CN101336381B - 利用化合物半导体的选择性蚀刻制造微透镜和集成有微透镜的光电器件的方法 - Google Patents
利用化合物半导体的选择性蚀刻制造微透镜和集成有微透镜的光电器件的方法 Download PDFInfo
- Publication number
- CN101336381B CN101336381B CN2006800517261A CN200680051726A CN101336381B CN 101336381 B CN101336381 B CN 101336381B CN 2006800517261 A CN2006800517261 A CN 2006800517261A CN 200680051726 A CN200680051726 A CN 200680051726A CN 101336381 B CN101336381 B CN 101336381B
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- Prior art keywords
- semiconductor layer
- compound semiconductor
- reactive metal
- described compound
- layer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
Abstract
Description
Claims (19)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2005-0114145 | 2005-11-28 | ||
KR1020050114145A KR20070055764A (ko) | 2005-11-28 | 2005-11-28 | 화합물 반도체의 선택적 식각을 이용한 마이크로렌즈 및마이크로 렌즈가 집적된 광전소자 제조 방법 |
KR1020050114145 | 2005-11-28 | ||
PCT/KR2006/005048 WO2007061271A1 (en) | 2005-11-28 | 2006-11-28 | Method for fabricating micro-lens and micro-lens integrated optoelectronic devices using selective etch of compound semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101336381A CN101336381A (zh) | 2008-12-31 |
CN101336381B true CN101336381B (zh) | 2010-05-19 |
Family
ID=38067442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006800517261A Expired - Fee Related CN101336381B (zh) | 2005-11-28 | 2006-11-28 | 利用化合物半导体的选择性蚀刻制造微透镜和集成有微透镜的光电器件的方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8021903B2 (zh) |
KR (1) | KR20070055764A (zh) |
CN (1) | CN101336381B (zh) |
WO (1) | WO2007061271A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG140473A1 (en) * | 2006-08-16 | 2008-03-28 | Tinggi Tech Private Ltd | Improvements in external light efficiency of light emitting diodes |
KR100996669B1 (ko) | 2008-12-11 | 2010-11-25 | 한국기초과학지원연구원 | 마이크로 렌즈 어레이를 포함하는 이미지 센서 및 그 제조방법 |
CN102024898B (zh) * | 2010-11-03 | 2013-03-27 | 西安神光安瑞光电科技有限公司 | 发光二极管及其制造方法 |
CN102130252B (zh) * | 2010-11-03 | 2013-02-27 | 映瑞光电科技(上海)有限公司 | 发光二极管及其制造方法 |
KR101298927B1 (ko) * | 2011-12-26 | 2013-08-22 | 전자부품연구원 | 질화물계 발광 다이오드 및 그의 제조 방법 |
CN102730629B (zh) * | 2012-06-21 | 2015-01-28 | 华中科技大学 | 一种微透镜的制备方法及其产品 |
CN104591077B (zh) * | 2013-10-31 | 2016-09-28 | 中国科学院物理研究所 | 用于色心单光子收集的透镜的制备方法 |
US9927558B2 (en) * | 2016-04-19 | 2018-03-27 | Trilumina Corp. | Semiconductor lens optimization of fabrication |
CN112259567A (zh) * | 2020-10-20 | 2021-01-22 | 华虹半导体(无锡)有限公司 | Cis的微透镜的形成方法 |
CN113189684B (zh) * | 2021-04-30 | 2023-03-14 | 常州纵慧芯光半导体科技有限公司 | 可变焦距半导体表面微透镜及其制作方法、激光器 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6548144B1 (en) * | 1998-07-29 | 2003-04-15 | Canon Kabushiki Kaisha | Semispherical microstructure, microlens and method of fabricating the same |
CN1469135A (zh) * | 2002-06-12 | 2004-01-21 | ������������ʽ���� | 微型透镜及制造方法、微型透镜阵列板、电光装置和电子仪器 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5371399A (en) * | 1991-06-14 | 1994-12-06 | International Business Machines Corporation | Compound semiconductor having metallic inclusions and devices fabricated therefrom |
US5633527A (en) * | 1995-02-06 | 1997-05-27 | Sandia Corporation | Unitary lens semiconductor device |
US6215134B1 (en) * | 1997-05-09 | 2001-04-10 | California Institute Of Technology | Semiconductor surface lenses and shaped structures |
US6661581B1 (en) * | 2000-09-29 | 2003-12-09 | Rockwell Scientific Company | Graded index microlenses and methods of design and formation |
EP1251365B1 (en) | 2001-04-20 | 2004-02-25 | Matsushita Electric Industrial Co., Ltd. | Microlens array and method of its manufacturing |
US7317579B2 (en) * | 2005-08-11 | 2008-01-08 | Micron Technology, Inc. | Method and apparatus providing graded-index microlenses |
-
2005
- 2005-11-28 KR KR1020050114145A patent/KR20070055764A/ko not_active Application Discontinuation
-
2006
- 2006-11-28 WO PCT/KR2006/005048 patent/WO2007061271A1/en active Application Filing
- 2006-11-28 CN CN2006800517261A patent/CN101336381B/zh not_active Expired - Fee Related
- 2006-11-28 US US12/085,585 patent/US8021903B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6548144B1 (en) * | 1998-07-29 | 2003-04-15 | Canon Kabushiki Kaisha | Semispherical microstructure, microlens and method of fabricating the same |
CN1469135A (zh) * | 2002-06-12 | 2004-01-21 | ������������ʽ���� | 微型透镜及制造方法、微型透镜阵列板、电光装置和电子仪器 |
Non-Patent Citations (2)
Title |
---|
吕俊峰,张静娟,梁文锡.在GaAs材料上制备衍射光学元件.光电子·激光12 7.2001,12(7),全文. |
吕俊峰,张静娟,梁文锡.在GaAs材料上制备衍射光学元件.光电子·激光12 7.2001,12(7),全文. * |
Also Published As
Publication number | Publication date |
---|---|
KR20070055764A (ko) | 2007-05-31 |
WO2007061271A1 (en) | 2007-05-31 |
US20090068775A1 (en) | 2009-03-12 |
CN101336381A (zh) | 2008-12-31 |
US8021903B2 (en) | 2011-09-20 |
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Owner name: YTEL PHOTONICS CO., LTD. Free format text: FORMER OWNER: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY Effective date: 20101215 |
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Effective date of registration: 20101215 Address after: Korea wide city Co-patentee after: Edith Cowan University Patentee after: YTEL Photonics Co., Ltd. Address before: Korea wide city Co-patentee before: Edith Cowan University Patentee before: Kwangiu Science & Technology Inst. |
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