CN101278184B - Shear measuring method and its device - Google Patents

Abstract

The present invention provides a method for measuring the resonance shear. In the measurement of the shear response of the sample, Fourier transform is performed on the vibration attenuation curve of the surface of one side of the sample to obtain the resonance shear curve, so that the resonance shear curve can be obtained. Simple short-time measurement. In the resonance shear measurement method, the input signal U _in is input to the horizontal driving part of the resonance shear measurement unit, and the displacement of one side surface of the sample sandwiched by the solid surface in the resonance shear measurement unit is measured using a displacement meter. Vibration is detected as an output signal U _out , together with the input signal U _in , the output signal U _out is input to the resonance shear measurement device, and the test sample sandwiched in the solid surface of the resonance shear measurement unit is The shear response of the sample was measured together with the change of the film thickness, and the resonance shear curve was obtained by performing Fourier transform on the vibration attenuation curve of one side surface of the sample using the Fourier transform unit (5B). In addition, there is provided a dual-path shear stress measurement device capable of precise shear stress measurement using a dual-path method capable of measuring the distance between opaque substrates.

Description

Shear measurement method and device thereof

technical field

The present invention relates to a shear measurement method and its device capable of performing desired measurement of a thin film between two solid surfaces or between two solid surfaces regardless of whether it is transparent or opaque, and more specifically relates to (1) measuring the thickness easily Rapid, simple, versatile and precise resonance shear measurement method and its device for the measurement of changing films and highly volatile liquid films, etc. A measuring method and device thereof for measuring the shear stress between a liquid film, a liquid crystal film, a polymer adsorption layer and the like sandwiched therebetween while changing the distance between two solid surfaces.

Background technique

(1)First of all 1st

Technology to know the shear response of a sample (liquid, liquid crystal, etc.) sandwiched between solid surfaces together with changes in film thickness at the nanometer level, friction and lubrication between solid surfaces, and orientation and structure of liquid and liquid crystal molecules It is important in the understanding and control of culture. In the resonance shear measurement for measuring the shear response of a sample, shear is applied to the sample by vibrating one side surface in the horizontal direction, and the response is monitored near the resonance frequency. The result of plotting this shear response as a function of frequency is the resonance curve. The resonance frequency and the height of the resonance peak are sensitive to the physical properties of the sample between the solid surfaces and are also strong against vibration noise from outside the measurement device.

Conventionally, in order to accurately know the shear response of a sample sandwiched by a solid surface, the following operation was performed: the shear response of the sample was measured while changing the frequency around the resonance frequency, and the frequency plotted The resulting resonance shear curve. Such a technique is disclosed in, for example, Non-Patent Document 1 below.

In addition, a precision strain stress measuring device based on the proposal of the inventors of the present application has been proposed (Patent Document 1 below).

Patent Document 1: Patent No. 3032152

Non-Patent Document 1: Liquid Crystals Volume 6 No. 1 p34-41 2002

(2) Second, the inventors of the present application have proposed a precision strain-stress measuring device capable of measuring rheological movement in nanometer-order minute spaces with high precision (see Patent Document 2 below).

In addition, a surface force measurement device and a method thereof have been proposed that can measure the surface force between samples with high precision even if the sample is opaque to light (see Patent Document 3 below).

Patent Document 2: Patent No. 3032152

Patent Document 3: JP-A-2001-108603

However, in the conventional technique of (1) above, since the shear response of the sample is measured near the resonance frequency while changing the vibration frequency, it is necessary to keep the film thickness of the sample constant for a long time, and it is difficult to measure the thickness. Determination of easily changing films and thin films of highly volatile liquids.

In addition, as the conventional technology of (2) above, in order to measure the viscoelasticity and friction and lubrication characteristics of the sample sandwiched between the surfaces while measuring the distance between the surfaces with a resolution of 0.1 nm, the A method that combines the distance measurement between surfaces by the optical interferometry of equichromatic interference fringes (FECO) and a shear resonance measurement device. Since this method uses light transmitted through the surface, the substrate and the sample sandwiched between the substrate surface are limited to light-transmitting samples. In particular, practically, the substrate is generally limited to mica, and only a thin piece of sapphire or glass (about 2 μm in thickness) was used as the substrate even in the test.

In addition, the two-way surface force measuring device (the above-mentioned Patent Document 3) is a device for measuring the force acting on the upper and lower surfaces, and cannot perform shear measurement.

Contents of the invention

An object of the present invention is to provide a shear measurement method and an apparatus thereof that can perform desired measurement regardless of whether a sample is transparent or opaque.

In more specific terms,

In view of the above situation, the first object of the present invention is to provide a resonance shear measurement method, wherein, in the measurement of the shear response of the sample, Fourier transform is performed on the attenuation curve of the vibration of one side surface of the sample to obtain Resonance shear curve, so that it can be easily measured in a short time.

In addition, in view of the above situation, the second object of the present invention is to provide a two-way type shear stress measurement method and its device, wherein the distance between the substrates can be measured when the substrate or the sample is opaque. Two-way method for precise shear stress measurement.

In order to achieve the above object, the invention of the present application,

(1) In the resonant shear measurement method, the input signal U _in is input to the horizontal driving part of the resonance shear measurement unit, and the displacement The vibration of the surface on one side of the meter is detected as the output signal U _out , and together with the input signal U _in , the output signal U _out is input to the resonance shear measurement device, and the resonance shear measurement unit The shear response of the sample clamped in the solid surface of the sample is measured together with the change of the film thickness, and it is characterized in that the attenuation curve of the vibration of the one-sided surface of the sample is subjected to Fourier transform to obtain the resonance shear curve.

(2) In the resonance shear measurement method, the input signal U _in is input to the horizontal driving part of the resonance shear measurement unit, and the solid surface itself is used as the sample without sandwiching the sample between the solid surfaces, and the displacement gauge is used to measure the The vibration of one side surface of the sample in the resonance shear measurement unit is detected as an output signal U _out , and together with the input signal U _in , the output signal U _out is input to the resonance shear measurement device, The shear response of the sample of the resonance shear measurement unit is measured together with the change of the film thickness, and it is characterized in that the attenuation curve of the vibration of the surface of one side of the sample is subjected to Fourier transform to obtain Resonance shear curve.

(3) In the resonance shear measurement method described in (1) above, the sample is a thin film.

(4) In the resonance shear measurement method described in (1) above, the sample is a liquid.

(5) In the resonance shear measurement method described in (1) above, the sample is a liquid crystal.

(6) In the resonance shear measurement method described in (1) above, the sample has a nanometer-sized thickness.

(7) In the resonance shear measurement method described in (1) or (2) above, the surface of the sample is modified by adsorption or chemical modification.

(8) In the resonance shear measurement method described in (1) or (2) above, the resonance shear curve is a frequency characteristic of the shear response of the sample.

(9) A resonance shear measurement device, characterized in that the resonance shear measurement device has: a waveform generator; a power supply connected to the waveform generator; a resonance shear measurement unit connected to the power supply and inputted Signal U _in ; displacement meter, connected with the resonance shear measurement unit; resonance shear measurement device, connected with the displacement meter and the power supply and input and output signal U _out and input signal U _in , the resonance shear measurement device There is a timing part, a Fourier transform part connected with the timing part and the displacement meter, an amplitude spectrum generation part connected with the Fourier transform part, a standard part of the amplitude (U _out /U _in ), and a resonance shear curve made part; and a computer connected to the waveform generator and the resonance shear measuring device.

(10) A two-way type shear stress measurement method, characterized in that, in the two-way type shear stress measurement method, laser light is irradiated to a reflector installed on the bottom surface of the lower surface holder of the sample, and the combination A two-way surface-to-surface distance measurement method that measures the distance displacement between the surfaces of the sample from the phase change of the reflected light from the mirror, and the viscoelasticity, friction and lubrication of the sample from the resonance curve The measurement method for measuring the characteristics is to measure the shear stress of the sample.

(11) A two-way type shear stress measuring device is characterized in that the two-way type shear stress measuring device has: a precision variable device, which makes the upper surface holder of the sample displace along the horizontal direction; , the horizontal displacement of the upper surface holder of the sample is detected; the lower surface fixing unit of the sample composed of a leaf spring holds the lower surface holder of the sample at the front end and has a a reflector arranged on the bottom surface of the lower surface holder; a driving device for driving the lower surface fixing unit to drive the lower surface holder of the sample up and down; and a two-way inter-surface distance measuring unit for the The reflector is irradiated with laser light, and the distance between the upper surface of the sample and the lower surface of the sample is measured according to the phase change of the reflected light from the reflector, wherein the upper surface of the sample is The viscoelasticity and friction/lubricity properties of the sample were measured for each distance between the surface and the lower surface of the sample.

(12) In the two-way shear stress measuring device described in (11) above, the viscoelasticity and friction/lubrication properties of the sample are measured based on the resonance curve of the sample.

(13) In the dual-channel shear stress measuring device described in (11) or (12) above, the sample is a transparent sample or an opaque sample.

(14) In the dual-channel shear stress measuring device described in (11) or (12) above, the sample is a liquid thin film.

(15) In the two-way shear stress measuring device described in the above (11) or (12), the sample is a liquid crystal film.

(16) In the two-way shear stress measuring device described in (11) or (12) above, the sample is an adsorption layer of a polymer, surfactant, or the like, or a chemically modified film.

(17) In the two-way shear stress measuring device described in the above (11) or (12), one or both of the upper surface holder and the lower surface holder of the sample are opaque. substrate.

Description of drawings

FIG. 1 is a schematic diagram showing a resonance shear measurement system according to an embodiment of the present invention.

2 is a schematic diagram illustrating an example of a resonance shear measurement unit of a resonance shear measurement system according to an embodiment of the present invention.

3 is a schematic partial configuration diagram showing a resonance shear measurement unit of a resonance shear measurement system according to a modified example of the present invention.

Fig. 4 is a flowchart showing head vibration shear measurement according to an embodiment of the present invention.

Fig. 5 is a diagram showing an example of attenuated vibration of one side surface when a sample is set on the resonance shear measurement unit of the present invention and the measurement is performed.

6 is a diagram showing a resonance shear curve obtained by performing Fourier transform of the present invention on the damped vibration shown in FIG. 5 and respective curves obtained by a conventional method.

Fig. 7 is a schematic diagram showing a two-way shear stress measuring device according to another embodiment of the present invention.

Fig. 8 is a schematic view showing a sample used to illustrate an application example of a two-way shear stress measuring device according to another embodiment of the present invention.

9 is a chemical formula of liquid crystal (4-cyano-4-hexyl biphenyl, 6CB) as a sample sandwiched in the surface of mica according to another embodiment of the present invention.

Fig. 10 shows another example of the present invention and shows the result of measuring liquid crystal (4-cyano-4-hexyl biphenyl, 6CB) as a sample using the two-way shear stress measuring device of the present invention. picture.

Detailed ways

In the first resonance shear measurement method and its device of the present invention, the input signal U _in is input to the piezoelectric (piezo) element of the resonance shear measurement unit, and the solid surface in the resonance shear measurement unit is detected using a displacement meter. The vibration of the surface of one side of the sample clamped in is detected as the output signal U _out , together with the input signal U _in , the output signal U _out is input to the resonance shear measurement device, and the resonance shear The shear response of the sample sandwiched in the solid surface of the variable measurement unit is measured together with the change in film thickness, wherein the decay curve of the vibration of the one-sided surface of the sample is Fourier transformed to obtain the resonance shear curve.

The second two-way type shear stress measuring device of the present invention has: a precision variable device for displacing the upper surface of the sample along the horizontal direction; a displacement meter for detecting the displacement of the upper surface of the sample in the horizontal direction The lower surface fixing unit of the sample composed of a plate spring holds the lower surface of the sample at the front end and has a reflector arranged on its bottom surface; the driving device drives the lower surface fixing unit to adjust the lower surface of the sample. The lower surface of the sample A is driven up and down; and the two-way inter-surface distance measuring unit measures the distance between the upper surface of the sample A and the lower surface of the sample according to the phase change of the reflected light from the mirror. The distance between the upper surface of each sample and the lower surface of the sample was measured, and the viscoelasticity and friction and lubrication characteristics of the sample were measured for each distance between the upper surface of the sample and the lower surface of the sample.

Implementation example

Hereinafter, embodiments of the present invention will be described in detail.

FIG. 1 is a schematic diagram showing a resonance shear measurement system according to an embodiment of the present invention, and FIG. 2 is a schematic diagram showing an example of the resonance shear measurement unit. In this figure, 1 is a waveform generator, 2 is a power supply connected to the waveform generator 1, 3 is a resonance shear measurement unit connected to the power supply 2 and inputting an input voltage U _in as an input signal, and 4 is a resonance shear measurement unit. The displacement meter connected to the measurement unit 3, such as an electrostatic capacitance displacement meter, 5 is a resonance shear measuring device connected to the electrostatic capacitance displacement meter 4 and the power supply 2 and inputting the output voltage U _out and the input voltage U _in as the output signal. The resonance shear measuring device 5 is composed of a timing unit 5A, a Fourier transform unit 5B, an amplitude spectrum generation unit 5C, a standard unit [U _in (ω) and U _out standardization unit] 5D of the amplitude (U _out /U _in ), and The resonance shear curve forming part 5E is constituted. 6 is a personal computer (PC) 6 connected to the resonance shear measurement device 5 , and the personal computer (PC) 6 is connected to the waveform generator 1 . In addition, a strain gauge may also be used as the displacement gauge described above.

In Fig. 2, 10 is the resonance shear measurement unit (corresponding to the resonance shear measurement unit 3 in Fig. 1), 11 is the cantilever, 12 is the disc holder (disc holder), 13 is the white light, and 14 is fixed on the disc The lower substrate on the support 12, 15 is a four-divided piezoelectric element as a horizontal driving part that drives the upper surface in the horizontal direction, 16 is an upper substrate fixed to the bottom of the four-divided piezoelectric element 15, and 17 is The leaf springs supporting the four divided piezoelectric elements 15 are supported. 18 is a capacitance displacement meter (probe) (corresponding to the capacitance displacement meter 4 in FIG. 1 ) for measuring the horizontal displacement Δx of the plate spring 17, and 19 is a sample (solid , liquid, liquid crystal, etc.). In addition, here, the liquid is not limited to a single component, and may be various solutions including two or more kinds of molecular clusters or colloidal dispersion systems. In addition, an electric motor can also be used as the above-mentioned horizontal drive unit.

3 is a schematic partial configuration diagram showing a resonance shear measurement unit of a resonance shear measurement system according to a modified example of the present invention.

In this example, the substrates themselves can also be used as samples 21 and 22, instead of sandwiching the samples between the substrates as shown in FIG. Mutual friction (lubrication) characteristics were measured.

Fig. 4 is a flowchart of the resonance shear measurement.

(1) First, the sine wave (angular frequency ω) of the amplitude voltage U _in shown in FIG. 1 is input to the piezoelectric element (the quartered piezoelectric element 15 in FIG. 2 ) (step S1 ).

(2) Obtain the output voltage U _out (ω) (step S2).

(3) Stop the input voltage U _in (step S3).

(4) Obtain the output voltage U _out and the elapsed time (step S4).

(5) Perform Fourier transform (step S5).

(6) Output the amplitude spectrum (step S6).

(7) Normalize with the output voltage U _out (ω) and the input voltage U _in (step S7).

(8) Outputting the resonance shear curve (step S8).

When a sample is set on the above-mentioned resonance shear measurement unit and measured, the damped vibration of one surface of the sample draws a curve like that shown in FIG. 5 .

Here, the horizontal axis represents elapsed time, and the vertical axis represents the amplitude of vibration. In this damped vibration, Fourier transform represented by the following formula is performed,

$\mathrm{<span\; class="notranslate">\; f</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; \&omega;</span>}<span\; class="notranslate">\; )</span><span\; class="notranslate">\; =</span>\underset{<span\; class="notranslate">\; -</span><span\; class="notranslate">\; \&infin;</span>}{\overset{<span\; class="notranslate">\; +</span><span\; class="notranslate">\; \&infin;</span>}{<span\; class="notranslate">\; \&Integral;</span>}}\mathrm{<span\; class="notranslate">\; f</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; t</span>}<span\; class="notranslate">\; )</span>{\mathrm{<span\; class="notranslate">\; e</span>}}^{<span\; class="notranslate">\; -</span>\mathrm{<span\; class="notranslate">\; i\&omega;t</span>}}\mathrm{<span\; class="notranslate">\; dt</span>}<span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; 1</span>}<span\; class="notranslate">\; )</span>$

This amplitude spectrum is taken to obtain a resonance shear curve. Here, ω represents the number of angular vibrations, F(ω) represents the obtained Fourier spectrum, f(t) represents the damped vibration, and t represents time.

The results obtained by the resonance shear curve of the present invention and the results obtained by the conventional method are shown below.

6 is a diagram showing a resonance shear curve obtained by performing Fourier transform of the present invention on the damped vibration shown in FIG. 5 and respective curves obtained by a conventional method.

The horizontal axis represents the vibration frequency of one side of the sample, and the vertical axis represents the vibration amplitude. The difference between the input voltage (U _IN ) applied to the piezoelectric device of the shear measurement unit and the output voltage (U _OUT ) measured by the capacitance meter than to express. The conventional method is to measure the response of one side surface corresponding to each vibration frequency point by point. Figure 6 shows that the present invention can better measure the response of the one-sided surface corresponding to the frequency, and can continuously measure the response of the one-sided surface of the sample corresponding to a wide range of vibration frequencies in a short time Methods.

In addition, according to the present invention, a sample (solid, liquid, liquid crystal, etc.) can be sandwiched between two solid substrates, and the thickness of the sample can be changed while changing the viscoelasticity of the sample, friction and lubrication characteristics, the sample and the solid substrate. The bonding strength was evaluated. In addition, the substrate itself may be used as a sample, and mutual friction (lubricating) characteristics may be measured without sandwiching the sample therebetween. In addition, the surface can also be modified by adsorption or a chemical modification method [LB (Langmuir·Brochette) modification method] or the like. In addition, the frequency response of the sample can be measured by vibrating the surface not only in the horizontal direction but also in the vertical direction.

According to the present invention, the resonance shear curve can be measured simply and accurately in a short time without measuring the shear response at each vibration frequency one by one as in the prior art.

Next, a two-way type shear stress measurement according to another embodiment of the present invention will be described.

Fig. 7 is a schematic diagram showing a two-way shear stress measurement device according to an embodiment of the present invention.

In this figure, 31 is a resonance shear measurement unit, 32 is a four-divided piezoelectric element that drives the upper surface in the horizontal direction, 33 is a leaf spring supporting the four-divided piezoelectric element 32, and 34 is a pair of leaf springs 33. 35 is an upper substrate fixed to the bottom of the piezoelectric element 32 divided into four.

In addition, the unit 40 for fixing the lower surface holder 42 of the sample A holds the lower surface holder 42 of the sample A at the tip of the plate spring 41 , and a reflection mirror 43 is arranged on the lower surface of the lower surface holder 42 . On the other hand, a driving device [for example, a motor (not shown)] that drives the leaf spring 41 vertically is provided at the base of the leaf spring 41 .

In addition, 51 is a two-way surface-to-surface distance measuring device, which has: a laser light source 52; a diffraction grating 53, which receives the laser light from the laser light source 52, and separates it into a measurement light and a reference light; 53 adjusts; Lens 55, accepts the light from diffraction grating 53; Fixed reflector 56, accepts the reference light as a part of this laser light; Diffraction grating 57, accepts the reference light reflected by this fixed reflector 56 via lens 55 again And the metering light reflected by the reflection mirror 43 designed on the bottom surface of the lower surface holder 52 of the sample A; the photodiode 58, which receives the light from the diffraction grating 57; and the personal computer 59, with the piezoelectric element 54 and the photodiode 58 connections.

Due to such a configuration, the change in the distance between the surfaces sandwiching the sample A is measured using the two-way distance measuring device 51 between surfaces, and the upper surface of the sample A is mounted on the precision variable resonance measuring unit 31, and the test is performed. Such viscoelasticity and friction and lubrication characteristics can be measured, so that the shear stress can be measured precisely.

Fig. 8 is a schematic diagram of a sample used in order to show an application example of the two-way type shear stress measuring device of the present invention, and Fig. 9 is a liquid crystal (4-cyano-4-hexyl biphenyl, 6CB) as the sample Chemical formula, FIG. 10 is a graph showing the resonance curve measured for the liquid crystal (4-cyano-4-hexyl biphenyl, 6CB) as the sample using the two-way shear stress measuring device of the present invention.

As shown in FIG. 8 , mica 62 and 63 are arranged above and below a liquid crystal (4-cyano-4-hexyl biphenyl, 6CB) 61 as a sample. That is, it is arranged so that liquid crystal 61 as a sample is sandwiched between mica 62 as upper substrate 35 and mica 63 as lower surface support 42 .

The chemical formula of the sample liquid crystal (4-cyano-4-hexyl biphenyl, 6CB) sandwiched in the mica surface is shown in FIG. 9 .

In FIG. 10, the horizontal axis represents the angular vibration number (s ^-1 ) of the upper surface of the sample, and the vertical axis represents the input voltage (U _in ) to the piezoelectric element of the precision shear resonance measurement unit and the voltage measured by the capacitance displacement meter. The measured output voltage (U _out ) ratio. In addition to the results obtained by measuring the liquid crystal as a sample, for the results measured in a state where the liquid crystal as a sample is not sandwiched and separated from the surface of the holder [in the air (separation side)], and the holder The results of surface contact measurements [in air (mica-mica contact)] are compared and plotted. The horizontal solid line of the distance between the surfaces of the sample indicates the resonance peak at the distance. Here, regarding the distance between surfaces, when the lower surface holder is driven upward using a driving device, the point at which the distance between surfaces does not change is defined as 0 nm. As the distance between the surfaces varies, a change in the resonance curve is observed. The phenomenon that there are many peaks of 0 nm indicates that the surface distance is constant and the load varies.

In addition, according to the present invention, a sample (liquid, solid, liquid crystal, etc.) can be sandwiched between two solid substrates, and the thickness of the sample can be changed while changing the viscoelasticity of the sample, friction and lubrication characteristics, and the difference between the sample and the solid. The bonding strength of the substrate and the like were evaluated. In addition, the substrate itself may be used as a sample, and the mutual friction (lubricating) characteristics may be measured without sandwiching the sample between the substrates. In addition, the surface can also be modified by adsorption or a chemical modification method [LB (Langmuir·Brochette method)] or the like.

In addition, since the reflected light of the laser light is used, it is not necessary to transmit light through the substrate and the sample, and the distance between surfaces can be measured even when an opaque substrate and opaque sample are used. Viscoelasticity and friction and lubrication properties were measured.

In addition, the present invention is not limited to the above-mentioned embodiments, and various modifications can be made according to the gist of the present invention, and these are not excluded from the scope of the present invention.

Industrial availability

The first resonance shear measurement method of the present invention is particularly suitable for the simple and accurate measurement of the physical properties of a liquid thin film having a nanometer-order thickness between solid surfaces.

The second two-way type shear stress measuring device of the present invention can be utilized as a two-way type shear stress measuring device capable of precise shear stress measurement using a two-way method for measuring the distance between opaque substrates, Similar to the first resonance shear measurement method, it is suitable for the simple and accurate measurement of the physical properties of a liquid thin film having a nanometer-order thickness between solid surfaces.

Claims (9)

1. A resonance shear measurement method, in this resonance shear measurement method, the input signal U _in is input to the horizontal driving part of the resonance shear measurement unit, for the clamped in the solid surface in the resonance shear measurement unit For the input sample, the displacement meter is used to detect the vibration of one side of the surface as the output signal U _out , and together with the input signal U _in , the output signal U _out is input to the resonant shear measurement device, and the The shear response of the sample sandwiched in the solid surface of the resonance shear measurement unit is measured together with the change of the film thickness, and it is characterized in that the Fourier transform is performed on the vibration attenuation curve of the one-side surface of the sample. transform to obtain the resonance shear curve. 2. A resonance shear measurement method, in this resonance shear measurement method, the input signal U _in is input to the horizontal driving part of the resonance shear measurement unit, and the solid surface itself is not sandwiched between the solid surfaces As a sample, use a displacement meter to detect the vibration of one side surface of the sample in the resonance shear measurement unit as an output signal U _out , and together with the input signal U _in , output the output signal U _out It is input to the resonance shear measurement device, and the shear response of the sample of the resonance shear measurement unit is measured together with the change of the film thickness, and it is characterized in that the vibration of the one-side surface of the sample The decay curve is Fourier transformed to obtain the resonant shear curve. 3. The method for measuring resonance shear according to claim 1, wherein the sample is a thin film. 4. The method for measuring resonance shear according to claim 1, wherein the sample is a liquid. 5. The method for measuring resonance shear according to claim 1, wherein the sample is a liquid crystal. 6. The method for measuring resonance shear according to claim 1, wherein the sample has a thickness of nanometer size. 7. The resonance shear measurement method according to claim 1 or 2, characterized in that the surface of the sample is modified by adsorption or chemical modification. 8. The resonance shear measurement method according to claim 1 or 2, wherein the resonance shear curve is the frequency characteristic of the shear response of the sample. 9. A resonance shear measurement device, characterized in that the resonance shear measurement device has: a waveform generator; a power supply connected to the waveform generator; a resonance shear measurement unit connected to the power supply and inputted with an input signal U _in ; a displacement meter, connected to the resonance shear measurement unit; a resonance shear measurement device, connected to the displacement meter and the power supply and input and output signal U _out and an input signal U _in , the resonance shear measurement device has (a) the timing department, (b) a Fourier transform part connected to the timing part and the displacement meter, (c) an amplitude spectrum generation unit connected to the Fourier transform unit, (d) the standard part of the amplitude U _out /U _in , and (e) The resonance shear curve forming part; And a computer connected with the waveform generator and the resonant shear measurement device.

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