CN101210317B - Gas integrated unit - Google Patents
Gas integrated unit Download PDFInfo
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- CN101210317B CN101210317B CN2007101940758A CN200710194075A CN101210317B CN 101210317 B CN101210317 B CN 101210317B CN 2007101940758 A CN2007101940758 A CN 2007101940758A CN 200710194075 A CN200710194075 A CN 200710194075A CN 101210317 B CN101210317 B CN 101210317B
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- 238000004140 cleaning Methods 0.000 claims abstract description 138
- 238000000034 method Methods 0.000 claims description 37
- 239000012530 fluid Substances 0.000 abstract description 20
- 230000010354 integration Effects 0.000 abstract 2
- 230000000694 effects Effects 0.000 description 34
- 230000008520 organization Effects 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000012423 maintenance Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000013022 venting Methods 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007726 management method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Valve Housings (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
The present invention provides a gas integration unit capable of reducing base space. In the gas integration unit, setting first gas units (72A, 72B, 72C), for controlling the supply of a first gas; a second gas unit (73), connecting with the first gas units (72A, 72B, 72C) and controlling cleaning gas converging to the first gas units (72A, 72B, 72C) by means of a plurality of fluid control components (31 to 34, 38A to 43a, 38B to 43B, 38C to 43C); and stackup blocks (61A, 61B, 61C), stacking on the first gas units (72A, 72B, 72C) and stacking parts (38A 38B, 38C) of the fluid control components on the stackup blocks (61A, 61B, 61C).
Description
Technical field
The present invention relates to a kind of gas integrated unit with gas cell and cleaning gas cell.
Background technology
In the past, in semiconductor-fabricating device, a certain amount of effect gas of each supply carried out film forming on wafer on the wafer of treatment chamber.Wafer is supplied to multiple effect gas, stacked film forming.Because the flow effect quality of forming film of effect gas, thereby semiconductor-fabricating device will be used for the upstream side that gas integrated unit that a plurality of process gass of lift-launch unit that control action kou gas supplies with forms is configured in treatment chamber.
In order to make quality of forming film good, need carry out strict management to the composition of the effect gas of supplying with wafer.Therefore, gas integrated unit will clean gas cell and be connected on each process gas unit and cleaning gas is converged, and remove the effect gas that remains in the unitary stream of process gas.Thus, gas integrated unit can be adjusted to effect gas predetermined component and supply with wafer.
Patent documentation 1 Japanese Patent discloses flat 11-50257 communique
But in the existing gas integrated unit, the cleaning gas cell has a plurality of fluid control components for the supply of controlling cleaning gas, because this cleaning gas cell is arranged side by side the next door in gas cell, thereby base space becomes big.
Summary of the invention
The present invention makes in order to address the above problem a little, and purpose is to provide a kind of gas integrated unit that can reduce base space.
Gas integrated unit of the present invention has following formation.
(1) gas integrated unit is provided with first gas cell, controls the supply of first gas; Second gas cell is connected with above-mentioned first gas cell, converges to second gas of above-mentioned first gas cell by a plurality of fluid control component controls; With stacked, be stacked on above-mentioned first gas cell, and, the part of above-mentioned fluid control component is stacked on above-mentioned stacked.
And the part of fluid control component for example refers to the parts of pilot-gas such as mass flow controller, mass flowmeter, vacuum breaker, throttle orifice, pneumavalve.The part of fluid control component can be a fluid control component, also can be a plurality of fluid control components.
(2) in (1) described invention, above-mentioned stacked is provided with in the mode that covers the pipe arrangement that is comprised in above-mentioned first gas cell.
(3) in (1) described invention, above-mentioned stacked, have be used for fixing mounting have above-mentioned fluid control component a part bottom stream piece fixed part and with the maintenance groove of the above-mentioned first gas cell butt, and well heater is installed.
(4) in (1) described invention, above-mentioned fluid control component is mass flow controller or mass flowmeter.
The invention effect
Gas integrated unit of the present invention with above-mentioned formation, on first gas cell that control first gas is supplied with stacked stacked, and then the part that will constitute the fluid control component of second gas cell is stacked on stacked.Thus, the part and first gas cell that constitute the fluid control component of second gas cell become two sections structures, thereby the base space of gas integrated unit has reduced to be stacked in the amount of the base space of the flow control component on stacked.Therefore, according to gas integrated unit of the present invention, can reduce base space.Gas integrated unit of the present invention, owing to dispose stacked in the mode that covers the pipe arrangement that is comprised in first gas cell, thereby can dispose stacked in the mode in the width dimensions that is converged in first gas cell.
Gas integrated unit of the present invention, the relative fixed bottom stream piece on stacked is the part of fluid control component fixedly, and by stacked of heater heats.With first gas cell of stacked maintenance groove butt,, for example can avoid first gas accumulative unfavorable condition in the stream of first gas cell owing to the heat from stacked transmission well heater is heated.Thus, according to gas integrated unit of the present invention, can be with the fixedly effect of bottom stream piece and on the first cascade piece with the heat passage effect of giving first gas cell of well heater.
Gas integrated unit of the present invention owing to mass flow controller or the mass flowmeter that base space is bigger is stacked on stacked, thereby can reduce the base space of whole unit effectively.
Description of drawings
Fig. 1 is the loop diagram of gas integrated unit.
Fig. 2 is the vertical view of the gas integrated unit in the embodiments of the present invention that loop shown in Figure 1 is specialized.
Fig. 3 is the A-A sectional view of Fig. 2.
Fig. 4 is a stacked vertical view shown in Figure 2.
Fig. 5 is the arrow B direction observed stacked piece figure of expression from Fig. 4.
Fig. 6 is the C-C sectional view of Fig. 4.
Fig. 7 does not use stacked piece and the figure of gas integrated unit that loop shown in Figure 1 has been specialized.
Embodiment
Then, describe with reference to the embodiment of accompanying drawing gas integrated unit of the present invention.
(loop explanation)
Fig. 1 is the loop diagram of gas integrated unit 1.
Gas integrated unit 1 is arranged between not shown gas tank and the not shown treatment chamber, for the effect gas of not shown gas tank at every turn with the not shown treatment chamber of a certain amount of supply, be provided with first～the 3rd process gas pipeline 2A, 2B, 2C.In addition, gas integrated unit 1 is provided with the cleaning gas tube 6 that is used to clean first～the 3rd process gas pipeline 2A, 2B, 2C.
In first～the 3rd process gas pipeline 2A, 2B, 2C, be provided with a plurality of fluid control components. Manual valve 11A, 11B, 11C are connected with not shown gas tank by effect gas input port 3A, 3B, 3C. Manual valve 11A, 11B, 11C are connected with the first technology side pneumavalve 15A, 15B, 15C with pressure warning unit 14A, 14B, 14C by strainer 12A, 12B, 12C, setter 13A, 13B, 13C.
The first technology side pneumavalve 15A, 15B, 15C are connected with the second technology side pneumavalve 17A, 17B, 17C by technology side mass flow controller 16A, 16B, 16C.The second technology side pneumavalve 17A, 17B, 17C are connected with common delivery port 4A, 4B, 4C by strainer 18A, 18B, 18C. Common delivery port 4A, 4B, 4C are connected with not shown treatment chamber.
And technology side mass flow controller 16A, 16B, 16C also are connected with the 3rd technology side pneumavalve 19A, 19B, 19C.The 3rd technology side pneumavalve 19A, 19B, 19C are connected with venting port 5A, 5B, 5C by technology side vacuum breaker 20A, 20B, 20C.Venting port 5A, 5B, 5C are connected with not shown exhaust flow path.
Relative therewith, cleaning gas tube 6 also is provided with a plurality of fluid control components.Manual valve 31 is connected with not shown cleaning gas tank by cleaning gas input port 7.Manual valve 31 is connected with the first cleaning side pneumavalve 35 by strainer 32, setter 33, pressure warning unit 34.The first cleaning side pneumavalve 35 is connected with cleaning gas exhaust port 8 by the first cleaning side mass flow controller 36, the second cleaning side pneumavalve 37.Cleaning gas exhaust port 8 is connected with not shown exhaust flow path.
And pressure warning unit 34 is also swept side pneumavalve 41A with cleaning politics, economics, organization, and ideology, 41B, 41C are connected.Side pneumavalve 41A is swept in cleaning politics, economics, organization, and ideology, 41B, 41C are connected first～the 3rd process gas pipeline 2A, strainer 18A, the 18B of 2B, 2C, the upstream side of 18C by the 3rd cleaning side mass flow controller 42A, 42B, 42C and the 5th cleaning side pneumavalve 43A, 43B, 43C.
(whole formation)
Fig. 2 is the vertical view of the gas integrated unit 1 of embodiments of the present invention that loop shown in Figure 1 is specialized.
Gas integrated unit 1 constitutes first～the 3rd process gas pipeline 2A, 2B, 2C, and first～the 3rd process gas unit 72A that control is supplied with as the effect gas of an example of " first gas ", 72B, 72C (being equivalent to " first gas cell ") and formation cleaning gas tube 6 and control are fixed on the mounting plate 9 as the cleaning gas cell 73 (being equivalent to " second gas cell ") of the cleaning gas supply of an example of " second gas ".The formation of first～the 3rd process gas unit 72A, 72B, 72C is identical, thereby is that example explanation constitutes at this with the first process gas unit 72A.
(process gas unit)
Fig. 3 is the A-A sectional view of Fig. 2.
The first process gas unit 72A, the input port of its manual valve 11A is communicated with the input of CONTROL PROCESS gas with effect gas input port 3A on being located at input block 21.Manual valve 11A, its output port is connected with the input port of strainer 12A by V-shaped flow road piece 22.
Strainer 12A is connected with the input port of setter 1 3A by V-shaped flow road piece 22, will supply with setter 13A except that the effect gas behind the degranulation.Setter 13A, its output port is connected with the input port of pressure warning unit 14A by V-shaped flow road piece 22, and the pressure of Accommodation gas is so that pressure warning unit 14A display-setting pressure.
The output port of pressure warning unit 14A is connected with the 3rd port of the first technology side pneumavalve 15A by stream piece 23, pipe arrangement 24, stream piece 23, the first common stream piece 25 that forms L shaped stream.The first technology side pneumavalve 15A is a T-valve, according to the feed rate of valve opening control action kou gas.Second port of the first technology side pneumavalve 15A is connected with the input port of technology side mass flow controller 16A by V-shaped flow road piece 22.
Technology side mass flow controller 16A, its output port is connected with second port of the second technology side pneumavalve 17A by V-shaped flow road piece 22, acts on the flow adjustment of gas.The second technology side pneumavalve 17A is a T-valve, according to the feed rate of valve opening control action kou gas.The second technology side pneumavalve 17A, its 3rd port is connected with the input port of strainer 18A by the second common stream piece 26, V-shaped flow road piece 22, sink block 27, V-shaped flow road piece 22.The output port of strainer 18A is communicated with common delivery port 4A on being located at IOB 28, and output removes the effect gas behind the degranulation etc.
The first process gas unit 72A, with bottom stream piece 21,22,23,28 by insert logical not shown being bolted on the mounting plate 9 from the top.Then, above-mentioned manual valve 11A, strainer 12A, setter 13A, pressure warning unit 14A, the first common stream piece 25, the first technology side pneumavalve 15A, technology side mass flow controller 16A, the second technology side pneumavalve 17A, the second common stream piece 26, sink block 27, strainer 18A utilization are inserted logical bolt V and are separately fixed on the bottom stream piece 21,22,23,28 from the top.
The two ends of pipe arrangement 24 are welded on the stream piece 23,23, cover on stacked 61 described later.As shown in Figure 2, stacked 61 makes 4 bolt Vp, Vp, Vp, Vp connect four jiaos and be tightened on the mounting plate 9 from the top, fixing thus.
(cleaning gas cell)
Relative therewith, shown in Figure 2 cleaning gas cell 73 makes manual valve 31, strainer 32, setter 33, pressure warning unit 34 similarly be fixed on the mounting plate 9 with above-mentioned manual valve 11A, strainer 12A, setter 13A, pressure warning unit 14A, is interconnected.
Branch's piece 45 is connected with branching block 47,48 by pipe arrangement 46.Branching block 47 is so that the input port ways of connecting that side pneumavalve 41A, 41C are swept in pipe arrangement 46 above being connected and cleaning politics, economics, organization, and ideology forms stream.On the other hand, branching block 48 is so that the input port ways of connecting that side pneumavalve 41B is swept in pipe arrangement 46 above being connected and cleaning politics, economics, organization, and ideology forms stream.And then, pipe arrangement 46 from the top of branching block 48 with the wraparound of L type, be connected the set V-shaped flow road piece 22,22,22 in pressure warning unit 14A, the 14B, the 14C next door that constitute first～the 3rd process gas pipeline 2A, 2B, 2C (Fig. 1) above.
As shown in Figure 3, at stacked above the 61A described later, the second cleaning side mass flow controller 38A is set on 2 V-shaped flow road pieces 22,22.V-shaped flow road piece 22,22 is by not shown being bolted on the stacked 61A.The second cleaning side mass flow controller 38A is fixed on the V-shaped flow road piece 22,22 by insert logical 4 bolt V, V, V, V from the top.
V-shaped flow road piece 22 with the input port of the second cleaning side mass flow controller 38A is communicated with utilizes 2 bolt Vs, Vs to be connected with pipe arrangement 46 from the top.V-shaped flow road piece 22 with the output port of the second cleaning side mass flow controller 38A is communicated with utilizes 2 bolt Vs, Vs to be fixed with pipe arrangement 49 from the top.Pipe arrangement 49 be connected 39A above, the refluence that prevents to clean gas.
Cleaning side vacuum breaker 39A, 39B, 39C and the 3rd clean side pneumavalve 40A, 40B, 40C together be installed in the first common stream piece 25,25,25 above.The output port of cleaning side vacuum breaker 39A, 39B, 39C is connected with the input port of the 3rd cleaning side pneumavalve 40A, 40B, 40C.The 3rd cleaning side pneumavalve 40A, 40B, 40C, its output port is connected with first port of the first technology side pneumavalve, 1 5A, and control is supplied with the cleaning gas of first～the 3rd process gas pipeline 2A, 2B, 2C (with reference to Fig. 1).
On the other hand, side pneumavalve 41A, 41B, 41C are swept in cleaning politics, economics, organization, and ideology shown in Figure 2, and its input port is connected with branching block 47,48, and output port is connected with the input port of the 3rd cleaning side mass flow controller 42A, 42B, 42C.Because branching block 47 Inverted Outputs cleaning gas, thereby cleaning politics, economics, organization, and ideology is swept side pneumavalve 41A, 41C across branching block 47 reverse settings.
The output port that side pneumavalve 41A, 41B, 41C are swept in cleaning politics, economics, organization, and ideology is connected with the input port of the 5th cleaning side pneumavalve 43A, 43B, 43C by the 3rd cleaning side mass flow controller 42A, 42B, 42C, adjusts the flow of cleaning gas.The 5th cleaning side pneumavalve 43A, 43B, 43C, its output port be connected to by pipe arrangement 50,51,52 sink block 27,27,27 that is provided with between technology side vacuum breaker 20A, 20B, 20C and strainer 18A, 18B, the 18C above, control cleaning gas is supplied with.
(stacked)
Then, above-mentioned stacked 61A, 61B, 61C are described.Stacked 61A, 61B, 61C are identical formation, thereby the explanation of omitting stacked 61B, 61C when the formation of stacked 61A of this explanation.
Fig. 4 is the vertical view of stacked 61A.Fig. 5 is the figure of the arrow B direction observed stacked piece 61A of expression from Fig. 4.Fig. 6 is the C-C sectional view of Fig. 4.
Stacked 61A is configured as rectangular shape with metal (for example aluminium etc.) or resin material (for example tetrafluoroethylene resin (PTFE) etc.) and forms.Be formed with maintenance groove 62A with arcuation on a side, this maintenance groove 62A is used for reliable chimeric pipe arrangement 24A (with reference to Fig. 2, Fig. 3) and keeps pipe arrangement 24A.At the two ends of stacked 61A, across keeping groove 62A to form fixed orifices 63A, 63A respectively, this fixed orifices 63A, 63A are for fixing V-shaped flow road piece 22,22 and at inner peripheral surface formation internal thread.And, at the two ends of stacked 61A, being used for inserting inserting hole 64A, the 64A that leads to bolt Vp across keeping groove 62A to be formed with in the outside of fixed orifices 63A, 63A, this bolt Vp is used for stacked 61A is fixed on mounting plate 9.The reason that forms inserting hole 64A in the outside of fixed orifices 63A is, can operate stacked 61A together with the second cleaning side mass flow controller 38A, thereby make operability, maintainability good.
Stacked 61A for example when well heater 71,71 (with reference to Fig. 2) is installed, can select the high aluminium of thermal conductivity etc., so that the thermal capacitance of well heater 71,71 easily is passed to the pipe arrangement 24A of gas stream warp by stacked 61A.On the other hand, stacked 61A in order to reduce to act on the temperature variation of gas, can select the material as stacked 61A such as the low stainless steel of thermal conductivity, fluorine resin under the situation of not using well heater 71,71.
(action specification)
Then, the action to gas integrated unit 1 with above-mentioned formation describes.
Gas integrated unit 1 is for example from the first process gas pipeline 2A during to not shown treatment chamber supply effect gas, make the first technology side pneumavalve 15A and the 3rd technology side pneumavalve 19A become open mode, side pneumavalve 41A, 41B, 41C and the 5th cleaning side pneumavalve 43A, 43B, 43C are swept in the first technology side pneumavalve 15B, 15C, the second technology side pneumavalve, the second technology side pneumavalve 17A, 17B, 17C, the 3rd technology side pneumavalve 19B, 19C, the 3rd cleaning side pneumavalve 40A, 40B, 40C, cleaning politics, economics, organization, and ideology becomes closing condition.
Be supplied in the effect gas of effect gas input port 3A, undertaken after pressure adjusts by manual valve 11A, strainer 12A, setter 13A, pressure warning unit 14A, flow to pipe arrangement 24, the first common stream piece 25, the first technology side pneumavalve 15A, technology side mass flow controller 16A, carry out the flow adjustment.Effect gas is discharged to exhaust flow path by the second technology side pneumavalve 17A, the 3rd technology side pneumavalve 19A, technology side vacuum breaker 20A from technology side mass flow controller 16A.
The pressure of effect gas and stability of flow switch to open mode with the second technology side pneumavalve 17A from closing condition, and the 3rd technology side pneumavalve 19A are switched to closing condition from open mode behind prescribed value.Thus, effect gas supplies to strainer 18A and after removing impurity, supplies to not shown treatment chamber from common delivery port 4A through sink block 27 from the second technology side pneumavalve 17A.
Thereafter, under the situation that the first process gas pipeline 2A is cleaned, the first technology side pneumavalve 15A and the second technology side pneumavalve 17A made with remaining on open mode side pneumavalve 41A is swept in the 3rd technology side pneumavalve 19A, the 3rd cleaning side pneumavalve 40A, cleaning politics, economics, organization, and ideology, the 5th cleaning side pneumavalve 43A switches to open mode from closing condition.
Cleaning gas to 7 supplies of cleaning gas input port, undertaken after pressure adjusts by manual valve 31, strainer 32, setter 33, pressure warning unit 34, be supplied to the second cleaning side mass flow controller 38A through pipe arrangement 44, branch's piece 45, pipe arrangement 46, V-shaped flow road piece 22, carry out the flow adjustment.Thereafter, cleaning gas is supplied to the first technology side pneumavalve 15A through cleaning side vacuum breaker 39A, the 3rd cleaning side pneumavalve 40A, is supplied to the stream of effect gas stream warp.Cleaning gas is supplied to the second technology side pneumavalve 17A from the first technology side pneumavalve 15A via technology side mass flow controller 16A.
Cleaning gas, its part through the 3rd technology side pneumavalve 19A, technology side vacuum breaker 20A, and are discharged to not shown exhaust flow path from venting port 5A from the second technology side pneumavalve 17A.Remaining cleaning gas outputs to not shown treatment chamber from the second technology side pneumavalve 17A through the second common stream piece 26, sink block 27, strainer 18A, common delivery port 4A.
By above-mentioned cleaning action, clean the stream in the downstream side of the first technology side pneumavalve 15A.
At this moment, if compare the flow of the second cleaning side mass flow controller 38A and technology side mass flow controller 16A, then can detect the unusual of technology side mass flow controller 16A.
Move side by side with above-mentioned cleaning, cleaning gas from branching block 47 through cleaning politics, economics, organization, and ideology sweep side pneumavalve 41A, the 3rd cleaning side mass flow controller 42A, the 5th cleaning side pneumavalve 43A, pipe arrangement 50 is supplied to sink block 27, pass through strainer 18A from sink block 27, and output to not shown treatment chamber from common delivery port 4A.Can clean in the pipe arrangement 50 thus.At this moment, by measuring the flow of the 3rd cleaning side mass flow controller 42A, the mesh that can detect strainer 18A stops up.
Make effect gas or cleaning gas flow into the action of second, third process gas pipeline 2B, 2C,, thereby omit explanation with to make effect gas or cleaning gas flow into the action of the above-mentioned first process gas pipeline 2A same.
(action effect)
Then, the action effect to gas integrated unit 1 with above-mentioned formation describes.Fig. 7 represents not use stacked 61A, 61B, 61C and the figure of gas integrated unit 100 that loop shown in Figure 1 has been specialized.
As shown in Figure 7, under the situation of not using stacked 61A, 61B, 61C, the second cleaning side mass flow controller 38A, 38B, 38C are configured on the regional P11 that is located at pipe arrangement 24A, 24B, 24C side.In this case, in order to suppress base space, the second cleaning side mass flow controller 38A, 38B, 38C are connected on the branching block 47,47,47 in the mode that lays respectively at same column with the 3rd cleaning side mass flow controller 42A, 42B, 42C.The second cleaning side mass flow controller 38A, 38B, 38C and the 3rd cleaning side mass flow controller 42A, 42B, 42C control from the flow of the cleaning gas of pipe arrangement 101 supplies.
Relative therewith, as shown in Figure 2, under the situation of using stacked 61A, 61B, 61C, be stacked and placed on stacked 61A, 61B on pipe arrangement 24A, 24B, the 24C, the 61C the stacked second cleaning side mass flow controller 38A, 38B, 38C.Thus, the second cleaning side mass flow controller 38A, 38B, 38C and pipe arrangement 24A, 24B, 24C form two sections structures.
Thus, under the situation of not using stacked 61A, 61B, 61C, as shown in Figure 7, need be used to dispose the regional P11 of the second cleaning side mass flow controller 38A, 38B, 38C, but by using stacked 61A, 61B, 61C, as shown in Figure 2, the second cleaning side mass flow controller 38A, 38B, 38C can be set in being used to dispose the regional P1 of pipe arrangement 24A, 24B, 24C.Therefore, according to the gas integrated unit 1 of present embodiment, can eliminate the zone 11 that is used to dispose the second cleaning side mass flow controller 38A, 38B, 38C, to reduce base space.
And, form two sections structures by making the second cleaning side mass flow controller 38A, 38B, 38C and pipe arrangement 24A, 24B, 24C, regional P11 shown in Figure 7 is vacated.As shown in Figure 2, utilize branching block 47 reverse configuration cleaning politics, economics, organization, and ideology to sweep side pneumavalve 41A, the 3rd cleaning side mass flow controller 42A, the 5th cleaning side pneumavalve 43A.Thus, regional P21 shown in Figure 7 moves to regional P2 shown in Figure 2, the width dimensions of gas integrated unit 1 can be reduced the amount of 1 pipeline.
Usually, in semiconductor-fabricating device since the quantity of employed fluid control component more, be difficult to shorten total length, therefore expectation can reduce width dimensions.Therefore, as mentioned above pipe arrangement 24A, 24B, 24C and the second cleaning side mass flow controller 38A, 38B, 38C are set as two sections structures to form free space, be provided with in this free space that side pneumavalve 41A, the 3rd cleaning side mass flow controller 42A, the 5th cleaning side pneumavalve 43A are swept in the cleaning politics, economics, organization, and ideology that constitutes cleaning gas tube 6 and the width dimensions that reduces gas integrated unit 1 is very useful.
In addition, under the situation of not using stacked 61A, 61B, 61C as shown in Figure 7, the second cleaning side mass flow controller 38A, 38B, 38C, in order to supply with the cleaning gas after adjusting flow, make pipe arrangement 102,103,104 to be connected the top mode wraparound of cleaning side vacuum breaker 39A, 39B, 39C separately to cleaning side vacuum breaker 39A, 39B, 39C.And the 5th cleaning side pneumavalve 43A, 43B, 43C make pipe arrangement 105,106,107 with L shaped wraparound, and are connected on the sink block 27,27,27 of first～the 3rd process gas unit 72A, 72B, 72C.
Relative therewith, as shown in Figure 2, under the situation of using stacked 61A, 61B, 61C, owing to do not need the feed rate of cleaning gas is carried out strict management, thereby pipe arrangement 46 is connected with the input port of the second cleaning side mass flow controller 38A, 38B, 38C, and the output port of the second cleaning side mass flow controller 38A, 38B, 38C is connected with cleaning side vacuum breaker 39A, 39B, 39C through short pipe arrangement 49,49,49.And, in the mode by being formed at the gap between the gas cell with pipe arrangement 50 wraparounds, thereby will be connected on the sink block 27 of the first process gas unit 72A with the 5th cleaning side pneumavalve 43A of the 5th cleaning side pneumavalve 43B, the reverse setting of 43C.For the 5th cleaning side gas-operated 43B, 43C, be configured to pipe arrangement 51,53 wraparounds L shaped.
Therefore, as Fig. 2, shown in Figure 3, by using stacked 61A, 61B, 61C and first～the 3rd process gas unit 72A, 72B, 72C are constituted two sections structures, shorten to the piping length of cleaning side vacuum breaker 39A, 39B, 39C from the second cleaning side mass flow controller 38A, 38B, 38C, can reduce the loss of the adjusted cleaning gas of stream and control cleaning gas.And gas integrated unit 1 as shown in Figure 2 because pipe arrangement 102,103,104 that will be as shown in Figure 7 accumulates 1 pipe arrangement 46, thereby is compared with gas integrated unit 100 shown in Figure 7 and can be cut down the pipe arrangement space.And, because the gap that utilizes gas cell is pipe arrangement 50 wraparounds, thereby do not need to be provided with separately the pipe arrangement space of pipe arrangement 50 usefulness, can not cause the maximization of cell size.
And, the gas integrated unit 1 of present embodiment, as shown in Figures 2 and 3, owing to dispose stacked 61A, 61B, 61C in the mode that covers pipe arrangement 24A, 24B, 24C, thereby can dispose stacked 61A, 61B, 61C in the mode in the width dimensions that converges on first～the 3rd process gas unit 72A, 72B, 72C.
And, the gas integrated unit 1 of present embodiment, as shown in Figure 2, utilize the slotting bolt Vp that leads in inserting hole 64A that stacked 61A, 61B, 61C are fixed on the mounting plate 9, V-shaped flow road piece 22 is separately fixed among the fixed orifices 63A of stacked 61A, 61B, 61C by not shown bolt, and then the second cleaning side mass flow controller 38A, 38B, 38C utilize bolt V to be separately fixed on the V-shaped flow road piece 22.
For example under the situation of heating the 3rd process gas unit 72C, zonal well heater 71,71 is installed in the both sides of manual valve 11C, strainer 12C, setter 13C, pressure warning unit 14C, stacked 61C, the first common stream piece 25, the first technology side pneumavalve 15C, technology side mass flow controller 16C, the second technology side pneumavalve 17C, the second common stream piece 26, sink block 27, strainer 18C.Thus, each fluid control component and the bottom stream piece that is configured in below them are heated, and effect gas can not accumulate in the stream.At this moment, stacked 61C is close to well heater 71,71 heating on the two sides, and this is heat passage to the pipe arrangement 24C that contacts with the inwall that keeps groove 62C, and pipe arrangement 24C is heated.Therefore, mobile effect gas can not assembled in pipe arrangement 24C in pipe arrangement 24C.
Thus, according to the gas integrated unit 1 of present embodiment, can with on 1 stacked 61, fix the second cleaning side mass flow controller 38 and be configured in its underpart V-shaped flow road piece 22,22 effect and with the heat passage effect of well heater 71,71 to pipe arrangement 24A, 24B, 24C.
In other words, as shown in Figure 7, when under the situation of not using stacked 61C, the process gas unit being heated,, can not effectively utilize heat block 110 tops though heat block 110 is fixed on the mounting plate 9 in the mode that covers pipe arrangement 24C.Relative therewith, as shown in Figures 2 and 3, have outside the effect of heating pipe arrangement 24 by making stacked 61, also make it have the fixedly effect of V-shaped flow road piece 22,22, can effectively utilize stacked 61 top, can reduce base space.
And, the gas integrated unit 1 of present embodiment, as shown in Figures 2 and 3, owing to the second cleaning side mass flow controller 38A, 38B, 38C that base space is bigger are stacked on stacked 61A, 61B, the 61C, thereby can effectively reduce the base space of whole unit.
The invention is not restricted to above-mentioned embodiment, various application can be arranged.
(1) for example, in the above-described embodiment, enumerated first～the 3rd process gas unit 72A, 72B, the 72C of effect gas stream warp as the example of " first gas cell ", enumerated cleaning gas cell 73 as the example of " second gas cell ".Relative therewith, for example also can be with control action kou gas gas supplied unit as " first, second gas cell ".
(2) for example, in the above-described embodiment, make stacked 61 maintenance groove 62 form arcuation, but carrying out heat passage shape so long as can contact with the periphery of pipe arrangement 24 get final product, and can also be rectangle or trilateral etc.
(3) for example, in the above-described embodiment, stacked 61 is stacked on the pipe arrangement 24, but also can be stacked on the stream piece etc.
(4) for example, in the above-described embodiment, the 3rd cleaning side mass flow controller 38 is configured in stacked 61 top, but also the fluid control component of other kinds such as valve or transmitter can be configured in stacked 61 top.
Claims (2)
1. a gas integrated unit is characterized in that, is provided with:
The process gas unit is by the flow of process gas with mass flow controller CONTROL PROCESS gas;
The cleaning gas cell is connected with described process gas unit, converges to the flow of the unitary cleaning gas of described process gas with mass flow controller or mass flowmeter control by cleaning gas; With
Stacked, be stacked on the described process gas unit,
And, the part of described cleaning gas with mass flow controller or mass flowmeter is stacked on described stacked,
Described stacked is provided with in the mode that covers the pipe arrangement that is comprised in the described process gas unit,
On described stacked, be formed with recess at the both ends of the surface opening,
Described pipe arrangement all is housed in the described recess.
2. gas integrated unit as claimed in claim 1, it is characterized in that, described stacked, have and be used for fixing mounting the fixed part of described cleaning gas with the bottom stream piece of the part of mass flow controller or mass flowmeter arranged, and when being heated, carry out heat passage to described process gas unit by well heater.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006347957A JP4355724B2 (en) | 2006-12-25 | 2006-12-25 | Gas integrated unit |
| JP2006-347957 | 2006-12-25 | ||
| JP2006347957 | 2006-12-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101210317A CN101210317A (en) | 2008-07-02 |
| CN101210317B true CN101210317B (en) | 2010-07-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101940758A Active CN101210317B (en) | 2006-12-25 | 2007-11-30 | Gas integrated unit |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4355724B2 (en) |
| KR (1) | KR100924767B1 (en) |
| CN (1) | CN101210317B (en) |
| TW (1) | TW200828484A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4700095B2 (en) * | 2008-11-03 | 2011-06-15 | シーケーディ株式会社 | Gas supply device, block-shaped flange |
| JP5753831B2 (en) | 2012-11-29 | 2015-07-22 | 株式会社フジキン | Fluid control device |
| US20240055278A1 (en) * | 2021-02-08 | 2024-02-15 | Hitachi High-Tech Corporation | Gas supply apparatus, vacuum processing apparatus, and gas supply method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3919208B2 (en) | 1997-08-01 | 2007-05-23 | シーケーディ株式会社 | Process gas supply unit |
| JP4655423B2 (en) * | 2001-07-05 | 2011-03-23 | 株式会社フジキン | Fluid control device |
| KR100929713B1 (en) * | 2003-02-07 | 2009-12-03 | 도쿄엘렉트론가부시키가이샤 | Fluid control unit and heat treatment unit |
-
2006
- 2006-12-25 JP JP2006347957A patent/JP4355724B2/en active Active
-
2007
- 2007-10-02 TW TW096136874A patent/TW200828484A/en unknown
- 2007-11-30 CN CN2007101940758A patent/CN101210317B/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20080059506A (en) | 2008-06-30 |
| KR100924767B1 (en) | 2009-11-05 |
| TW200828484A (en) | 2008-07-01 |
| JP4355724B2 (en) | 2009-11-04 |
| CN101210317A (en) | 2008-07-02 |
| TWI349321B (en) | 2011-09-21 |
| JP2008159905A (en) | 2008-07-10 |
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