CN101294270B - Equipment and method for producing nichrome composite plate with vacuum arc ion plating - Google Patents
Equipment and method for producing nichrome composite plate with vacuum arc ion plating Download PDFInfo
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- CN101294270B CN101294270B CN2008100117147A CN200810011714A CN101294270B CN 101294270 B CN101294270 B CN 101294270B CN 2008100117147 A CN2008100117147 A CN 2008100117147A CN 200810011714 A CN200810011714 A CN 200810011714A CN 101294270 B CN101294270 B CN 101294270B
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Abstract
The invention relates to a device for manufacturing a nickel-chromium composite plate by using vacuum arc ion plating to replace electroplating and a method thereof, and is characterized in that the device of the vacuum arc ion plating and the method are utilized to replace water electroplating to sequentially prepare the nickel-chromium composite plate composed of a pure nickel film, a nickel-chromium gradient transition film and a pure chromium film on a copper substrate; the device for manufacturing the nickel-chromium composite plate by using the vacuum arc ion plating is of a vertical cylindrical shape or a regular polygon; arc target sources are evenly distributed around a vacuum chamber wall; a controllable mechanical baffle plate is arranged in front of each target source; a planetary type work rest with rotation and revolution is arranged in the middle part of a vacuum chamber; the technical process of a filming operation comprises three stages that are preliminary treatment,the filming operation and post treatment. The device and the method simplify the process flows and the operation links, increase the work efficiency, fully replace the traditional electroplating technology to coat a wearproof anticorrosion decoration coating on a coppery water heating component, and thoroughly eliminate the environmental pollution problems in the electroplating.
Description
Technical field
The present invention relates to technical field of vacuum plating, particularly a kind of filtered cathode vacuum arc replaces water power to be plated in preparation nickel chromium triangle composite deposite Apparatus and method in the copper substrate.
Background technology
In the copper substrate, be coated with anticorrosion antiwear nickel chromium triangle composite deposite method and extensive application arranged, its typical products such as plumbing element in Industrial products.The production technique of high-grade hot-water heating spare is: casting in bronze causes type, surface finish, first nickel plating, chromium plating again.The function of nickel chromium triangle coating is erosion resistance, surface abrasion resistance and the surface brightness that improves product.The quality of superficial film quality is directly determining class, price and the work-ing life of product.For a long time, the hot-water heating element surface coating process of China adopts the water power coating technology always.Develop very ripe.Corrosion-resistant, the abrasion resistance properties of product can both satisfy the demand of real life use and the technical survey standard of industry.
But electroplating technology has the fatal shortcoming that can't eliminate, and that is exactly the serious environmental pollution that a large amount of discharging of waste liquid are brought in objectionable impurities composition residual in the plated item coating and the electroplating technology link.Especially in the top layer electrodeposited chromium operation at the residual high valence chrome composition of product surface and the chromium containing electroplating raffinate of discharging, can not be in the nature environment natural degradation, it is in biological and human body inner accumulated, can cause the harm of chronicity, being the extremely strong carcinogenic substance of a kind of toxicity, also is serious corrosive medium.Hot-water heating spare electroplating technology and is still polluting human natural ecological environment seriously, presses for to improve or substitute.
Replacing the water power depositing process with the vacuum coating method that does not have " three wastes " discharging, is one of good approach that addresses the above problem.But there are the following problems for traditional conventional vacuum filming equipment and processing method: (1) imitation water power depositing process directly is coated with pure nickel film and pure chromium film successively in the copper substrate, is easy to cause because of stress between nickel rete and the chromium rete is excessive rete in conjunction with not firm even come off; (2) adopt the frozen composition target as intermediate layer, for example can adopt nickeliferous, each target of 50% of chromium to deposit intermediate layer.But this film structure just becomes the difference on the separation surface to share on two interfaces with original one, thereby has reduced the difference degree at each interface, does not but eliminate the existence at interface, has increased by one on the contrary and has become separation surface; (3) adopt the frozen composition intermediate layer, require coating equipment to have the target arc source of inter-level target, increased the complexity of equipment, three kinds of target arc sources are again to work alone respectively in the coating process, make sedimentation rate low, and the working hour is long.
Summary of the invention
At the problem of existing electroplating technology and vacuum coating technology existence, the invention provides a kind of filtered cathode vacuum arc and replace water power to be plated in the Apparatus and method for of preparation nickel chromium triangle composite deposite in the copper substrate.
Filtered cathode vacuum arc film device of the present invention comprises auxiliary ligand cover systems such as plated film vacuum chamber, vacuum system, pneumatic system, airing system, water-cooling system, heating system, transmission system, electrical system, control and Monitoring systems.
The plated film vacuum chamber of filtered cathode vacuum arc film device is vertical and cylindrical or regular polygon.Around vacuum-chamber wall, arranged the electric arc target source equably, each front, target source all is provided with the controllable mechanical baffle plate, and this controllable mechanical baffle plate is controlled coordinated type baffle mechanism or discrete baffle mechanism, and the vacuum chamber middle part is provided with the planetary work rest of rotation and revolution.
The target source that is provided with around the plated film vacuum-chamber wall comprises nickel target source and two kinds of arc ion plating targets source, chromium target source, and the quantity in nickel target source equals or be slightly more than the quantity in chromium target source, and alternately arrange at interval in nickel target source and chromium target source.When adopting electric arc target source, roundlet plane, then arrange along the form that plated film vacuum chamber barrel peripheral direction becomes spiral-line to rise respectively in two kinds of target sources; When adopting rectangle or cylinder electric arc target source, then should around the vacuum chamber barrel, evenly vertically arrange.The workpiece to be plated that the arranging of two kinds of target sources is in the work rest outside can both obtain the film material deposition of nickel and chromium simultaneously.
Described work rest carries the formula work rest for the suspension type or the holder of carrying workpiece to be plated, this work rest is arranged in the middle part of vacuum chamber, adopt planetary transmission rig to drive, have rotation and revolution motion, can both obtain uniform film deposition to guarantee all workpieces to be plated.
In each front, electric arc target source, controlled coordinated type baffle mechanism or discrete baffle mechanism are set.Its effect is to prevent that a kind of target source from being polluted by the target source in the another kind work in the stage of quitting work; And preventing that the big drop that ejected in the starting the arc stage in the electric arc target source from influencing the film quality of workpiece to be plated, baffle plate is all closed in each target source of special requirement when starting striking, open baffle plate again after forming stable discharging, to the workpiece to be plated plated film.If adopt the discrete baffle mechanism, be that a baffle plate all independently is set before each electric arc target source, detailed directions is: when being coated with the nickel rete, the baffle plate before the nickel target is opened, kept chromium target flapper closure; When being coated with the chromium rete, chromium target baffle plate is opened, and keeps nickel target flapper closure; When being coated with nickel-chromium gradient transition rete, the baffle plate in two kinds of target sources is all opened.
Filtered cathode vacuum arc of the present invention replaces electroplating the technical scheme that is adopted in preparation nickel chromium triangle composite deposite method in the copper substrate: in above-mentioned filtered cathode vacuum arc film device provided by the invention, all adopt the filtered cathode vacuum arc membrane method, in the copper element substrate, deposit the nickel chromium triangle composite deposite of being made up of pure nickel rete, nickel chromium triangle gradient transition rete and pure chromium rete successively, whole coating process are finished in shove charge start.
The technological process of plated film operation is divided into pre-treatment, plated film operation and aftertreatment three phases.
1. pretreatment stage: will hang on the work rest through the workpiece to be plated dress of cleaning, drying, close door for vacuum chamber, start the forepump and the main pump of vacuum system successively, make vacuum chamber reach background pressure, its pressure values is lower than 1 * 10
-3Pa; Charge into the working gas argon gas, make vacuum chamber pressure to 0.1～5Pa scope; Starting the ion bombardment power supply is that workpiece adds 500～1200V bombarding voltage; Workpiece is carried out icon bombardment cleaning and heating, make its temperature reach 250～400 ℃ after, close the ion bombardment power supply.
2. plated film sessions: gaseous tension is 5 * 10 in the surge chamber
-2Desired value in the～5Pa scope also remains unchanged, and makes work rest begin rotation; Striking starts nickel target arc source, opens nickel target baffle plate and closes chromium target baffle plate, and beginning nickel deposited film on the copper workpiece reaches expection thickness until the nickel film; Striking starts chromium target arc source, opens chromium target baffle plate, carries out nickel chromium triangle and plates altogether, nickel deposited-chromium gradient transition film; During nickel chromium triangle plates altogether, improve the transmitter current and the film material emission rate in chromium target arc source gradually, simultaneously corresponding transmitter current and the film material emission rate that reduces nickel target arc source makes in the depositional coating component proportions of nickel reduce gradually and the component proportions of chromium increases gradually; Reach expection thickness until institute's nickel deposited-chromium gradient transition rete; Transmitter current to the transmitter current in maximum operation value and nickel target arc source of regulating chromium target arc source reduce to very little after, close nickel target baffle plate, cut off nickel target arc source current; Begin the pure chromium film of independent deposition surface,, close chromium target baffle plate, cut off chromium target arc source current until reaching expection thickness.
3. post-processing stages: stop work rest and drive; Charge into nitrogen and the vacuum indoor pressure to 10 that raises gradually
3Pa or 10
3Below the Pa, workpiece is cooled to below 100 ℃; Vacuum chamber amplifies gas; Blow-on door, workpiece to be plated are come out of the stove, check, are packed.
Filtered cathode vacuum arc of the present invention replaces electroplating the principal character of preparation nickel chromium triangle composite deposite method:
1. the present invention proposes a kind of coated membrane architecture that product performance require, are complementary with film coating method that is suitable for.The coated membrane system that is adopted is in the copper substrate, deposits three layers of nickel chromium triangle composite deposite being made up of pure nickel film, nickel-chromium gradient transition film and pure chromium film successively, as shown in Figure 3.Wherein the nickel rete is thicker, and main effect is corrosion-resistant with copper substrate mortise and protection copper surface; Outermost chromium rete is thinner relatively, and main effect is raising surface hardness and rub resistance wearing and tearing ability, improves surface brightness, increases the product decoration effect; The nickel that mediates-chromium transition film layer thickness is suitable with the chromium rete, its nickel chromium triangle component content ratio is the uniform gradient transition change, by close nickel film place is 100% nickel composition, until close chromium film place is 100% chromium component, main effect is to realize soft nickel film of low-stress and the intermembranous coordination transition of heavily stressed hard chrome, eliminates the stress between two kinds of retes.The film structure that the present invention proposes can only can be realized under two target codeposition conditions.
2. three layers of above-mentioned nickel chromium triangle composite deposite film system all adopt the filtered cathode vacuum arc technology to be coated with.The coordination coupling method of work in two kinds of target arc sources realizes just by the optimised process of pure nickel rete to pure chromium even film layer gradient transition in the filtered cathode vacuum arc film device that employing the present invention proposes.Owing to belong to the arc ions electroplating method, nickel plating arc source and chromium plating arc source can be in same coating chambers, under uniform temp and the pressure condition, work simultaneously and do not disturb mutually.Change its sedimentation rate by regulated at will working current separately, reach the purpose of preparation nickel-chromium uniform gradient transition rete.In addition, workpiece to be plated once just can be finished the processing that is coated with of whole 3 kinds of retes after cleaning, shove charge, simplified technical process and cargo handling operation, has improved working efficiency.
3. apparatus and method for proposed by the invention can substitute the traditional electrical coating technology fully and is copper hot-water heating spare etc. and be coated with the anticorrosion antiwear decoration coating, has thoroughly eliminated the problem of environmental pollution in electroplating.
Description of drawings
Fig. 1 is the vertical and cylindrical filtered cathode vacuum arc film machine vertical view that plated film vacuum chamber of the present invention is provided with roundlet plane electric arc target helical arrangement;
Fig. 2 is the front view of Fig. 1;
Fig. 3 is that plated film vacuum chamber of the present invention is provided with the vertical square filtered cathode vacuum arc film machine vertical view that the cylinder electric arc target is vertically arranged;
Fig. 4 is the front view of Fig. 3;
Fig. 5 is that the film system of nickel chromium triangle composite deposite of the present invention forms synoptic diagram;
Fig. 6 is a process flow sheet of the present invention.
1 door for vacuum chamber among the figure, 2 vacuum chamber bodies, 3 disk electric arc nickel target sources, 4 coordinated type baffle plates, 5 suspension type work rests, 6 disk electric arc chromium target sources, 7 viewing windows, 8 vacuum chamber bleeding points, 9 bleeding points shielding baffle plate, 10 barrier driving mechanisms, 11 suspension type work rest epicyclic transmission mechanisms, 12 work rest driving mechanisms, 13 cylinder electric arc nickel target sources, the formula work rest is carried in 15 holders of 14 cylinder electric arc chromium target sources, and formula work rest epicyclic transmission mechanism is carried in 16 holders.
Embodiment
Embodiment 1:
Present embodiment filtered cathode vacuum arc film device comprises auxiliary ligand cover systems such as plated film vacuum chamber, vacuum system, pneumatic system, airing system, water-cooling system, heating system, transmission system, electrical system, control and Monitoring systems.
The structure of plated film vacuum chamber is the vertical and cylindrical structure in the present embodiment filtered cathode vacuum arc film device, as shown in Figure 1 and Figure 2.
Around plated film vacuum chamber cylinder, be provided with totally 18 in 9 disk electric arc nickel target sources 3 and 6, the two kinds of disk electric arc platings in 9 disk electric arc chromium target sources target source; The 6 one-tenth vertical setting of types in nickel target source 3 and chromium target source are alternately arranged at interval.Arrange along the form that plated film vacuum chamber barrel circumferential direction becomes spiral-line to rise respectively.
Be furnished with suspension type work rest epicyclic transmission mechanism 11 in the vacuum chamber center upper portion, the suspension type work rest 5 of following band carrying workpiece to be plated is driven by work rest driving mechanism 12, realizes the revolution and the spinning motion of work rest 5.
Between each electric arc target source and work rest, be provided with controlled coordinated type baffle mechanism 4.Coordinated type baffle mechanism 4 has 3 baffle plates, and the mode of mating work with the 6 row electric arc target sources of evenly arranging along circumference is: utilize barrier driving mechanism 10, when being coated with the nickel rete, baffle plate forwards 6 fronts, chromium target source (A position among Fig. 1) to; When being coated with nickel-chromium gradient transition rete, forward empty place (B position among Fig. 1) to; When being coated with the chromium rete, forward to before the nickel target source (C position among Fig. 1).Each target source all is to close baffle plate when starting striking, opens baffle plate again after forming stable discharging, to the workpiece to be plated plated film.
Present embodiment application aforesaid device is coated with nickel chromium triangle composite deposite (structure as shown in Figure 5) operation in the copper substrate technological process is divided into pre-treatment, plated film operation and aftertreatment three phases, and concrete technical process as shown in Figure 6.
1. pretreatment stage: the dress of the copper workpiece to be plated behind the cleaning, drying is hung on the work rest 5; Close door for vacuum chamber 1, start the forepump and the main pump of vacuum system successively, make vacuum indoor pressure reach base vacuum 1 * 10
-3Pa; Charge into the working gas argon gas, pressure is to 0.5Pa; Start work rest driving mechanism 12 and make work rest 5 rotations; Starting the ion bombardment power supply is that workpiece adds the 800V bombarding voltage; Workpiece is carried out icon bombardment cleaning and heating, make its temperature reach 350 ℃ after, close the ion bombardment power supply.
2. plated film sessions: gaseous tension remains unchanged to 0.6Pa in the surge chamber; Forward coordinated type baffle plate 4 to 3 fronts, nickel target source (C position among Fig. 1); Striking starts nickel target arc source 3, and regulating voltage is to 20V, the electric current 80A of every target; Forward coordinated type baffle plate 4 to 6 fronts, chromium target source (A position among Fig. 1), beginning nickel deposited film on workpiece reaches 6 μ m until the nickel film thickness; Striking starts chromium target arc source 6, and regulating voltage is to 12V, the electric current 15A of every target; Forward coordinated type baffle plate 4 to empty place (B position among Fig. 1), carry out nickel chromium triangle and plate altogether, nickel deposited-chromium gradient transition film; During nickel chromium triangle plated altogether, the voltage that improves chromium target arc source 6 gradually was to 20V, and electric current is to 80A, and the corresponding simultaneously voltage that reduces nickel target arc source 3 is to 12V, and electric current reaches 1.5 μ m to 15A until institute's nickel deposited-chromium gradient transition thicknesses of layers; Forward coordinated type baffle plate 4 to 3 fronts, nickel target source (C position among Fig. 1), cut off the power supply in nickel target arc source 3; Begin the pure chromium film of independent deposition surface, reach 1.5 μ m until thickness; Forward coordinated type baffle plate 4 to 6 fronts, chromium target source (A position among Fig. 1), cut off the power supply in chromium target arc source 6.
3. post-processing stages: stop work rest and drive; Charge into nitrogen and the vacuum indoor pressure to 10 that raises gradually
3Pa is cooled to below 100 ℃ workpiece; Vacuum chamber amplifies gas; Blow-on door, workpiece are come out of the stove, check, are packed.
Embodiment 2:
Present embodiment filtered cathode vacuum arc film device comprises auxiliary ligand cover systems such as plated film vacuum chamber, vacuum system, pneumatic system, airing system, water-cooling system, heating system, transmission system, electrical system, control and Monitoring systems.
The structure of plated film vacuum chamber is vertical square structure in the present embodiment filtered cathode vacuum arc film device, as shown in Figure 3, Figure 4.
At plated film vacuum chamber body corner location place, be provided with 2 cylinder electric arc nickel target sources 13 and 2 cylinder electric arc chromium target sources 14, two kinds of cylinder electric arcs plate totally 4 in target source, alternately vertically lay at interval, arrange on plated film vacuum chamber interior opposite angle line direction relatively in 2 target sources of identical target.
Be furnished with holder in the vacuum chamber center upper portion and carry formula work rest epicyclic transmission mechanism 16, formula work rest 15 is carried in the holder of laying the carrying workpiece to be plated above, is driven by work rest driving mechanism 12, realizes the revolution and the spinning motion of work rest 15.
Between 4 electric arc target sources and work rest, be provided with controlled coordinated type baffle mechanism 4.Coordinated type baffle mechanism 4 has 2 baffle plates, and the mode of mating work with 4 electric arc target sources of evenly arranging along circumference is: utilize barrier driving mechanism 10, when being coated with the nickel rete, baffle plate forwards 14 fronts, chromium target source (A position among Fig. 3) to; When being coated with nickel-chromium gradient transition rete, forward empty place (B position among Fig. 3) to; When being coated with the chromium rete, forward to before the nickel target source 13 (C position among Fig. 3).Each target source all is to close baffle plate when starting striking, opens baffle plate again after forming stable discharging, to the workpiece to be plated plated film.
Present embodiment application aforesaid device is coated with nickel chromium triangle composite deposite (structure as shown in Figure 5) operation in the copper substrate technological process is divided into pre-treatment, plated film operation and aftertreatment three phases, and concrete technical process as shown in Figure 6.
1. pretreatment stage: the dress of the copper workpiece to be plated behind the cleaning, drying is hung on the work rest 15; Close door for vacuum chamber 1, start the forepump and the main pump of vacuum system successively, make vacuum indoor pressure reach base vacuum 2 * 10
-3Pa; Charge into the working gas argon gas, pressure is to 0.6Pa; Start work rest driving mechanism 12 and make work rest 15 rotations; Starting the ion bombardment power supply is that workpiece adds the 900V bombarding voltage; Workpiece is carried out icon bombardment cleaning and heating, make its temperature reach 320 ℃ after, close the ion bombardment power supply.
2. plated film sessions: gaseous tension remains unchanged to 0.4Pa in the surge chamber; Confirm that coordinated type baffle plate 4 is in 13 fronts, nickel target source (C position among Fig. 3); Striking starts nickel target arc source 13, and regulating voltage is to 20V, the electric current 380A of every target; Forward coordinated type baffle plate 4 to 14 fronts, chromium target source (A position among Fig. 3), beginning nickel deposited film on workpiece, 2 hours time length; Striking starts chromium target arc source 14, and regulating voltage is to 14V, the electric current 65A of every target; Forward coordinated type baffle plate 4 to empty place (B position among Fig. 3), carry out nickel chromium triangle and plate altogether, nickel deposited-chromium gradient transition film; During nickel chromium triangle plated altogether, the voltage that improves chromium target arc source 14 gradually was to 20V, and electric current is to 380A, and the corresponding simultaneously voltage that reduces nickel target arc source 13 is to 15V, and electric current is to 65A, 0.5 hour time length; Forward coordinated type baffle plate 4 to 13 fronts, nickel target source (C position among Fig. 3), cut off nickel target arc source current; Begin the pure chromium film of independent deposition surface, 0.5 hour time length; Forward coordinated type baffle plate 4 to 14 fronts, chromium target source (A position among Fig. 3), cut off chromium target arc source 14 power supplys.
3. post-processing stages: stop work rest and drive; Charge into nitrogen and the vacuum indoor pressure to 10 that raises gradually
3Pa is cooled to below 100 ℃ workpiece; Vacuum chamber amplifies gas; Blow-on door, workpiece are come out of the stove, check, are packed.
Claims (1)
1. a producing nichrome composite plate with vacuum arc ion plating equipment is coated with the method for nickel chromium triangle composite deposite, this coating equipment comprises the plated film vacuum chamber, described plated film vacuum chamber is vertical and cylindrical or regular polygon, around vacuum-chamber wall, arranged the electric arc target source equably, each front, target source is provided with the controllable mechanical baffle plate, and the vacuum chamber middle part is provided with the planetary work rest of rotation and revolution; The film system that it is characterized in that this composite deposite is made up of pure nickel film, nickel-chromium gradient transition film and pure chromium film, and its process for plating process is divided into pre-treatment, plated film operation and aftertreatment three phases:
(1) pretreatment stage: will hang on the work rest through the workpiece to be plated dress of cleaning, drying, close door for vacuum chamber, start the forepump and the main pump of vacuum system successively, make vacuum chamber reach background pressure, its pressure values is lower than 1 * 10
-3Pa; Charge into the working gas argon gas, make vacuum chamber pressure to 0.1～5Pa scope; Starting the ion bombardment power supply is that workpiece adds 500～1200V bombarding voltage; Workpiece is carried out icon bombardment cleaning and heating, make its temperature reach 250～400 ℃ after, close the ion bombardment power supply;
(2) plated film sessions: gaseous tension is 5 * 10 in the surge chamber
-2Desired value in the～5Pa scope also remains unchanged, and makes work rest begin rotation; Striking starts nickel target arc source, opens nickel target baffle plate and closes chromium target baffle plate, and beginning nickel deposited film on the copper workpiece reaches expection thickness until the nickel film; Striking starts chromium target arc source, opens chromium target baffle plate, carries out nickel chromium triangle and plates altogether, nickel deposited-chromium gradient transition film; During nickel chromium triangle plates altogether, improve the transmitter current and the film material emission rate in chromium target arc source gradually, simultaneously corresponding transmitter current and the film material emission rate that reduces nickel target arc source makes in the depositional coating component proportions of nickel reduce gradually and the component proportions of chromium increases gradually; Reach expection thickness until institute's nickel deposited-chromium gradient transition rete; Transmitter current to the transmitter current in maximum operation value and nickel target arc source of regulating chromium target arc source reduce to very little after, close nickel target baffle plate, cut off nickel target arc source current; Begin the pure chromium film of independent deposition surface,, close chromium target baffle plate, cut off chromium target arc source current until reaching expection thickness;
(3) post-processing stages: stop work rest and drive; Charge into nitrogen and the vacuum indoor pressure to 10 that raises gradually
3Pa or 10
3Below the Pa, workpiece is cooled to below 100 ℃; Vacuum chamber amplifies gas; Blow-on door, workpiece to be plated are come out of the stove, check, are packed.
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| CN2008100117147A CN101294270B (en) | 2008-06-06 | 2008-06-06 | Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
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| CN2008100117147A CN101294270B (en) | 2008-06-06 | 2008-06-06 | Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
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