CN101295632B - 加热装置 - Google Patents
加热装置 Download PDFInfo
- Publication number
- CN101295632B CN101295632B CN2008100996426A CN200810099642A CN101295632B CN 101295632 B CN101295632 B CN 101295632B CN 2008100996426 A CN2008100996426 A CN 2008100996426A CN 200810099642 A CN200810099642 A CN 200810099642A CN 101295632 B CN101295632 B CN 101295632B
- Authority
- CN
- China
- Prior art keywords
- filament
- heater
- treated
- lamp
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010438 heat treatment Methods 0.000 title abstract description 24
- 238000005286 illumination Methods 0.000 claims description 22
- 238000009826 distribution Methods 0.000 abstract description 41
- 230000008859 change Effects 0.000 abstract description 4
- 230000009467 reduction Effects 0.000 abstract description 4
- 239000012780 transparent material Substances 0.000 abstract 1
- 238000009434 installation Methods 0.000 description 57
- 238000007789 sealing Methods 0.000 description 27
- 239000004065 semiconductor Substances 0.000 description 27
- 229910052751 metal Inorganic materials 0.000 description 24
- 239000002184 metal Substances 0.000 description 24
- 235000012431 wafers Nutrition 0.000 description 22
- 239000012212 insulator Substances 0.000 description 20
- 230000000694 effects Effects 0.000 description 16
- 238000001816 cooling Methods 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000000758 substrate Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 230000002950 deficient Effects 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000007323 disproportionation reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- -1 nitrogenize Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 230000005619 thermoelectricity Effects 0.000 description 1
- 238000001149 thermolysis Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Images
Landscapes
- Resistance Heating (AREA)
- Chemical Vapour Deposition (AREA)
- Control Of Resistance Heating (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005057803 | 2005-03-02 | ||
JP057803/2005 | 2005-03-02 | ||
JP191222/2005 | 2005-06-30 | ||
JP2005191222A JP2006279008A (ja) | 2005-03-02 | 2005-06-30 | ヒータ及びヒータを備えた加熱装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200610059456 Division CN1828829A (zh) | 2005-03-02 | 2006-03-02 | 加热器及具备加热器的加热装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101295632A CN101295632A (zh) | 2008-10-29 |
CN101295632B true CN101295632B (zh) | 2010-12-08 |
Family
ID=36947128
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200610059456 Pending CN1828829A (zh) | 2005-03-02 | 2006-03-02 | 加热器及具备加热器的加热装置 |
CN2008100996426A Expired - Fee Related CN101295632B (zh) | 2005-03-02 | 2006-03-02 | 加热装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200610059456 Pending CN1828829A (zh) | 2005-03-02 | 2006-03-02 | 加热器及具备加热器的加热装置 |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP2011103475A (ja) |
CN (2) | CN1828829A (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4893159B2 (ja) * | 2006-08-24 | 2012-03-07 | ウシオ電機株式会社 | フィラメントランプおよび光照射式加熱処理装置 |
JP4935417B2 (ja) * | 2007-02-26 | 2012-05-23 | ウシオ電機株式会社 | 光照射式加熱処理装置 |
JP2009238552A (ja) * | 2008-03-27 | 2009-10-15 | Ushio Inc | フィラメントランプ |
JP5125933B2 (ja) * | 2008-09-22 | 2013-01-23 | ウシオ電機株式会社 | フィラメントランプ |
CN103014674A (zh) * | 2011-09-26 | 2013-04-03 | 吉富新能源科技(上海)有限公司 | 一种太阳能光伏玻璃镀膜预加热装置 |
JP6219227B2 (ja) * | 2014-05-12 | 2017-10-25 | 東京エレクトロン株式会社 | ヒータ給電機構及びステージの温度制御方法 |
TWI674071B (zh) * | 2014-12-15 | 2019-10-11 | 瑞士商菲利浦莫里斯製品股份有限公司 | 氣溶膠產生系統及用於在電熱式氣溶膠產生系統內導引氣流的方法 |
CN111501022A (zh) * | 2020-06-20 | 2020-08-07 | 西南石油大学 | 一种多组热丝反应设备 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5549742B2 (ja) * | 1974-04-24 | 1980-12-13 | ||
JPH0652674B2 (ja) * | 1985-02-05 | 1994-07-06 | ミノルタカメラ株式会社 | 加熱装置用ハロゲン発熱体 |
JPS62167397U (ja) * | 1986-04-14 | 1987-10-23 | ||
JPS62180891U (ja) * | 1986-05-08 | 1987-11-17 | ||
JP3103896B2 (ja) * | 1991-03-15 | 2000-10-30 | ソニー株式会社 | ハロゲンランプ及び熱処理炉 |
JPH0620938A (ja) * | 1992-06-30 | 1994-01-28 | Kawasaki Steel Corp | 半導体基板の急速熱酸化装置 |
JPH0716353U (ja) * | 1993-08-31 | 1995-03-17 | ウシオ電機株式会社 | 管型ランプ |
EP0924500B1 (de) * | 1997-12-08 | 2006-10-18 | STEAG RTP Systems GmbH | Verfahren zum Messen elektromagnetischer Strahlung |
-
2006
- 2006-03-02 CN CN 200610059456 patent/CN1828829A/zh active Pending
- 2006-03-02 CN CN2008100996426A patent/CN101295632B/zh not_active Expired - Fee Related
-
2010
- 2010-12-22 JP JP2010285312A patent/JP2011103475A/ja active Pending
- 2010-12-22 JP JP2010285313A patent/JP2011103476A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2011103476A (ja) | 2011-05-26 |
CN1828829A (zh) | 2006-09-06 |
JP2011103475A (ja) | 2011-05-26 |
CN101295632A (zh) | 2008-10-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101295632B (zh) | 加热装置 | |
KR100859401B1 (ko) | 히터 및 히터를 구비한 가열 장치 | |
CN101131920B (zh) | 灯丝灯及光照式加热处理装置 | |
CN101256929B (zh) | 白炽灯及光照射式加热处理装置 | |
US10356848B2 (en) | Lamp heating for process chamber | |
US20090251882A1 (en) | Light-emitting diode illumination structures | |
JP2009200401A (ja) | 光照射式加熱方法及び光照射式加熱装置 | |
KR20080024060A (ko) | 광 조사식 가열 장치 및 광 조사식 가열 방법 | |
CN101661868A (zh) | 白炽灯及光照射式加热处理装置 | |
US9513052B2 (en) | Linear high packing density for LED arrays | |
WO2014163760A1 (en) | Lamphead pcb with flexible standoffs | |
US11143416B2 (en) | Radiation heater arrangement | |
CN101315867A (zh) | 白炽灯及光照射式加热处理装置 | |
CN103175011A (zh) | 面积等分对称式可调光led集成光源 | |
KR20100062943A (ko) | 급속 온도 처리용 램프 | |
CN102748595B (zh) | 发光二极管光源装置 | |
JP4040030B2 (ja) | 半導体製造装置 | |
JP7483894B2 (ja) | 蒸発方法、蒸発装置、及び蒸発源 | |
JP2012068002A (ja) | 加熱装置 | |
KR20080065258A (ko) | 형광램프 제조장치 및 형광램프 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101208 |
|
CF01 | Termination of patent right due to non-payment of annual fee |