CN101159164A - 包括多位存储单元和温度收支传感器的半导体器件 - Google Patents
包括多位存储单元和温度收支传感器的半导体器件 Download PDFInfo
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- CN101159164A CN101159164A CNA2007101638359A CN200710163835A CN101159164A CN 101159164 A CN101159164 A CN 101159164A CN A2007101638359 A CNA2007101638359 A CN A2007101638359A CN 200710163835 A CN200710163835 A CN 200710163835A CN 101159164 A CN101159164 A CN 101159164A
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- memory cell
- state
- temperature budget
- phase
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 239000012782 phase change material Substances 0.000 claims description 79
- 230000000052 comparative effect Effects 0.000 claims description 24
- 238000012544 monitoring process Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- 230000035945 sensitivity Effects 0.000 claims description 18
- 230000004044 response Effects 0.000 claims description 11
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims 1
- 238000003860 storage Methods 0.000 description 33
- 230000008859 change Effects 0.000 description 10
- 230000014759 maintenance of location Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 4
- -1 chalcogenide compound Chemical class 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000002178 crystalline material Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 230000001351 cycling effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 238000010977 unit operation Methods 0.000 description 2
- 229910000763 AgInSbTe Inorganic materials 0.000 description 1
- 241001269238 Data Species 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910005872 GeSb Inorganic materials 0.000 description 1
- 229910000618 GeSbTe Inorganic materials 0.000 description 1
- 229910005900 GeTe Inorganic materials 0.000 description 1
- 229910018321 SbTe Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910004491 TaAlN Inorganic materials 0.000 description 1
- 229910004166 TaN Inorganic materials 0.000 description 1
- 229910004200 TaSiN Inorganic materials 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 229910008482 TiSiN Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5678—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using amorphous/crystalline phase transition storage elements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0033—Disturbance prevention or evaluation; Refreshing of disturbed memory data
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/02—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3418—Disturbance prevention or evaluation; Refreshing of disturbed memory data
- G11C16/3431—Circuits or methods to detect disturbed nonvolatile memory cells, e.g. which still read as programmed but with threshold less than the program verify threshold or read as erased but with threshold greater than the erase verify threshold, and to reverse the disturbance via a refreshing programming or erasing step
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
- G11C7/04—Arrangements for writing information into, or reading information out from, a digital store with means for avoiding disturbances due to temperature effects
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Dram (AREA)
Abstract
Description
Claims (36)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/544,159 | 2006-10-06 | ||
US11/544,159 US7623401B2 (en) | 2006-10-06 | 2006-10-06 | Semiconductor device including multi-bit memory cells and a temperature budget sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101159164A true CN101159164A (zh) | 2008-04-09 |
CN101159164B CN101159164B (zh) | 2011-11-16 |
Family
ID=39301594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101638359A Expired - Fee Related CN101159164B (zh) | 2006-10-06 | 2007-09-30 | 半导体器件、存储器、以及操作存储器的方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7623401B2 (zh) |
JP (1) | JP2008135150A (zh) |
KR (1) | KR20080031841A (zh) |
CN (1) | CN101159164B (zh) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101889313A (zh) * | 2008-12-30 | 2010-11-17 | E·孔法洛涅里 | 具有扩展工作温度范围的非易失性存储器 |
CN102369579A (zh) * | 2008-12-30 | 2012-03-07 | 美光科技公司 | 非易失性存储器的温度警报和低速率刷新 |
CN102620843A (zh) * | 2012-04-18 | 2012-08-01 | 上海中科高等研究院 | 芯片过温监测器 |
CN104766633A (zh) * | 2008-12-30 | 2015-07-08 | E·孔法洛涅里 | 具有扩展工作温度范围的非易失性存储器 |
CN105023606A (zh) * | 2015-08-14 | 2015-11-04 | 中国科学院上海微系统与信息技术研究所 | 一种相变存储器及其恢复数据的方法 |
CN107978333A (zh) * | 2016-10-24 | 2018-05-01 | 爱思开海力士有限公司 | 电子设备 |
CN110134164A (zh) * | 2019-04-29 | 2019-08-16 | 淮南万泰电气有限公司 | 一种用于恒温车间的温度控制系统 |
CN112930567A (zh) * | 2018-09-21 | 2021-06-08 | 美光科技公司 | 温度通知的存储器刷新 |
CN114913887A (zh) * | 2021-02-08 | 2022-08-16 | 旺宏电子股份有限公司 | 存储器晶粒、存储器及感测存储器晶粒内部温度状态的方法 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100611775B1 (ko) | 2003-12-29 | 2006-08-10 | 주식회사 하이닉스반도체 | 온도변화에 따라 최적의 리프레쉬 주기를 가지는 반도체메모리 장치 |
US7795605B2 (en) * | 2007-06-29 | 2010-09-14 | International Business Machines Corporation | Phase change material based temperature sensor |
US7997791B2 (en) * | 2007-07-24 | 2011-08-16 | Qimonda Ag | Temperature sensor, integrated circuit, memory module, and method of collecting temperature treatment data |
KR20100030979A (ko) * | 2008-09-11 | 2010-03-19 | 삼성전자주식회사 | 저항체를 이용한 비휘발성 메모리 장치 |
US8116115B2 (en) | 2008-11-06 | 2012-02-14 | Micron Technology, Inc. | Multilevel phase change memory operation |
KR101057725B1 (ko) * | 2008-12-31 | 2011-08-18 | 주식회사 하이닉스반도체 | 멀티 레벨 셀 데이터 센싱 장치 및 그 방법 |
US8379440B2 (en) * | 2009-05-01 | 2013-02-19 | The Royal Institution For The Advancement Of Learning/Mcgill University | Metallic-glass-based phase-change memory |
WO2011004448A1 (ja) * | 2009-07-06 | 2011-01-13 | 株式会社日立製作所 | 半導体記憶装置およびその製造方法 |
US8351251B2 (en) | 2009-08-27 | 2013-01-08 | International Business Machines Corporation | Multilevel programming of phase change memory |
US8159857B2 (en) * | 2009-09-21 | 2012-04-17 | Infineon Technologies Ag | Electronic device with a programmable resistive element and a method for blocking a device |
US8351289B1 (en) | 2009-12-30 | 2013-01-08 | Micron Technology, Inc. | Apparatuses and methods for sensing a phase-change test cell and determining changes to the test cell resistance due to thermal exposure |
WO2011121491A1 (en) | 2010-03-30 | 2011-10-06 | International Business Machines Corporation | Programming at least one multi-level phase change memory cell |
US8707104B1 (en) | 2011-09-06 | 2014-04-22 | Western Digital Technologies, Inc. | Systems and methods for error injection in data storage systems |
US8713357B1 (en) | 2011-09-06 | 2014-04-29 | Western Digital Technologies, Inc. | Systems and methods for detailed error reporting in data storage systems |
US9195530B1 (en) | 2011-09-06 | 2015-11-24 | Western Digital Technologies, Inc. | Systems and methods for improved data management in data storage systems |
US8700834B2 (en) | 2011-09-06 | 2014-04-15 | Western Digital Technologies, Inc. | Systems and methods for an enhanced controller architecture in data storage systems |
US9798654B2 (en) * | 2011-09-15 | 2017-10-24 | International Business Machines Corporation | Retention management for phase change memory lifetime improvement through application and hardware profile matching |
US9053008B1 (en) * | 2012-03-26 | 2015-06-09 | Western Digital Technologies, Inc. | Systems and methods for providing inline parameter service in data storage devices |
US9058869B2 (en) * | 2013-02-07 | 2015-06-16 | Seagate Technology Llc | Applying a bias signal to memory cells to reverse a resistance shift of the memory cells |
US9047938B2 (en) * | 2013-02-25 | 2015-06-02 | International Business Machines Corporation | Phase change memory management |
US9165668B1 (en) | 2013-07-29 | 2015-10-20 | Western Digital Technologies, Inc. | Data retention monitoring using temperature history in solid state drives |
US9257167B2 (en) * | 2014-03-13 | 2016-02-09 | Katsuyuki Fujita | Resistance change memory |
DE102014211111A1 (de) * | 2014-06-11 | 2015-12-17 | Robert Bosch Gmbh | Refresh eines Speicherbereichs einer nichtflüchtigen Speichereinheit |
KR102276249B1 (ko) * | 2014-06-18 | 2021-07-12 | 에스케이하이닉스 주식회사 | 반도체 메모리 장치 및 그 동작 방법 |
US11139025B2 (en) * | 2020-01-22 | 2021-10-05 | International Business Machines Corporation | Multi-level cell threshold voltage operation of one-selector-one-resistor structure included in a crossbar array |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6768665B2 (en) | 2002-08-05 | 2004-07-27 | Intel Corporation | Refreshing memory cells of a phase change material memory device |
DE60227534D1 (de) | 2002-11-18 | 2008-08-21 | St Microelectronics Srl | Schaltung und Anordnung zur Tempeaturüberwachung von chalcogenische Elementen, insbesondere von Phasenänderungsspeicherelementen |
JP4129170B2 (ja) * | 2002-12-05 | 2008-08-06 | シャープ株式会社 | 半導体記憶装置及びメモリセルの記憶データ補正方法 |
US6768655B1 (en) | 2003-02-03 | 2004-07-27 | System General Corp. | Discontinuous mode PFC controller having a power saving modulator and operation method thereof |
US7027343B2 (en) * | 2003-09-22 | 2006-04-11 | Micron Technology | Method and apparatus for controlling refresh operations in a dynamic memory device |
US7009904B2 (en) * | 2003-11-19 | 2006-03-07 | Infineon Technologies Ag | Back-bias voltage generator with temperature control |
TW200527656A (en) * | 2004-02-05 | 2005-08-16 | Renesas Tech Corp | Semiconductor device |
JP4282612B2 (ja) * | 2005-01-19 | 2009-06-24 | エルピーダメモリ株式会社 | メモリ装置及びそのリフレッシュ方法 |
-
2006
- 2006-10-06 US US11/544,159 patent/US7623401B2/en not_active Expired - Fee Related
-
2007
- 2007-09-30 CN CN2007101638359A patent/CN101159164B/zh not_active Expired - Fee Related
- 2007-10-01 JP JP2007257463A patent/JP2008135150A/ja not_active Withdrawn
- 2007-10-05 KR KR1020070100598A patent/KR20080031841A/ko not_active Application Discontinuation
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101889313A (zh) * | 2008-12-30 | 2010-11-17 | E·孔法洛涅里 | 具有扩展工作温度范围的非易失性存储器 |
CN102369579A (zh) * | 2008-12-30 | 2012-03-07 | 美光科技公司 | 非易失性存储器的温度警报和低速率刷新 |
US8572333B2 (en) | 2008-12-30 | 2013-10-29 | Micron Technology, Inc. | Non-volatile memory with extended operating temperature range |
CN101889313B (zh) * | 2008-12-30 | 2014-12-03 | E·孔法洛涅里 | 具有扩展工作温度范围的非易失性存储器 |
CN102369579B (zh) * | 2008-12-30 | 2015-01-14 | 美光科技公司 | 非易失性存储器的温度警报和低速率刷新 |
CN104766633A (zh) * | 2008-12-30 | 2015-07-08 | E·孔法洛涅里 | 具有扩展工作温度范围的非易失性存储器 |
CN102620843A (zh) * | 2012-04-18 | 2012-08-01 | 上海中科高等研究院 | 芯片过温监测器 |
CN102620843B (zh) * | 2012-04-18 | 2013-09-11 | 上海中科高等研究院 | 芯片过温监测器 |
CN105023606A (zh) * | 2015-08-14 | 2015-11-04 | 中国科学院上海微系统与信息技术研究所 | 一种相变存储器及其恢复数据的方法 |
CN105023606B (zh) * | 2015-08-14 | 2018-06-26 | 中国科学院上海微系统与信息技术研究所 | 一种相变存储器及其恢复数据的方法 |
CN107978333A (zh) * | 2016-10-24 | 2018-05-01 | 爱思开海力士有限公司 | 电子设备 |
CN107978333B (zh) * | 2016-10-24 | 2021-09-21 | 爱思开海力士有限公司 | 电子设备 |
CN112930567A (zh) * | 2018-09-21 | 2021-06-08 | 美光科技公司 | 温度通知的存储器刷新 |
US11335394B2 (en) | 2018-09-21 | 2022-05-17 | Micron Technology, Inc. | Temperature informed memory refresh |
CN112930567B (zh) * | 2018-09-21 | 2022-06-14 | 美光科技公司 | 温度通知的存储器刷新 |
US11887651B2 (en) | 2018-09-21 | 2024-01-30 | Micron Technology, Inc. | Temperature informed memory refresh |
CN110134164A (zh) * | 2019-04-29 | 2019-08-16 | 淮南万泰电气有限公司 | 一种用于恒温车间的温度控制系统 |
CN114913887A (zh) * | 2021-02-08 | 2022-08-16 | 旺宏电子股份有限公司 | 存储器晶粒、存储器及感测存储器晶粒内部温度状态的方法 |
Also Published As
Publication number | Publication date |
---|---|
US7623401B2 (en) | 2009-11-24 |
US20080084738A1 (en) | 2008-04-10 |
JP2008135150A (ja) | 2008-06-12 |
CN101159164B (zh) | 2011-11-16 |
KR20080031841A (ko) | 2008-04-11 |
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