CN101219534B - Polishing pad and method of producing the same - Google Patents
Polishing pad and method of producing the same Download PDFInfo
- Publication number
- CN101219534B CN101219534B CN2007100979642A CN200710097964A CN101219534B CN 101219534 B CN101219534 B CN 101219534B CN 2007100979642 A CN2007100979642 A CN 2007100979642A CN 200710097964 A CN200710097964 A CN 200710097964A CN 101219534 B CN101219534 B CN 101219534B
- Authority
- CN
- China
- Prior art keywords
- polishing pad
- elastomer
- fibre
- nonwoven fabric
- basic material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/02—Backings, e.g. foils, webs, mesh fabrics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/22—Rubbers synthetic or natural
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/60—Nonwoven fabric [i.e., nonwoven strand or fiber material]
- Y10T442/608—Including strand or fiber material which is of specific structural definition
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Nonwoven Fabrics (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The non-woven fabric is made of a long fiber and the elastomer is embedded into the fabric.
Description
Technical field
The present invention relates to be used for the manufacture method of the polishing pad and the described polishing pad of chemically mechanical polishing.
Background technology
Chemically mechanical polishing (CMP) is the program that makes the having an even surface of substrate with polishing pad.CMP is applied to polish oxidation and/or the metal level on substrate, silicon chip and the silicon wafer of lens, minute surface, LCD usually.
With the silicon wafer is example, at first cuts monocrystal silicon.Usually polish wafer so that they are smooth, to be used for chemical etching subsequently.Behind etch process, need glossing.During glossing, polishing pad is together with the silicon atom chemically reactive on slurry and the wafer surface, so that the silicon below the surface ratio of reacting is soft.In addition, the wiping surface of reacting makes new silicon is exposed to slurry and polishing pad continuously.
Conventional polishing pad comprises basic material, and it has the surface that is used for polished substrate.Described surface comprises fabric and embeds the elastomer of described fabric.The fiber of fabric has in glossing the delivery slurry and removes the function on the surface of reacting from wafer together with elastomer.Usually use nonwoven fabric in the basic material.Conventional nonwoven fabric uses directed or omnidirectional short fiber (having the length less than 10cm usually), does not form fabric by braiding.According to the mode that forms fabric, nonwoven fabric comprises compound nonwoven fabric, acupuncture nonwoven fabric, melt blown non-woven, spunbond nonwoven fabric, dry method nonwoven fabric, wet method nonwoven fabric, loop bonding nonwoven fabric and water thorn nonwoven fabric usually.Yet, need to make short fiber, and when making the acupuncture nonwoven fabric, also need needling process by carding process.This type of technology causes the uneven distribution of fiber, and observes the gathering of fiber easily in nonwoven fabric.In addition, because the fracture of fiber also takes place in the cause of these technologies.In addition, after embedding elastomer in the fabric, because eyelet size, hardness, homogeneity, elastomeric density and thickness that the elastomeric uneven distribution influence that the uneven distribution of fiber causes is made of fiber and elastomer, and slurry can not flow swimmingly, and the polishing particulate in the slurry can not spread equably.Usually observe balling-up during polishing.In addition, the residue that forms during polishing rests on the surface of polishing pad easily, and is difficult to its removal; Therefore, residue is swiped and is damaged the substrate that will polish.
Summary of the invention
An object of the present invention is to provide a kind of polishing pad, it comprises a basic material, and described basic material has a surface, is used to polish a substrate, and wherein said surface comprises nonwoven fabric and elastomer.Nonwoven fabric is made by long fibre, and elastomer embeds in the nonwoven fabric.
Another object of the present invention provides a kind of method of polished substrate.Described method comprises the step of using polishing pad referred to above to come the polished substrate surface.
Another purpose of the present invention provides a kind of method of making polishing pad mentioned above.Described method comprises following steps: basic material (a) is provided, and it comprises the nonwoven fabric of being made by long fibre; (b) flood the surface of basic material with elastomer solution; (c) solidify elastomer in the surface be immersed in basic material.
Description of drawings
Do not have
The specific embodiment
The invention provides a kind of polishing pad, it comprises the basic material with the surface that is used for polished substrate, and wherein said surface comprises nonwoven fabric and elastomer.Nonwoven fabric is made by long fibre, and elastomer embeds in the nonwoven fabric.
As used herein, " nonwoven fabric " is meant the fiber by direction or random orientation except that paper, single, the net or the mat that are bonded together and process by frictional force and/or cohesive force and/or adhesion, with through braiding, woollen yarn knitting, cluster, loop bonding, or by the wet-milling bonding, no matter whether otherwise knitting product in conjunction with yarn or filament.The source of described fiber can be natural or artificial.They can be staple fiber or continuous fiber or original position and form.According to shape method into the net, nonwoven fabric comprises compound nonwoven fabric, acupuncture nonwoven fabric, melt blown non-woven, spunbond nonwoven fabric, dry method nonwoven fabric, wet method nonwoven fabric, loop bonding nonwoven fabric and water thorn nonwoven fabric usually.Compare with fabric, nonwoven fabric has material behavior preferably.
In a preferred embodiment of the invention, use nonwoven fabric in the reel-to-reel mode of improving the batch homogeneity.
As used herein, term " fiber " is meant ultimate fibre or composite fibre, is preferably composite fibre.Select fiber according to the substrate that will polish.The fiber on the surface of basic material provides projection for polishing, and also provides platform, in the space that its falsework that allows elastomer to be placed in to be become by fiber defines.The those skilled in the art can select the fiber of suitable species, and coordinates elastomer polymer and fiber according to the disclosure of specification.Preferably, long fibre is made by at least a material in the material that is selected from the group that is made up of following material: polyamide, terephthalamide, polyester, polymethyl methacrylate, PET, polyacrylonitrile and its mixture.
As defining in the affiliated field, term " long fibre " is meant the fiber that has greater than the length of 10cm.Long stapled shape be continuous and length unrestricted in theory.Long fibre twists easily, to improve intensity and stress.
In a preferred embodiment of the invention, fiber is a sea-island fibre.As used herein, term " sea-island fibre " also is called as " islands-in-sea bicomponent fibre ", relates to the fiber that comprises extra large component and island component.For instance, by producing sea-island fibre with the weaving of island mode conjugation or two kinds of polymer of mixed textile.In a preferred embodiment of the invention, reduce by weight and to handle sea-island fibre to reduce the ratio of extra large component.The method of extra large component being carried out the weight minimizing is that the those skilled in the art is well-known, for example uses the method for NaOH or toluene.Preferably, after reducing extra large component, long fibre is divided into 0.05 to 0.0001 Denier.
In a preferred embodiment of the invention, nonwoven fabric comprises screen frame (net frame).As used herein, term " screen frame " is meant for improve that intensity according to nonwoven fabric of the present invention designs thin and the material strengthened.The material of screen frame is preferably polyamide, polyester or polyolefin.Screen frame is preferably made by long fibre.Fiber can be braiding or non-woven to form screen frame.In order to allow long fibre to form according to nonwoven fabric of the present invention, screen frame comprises mesh, and the long fibre of the fiber of screen frame and nonwoven fabric twines each other.Preferably, screen frame has 0.01 to 1.0mm thickness.Screen frame has 10 to 200g/m
2Per unit area weight.In addition, screen frame has 10 to 150 mesh.
As used herein, term " elastomer " also is called " elastomeric polymer ", is meant a base polymer that shows the rubber like quality.When polishing, elastomer serves as the surface of the substrate that good cushion will polish to avoid swiping.In a preferred embodiment of the invention, elastomer is a foamed resin.As used herein, term " foamed resin " is meant the material that contains thermoplastic resin and thermal decomposition of blowing agent.Preferably, elastomer is to be selected from the group that is made up of polyurethane, polyamide, Merlon, poly-amino nitrile, polymethacrylates, epoxy resin, phenolic resins, polymethyl methacrylate, polyamine base ester, vinyl benzene polymer, acrylic resin and polyurethane at least one.
Can avoid the defective of the conventional polishing pad made by short fiber according to polishing pad of the present invention.Because long fibre can be without carding process or needling process and is formed nonwoven fabric, so avoided uneven distribution, the gathering of fiber and the fracture of fiber of the fiber that causes owing to described technology.Therefore, elastomer according to the present invention embeds in the nonwoven fabric equably.In addition, the regeneration rate after the eyelet size that is made of fiber and elastomer, hardness, homogeneity, elastomeric density, thickness, compression ratio and the compression all is improved.Slurry can flow swimmingly, and the polishing particulate also can spread equably.Do not damage the surface of the substrate that will polish according to polishing pad of the present invention, and significantly reduce balling-up.In addition, when using, satisfy polishing efficiency according to polishing pad of the present invention.
The present invention also provides a kind of method of polished substrate.Described method comprises the step of using polishing pad mentioned above to come the polished substrate surface.
The present invention further provides a kind of method of producing polishing pad as mentioned above.Described method comprises following steps: basic material (a) is provided, and it comprises the nonwoven fabric of being made by long fibre; (b) flood the surface of basic material with elastomer solution; (c) solidify elastomer in the surface be immersed in basic material.
In the step (b) of described method, the mode of flooding basic material with elastomer solution is the method for soaking nonwoven fabric with elastomer solution.The condition of dipping is that the those skilled in the art is well-known.Employed suitable solvent comprises dimethyl formamide (DMF) in the elastomer solution.Elastomer solution comprises additive, for example cleaning agent according to circumstances.Preferably, elastomer has scope in the concentration from 2 weight % to 60 weight % in elastomer solution.
Preferably, step (b) further comprises with elastomer solution and floods whole basic material.
In the step (c) of described method, solidifying the elastomeric mode that is immersed in the basic material is the elastomer that solidifies in the nonwoven fabric.In one embodiment of the invention, basic material is put into curing solution to be cured.Preferably, curing solution comprises the dimethyl formamide of 0 to 40 weight % in water.The condition of solidifying is that the those skilled in the art is well-known.Preferably, under room temperature and constant pressure, carry out curing.
In a preferred embodiment of the invention, the method for producing polishing pad further is included in the step (c1) that basic material is cleaned in step (c) back.The purpose of cleaning is to remove residue from polishing pad.In one embodiment of the invention, in cleaning, make water, and use according to circumstances and extrude wheel.The condition of cleaning is that the those skilled in the art is well-known.Preferably, clean basic material, and then make basic material stand to extrude wheel for several times with 50 to 90 ℃ water.
In another preferred embodiment of the present invention, the method for producing polishing pad further is included in the step (c2) of step (c1) back dry-basis material.Dry purpose is the excessive solvent of removing from step (c1).Dry condition is that the those skilled in the art is well-known.In one embodiment of the invention, drying is the air drying, and baking temperature is in 100 ℃ to 160 ℃ scope.
Preferably, the method for production polishing pad further comprises the surface and the elastomeric step (c3) of machine glazed finish basic material.For instance, can use sandblast to realize machine glazed finish.The condition of machine glazed finish is that the those skilled in the art is well-known.More preferably, after machine glazed finish, fiber is exposed to the surface of basic material.
In a preferred embodiment of the invention, step (b) and (c) repeat for several times.Each employed elastomeric kind can be similar and different.
Following example only provides and is not intended to limit the scope of the invention for illustrative purposes.
Example:
Basic material: the polyethylene terephthalate small pieces are in 260 ℃ to 300 ℃ following melt-spuns and quenching at room temperature.Then, small pieces stand calender and have 10 to 150 mesh and have 0.7mm thickness and 150g/m obtaining
2The basic material of weight.
Screen frame: fabric is slitting to obtain net.Several net twistings are got up, and then be woven together to obtain to have thickness and the 35g/m of 0.15mm with nylon 6 yarns of 70 Denier
230 mesh lists of weight.Then, singly carry out acupuncture (700 times/m to described
2) to obtain to have 475g/m
2The screen frame of weight.
Dipping: basic material is immersed in the elastomer solution with viscosity of 700 to 850Cps.Elastomer solution comprises the polyurethane of 50 weight %, the dimethyl formamide of 49 weight % and the cleaning agent of 1 weight %.
Solidify: behind dipping, basic material is placed in comprise 25 weight % dimethyl formamides in the water curing solution with the molded elastomer that is immersed in the fiber.
Clean: extrude wheel and will remove residue and excessive curing solution.The water of following with 80 ℃ cleans basic material, and then makes basic material stand to extrude wheel for several times.
Dry: after cleaning, then at 140 ℃ of following dry-basis materials.
Polishing: after drying, basic material stand #150 and #400 sand paper 1200 and 1300rpm under machine glazed finish, and obtain to have the 1.28mm product of flat surface.
Check: check according to the conventional polishing pad (short fiber) that has long stapled polishing pad (long fibre) and have short fiber of the present invention, and show the result in the table 1.Compare with conventional polishing pad, compression ratio and the regeneration rate of polishing pad according to the present invention after compression all is improved.
Table 1:
| Thickness (mm) | Compression ratio (%) | Regeneration rate after the compression (%) | |
| Long fibre | 1.40 | 19.63 | 92.34 |
| Short fiber | 1.35 | 15.99 | 89.67 |
Though illustrated and described embodiments of the invention, the those skilled in the art can make various modifications and improvement.Therefore, with illustrative but not restrictive, sense is described embodiments of the invention.Wish that the present invention is not limited to illustrated particular form, and do not break away from the scope that all modifications of the spirit and scope of the present invention all defined in appended claims.
Claims (17)
1. polishing pad, it comprises basic material, described basic material has the surface, be used for polished substrate, wherein said surface comprises nonwoven fabric and elastomer, described nonwoven fabric is made by the long fibre of random orientation, and described elastomer embeds in the described nonwoven fabric, and described long stapled length is greater than 10cm.
2. polishing pad according to claim 1, wherein said long fibre are to be selected from the group that is made up of ultimate fibre and composite fibre.
3. polishing pad according to claim 1, wherein said long fibre is made by at least a material that is selected from the group that is made up of polyamide, terephthalamide, polyester, polymethyl methacrylate, PET, polyacrylonitrile and its mixture.
4. polishing pad according to claim 1, wherein said long fibre is a sea-island fibre.
5. polishing pad according to claim 1, wherein said nonwoven fabric comprises screen frame.
6. polishing pad according to claim 5, wherein said screen frame is made by described long fibre.
7. polishing pad according to claim 1, wherein said elastomer is a foamed resin.
8. method of producing polishing pad according to claim 1, it comprises following steps:
(a) provide basic material, it comprises the nonwoven fabric of being made by the long fibre of random orientation, and described long stapled length is greater than 10cm;
(b) flood the surface of described basic material with elastomer solution; With
(c) solidify described elastomer in the described surface be immersed in described basic material.
9. method according to claim 8, wherein said long fibre are to be selected from the group that is made up of ultimate fibre and composite fibre.
10. method according to claim 8, wherein said long fibre is made by at least a material that is selected from the group that is made up of polyamide, terephthalamide, polyester, polymethyl methacrylate, PET, polyacrylonitrile and its mixture.
11. method according to claim 8, wherein said long fibre is a sea-island fibre.
12. method according to claim 8, wherein said nonwoven fabric comprises screen frame.
13. method according to claim 12, wherein said screen frame is made by described long fibre.
14. method according to claim 8, wherein said elastomer is a foamed resin.
15. according to requiring 8 described methods in the right, it further is included in the step (c1) that the described surface of described basic material is cleaned in step (c) back.
16. according to requiring 15 described methods in the right, it further is included in the step (c2) on the described surface of the dry described basic material in step (c1) back.
17. according to requiring 8 described methods in the right, it further is included in the back step (c3) that the described surface and the described elastomer of described basic material are carried out machine glazed finish of step (c).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/652,595 US20080171493A1 (en) | 2007-01-12 | 2007-01-12 | Polishing pad and method of producing the same |
| US11/652,595 | 2007-01-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101219534A CN101219534A (en) | 2008-07-16 |
| CN101219534B true CN101219534B (en) | 2010-12-29 |
Family
ID=39618149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100979642A Expired - Fee Related CN101219534B (en) | 2007-01-12 | 2007-04-25 | Polishing pad and method of producing the same |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20080171493A1 (en) |
| CN (1) | CN101219534B (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2340152A1 (en) * | 2008-09-04 | 2011-07-06 | innoPad, Inc. | Fabric containing non-crimped fibers and methods of manufacture |
| JP5233621B2 (en) * | 2008-12-02 | 2013-07-10 | 旭硝子株式会社 | Glass substrate for magnetic disk and method for producing the same. |
| US8197307B1 (en) * | 2009-03-19 | 2012-06-12 | Kenneth Luna | Surface polishing system |
| TWI404596B (en) | 2009-09-22 | 2013-08-11 | San Fang Chemical Industry Co | Method for manufacturing polishing pad and polishing pad |
| TW201125687A (en) * | 2010-01-20 | 2011-08-01 | San Fang Chemical Industry Co | Polishing pad and method for making the same |
| CN102189504A (en) * | 2010-03-18 | 2011-09-21 | 三芳化学工业股份有限公司 | Polishing pad and manufacturing method thereof |
| CN102211319B (en) * | 2010-04-08 | 2014-06-11 | 三芳化学工业股份有限公司 | Polishing pad manufacturing method and polishing pad |
| CN104552034B (en) * | 2013-10-18 | 2019-04-09 | 三芳化学工业股份有限公司 | Grinding pad, grinding device and the method for manufacturing grinding pad |
| TWI516373B (en) * | 2014-01-17 | 2016-01-11 | 三芳化學工業股份有限公司 | Polishing pad, polishing apparatus and method for manufacturing polishing pad |
| TWI630982B (en) * | 2014-09-19 | 2018-08-01 | 三芳化學工業股份有限公司 | Polishing pad, polishing apparatus and method for manufacturing polishing pad |
| US9748090B2 (en) * | 2015-01-22 | 2017-08-29 | Toshiba Memory Corporation | Semiconductor manufacturing apparatus and manufacturing method of semiconductor device |
| CN104695131B (en) * | 2015-02-11 | 2016-05-04 | 福建鑫发无纺布有限责任公司 | The super fine Wiping material preparation method in a kind of well-pressed Ding Dao island |
| TWI565735B (en) * | 2015-08-17 | 2017-01-11 | Nanya Plastics Corp | A polishing pad for surface planarization processing and a process for making the same |
| CN105415168B (en) * | 2015-10-30 | 2018-01-16 | 佛山市金辉高科光电材料有限公司 | A kind of composite polishing pad and preparation method thereof |
| RU2736460C2 (en) * | 2016-06-01 | 2020-11-17 | Фудзибо Холдингс, Инк. | Polishing pad and method for production thereof, as well as a method of producing a polished article |
| CN107459627A (en) * | 2017-07-26 | 2017-12-12 | 无锡旺绿鸿纺织品有限公司 | For the preparation method and applications for the aqueous epoxy resins for manufacturing polishing cloth |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1026140C (en) * | 1992-07-31 | 1994-10-05 | 周征彦 | Nonwoven fabric and its producting process and apparatus |
| JP2005023507A (en) * | 2003-06-11 | 2005-01-27 | Daiwabo Co Ltd | Laminated nonwoven fabric, method for manufacturing the same, and nonwoven fabric for polishing |
| CN1814410A (en) * | 2005-02-02 | 2006-08-09 | 三芳化学工业股份有限公司 | Lapping sheet and its manufacturing method and polishing device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5139841A (en) * | 1991-03-27 | 1992-08-18 | James River Corporation Of Virginia | Superabsorbent towel with scrim reinforcement |
| US6964604B2 (en) * | 2000-06-23 | 2005-11-15 | International Business Machines Corporation | Fiber embedded polishing pad |
| KR100877390B1 (en) * | 2001-11-13 | 2009-01-07 | 도요 고무 고교 가부시키가이샤 | Grinding pad and method of producing the same |
| US7086932B2 (en) * | 2004-05-11 | 2006-08-08 | Freudenberg Nonwovens | Polishing pad |
| US20060148917A1 (en) * | 2004-12-30 | 2006-07-06 | Radwanski Fred R | Absorbent foam containing fiber |
-
2007
- 2007-01-12 US US11/652,595 patent/US20080171493A1/en not_active Abandoned
- 2007-04-25 CN CN2007100979642A patent/CN101219534B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1026140C (en) * | 1992-07-31 | 1994-10-05 | 周征彦 | Nonwoven fabric and its producting process and apparatus |
| JP2005023507A (en) * | 2003-06-11 | 2005-01-27 | Daiwabo Co Ltd | Laminated nonwoven fabric, method for manufacturing the same, and nonwoven fabric for polishing |
| CN1814410A (en) * | 2005-02-02 | 2006-08-09 | 三芳化学工业股份有限公司 | Lapping sheet and its manufacturing method and polishing device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080171493A1 (en) | 2008-07-17 |
| CN101219534A (en) | 2008-07-16 |
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