CN101171546A - 平版印刷设备中的光学系统 - Google Patents

平版印刷设备中的光学系统 Download PDF

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Publication number
CN101171546A
CN101171546A CNA2006800148110A CN200680014811A CN101171546A CN 101171546 A CN101171546 A CN 101171546A CN A2006800148110 A CNA2006800148110 A CN A2006800148110A CN 200680014811 A CN200680014811 A CN 200680014811A CN 101171546 A CN101171546 A CN 101171546A
Authority
CN
China
Prior art keywords
mirror
concave spherical
optical system
lens
spherical mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2006800148110A
Other languages
English (en)
Chinese (zh)
Inventor
让-佛朗索瓦·塔内
让-吕克·米什兰
罗兰·盖尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAGEM SA
Safran Electronics and Defense SAS
Original Assignee
SAGEM SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAGEM SA filed Critical SAGEM SA
Priority to CN201510411738.1A priority Critical patent/CN105182508A/zh
Publication of CN101171546A publication Critical patent/CN101171546A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CNA2006800148110A 2005-04-29 2006-05-02 平版印刷设备中的光学系统 Pending CN101171546A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510411738.1A CN105182508A (zh) 2005-04-29 2006-05-02 平版印刷设备中的光学系统

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0504362 2005-04-29
FR0504362A FR2885234B1 (fr) 2005-04-29 2005-04-29 Systeme optique pour un dispositif de photolithographie
FR0508657 2005-08-22

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201510411738.1A Division CN105182508A (zh) 2005-04-29 2006-05-02 平版印刷设备中的光学系统

Publications (1)

Publication Number Publication Date
CN101171546A true CN101171546A (zh) 2008-04-30

Family

ID=35431913

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201510411738.1A Pending CN105182508A (zh) 2005-04-29 2006-05-02 平版印刷设备中的光学系统
CNA2006800148110A Pending CN101171546A (zh) 2005-04-29 2006-05-02 平版印刷设备中的光学系统

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201510411738.1A Pending CN105182508A (zh) 2005-04-29 2006-05-02 平版印刷设备中的光学系统

Country Status (2)

Country Link
CN (2) CN105182508A (fr)
FR (2) FR2885234B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1959289A1 (fr) * 2007-02-13 2008-08-20 Carl Zeiss SMT AG Objectif de projection d'agrandissement d'unité

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
EP1102100A3 (fr) * 1999-11-12 2003-12-10 Carl Zeiss Objectif catadioptrique avec diviseur de faisceau
US6898025B2 (en) * 2002-06-04 2005-05-24 Pentax Corporation Projection aligner and optical system therefor
KR20050035890A (ko) * 2002-08-23 2005-04-19 가부시키가이샤 니콘 투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법
US6863403B2 (en) * 2003-05-27 2005-03-08 Ultratech, Inc. Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus

Also Published As

Publication number Publication date
FR2885235A1 (fr) 2006-11-03
FR2885234B1 (fr) 2008-07-11
FR2885235B1 (fr) 2008-07-18
CN105182508A (zh) 2015-12-23
FR2885234A1 (fr) 2006-11-03

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PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C12 Rejection of a patent application after its publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20080430