CN101221873A

CN101221873A - Method of manufacturing lower panel for plasma display panel using X-rays

Info

Publication number: CN101221873A
Application number: CNA2007103052027A
Authority: CN
Inventors: 梁东烈; 柳承玟; 朴奭熙; 崔钟书; 崔龟锡; 李范旭
Original assignee: Samsung SDI Co Ltd
Current assignee: Samsung SDI Co Ltd
Priority date: 2006-12-29
Filing date: 2007-12-29
Publication date: 2008-07-16
Also published as: KR100838074B1

Abstract

A method of manufacturing a lower panel for a plasma display panel using X-rays which includes preparing a base substrate; forming a barrier rib material layer on the base substrate; defining barrier rib patterns by scanning X-rays through an X-ray mask on the barrier rib material layer; and developing the barrier rib material layer to form barrier ribs. Fine-pitch patterning of the barrier ribs can be achieved with high precision by using X-rays.

Description

Use X ray to make the method for the lower panel of plasma display

Technical field

The present invention relates to a kind of manufacture method of lower panel of plasma display, more specifically, relate to the manufacture method of the lower panel of plasma display, wherein can be with the fine pitch composition of done with high accuracy barrier rib.

Background technology

Plasma display (PDP) is by using ultraviolet (UV) light excitation phosphorus to produce the flat panel display equipment of image, and ultraviolet light is generation when keeping of forming between upper substrate and the infrabasal plate discharge occurs between the electrode.

Fig. 1 is the schematic diagram that conventional (AC) the driving surface discharge PDP of interchange is shown.With reference to figure 1, a plurality of addressing electrodes 22 and following dielectric layer 21 are arranged on the infrabasal plate 20, make addressing electrode 22 be imbedded in down in the dielectric layer 21.Barrier rib 24 defines a plurality of discharge space G of being arranged in down on the dielectric layer 21 and discharge space G is defined as independent luminous zone.Discharge space G is coated with red, green and blue RGB phosphor 25.Thereby the ultraviolet light excitation that RGB phosphor 25 is produced by plasma discharge produces visible light, thereby and described RGB phosphor 25 be arranged in the discharge space G and handled and produce static or dynamic image.

Upper dielectric layer 11 and protective layer 15 are arranged on the upper substrate 10, are arranged in the scanning on the upper substrate 10 and keep electrode pair 16 thereby cover.Upper dielectric layer 11 gathers the wall electric charge of plasma discharge, and electrode pair 16 is kept in protective layer 15 protections and upper dielectric layer 11 is not subjected to the sputter of the gas ion of plasma discharge, and increases the emission effciency of secondary electron simultaneously.For example the inert gas of He, Xe or Ne is filled the discharge space G of PDP with about pressure of 400 to 600Torr.

Barrier rib 24 can form with the open type bar paten, as shown in Fig. 1, or forms with the enclosed type pattern for discharge more effectively.Barrier rib 24 plays a part to keep the preset distance between upper substrate 10 and the infrabasal plate 20 and define discharge space G.Barrier rib 24 avoids electricity between the discharge space G or optical crosstalk so that improve picture quality (comprising colorimetric purity) and provide the district of associated with phosphor coating 25 so that contribute to the luminosity of PDP.Simultaneously, barrier rib 24 is determined the size of pixels, and this is the least unit of the image that is made of the discharge space G with rgb format, and determines the resolution of image by defining unit interval between the discharge space G.Thereby barrier rib 24 influences picture quality and luminous efficiency.Along with the size of panel increases and the more image of high definition is provided, carried out the research of many barrier ribs.

Usually, barrier rib by silk screen printing, sandblast, the manufacturings such as photoetching of etching, use photosensitive paste.Wherein, use as described below the carrying out of photoetching of photosensitive paste.At first, thus the photosensitive paste that comprises ceramic barrier rib material is coated on the substrate and is dried and obtains to have the film of wishing thickness.Then, photosensitive paste optionally is exposed to UV light by the photomask of alignment, thereby and uses developer to develop and remove the part of uncured (uncured).Finally, the structure that sintering is finished is finished barrier rib thus.During being exposed to UV light, by the photosensitive paste part of polymerization reaction curing exposure, thereby form barrier rib, and the residual fraction of the photosensitive paste that is shielded by photomask not being cured, but during developing, being decomposed and removing in UV light.

Photosensitive paste can comprise inorganic microparticle and organic material.UV light can scattering on the interface between inorganic microparticle and the organic material, and thereby photocuring can occur in the photosensitive paste part adjacent to target photosensitive paste part.In addition, because the light scattering that occurs along the light path of UV light, the amount of UV light that is provided to the part (the perhaps the most close part of the photosensitive paste of dielectric layer 21 down among Fig. 1) of close the bottom of photosensitive paste may be not enough to solidify the part photosensitive paste of close bottom.Like this, as shown in Fig. 1, barrier rib 24 is wideer than the top in the bottom.So that when increasing the penetration depth of UV light, the intensity of scattered beam also increases when the intensity that increases UV light.

Summary of the invention

An aspect of of the present present invention provides the method for the lower panel of a kind of manufacturing plasma scope (PDP), wherein can use X ray to realize the fine pitch composition of high-precision barrier rib.

According to an aspect of the present invention, provide the method for the lower panel of a kind of PDP of manufacturing, described method comprises: basal substrate is provided; On basal substrate, form the barrier rib material layer; Define the barrier rib pattern by scanning X ray on the barrier rib material layer; And thereby development barrier rib material layer forms barrier rib.

According to a further aspect in the invention, provide the manufacture method of the lower panel of a kind of PDP, described method comprises: the first barrier rib material layer that forms first thickness on basal substrate; Define the first barrier rib pattern by scanning X ray on the first barrier rib material layer; On the first barrier rib material layer, form the second barrier rib material layer of second thickness; On the first and second barrier rib material layers, define the second barrier rib pattern by the scanning X ray; And the first and second barrier rib material layers that develop, thereby form barrier rib with differing heights.

Others of the present invention and/or advantage part in the following description propose, and part is obvious from following description, perhaps can learn by practice of the present invention.

Description of drawings

In conjunction with the accompanying drawings, from the following description of embodiments of the invention, these and/or others of the present invention and advantage will become more obvious and be more readily understood, wherein:

Fig. 1 is the decomposition diagram that conventional plasma display PDP is shown;

Fig. 2 is the flow chart that the manufacture method of the lower panel of the PDP of many aspects according to the present invention is shown;

Fig. 3 A to 3E is the vertical cross-section diagram of detailed process that the method for Fig. 2 is shown;

Fig. 4 is the vertical cross-section diagram that the barrier rib of making as the use ultraviolet lithography of comparison example of the present invention is shown;

Fig. 5 illustrates to use the basis figure of the barrier rib pattern of method manufacturing shown in figure 2;

Fig. 6 A to 6C is the figure that is illustrated in the barrier rib of making under the different conditions of exposures;

Fig. 7 A to 7D is the perspective view of manufacture method that the lower panel of PDP according to an aspect of the present invention is shown;

Fig. 8 is the perspective view that the example of the lower panel of making according to the method for Fig. 7 A to 7D is shown;

Fig. 9 illustrates the figure of use according to the barrier rib pattern of the method manufacturing of many aspects of the present invention;

Figure 10 is the figure that illustrates according to the manufacture method of the lower panel of many aspects of the present invention; And

Figure 11 A to 11D is the figure that illustrates according to the manufacture method of the lower panel of the PDP of many aspects of the present invention.

Embodiment

Now will describe embodiments of the invention in detail, the example is shown in the drawings, the wherein similar similar element of reference numerals indication.The following examples are described so that explain the present invention with reference to the accompanying drawings.But various aspects of the present invention can be implemented with different forms, and should not be construed as the embodiment that is confined in this proposition.When introduce one deck or arrangement of electrodes be formed at another layer or substrate " on " time, this term means described layer or electrode can directly be formed on another layer or the substrate, perhaps the 3rd layer can be arranged in therebetween.In addition for the sake of clarity, the thickness that can exaggerate floor or distinguish.

Fig. 2 is the flow chart of manufacture method of lower panel that the plasma display PDP of the many aspects according to the present invention is shown.With reference to figure 2, the manufacture method of the lower panel of the PDP of many aspects has been described according to the present invention at this.The infrabasal plate (S101) of PDP at first is provided, on infrabasal plate, forms the barrier rib material layer (S103) wish thickness, thereby and on the barrier rib material layer scanning X ray define barrier rib pattern (S105).Then, the barrier rib material layer is developed and composition (S107).Finally, the structure that sintering is finished (S109) is finished the lower panel of PDP thus.

Below, aforesaid operations will be described in more detail in order.Fig. 3 A to 3E is the signal artwork that aforesaid operations is shown.At first, with reference to figure 3A, the infrabasal plate 120 of the PDP that before provided is arranged on the workbench S.Infrabasal plate 120 can be glass substrate of being made by glass material or the flexible base, board of being made by flexible plastic material.At this moment, go out as shown, a plurality of electrodes 122 can be arranged on the infrabasal plate 120, but can differently arrange in others.Thereby dielectric layer 121 is arranged in coated electrode 122 on the infrabasal plate 120.Electrode 122 is arranged to such an extent that be parallel to each other, and makes it corresponding to the district that wherein will form discharge space thereby separate with preset space length by this way.Dielectric layer 121 can form by the whole dielectric cream that applies on the infrabasal plate 120 of coated electrode 122, but is not limited to this.According to the structure of the hope of PDP, can omit electrode 122 and/or dielectric layer 121.For example, in not comprising the PDP structure of addressing electrode, electrode 122 and dielectric layer 121 can be omitted or use other method construct.

Use X ray that the barrier rib pattern is provided on the infrabasal plate 120 that provides as mentioned above.After this, will formation barrier rib method of patterning that use X-ray lithography be described.At first, with reference to figure 3B, formed thereon and formed barrier rib material layer 150 on the infrabasal plate 120 of electrode 122 and dielectric layer 121 to thickness H.Thickness H is with respect to the top of dielectric layer 121.Barrier rib material layer 150 can by X ray is shown developing property or development (for example can by X ray light or hot curing or during evaporating dry material) material forms and thereby can be by development composition.In addition, barrier rib material layer 150 can form by the barrier rib material that applies paste at (or as shown in the figure on dielectric layer 121) on the infrabasal plate 120, perhaps as an alternative, and lamination sheets form drag retaining timber material on infrabasal plate 120.

For example, barrier rib material layer 150 can be formed by photocurable composite organic-inorganic material that comprises inorganic microparticle 152 and multiple organic material 151, thereby inorganic microparticle 152 is basic glass materials of formation barrier rib to be sintered.In more detail, inorganic microparticle 152 can be made of glass frit powder, and inorganic material 151 can comprise the adhesive that makes inorganic microparticle 152 become the carrier of paste, bonding inorganic microparticle 152, promote the light trigger that solidifies etc. by photochemical reaction.In addition, organic material 151 can comprise monomer, dispersant or other material.

The thickness H of barrier rib material layer 150 is corresponding to the height of the barrier rib that will form.Thereby preferred barrier rib material layer 150 should be formed up to enough thickness.For example, consider the contraction of barrier rib behind the sintering,, then behind sintering, can obtain to have the barrier rib of 120 to 130 μ m height if barrier rib material layer 150 is formed up to the thickness of 160 to 180 μ m before sintering.Forming barrier rib material layer 150 to the thickness of hope, barrier rib material layer 150 is cured by dry.The drying that when barrier rib material layer 150 is formed by the barrier rib material of paste, needs barrier rib material layer 150.Thereby, when the additional process of the shape that need not to stablize barrier rib, for example when barrier rib material layer 150 is formed by sheet form drag retaining timber material, can omit the drying of barrier rib material layer 150.

Then, with reference to figure 3C, the X ray mask 130 with predetermined pattern is arranged in described barrier rib material layer 150 tops.At this moment, X ray mask 130 and infrabasal plate 120 mutual vertical alignments with barrier rib material layer 150 disposed thereon.X ray mask 130 is divided into transmission area Wmask and blind zone.As shown in Fig. 3 C, when X ray mask 130 comprised transparency carrier 131 and absorber 132, absorber 132 is the composition equably on the surface of transparency carrier 131 at least.Like this, transmission area Wmask is corresponding to the part of the transparency carrier 131 that covers without absorber 132, and the blind zone is corresponding to the part of the transparency carrier 131 that covers with absorber 132.Part (being illustrated as 150a) corresponding to the barrier rib material layer 150 of transmission area Wmask tends to form barrier rib 155 behind photocuring, and is not cured and is removed subsequently corresponding to the part of the barrier rib material layer 150 of blind zone.Here, transparency carrier 131 can be made by the material with good transmission, makes that high-intensity X ray 100 can the transmission by transmission area Wmask.For this reason, transparency carrier 131 can be made so that have low absorbability by the material of low atomic number.For example, in order to make the large scale mask, transparency carrier 131 can be made by Bohemian glass substrate or flexible polyimide film.Simultaneously, absorber 132 can be formed up to for example preset thickness t, so that the transmittance of blind zone do not occur passing.Absorber 132 can be made by the material of high atomic number, and for example golden (Au) or tungsten (W) are so that increase absorbability.Being arranged in transparency carrier 131 lip-deep absorbers 132 can use photoetching or electroplate composition.Although described X ray mask 130, transparency carrier 131 and absorber 132 for X ray, but X ray mask 130, transparency carrier 131 and absorber 132 not only are confined to this, so that any type of electromagnetic radiation can be used for composition barrier rib material layer 150.For example, transparency carrier 131 can be for the electromagnetic radiation of higher-energy transparent and absorber 132 can stop its transmission.

Then, X ray 100 scans on barrier rib material layer 150 by X ray mask 130, thereby defines the pattern of hope on barrier rib material layer 150.This operation can be explained in more detail with reference to figure 3D.Promptly when the x-ray source (not shown) that sends X ray 100 when (arrow A) is mobile on a direction under the state that X ray mask 130 and infrabasal plate 120 are aligned, can scan X ray 100.As an alternative, when X ray mask 130 with when supporting the workbench S of infrabasal plate 120 (arrow B) is mobile on a direction, can scan X ray 100 from fixing x-ray source (not shown).For the purpose of convenient, can select the best approach and can relate to x-ray source and the moving of workbench S.But, when the mutual relative motion of X ray 100 and barrier rib material layer 150, be identical from these two kinds of methods aspect the side direction offside scanning of barrier rib material layer 150 at X ray 100.The part 150a that is exposed to the barrier rib material layer 150 of X ray 100 solidifies by polymerization reaction, and stays during developing and form barrier rib 155 thus.In contrast, the part of unexposed barrier rib material layer 150 in X ray 100 is not cured, and is removed during developing, and defines discharge space thus.Usually, but employed X ray 100 can have the wavelength of 0.01 to 100  not only be confined to this in pattern defining.

Occur developing after the above-mentioned pattern defining.During developing process, appropriate developer (for example aqueous slkali) puts on barrier rib material layer 150, thereby optionally dissolves, disperses and remove the uncured part of barrier rib material layer 150.After finishing development, only stay the part of the barrier rib material layer 150 that is exposed by X ray 100 and solidify and form barrier rib 155, as shown in Fig. 3 E.

As shown in Fig. 3 A to Fig. 3 E, because the optical characteristics of X ray 100, the barrier rib 155 with preset width Wrib can be formed corresponding to the transmission area Wmask of X ray mask 130.Like this, advantage of the present invention is to obtain having even width, or the barrier rib of the fine pitch that do not change on short transverse of width.

Fig. 4 is the sectional view that the barrier rib that uses UV light composition is shown.With reference to figure 4, barrier rib material layer 150 comprises organic material 151 and inorganic microparticle 152.UV light on being radiated at barrier rib material layer 150 when the barrier rib material layer 150, its inorganic microparticle 152 at the interface with the wide angle scattering and be diffused into subsequently in the part that enters outside the barrier rib material layer part of hope adjacent to the barrier rib material layer 150 of the barrier rib material layer part of hope.The part that is exposed to the barrier rib material layer 150 of scattered beam may undesirably be solidified.Promptly the part corresponding to the barrier rib material layer 150 of the blind zone of mask also is exposed to UV light.Because this reason, the width W ' rib of barrier rib is inhomogeneous on short transverse, but increase gradually along the light path of UV light, promptly with reference to figure 1, thereby barrier rib material layer 150 solidifies and forms the barrier rib 24 with the width that increases in 20 the direction from upper substrate 10 to infrabasal plate.

In addition, because light is scattered along light path, so the quantity of UV light reduces constantly along the light path of UV light.As a result, the UV light of lazy weight can be applied in the part of close bottom of barrier rib material layer 150 of the substrate 120 that approaches Fig. 4 most.Consider such problem, when increasing the intensity of UV light, the intensity of scattering also increases, and thereby is exposed to UV light more corresponding to the part of the barrier rib material layer 150 of the blind zone of mask.In contrast,, use the X ray that on inorganic microparticle interface, shows less scattering properties, and thereby can avoid because the appearance of uncontrollable exposure of light scatter according to many aspects of the present invention.Therefore, can accurately make the barrier rib pattern that has corresponding to the even width of the transmission area of mask.

The employed short wavelength's of having of many aspects X ray has according to the present invention is enough to penetrate the good transmittance with thick thickness, and thereby can run through the bottom that arrives the barrier rib material layer.Thereby, according to the many aspects of this aspect, can overcome according to the transmittance of employed light and the restriction of the thickness of definite barrier rib material layer.In addition, when needs, by forming the barrier rib material layer to thick thickness, can easily make barrier rib with high aspect ratio (promptly wherein the height of barrier rib to the ratio height of the width of barrier rib).In addition because the high-penetrability of X ray can reduce the caused refraction effect of difference by refractive index between organic material and the inorganic microparticle, and thereby improved the precision of radiation direction, make it possible to achieve the composition of the fine pitch of barrier rib thus.Fig. 5 shows the barrier rib of the fine pitch that uses the X ray composition, and wherein the last width of barrier rib is about 14 μ m.

Amount of energy (exposure dose, unit: kJ/cm in the systemic unit volume of barrier rib material layer ³) closely related with the precision of the final barrier rib structure that obtains.Thereby many aspects according to the present invention are when being exposed to X ray with the barrier rib material layer, and preferred (but not must) calculates the dosage of accurately controlling the X ray that is applied to the barrier rib material layer by quantity.Consider the depth of penetration of X ray and the X ray absorbability of barrier rib material layer, the dosage that is applied to the X ray of barrier rib material layer can be optimized by control conditions of exposure (for example the intensity of X ray, time for exposure).Fig. 6 A to 6C is the figure that is illustrated in the barrier rib of making under the different exposure.If the time for exposure is too short, then since the barrier rib material layer sufficiently do not solidify owing to lack exposure, so barrier rib fail correctly to form, as shown in Fig. 6 A.In contrast, if the time for exposure is oversize, as shown in Fig. 6 C, then in the barrier rib of finishing, produce defective (for example cavity or crack), and the part corresponding to the barrier rib material layer of the blind zone of X ray mask also is exposed to X ray, causes the curing corresponding to the part of the barrier rib material layer of the blind zone of X ray mask thus.But the barrier rib of making by suitable time for exposure has smooth surface, as shown in Fig. 6 B.

Refer again to Fig. 3 A to 3E, sintering is by above-mentioned pattern defining and barrier rib material layer pattern that development obtained.For this reason, the barrier rib material layer pattern is heated to the high temperature near the fusing point of the inorganic microparticle 152 (for example frit) that is comprised in the barrier rib material layer pattern, make inorganic microparticle 152 be melted and sintering, and simultaneously, remove the organic material 151 that is comprised in the barrier rib material layer pattern.

According to many aspects of the present invention, show the formation of the barrier rib that uses X-ray lithography.But if the barrier rib material layer can use the X ray composition, then the formation method based on the barrier rib of X ray not only is confined to said method, and described know-why can be applied to the whole bag of tricks of the many aspects according to the present invention.For example, can substitute the use exposed mask according to the light path of barrier rib pattern control X ray.Like this, can on the barrier rib material layer, define the pattern of hope.This can by with on biaxially oriented movably X-Y table handle the X ray rifle and realize.

Fig. 7 A to 7D is the perspective view of manufacture method that the lower panel of PDP according to an aspect of the present invention is shown.As mentioned above, on the barrier rib material layer, use X ray to define the pattern of hope, but so-called ladder barrier rib pattern, promptly wherein the diverse location of barrier rib has the barrier rib of differing heights, uses two operations to form: first pattern defining and second pattern defining.

Below, many aspects of the present invention will be described in more detail.At first, with reference to figure 7A, the infrabasal plate 120 of the PDP that provides in advance is placed on the workbench S.At this moment, on infrabasal plate 120, form a plurality of electrodes 122 and layout dielectric layer 121, but need not to be confined to this with coated electrode 122.Then, on infrabasal plate 120, form the first barrier rib material layer 150 '.For example, the first barrier rib material layer 150 ' can comprise that the photosensitive paste of the organic material of inorganic microparticle and various functions is formed up to preset thickness ho by coating.Here, the thickness h o of the first barrier rib material layer 150 ' is corresponding to the height that has first barrier rib of relatively low height in the ladder barrier rib that will form.Then, the first barrier rib material layer 150 ' is dried.According to the physical characteristic of the material of the first barrier rib material layer 150 ', the drying of the first barrier rib material layer 150 ' can be omitted.For example, if the barrier rib material piece adheres to infrabasal plate, drying-free then.

Then, with reference to figure 7B, the X ray mask 130 with predetermined pattern has formed the top alignment of the infrabasal plate 120 of the first barrier rib material layer 150 ' thereon.X ray mask 130 can be wherein on the surface of transparency carrier 131 composition the mask of absorber 132.Here, absorber 132 defines the blind zone of shielding X ray, and does not define the transmission area of Transmission X ray with the part of the transparency carrier 131 of absorber 132 coverings.X ray mask 130 can be designed as to have in a direction (for example x direction of principal axis) by the transmission area of bar shaped composition.

Then, go up the pattern (first pattern defining) that uses X ray mask 130 to define hope at the first barrier rib material layer 150 '.At this moment, be exposed to X ray 100, and pass through polymerization reaction and solidify corresponding to the part 150b of the first barrier rib material layer 150 ' of the transmission area of X ray mask 130.Part corresponding to the first barrier rib material layer 150 ' of the blind zone of X ray mask 130 is not cured.Simultaneously, in this operation, when the x-ray source (not shown) that sends X ray 100 therein under X ray mask 130 and infrabasal plate 120 condition of aliging regularly in a direction (for example at the x direction of principal axis, when or arrow A) mobile, can scan X ray 100, perhaps as an alternative, when X ray mask 130 and the workbench S that supports infrabasal plate 120 at a direction (x direction of principal axis for example, when or arrow B) mobile, X ray 100 can be from fixedly x-ray source (not shown) scanning.

When as mentioned above and when shown in Fig. 7 C, finishing first pattern defining, the second barrier rib material layer 150 " go up coated at the first barrier rib material layer 150 ' with thickness deltat h with thickness h o.Thereby, comprise the first and second barrier rib material layers 150 ' and 150 " barrier rib material layer 150 on infrabasal plate 120, be formed up to thickness h (ho+ Δ h).At this moment, the thickness h of barrier rib material layer 150 is corresponding to the height of second barrier rib that has relative high height among the ladder barrier rib.Form the second barrier rib material layer 150 as mentioned above " afterwards, if desired, can dry barrier rib material layer 150.

Then, with reference to figure 7D, X ray mask 130 ' is aligned above barrier rib material layer 150.X ray mask 130 ' can be absorber 132 ' patterned mask on the surface of transparency carrier 131 ' wherein.X ray mask 130 ' can be designed as to have in a direction (for example at the z direction of principal axis) and goes up by the transmission area of bar shaped composition.Transmission area can extend, thereby intersects with the transmission area of employed X ray mask 130 in the defining of above-mentioned first pattern.

Again, use X ray mask 130 ' on barrier rib material layer 150, to define the pattern (second pattern defining) of hope.At this moment, be exposed to X ray 100 and pass through polymerization reaction corresponding to the part 150c of the barrier rib material layer 150 of the transmission area of X ray mask 130 ' and solidify.At this moment, the pattern that solidifies by second pattern defining can with the pattern overlapping that solidifies by first pattern defining.Simultaneously, in this operation, when the x-ray source (not shown) that sends X ray 100 under the state that X ray mask 130 ' and infrabasal plate 120 align regularly in a direction (for example at the z direction of principal axis, or arrow A ') when mobile, can scan X ray 100, perhaps as an alternative, when X ray mask 130 ' and the workbench S that supports infrabasal plate 120 on a direction (for example at the z direction of principal axis, or arrow B ') when mobile, X ray 100 can be from fixing x-ray source (not shown) scanning.Although describe and illustrate direction as x axle and z direction of principal axis, direction not only is confined to this, makes the x axle need not vertical with the z direction of principal axis and only needs to intersect or extend to crossing.In addition, can use the 3rd and/or fourth class X-ray pattern define technology further defining barrier rib with differing heights, thereby obtain the barrier rib of multi-ladder and have the barrier rib of the different pattern of differing heights.

As mentioned above, carry out two step X-ray patterns as mentioned above and define after the technology, barrier rib material layer 150 is developed and sintering, obtains thus as at the ladder barrier rib 124 shown in Fig. 8.With reference to figure 8, ladder barrier rib 124 comprises that extension is with mutual intersection and have the first barrier rib 124a and the second barrier rib 124b of height h ' o and h ' respectively, make the barrier rib 124a that wins extend to different height from following dielectric layer 121, thereby wherein descend dielectric layer 121 to be arranged in coated electrode 122 on the infrabasal plate 120 with the second barrier rib 124b.Fig. 9 is the figure that the ladder barrier rib pattern of making according to said method is shown.

According to many aspects of the present invention, show the formation of the barrier rib that uses X-ray lithography, but be not limited thereto.For example, by the output of X ray is set in predetermined light path, can realize optionally exposing.More specifically, for example use the X-Y table, by using along the driver composition barrier rib material layer of control path from X ray rifle guiding X ray.

The manufacture method of the lower panel of the PDP of many aspects according to the present invention is described with reference to Figure 10.According to the many aspects of the present invention in Figure 10, need not the whole area that the X ray mask covers the barrier rib material layer, but the X ray mask is placed in the light path of X ray, and has the small size of the part that only is enough to cover the barrier rib material layer that is subjected to x-ray bombardment.That is,, be positioned on the workbench S that installs movably on the direction, and X ray rifle (not shown) and X ray mask 230 are fixedly mounted in workbench S top coated with the infrabasal plate 120 of barrier rib material layer 150 with reference to Figure 10.At this moment, thus X ray mask 230 can comprise transparency carrier 231 and the absorber 232 that sticks on the transparency carrier 231 defines transmission area and blind zone.By X ray mask 230 being placed in the light path of X ray 100, predetermined X ray 100 bundles can scan on barrier rib material layer 150.

The workbench S that has arranged infrabasal plate 120 on it moves, and makes when infrabasal plate 120 moves on a direction at a predetermined velocity, and X ray 100 scans on barrier rib material layer 150 by X ray mask 230.Thereby when moving with respect to fixing X ray rifle at a predetermined velocity, the barrier rib material layer 150 that is coated on the infrabasal plate 120 is exposed to X ray 100 gradually.Promptly when barrier rib material layer 150 moved with respect to the X ray 100 that sends from fixing X ray rifle, X ray 100 was from the side direction offside scanning of barrier rib material layer 150.At this moment, comprise predetermined speed that the workbench S of barrier rib material layer 150 moves sweep speed, and definite X ray 100 is for the exposure dose of barrier rib material layer 150 corresponding to X ray 100.Thereby, preferably consider the absorbability of the penetration depth of X ray 100 and barrier rib material layer 150 and optimize the predetermined speed that the workbench S that comprises barrier rib material layer 150 moves.For example, when barrier rib material layer 150 was formed by the minus material, the part 150d that is exposed to the barrier rib material layer 150 of X ray 100 solidified by polymerization reaction.Thereby the exposed portion 150d of barrier rib material layer 150 is left during developing and finally forms barrier rib.

According to many aspects of the present invention, form the X ray mask, thereby have the light path that covers X ray at least and the area littler than the area that stops the timber bed of material.Thereby when obtaining exposure effect same as described above, can realize the decline of mask manufacturing cost.As a result, reduce the manufacturing cost of PDP, improved the competitiveness of cost and price thus.Particularly, for the display of large scale (for example more than or equal to 40 inches), realized the remarkable reduction of cost.

Figure 11 A to Figure 11 D is the artwork that illustrates according to the manufacture method of the lower panel of the PDP of many aspects of the present invention.Also provide a kind of use two operations in the many aspects of the present invention shown in Figure 11 A to 11D, i.e. first pattern defining and second pattern defining and form ladder barrier rib method of patterning.In addition, according in the many aspects of the present invention shown in Figure 11 A to 11D, use less X ray mask to carry out the manufacturing cost that a plurality of pattern definings reduce mask thus.

At first, with reference to figure 11A, the infrabasal plate 120 of the PDP that provides in advance is arranged on the workbench S, and the first barrier rib material layer 150 ' is coated on the infrabasal plate 120 with thickness h o.Here the thickness h o of the first barrier rib material layer 150 ' is corresponding to the height that has first barrier rib of low relatively height in the ladder barrier rib to be formed.Can the optionally dry first barrier rib material layer 150 '.

Then, with reference to figure 11B, X ray mask 230 is produced and is placed in the light path of X ray 100.Thereby X ray mask 230 can comprise transparency carrier 231 and absorber 232 and define transmission area and blind zone respectively, and the transmission area of X ray mask 230 can be designed as in upward extension of a direction (for example x direction of principal axis that is illustrating).Thereby X ray mask 230 places in the light path of X ray 100 and has the part that little area only is coated with the first barrier rib material layer 150 ' that may be exposed to X ray 100.Thereby, can reduce the manufacturing cost of X ray mask 230, reduce the manufacturing cost of PDP thus and increase the price competitiveness of PDP.

Then, use X ray mask 230 on the first barrier rib material layer 150 ', to define the pattern (first pattern defining) of hope.The infrabasal plate 120 of promptly using the first barrier rib material layer 150 ' to apply is arranged on the workbench S, and X ray rifle (not shown) and X ray mask are fixedly arranged in workbench S top.At this moment, X ray mask 230 places in the light path of X ray 100.When moving, the workbench S that supports infrabasal plate 120 make infrabasal plate 120 at a predetermined velocity when a direction (for example at the x direction of principal axis) goes up motion, X ray 100 scannings.Here, the moving direction of infrabasal plate 120 is parallel to the bearing of trend (for example x direction of principal axis) of the transmission area of X ray mask 230.When the first barrier rib material layer 150 ' moved with respect to the X ray 100 that sends from fixing x-ray source (not shown) at a predetermined velocity, X ray 100 was from the side direction offside scanning of the first barrier rib material layer 150 '.Along with X ray 100 is scanned, is exposed to X ray 100 and passes through polymerization reaction corresponding to the part 150e of the first barrier rib material layer 150 ' of the transmission area of X ray mask 230 and solidify.Part corresponding to the first barrier rib material layer 150 ' of the blind zone of X ray mask 230 is kept intact after carrying out the second pattern defining technology.

Finish after the first pattern defining technology the second barrier rib material layer 150 " be coated on the first barrier rib material layer 150 ' with thickness h o with the thickness of Δ h, as shown in Figure 11 C.Thereby, comprise the first and second barrier rib material layers 150 ' and 150 " barrier rib material layer 150 form on infrabasal plate 120 with the thickness of h (ho+ Δ h).At this moment, the thickness h of barrier rib material layer 150 is corresponding to the height of second barrier rib that has higher relatively height among the ladder barrier rib.Form the second barrier rib material layer 150 " afterwards, can dry barrier rib material layer 150.

Then, with reference to figure 11D, X ray mask 230 ' is provided and places in the light path of X ray 100.All do not need in all respects although be, but X ray mask 230 ' can comprise transparency carrier 231 ' and the absorber 232 ' that is arranged on the transparency carrier 231 ', thereby defines the transmission area of X ray mask 230 ' on a direction (the z direction of principal axis that is for example illustrating).The transmission area of X ray mask 230 ' can intersect with the transmission area of the X ray mask 230 that uses in the first pattern defining technology.Thereby X ray mask 230 ' has little area only covers the part of the barrier rib material layer 150 under the x-ray bombardment or the light path of the whole x-ray bombardment of mask, reduces the manufacturing cost of mask thus.

Then, the figure that uses X ray mask 230 ' to define hope on barrier rib material layer 150 softens.The infrabasal plate 120 that supports barrier rib material layer 150 is arranged in along on the workbench S that installs movably at least one direction (for example at the z direction of principal axis), and X ray rifle (not shown) is fixedly mounted in infrabasal plate 120 tops with X ray mask 230 ' and separates with infrabasal plate 120 with preset distance.At this moment, X ray mask 230 ' aligns on the light path of X ray 100.When the workbench S that has arranged infrabasal plate 120 on it worked on a direction (for example z direction of principal axis), X ray 100 scanned on barrier rib material layer 150.When barrier rib material layer 150 relatively moves for X ray 100, can be from the X ray 100 that fixing X ray rifle sends from the side direction offside scanning of barrier rib material layer 150.Along with X ray 100 is scanned, the part 150f that is exposed to the barrier rib material layer 150 of X ray 100 solidifies by polymerization reaction.At this moment, be exposed by the second pattern defining technology and the part 150f that solidifies can be overlapping with the part 150e that exposes by the first pattern defining technology and solidify.

When developing and sintering when having defined the barrier rib material layer 150 of pattern as mentioned above, thereby the inorganic microparticle of barrier rib material layer 150 fuses the barrier rib that finally forms ladder (see Fig. 8 124) mutually.The barrier rib of ladder comprises first barrier rib (seeing the 124a of Fig. 8) and second barrier rib (seeing the 124b of Fig. 8) that extends to such an extent that intersect mutually and have differing heights (seeing h ' o and the h ' of Fig. 8), makes the barrier rib of winning be in vertical ladder with second barrier rib.

According to many aspects of the present invention, can use X ray on the barrier rib material layer, accurately to define the pattern of hope with predetermined optical characteristic, and thereby can be with the composition of done with high accuracy fine pitch and high-resolution barrier rib.In addition, employed X ray has high-penetration efficient in pattern defining, makes X ray can solidify even approach most the barrier rib material of substrate.Thereby, in order to make barrier rib, can photosensitive paste system be coated to the thickness of hope with the process technology limit that reduces with high aspect ratio.

According to many aspects of the present invention, show low relatively scattering properties in addition at the barrier rib material internal X-ray that comprises two or more heterogeneities.Thereby, when selecting the barrier rib material, need not to consider other optical characteristics (for example refractive index) of barrier rib material, compare with the conventional UV photoetching of using special barrier rib material thus, reduced manufacturing cost.

In addition,, when using the X ray mask to carry out pattern defining,, can reduce the X ray means of mask dimensions, reduce the competitiveness of manufacturing cost and increase price thus according to the area of x-ray bombardment according to many aspects of the present invention.Particularly, when making the plasma display of large scale (for example more than or equal to 40 inches), can reduce manufacturing cost significantly.

Although illustrate and described some embodiments of the present invention, but those skilled in the art is to be understood that, can change these this embodiment under the prerequisite that does not depart from principle of the present invention and spirit, scope of the present invention defines in claims and equivalent thereof.

The application requires the priority of korean patent application 2006-138906 number submitted to Korea S Department of Intellectual Property on December 29th, 2006 and korean patent application 2006-138907 number, and its whole contents is quoted herein as a reference.

Claims

1. the manufacture method of the lower panel of a plasma display, described method comprises:

The barrier rib material layer is provided on the basal substrate that provides;

Define the barrier rib pattern by scanning X ray on described barrier rib material layer; And

Thereby the described barrier rib material layer with the barrier rib pattern that defines by X ray that develops forms barrier rib.

2. according to the process of claim 1 wherein that described barrier rib material layer comprises the material that the response X ray develops.

3. according to the process of claim 1 wherein that described barrier rib material layer comprises inorganic microparticle and organic material, thereby described inorganic microparticle is melted by X ray and forms barrier rib, and can remove by X ray to the small part organic material.

4. apply lotion on the described basal substrate or lamination sheets shape material on described basal substrate according to the process of claim 1 wherein that the formation of described barrier rib material layer also is included in.

5. according to the method for claim 1, also comprise basal substrate is provided, on described basal substrate, form a plurality of electrodes.

6. according to the method for claim 5, also comprise basal substrate is provided, cover described a plurality of electrode, on described dielectric layer, will form the barrier rib material layer thereby form dielectric layer.

7. according to the method for claim 1, also be included in and define before the described barrier rib pattern, dry described barrier rib material layer.

8. according to the method for claim 1, defining of wherein said barrier rib pattern comprises, in the light path of described X ray, place photomask, described photomask has blind zone and transmission area, and described photomask is exposed to X ray, make described blind zone with described barrier rib material layer and X ray shielding, and transmission area allow the transmission of X ray.

9. method according to Claim 8, wherein said photomask has the small size of the whole optical path of enough sheltering described X ray, and described small size is littler than described barrier rib material layer.

10. according to the method for claim 9, the x-ray source and the described photomask that wherein send described X ray are arranged in the precalculated position, and when described basal substrate moves in the scanning direction, scan described X ray.

11. method according to Claim 8, thereby wherein said X ray moves in predefined paths and defines described barrier rib pattern.

12., also comprise the barrier rib material layer of the described composition of sintering according to the method for claim 1.

13. according to the process of claim 1 wherein that described X ray has the wavelength of 0.01 to 100 .

14., remove the part of the barrier rib material layer that is not exposed to described scanning X ray according to the process of claim 1 wherein that described development also comprises.

15. the manufacture method of the lower panel of a plasma display, described method comprises:

On basal substrate, form the first barrier rib material layer of first thickness;

Define the first barrier rib pattern by scanning X ray on the described first barrier rib material layer;

On the described first barrier rib material layer, form the second barrier rib material layer of second thickness;

On the described first and second barrier rib material layers, define the second barrier rib pattern by the scanning X ray; And

Thereby the first and second barrier rib material layers with the described first and second barrier rib patterns that define by X ray that develop form the barrier rib with differing heights.

16. according to the method for claim 15, defining with defining of the described second barrier rib pattern of the wherein said first barrier rib pattern uses different photomasks to carry out.

17. according to the method for claim 15, thereby the wherein said first barrier rib pattern and the second barrier rib pattern extend intersection mutually with strip.

18. method according to claim 15, the formation of the wherein said first barrier rib material layer also comprises, apply lotion on the described basal substrate or on described basal substrate lamination sheets shape material, and the formation of the described second barrier rib material layer also is included in and applies lotion on the described first barrier rib material layer or lamination sheets shape material on the described first barrier rib material layer.

19. according to the method for claim 15, comprise also described basal substrate is provided that described basal substrate comprises:

Infrabasal plate;

Form to such an extent that stride across the addressing electrode of described infrabasal plate; With

Form to such an extent that cover the dielectric layer of described infrabasal plate and addressing electrode.

20. a plasma display comprises:

Layout is able to opposed facing upper substrate of preset space length and infrabasal plate;

Thereby be arranged in the barrier rib that defines discharge cell between the described upper and lower substrate; With

In discharge cell, produce the scanning of discharge and keep electrode thereby on described upper substrate, form,

Wherein lower panel comprises that at least infrabasal plate and described barrier rib pass through the method formation of claim 1.