CN101300291B - 模板化半导体颗粒和制造方法 - Google Patents

模板化半导体颗粒和制造方法 Download PDF

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CN101300291B
CN101300291B CN2006800110109A CN200680011010A CN101300291B CN 101300291 B CN101300291 B CN 101300291B CN 2006800110109 A CN2006800110109 A CN 2006800110109A CN 200680011010 A CN200680011010 A CN 200680011010A CN 101300291 B CN101300291 B CN 101300291B
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CN101300291A (zh
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尼尔·A·拉科
迈克尔·S·文德兰
玛丽·I·巴克埃特
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G83/00—Macromolecular compounds not provided for in groups C08G2/00 - C08G81/00
    • C08G83/002—Dendritic macromolecules
    • C08G83/003—Dendrimers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C08J3/126—Polymer particles coated by polymer, e.g. core shell structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C08J3/14—Powdering or granulating by precipitation from solutions
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00—Characterised by the use of unspecified polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00—Characterised by the use of unspecified polymers
    • C08J2300/20—Polymers characterized by their physical structure
    • C08J2300/202—Dendritic macromolecules, e.g. dendrimers or hyperbranched polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/754—Dendrimer, i.e. serially branching or "tree-like" structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y10S977/783—Organic host/matrix, e.g. lipid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y10S977/785—Electrically insulating host material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/895—Manufacture, treatment, or detection of nanostructure having step or means utilizing chemical property
    • Y10S977/896—Chemical synthesis, e.g. chemical bonding or breaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/895—Manufacture, treatment, or detection of nanostructure having step or means utilizing chemical property
    • Y10S977/896—Chemical synthesis, e.g. chemical bonding or breaking
    • Y10S977/897—Polymerization

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Medicinal Preparation (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
CN2006800110109A 2005-03-31 2006-03-27 模板化半导体颗粒和制造方法 Expired - Fee Related CN101300291B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/095,142 US7413607B2 (en) 2005-03-31 2005-03-31 Templated semiconductor particles and methods of making
US11/095,142 2005-03-31
PCT/US2006/011187 WO2006105046A1 (en) 2005-03-31 2006-03-27 Templated semiconductor particles and methods of making

Publications (2)

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CN101300291A CN101300291A (zh) 2008-11-05
CN101300291B true CN101300291B (zh) 2013-01-02

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US (2) US7413607B2 (enExample)
EP (1) EP1877468B1 (enExample)
JP (1) JP4976375B2 (enExample)
CN (1) CN101300291B (enExample)
AT (1) ATE541880T1 (enExample)
WO (1) WO2006105046A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005007819A2 (en) 2003-07-09 2005-01-27 Wisconsin Alumni Research Foundation Charge-dynamic polymers and delivery of anionic compounds
JP4928775B2 (ja) * 2005-01-06 2012-05-09 株式会社日立ソリューションズ 半導体ナノ粒子表面修飾方法
JP4293181B2 (ja) * 2005-03-18 2009-07-08 セイコーエプソン株式会社 金属粒子分散液、金属粒子分散液の製造方法、導電膜形成基板の製造方法、電子デバイスおよび電子機器
US7344583B2 (en) * 2005-03-31 2008-03-18 3M Innovative Properties Company Methods of making metal particles within cored dendrimers
WO2008036700A2 (en) * 2006-09-19 2008-03-27 3M Innovative Properties Company Templated metal oxide particles and methods of making
US8071210B2 (en) * 2007-10-09 2011-12-06 Wiscousin Alumni Research Foundation Covalent assembly of ultrathin polymeric films
WO2016201310A1 (en) 2015-06-12 2016-12-15 Rhodia Operations Hybrid nanoparticles containing dendrons, methods of producing such hybrid nanoparticles, and uses thereof
CN107737945B (zh) * 2017-09-12 2020-07-31 南京邮电大学 一种复合纳米金颗粒的合成方法及应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780251A (en) * 1996-06-27 1998-07-14 Fci Fiberchem, Inc. Ultrasensitive single-step, solid-state competitive immunoassay sensor with interference modifier and/or gel layer
CA2274458A1 (en) 1997-01-13 1998-07-16 Dendritech, Inc. Nanocomposites of dendritic polymers
US20010011109A1 (en) * 1997-09-05 2001-08-02 Donald A. Tomalia Nanocomposites of dendritic polymers
US5938934A (en) * 1998-01-13 1999-08-17 Dow Corning Corporation Dendrimer-based nanoscopic sponges and metal composites
WO1999055714A1 (en) * 1998-04-27 1999-11-04 The University Of Akron Supramolecular structures and process for making the same
WO2000046839A2 (en) 1999-02-05 2000-08-10 University Of Maryland, Baltimore LUMINESCENCE SPECTRAL PROPERTIES OF CdS NANOPARTICLES
US6350384B1 (en) * 2000-08-14 2002-02-26 Dow Corning Corporation Silicon containing multi-arm star polymers
MXPA03001777A (es) * 2000-08-31 2003-06-04 Hoffmann La Roche Derivados de quinazolina como antagonistas adrenergicos alfa-1.
US7153703B2 (en) * 2001-05-14 2006-12-26 Board Of Trustees Of The University Of Arkansas N. A. Synthesis of stable colloidal nanocrystals using organic dendrons
US7820737B2 (en) 2003-03-13 2010-10-26 Eugenia Kumacheva Method of producing hybrid polymer-inorganic materials
KR20060015534A (ko) * 2003-04-25 2006-02-17 더 펜 스테이트 리서치 파운데이션 성장 억제, 지질 유래된 생활성 화합물의 전신 전달을 위한방법 및 시스템
WO2005029539A2 (en) * 2003-07-21 2005-03-31 Dendritic Nanotechnologies, Inc. Stabilized and chemically functionalized nanoparticles

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Publication number Publication date
US7413607B2 (en) 2008-08-19
JP4976375B2 (ja) 2012-07-18
JP2008538225A (ja) 2008-10-16
CN101300291A (zh) 2008-11-05
EP1877468A1 (en) 2008-01-16
WO2006105046A1 (en) 2006-10-05
EP1877468B1 (en) 2012-01-18
US20080265221A1 (en) 2008-10-30
US20060219159A1 (en) 2006-10-05
US7588701B2 (en) 2009-09-15
ATE541880T1 (de) 2012-02-15

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