of material under the hot conditions, easy to use, highly sensitive, compact conformation.
Technical scheme of the present invention is as follows:
A kind of system for measuring high temperature moire interference deformation, contain image capturing system, laser instrument, light splitting coupler, have the high temperature furnace of observation window, sextuple adjusting bracket and moire interference light path system, described moire interference light path system comprises moire interference optical element case, camera lens and grating; Moire interference optical element case is placed on the sextuple adjusting bracket, image capturing system, camera lens and grating are located along the same line, grating sticks on the test specimen surface, and test specimen is placed in the high temperature furnace that has observation window, and laser instrument, light splitting coupler are positioned at the same side of moire interference light path system.
A kind of system for measuring high temperature moire interference deformation is characterized in that the grating that adopts in the moire interference light path system is the grating of 600 lines/mm; It is characterized in that moire interference light path system employing focal length is at least 100mm, diameter is at least the camera lens of 50mm as field lens; It is characterized in that laser instrument is the semiconductor green (light) laser, its wavelength is 533nm.
In the technical scheme of the present invention, it is characterized in that: in the described system for measuring high temperature moire interference deformation, adopt photoswitch as light splitting coupler, the laser that laser instrument is sent is divided into two-way, imports via single-mode fiber and one-to-two optical fiber splitter and measures light path.
In the technical scheme of the present invention, it is characterized in that: the described high temperature furnace that has observation window, its observation window adopt the double-deck quartz glass Precision Machining of cruciform piecemeal to form, and the characteristic dimension of inner glass is l
1=l
0+ 2t
1Tan18.6 °, the characteristic dimension of glass outer is l
2=l
0+ 2t
2Tan18.6 °, l wherein
0Be test specimen surface measurement provincial characteristics size, t
1, t
2Be respectively the distance of test specimen to inner layer glass and glass outer.
The present invention compared with prior art, have the following advantages and the high-lighting effect: this measuring system adopts green light semiconductor to avoid under the hot conditions test specimen surface heat radiation ruddiness to measuring the influence of striped as measurement light source, the employing focal length is at least 100mm, diameter is at least the camera lens of 50mm as field lens, increase image-forming range and reduce the temperature field measuring the influence of light path, and adopt photoswitch to control the switch of light path, realize the control of the robotization of 2 orientation measurement light paths.The present invention adopts the direction of sextuple adjusting bracket control moire interference light path system to regulate, and solves the problem that the test specimen position is difficult to regulate in the high temperature furnace.The high temperature furnace observation window adopts double-deck piecemeal quartz glass Precision Machining to form among the present invention, solves the problem that laser accurately enters high temperature furnace under the hot conditions, adopts the design of cruciform piecemeal to avoid that quartz glass expands the problem of breaking under the hot conditions simultaneously.The present invention is easy to use, compact conformation.Use the grating of 600 lines/mm, and have following performance parameter:
Displacement measurement sensitivity: u field and v field are 0.834 μ m;
The zone of test zone: 40 * 40mm;
Enlargement factor: 0.5X～100X
Striped resolution: 100 stripeds/mm
Strain measurement scope: 10 μ ε～10% ε
Description of drawings
Fig. 1 is structural representation of the present invention (containing moire interference light path system v field light path)
Fig. 2 is the used cruciform quartz glass synoptic diagram of the present invention
Fig. 3 is the used cruciform quartz glass side view of the present invention
Fig. 4 is the used sextuple adjusting bracket synoptic diagram of the present invention
Fig. 5 is the A-A sectional view of Fig. 4
Among the figure: the 1-image capturing system; The 2-laser instrument; The 3-light splitting coupler; 4-has the high temperature furnace of observation window; The sextuple adjusting bracket of 5-; 6-moire interference light path system; The 7-test specimen; The 8-camera lens; The 9-observation window; The 10-three-dimensional adjustable shelf; 11-left and right adjusting rotary knob; 12-up-down adjustment micrometer leading screw; Regulate rotary knob before and after the 13-; 14-one-to-two fiber optic splitter; 15-first laser couplers; 16-second laser couplers; 17-first catoptron; 18-second catoptron; 19-first collimation lens; 20-second collimation lens; 21-the 3rd catoptron; 22-the 4th catoptron; The laser of 23-v field; The laser of 24-u field; The accurate translation stage of 25-x direction; 26-elevating translational platform; The accurate translation stage of 27-y direction; 28-pitching platform; Universal stage in the 29-face; 30-x direction rotary knob; The 31-linear guides; The 32-slide block mechanism; 33-lifting rotary knob; The 34-elevating lever; The 35-screw rod; 36-y direction micrometer screw mandrel; The 37-flat board; The 38-support spring; The 39-ball; 40-first adjusting screw(rod); 41-second adjusting screw(rod); The 42-clamp-screw; Rotation micrometer screw mandrel in the 43-face; The 44-grating
Embodiment
Further specify concrete structure of the present invention and embodiment below in conjunction with accompanying drawing:
As shown in Figure 1, system for measuring high temperature moire interference deformation of the present invention mainly is made up of image capturing system 1, laser instrument 2, light splitting coupler 3, the high temperature furnace 4 that has observation window, sextuple adjusting bracket 5 and moire interference light path system, all is installed on the experiment table.The moire interference light path system comprises moire interference optical element case 6, camera lens 8 and grating 44, and moire interference optical element case 6 is integrated into a camera bellows, is fixed on the testing table by sextuple adjusting bracket 5.On moire interference optical element case 6, image capturing system 1, camera lens 8 and grating 44 are located along the same line image capturing system 1 by a three-dimensional adjustable shelf 10 and screw retention.Grating 44 sticks on test specimen 7 surfaces, is placed on together in the high temperature furnace 6 that has observation window.Laser instrument 2 and light splitting coupler 3 are fixed on the testing table by trip bolt respectively, are positioned at the same side of moire interference light path system.
What laser instrument 2 of the present invention adopted is that wavelength is the semiconductor green (light) laser of 533nm.In hot environment, the test specimen surface can produce heat radiation, induces ruddiness, conventional moire interference system, adopt the red-light source illumination to form interference fringe on the test specimen surface, the interference fringe of its generation can be subjected to the influence of the ruddiness that heat radiation brings out, thereby causes fringe contrast to reduce.The present invention adopts the short green (light) laser of wavelength ratio ruddiness as lighting source, and it is little that the interference fringe on test specimen surface is influenced by ruddiness, the fringe contrast height.
The present invention adopts the grating 44 of 600 lines/mm as specimen grating, sticks on test specimen 7 surfaces.According to the moire interference theory, adopt the grating of 600 lines/mm can reduce angle of diffraction, thereby increase the distance between moire interference optical element case 6 and the high temperature furnace 5, promptly object distance reduces the influence of hot environment to moire interference optical element case 6.The camera lens 8 that adopts long-focus (focal length 250) major diameter (diameter 80mm) in the moire interference light path system is as field lens, can realize the measurement of big object distance, reduce hot environment to measuring the influence of light path, increased observation scope simultaneously, improved the resolution of striped.
Adopt photoswitch as light splitting coupler 3 among the present invention, the light that laser instrument 2 sends enters in the photoswitch 3, and in photoswitch inside, laser is divided into two-way, enters the measurement light path of u field, v field respectively.When measuring the v field displacement, photoswitch is opened the laser 24 that v field laser 23 is closed the u field simultaneously, reflects the laser light to the test specimen surface by optical interference circuit; When measuring the u field displacement, photoswitch is opened the laser 23 that u field laser 24 is closed the v field simultaneously, reflects the laser light to the test specimen surface by optical interference circuit.Be example to measure the v field displacement below, the structure of simple declaration optical interference circuit, v field laser 23 passes through single-mode fiber, enter one-to-two fiber optic splitter 14, be divided into two-way light, by first laser couplers 15 and second laser couplers 16 in the single-mode fiber importing moire interference light path system 6, behind first catoptron 17, second catoptron 18 and first collimation lens 19, second collimation lens, 20 collimations, reflex to test specimen 7 surfaces by the 3rd catoptron 21 and the 4th catoptron 22, form interference fringe.The light path of measurement u field displacement and the light path of above-mentioned measurement v field displacement are basic identical.
As shown in Figure 2, high temperature furnace 4 observation windows of the present invention adopt double-deck quartz glass 9 Precision Machining of cruciform piecemeal to form.High temperature furnace 4 adopts double-deck quartz glass as observation window in order to guarantee effect of heat insulation.Design the size of criss-cross observation window as shown in Figure 3 according to the angle of incident light strictness, according to the moire interference theory, the incident angle α of laser, the frequency f of Wavelength of Laser λ and grating should satisfy diffraction equation,
sinα＝λf (1)
The optical maser wavelength that the present invention adopts is λ=533nm, and grating frequency is f=600 line/mm, so the incident angle of laser is α=arcsin0.3198=18.6 °.Test specimen 7 surperficial may observe provincial characteristicss are of a size of l
0, inboard quartz glass 9a is t with the distance of test specimen 7
1, the characteristic dimension l of then inboard quartz glass 9a
1=l
0+ 2t
1Tan18.6 °; Outer quartz glass 9b is t with the distance of test specimen 7
2, the characteristic dimension l of outer quartz glass 9b then
2=l
0+ 2t
2Tan18.6 °.The used cruciform quartz glass of the present invention simultaneously adopts piecemeal to be spliced, formed the cruciform observation window jointly by two blocks of square quartz glasss and the square quartz glass of a block length, avoided bulk silica glass under hot environment, because the glass fragmentation that thermal expansion effects causes.
As shown in Figure 4, sextuple adjusting bracket of the present invention is made of jointly universal stage 29 and pitching platform 28 5 parts in the accurate translation stage 25 of x direction, the accurate translation stage 27 of y direction, elevating translational platform 26, the face.Described moire interference light path system links with sextuple adjusting bracket by screw, because the position of test specimen 7 is difficult for adjusting in the high temperature furnace 4, adjusting by sextuple adjusting bracket can realize accurately the moving and rotating of 6 directions of moire interference light path system, can guarantee just in time to shine test specimen 7 surfaces by observation window 9 by the laser of moire interference light path system 6.Described elevating translational platform 26 by screw retention on the accurate translation stage 25 of x direction, the accurate translation stage 27 of y direction by screw retention on elevating translational platform 26, pitching platform 28 is connected on the accurate translation stage 27 of y direction by screw, in the face universal stage 29 by screw retention on pitching platform 28.The accurate translation stage 25 of x direction mainly is by x direction rotary knob 30, and slide block mechanism 32 property guide rails 31 along the line are moved, and realizes the accurate translation of x direction; Elevating translational platform 26 on the accurate translation stage 25 of x direction, by lifting rotary knob 33, makes elevating lever 34 move along screw rod 35 by screw retention, realizes elevating movement; The accurate translation stage 27 of y direction, is driven by regulating y direction micrometer screw mandrel 36 on elevating translational platform 26 by screw retention, makes the top of the accurate translation stage 27 of y direction, does the translation of y direction along smooth tongue guide rail; Pitching platform 28 is connected on the accurate translation stage 27 of y direction by screw, pitching platform 28 is made up of two dull and stereotyped 37a and 37b, support spring 38, ball 39, first adjusting screw(rod) (end is a ball), 40 and second adjusting screw(rod) 41, show as Fig. 5, by first adjusting screw(rod) 40, can make upper flat plate be the axle rotation around the line of centres of the ball 39 and second adjusting screw(rod) 41, by second adjusting screw(rod) 41, can make upper flat plate be the axle rotation, thereby realize the rotation of two vertical plane directions around the line of centres of the ball 39 and first adjusting screw(rod) 40; In the face universal stage 29 by screw retention on pitching platform 28, universal stage is made up of two parts in the face, by clamp-screw 42 upper and lower is fixed, send out clamp-screw 42,360 degree rotations can be realized in top in face, screw clamp-screw 42,, can provide 10 degree with interior accurate positioning of rotating by rotation micrometer leading screw 43 in the adjusting range.
Image capturing system 1 among the present invention is used for images acquired, constitute by CCD and imaging lens, by three-dimensional adjustable shelf 10 and screw retention on moire interference optical element case 6, realize the move left and right of image capturing system 1 by left and right adjusting rotary knob 11, regulate rotary knob 13 by front and back and can realize moving forward and backward of image capturing system 1, can realize moving up and down of image capturing system 1 by up-down adjustment micrometer leading screw 12.
When adopting the present invention to measure, at first test specimen 7 is placed on the test specimen chuck in the high temperature furnace 4 that has observation window, by sextuple adjusting bracket 5, adjust moire interference optical element case 6, make laser just in time by the observation window on the high temperature furnace 9, shine test specimen 7 surfaces, the reflection ray on test specimen surface enters into image capturing system 1 by field lens 8.Regulated light splitting coupler 3 before on-test, light is entered measure v field displacement light path, by adjusting the position of each optical element in the moire interference optical element case 6, make the interference fringe on test specimen surface be in null field position (promptly not having interference fringe) just, make light go into to measure u field displacement light path again, the same operation is finished the null field of u field light path and is regulated; Regulate in the null field process,, adjust the position of image capturing system 1, guarantee collection image quality by three-dimensional adjustable shelf 10; After on-test,, write down the u field interference fringe picture and the v field interference fringe picture on test specimen surface respectively by image capturing system 1 by the automatic conversion of light splitting coupler 3 realization light paths; After the off-test, just can calculate the u field displacement and the v field displacement of test specimen according to the interference fringe field of u field and v field.
Claims (3)
1. system for measuring high temperature moire interference deformation, contain image capturing system (1), laser instrument (2), light splitting coupler (3), have the high temperature furnace (4) of observation window, sextuple adjusting bracket (5) and moire interference light path system, described moire interference light path system comprises moire interference optical element case (6), camera lens (8) and grating (44); Moire interference optical element case (6) is placed on the sextuple adjusting bracket (5), image capturing system (1), camera lens (8) and grating (44) are located along the same line, grating (44) sticks on test specimen (7) surface, test specimen (7) is placed in the high temperature furnace (4) that has observation window, laser instrument (2), light splitting coupler (3) is positioned at the same side of moire interference light path system, it is characterized in that: described moire interference light path system adopts focal length to be at least 100mm, diameter is at least the camera lens (8) of 50mm as field lens, and the grating that adopts in the moire interference light path system is the grating of 600 lines/mm; Described laser instrument (2) is the semiconductor green (light) laser, and its wavelength is 533nm.
2. according to the described system for measuring high temperature moire interference deformation of claim 1, it is characterized in that: adopt photoswitch as light splitting coupler (3), the laser that laser instrument (2) is sent is divided into two-way, imports via single-mode fiber and one-to-two optical fiber splitter (14) and measures light path.
3. according to the described system for measuring high temperature moire interference deformation of claim 1, it is characterized in that: the described observation window that has the high temperature furnace (4) of observation window adopts the double-deck quartz glass of cruciform piecemeal to constitute, and the characteristic dimension of inner glass is l
1=l
0+ 2t
1Tan18.6 °, the characteristic dimension of glass outer is l
2=l
0+ 2t
2Tan18.6 °, l wherein
0Be test specimen (7) surface measurement provincial characteristics size, t
1, t
2Be respectively the distance of test specimen (7) to inner layer glass and glass outer.
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| CN2008101198052A CN101349549B (en) | 2008-09-11 | 2008-09-11 | System for measuring high temperature moire interference deformation |
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| CN2008101198052A CN101349549B (en) | 2008-09-11 | 2008-09-11 | System for measuring high temperature moire interference deformation |
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| CN101576374B (en) * | 2009-06-19 | 2011-05-25 | 南昌航空大学 | Mobile moire interferometer |
| CN101813417B (en) * | 2010-03-19 | 2012-05-23 | 南昌航空大学 | High temperature moire experimental furnace |
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| CN104330044B (en) * | 2014-10-27 | 2017-07-28 | 清华大学 | High temperature dislocation related system |
| CN106679814A (en) * | 2016-11-22 | 2017-05-17 | 北京理工大学 | Microsecond infrared real-time temperature measuring system |
| CN106767478B (en) * | 2016-11-29 | 2018-03-09 | 北京卫星制造厂 | Structure Light deformation measuring method under a kind of thermal vacuum high and low temperature environment |
| CN108007375B (en) * | 2017-12-18 | 2019-09-24 | 齐齐哈尔大学 | A kind of 3 D deformation measurement method based on the double light source speckle-shearing interferometries of synthetic wavelength |
| CN110444494A (en) * | 2019-08-26 | 2019-11-12 | 广东工业大学 | A kind of device and method using interference light irradiation auxiliary etch |
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