FR2885235A1 - Systeme optique pour un dispositif de photolithographie - Google Patents

Systeme optique pour un dispositif de photolithographie

Info

Publication number
FR2885235A1
FR2885235A1 FR0508657A FR0508657A FR2885235A1 FR 2885235 A1 FR2885235 A1 FR 2885235A1 FR 0508657 A FR0508657 A FR 0508657A FR 0508657 A FR0508657 A FR 0508657A FR 2885235 A1 FR2885235 A1 FR 2885235A1
Authority
FR
France
Prior art keywords
optical system
mirror
photolithography device
hand
refractive power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR0508657A
Other languages
English (en)
Other versions
FR2885235B1 (fr
Inventor
Jean Francois Tanne
Jean Luc Michelin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Electronics and Defense SAS
Original Assignee
Sagem Defense Securite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sagem Defense Securite SA filed Critical Sagem Defense Securite SA
Priority to FR0508657A priority Critical patent/FR2885235B1/fr
Priority to PCT/EP2006/061987 priority patent/WO2006117378A1/fr
Priority to CN201510411738.1A priority patent/CN105182508A/zh
Priority to EP06754963A priority patent/EP1880249B1/fr
Publication of FR2885235A1 publication Critical patent/FR2885235A1/fr
Application granted granted Critical
Publication of FR2885235B1 publication Critical patent/FR2885235B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV

Abstract

L'invention concerne un système optique d'un dispositif de photolithographie, comportant un miroir (10) et des moyens (31, 32) de support aptes à recevoir et maintenir d'une part un masque (M) et une plaque (W) d'autre part, le système comportant en outre des moyens (11, 41-45) de correction d'aberration, d'astigmatisme et de distorsion situés optiquement entre les moyens (31, 32) de support et le miroir (10), caractérisé en ce que la puissance réfractive des moyens (11, 41-45) de correction est de l'ordre de grandeur de la puissance réfractive du miroir.
FR0508657A 2005-04-29 2005-08-22 Systeme optique pour un dispositif de photolithographie Expired - Fee Related FR2885235B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR0508657A FR2885235B1 (fr) 2005-04-29 2005-08-22 Systeme optique pour un dispositif de photolithographie
PCT/EP2006/061987 WO2006117378A1 (fr) 2005-04-29 2006-05-02 Systeme optique pour un dispositif de lithographie
CN201510411738.1A CN105182508A (zh) 2005-04-29 2006-05-02 平版印刷设备中的光学系统
EP06754963A EP1880249B1 (fr) 2005-04-29 2006-05-02 Systeme optique pour un dispositif de lithographie

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0504362A FR2885234B1 (fr) 2005-04-29 2005-04-29 Systeme optique pour un dispositif de photolithographie
FR0508657A FR2885235B1 (fr) 2005-04-29 2005-08-22 Systeme optique pour un dispositif de photolithographie

Publications (2)

Publication Number Publication Date
FR2885235A1 true FR2885235A1 (fr) 2006-11-03
FR2885235B1 FR2885235B1 (fr) 2008-07-18

Family

ID=35431913

Family Applications (2)

Application Number Title Priority Date Filing Date
FR0504362A Expired - Fee Related FR2885234B1 (fr) 2005-04-29 2005-04-29 Systeme optique pour un dispositif de photolithographie
FR0508657A Expired - Fee Related FR2885235B1 (fr) 2005-04-29 2005-08-22 Systeme optique pour un dispositif de photolithographie

Family Applications Before (1)

Application Number Title Priority Date Filing Date
FR0504362A Expired - Fee Related FR2885234B1 (fr) 2005-04-29 2005-04-29 Systeme optique pour un dispositif de photolithographie

Country Status (2)

Country Link
CN (2) CN101171546A (fr)
FR (2) FR2885234B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1959289A1 (fr) * 2007-02-13 2008-08-20 Carl Zeiss SMT AG Objectif de projection d'agrandissement d'unité

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6424471B1 (en) * 1999-11-12 2002-07-23 Carl-Zeiss-Stiftung Catadioptric objective with physical beam splitter
US6556278B1 (en) * 1993-06-30 2003-04-29 Nikon Corporation Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
US20030223127A1 (en) * 2002-06-04 2003-12-04 Pentax Corporation Projection aligner and optical system therefor
WO2004019128A2 (fr) * 2002-08-23 2004-03-04 Nikon Corporation Systeme optique de projection et procede associe pour la photolithographie, et appareil d'exposition et procede associe

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US6863403B2 (en) * 2003-05-27 2005-03-08 Ultratech, Inc. Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6556278B1 (en) * 1993-06-30 2003-04-29 Nikon Corporation Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
US6424471B1 (en) * 1999-11-12 2002-07-23 Carl-Zeiss-Stiftung Catadioptric objective with physical beam splitter
US20030223127A1 (en) * 2002-06-04 2003-12-04 Pentax Corporation Projection aligner and optical system therefor
WO2004019128A2 (fr) * 2002-08-23 2004-03-04 Nikon Corporation Systeme optique de projection et procede associe pour la photolithographie, et appareil d'exposition et procede associe

Also Published As

Publication number Publication date
FR2885234A1 (fr) 2006-11-03
CN105182508A (zh) 2015-12-23
FR2885234B1 (fr) 2008-07-11
CN101171546A (zh) 2008-04-30
FR2885235B1 (fr) 2008-07-18

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20140430