CN101137935A - 显影凸版印刷用感光性层合印刷原版及使用该印刷原版的显影凸版印刷版的制造方法 - Google Patents
显影凸版印刷用感光性层合印刷原版及使用该印刷原版的显影凸版印刷版的制造方法 Download PDFInfo
- Publication number
- CN101137935A CN101137935A CNA2005800489801A CN200580048980A CN101137935A CN 101137935 A CN101137935 A CN 101137935A CN A2005800489801 A CNA2005800489801 A CN A2005800489801A CN 200580048980 A CN200580048980 A CN 200580048980A CN 101137935 A CN101137935 A CN 101137935A
- Authority
- CN
- China
- Prior art keywords
- ultraviolet
- development
- letterpress
- layer
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005069307A JP4225979B2 (ja) | 2005-03-11 | 2005-03-11 | レタープレス印刷用感光性積層印刷原版および該レタープレス印刷用感光性積層印刷原版を用いたレタープレス印刷版の製造方法 |
JP069307/2005 | 2005-03-11 | ||
PCT/JP2005/021906 WO2006095472A1 (ja) | 2005-03-11 | 2005-11-29 | レタープレス印刷用感光性積層印刷原版および該レタープレス印刷用感光性積層印刷原版を用いたレタープレス印刷版の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101137935A true CN101137935A (zh) | 2008-03-05 |
CN101137935B CN101137935B (zh) | 2010-12-22 |
Family
ID=36953078
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800489801A Expired - Fee Related CN101137935B (zh) | 2005-03-11 | 2005-11-29 | 显影凸版印刷用感光性层合印刷原版及使用该印刷原版的显影凸版印刷版的制造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7998659B2 (zh) |
EP (1) | EP1865376A4 (zh) |
JP (1) | JP4225979B2 (zh) |
KR (1) | KR100926855B1 (zh) |
CN (1) | CN101137935B (zh) |
TW (1) | TW200632535A (zh) |
WO (1) | WO2006095472A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102998912A (zh) * | 2012-12-21 | 2013-03-27 | 珠海天威飞马打印耗材有限公司 | 显影设备及显影方法 |
CN106675030A (zh) * | 2016-12-26 | 2017-05-17 | 海宁市佳峰彩印包装有限公司 | 一种高速数码显影凸版彩印用材料及其生产技术 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009058901A (ja) * | 2007-09-03 | 2009-03-19 | Tokyo Ohka Kogyo Co Ltd | 凸版印刷版製造用多層積層体及び凸版印刷版の製造方法 |
DE102008013073B4 (de) | 2008-03-06 | 2011-02-03 | Leonhard Kurz Stiftung & Co. Kg | Verfahren zur Herstellung eines Folienelements und Folienelement |
JP4200510B1 (ja) * | 2008-06-11 | 2008-12-24 | 東洋紡績株式会社 | 感光性フレキソ印刷原版 |
JP4247725B1 (ja) | 2008-07-16 | 2009-04-02 | 東洋紡績株式会社 | 感光性凸版印刷原版 |
TWI382914B (zh) * | 2010-05-21 | 2013-01-21 | Univ Nat Cheng Kung | 滾印模具之製造方法 |
CN110306156A (zh) * | 2014-06-06 | 2019-10-08 | 大日本印刷株式会社 | 蒸镀掩模及其前体、以及有机半导体元件的制造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4515877A (en) | 1982-11-27 | 1985-05-07 | Basf Aktiengesellschaft | Image-recording materials and image-recording carried out using these to produce an optical mask |
US5719009A (en) | 1992-08-07 | 1998-02-17 | E. I. Du Pont De Nemours And Company | Laser ablatable photosensitive elements utilized to make flexographic printing plates |
CA2171472C (en) | 1994-07-11 | 2002-02-26 | Katsuyuki Takeda | Presensitized lithographic printing plate and method for preparing lithographic printing plate |
US6238837B1 (en) | 1995-05-01 | 2001-05-29 | E.I. Du Pont De Nemours And Company | Flexographic element having an infrared ablatable layer |
DE19536808A1 (de) * | 1995-10-02 | 1997-04-03 | Basf Lacke & Farben | Verfahren zur Herstellung von photopolymeren Hochdruckplatten |
JPH11352670A (ja) * | 1998-06-04 | 1999-12-24 | Toyobo Co Ltd | 感光性印刷用原版およびその印刷版の作成方法 |
US6245481B1 (en) * | 1999-10-12 | 2001-06-12 | Gary Ganghui Teng | On-press process of lithographic plates having a laser sensitive mask layer |
JP3769171B2 (ja) * | 2000-05-17 | 2006-04-19 | 東京応化工業株式会社 | フレキソ印刷版製造用多層感光材料 |
DE10061116A1 (de) | 2000-12-07 | 2002-06-13 | Basf Drucksysteme Gmbh | Fotoempfindliches flexographisches Druckelement mit mindestens zwei IR-ablativen Schichten |
EP1216831B1 (en) | 2000-12-13 | 2003-10-29 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
US6773859B2 (en) | 2001-03-06 | 2004-08-10 | E. I. Du Pont De Nemours And Company | Process for making a flexographic printing plate and a photosensitive element for use in the process |
JP3781188B2 (ja) | 2002-09-06 | 2006-05-31 | 東洋紡績株式会社 | 感光性樹脂積層体 |
US6893796B2 (en) * | 2002-08-20 | 2005-05-17 | Kodak Polychrome Graphics Llc | Flexographic element having an integral thermally bleachable mask layer |
DE60325257D1 (de) * | 2002-10-24 | 2009-01-22 | Toray Industries | Druckplattenoriginal mit lichtempfindlichem harz, prozess zu seiner herstellung und prozess zur herstellung einer harzreliefdruckplatte damit |
WO2005026836A2 (en) * | 2003-09-12 | 2005-03-24 | Tokyo Ohka Kogyo Co., Ltd. | Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
-
2005
- 2005-03-11 JP JP2005069307A patent/JP4225979B2/ja not_active Expired - Fee Related
- 2005-11-29 EP EP05811727A patent/EP1865376A4/en not_active Withdrawn
- 2005-11-29 KR KR1020077018876A patent/KR100926855B1/ko not_active IP Right Cessation
- 2005-11-29 CN CN2005800489801A patent/CN101137935B/zh not_active Expired - Fee Related
- 2005-11-29 WO PCT/JP2005/021906 patent/WO2006095472A1/ja active Application Filing
- 2005-11-29 US US11/908,061 patent/US7998659B2/en not_active Expired - Fee Related
- 2005-12-12 TW TW094143784A patent/TW200632535A/zh unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102998912A (zh) * | 2012-12-21 | 2013-03-27 | 珠海天威飞马打印耗材有限公司 | 显影设备及显影方法 |
CN106675030A (zh) * | 2016-12-26 | 2017-05-17 | 海宁市佳峰彩印包装有限公司 | 一种高速数码显影凸版彩印用材料及其生产技术 |
Also Published As
Publication number | Publication date |
---|---|
JP4225979B2 (ja) | 2009-02-18 |
EP1865376A4 (en) | 2010-07-21 |
WO2006095472A1 (ja) | 2006-09-14 |
JP2006251500A (ja) | 2006-09-21 |
US7998659B2 (en) | 2011-08-16 |
CN101137935B (zh) | 2010-12-22 |
KR20070095424A (ko) | 2007-09-28 |
EP1865376A1 (en) | 2007-12-12 |
TW200632535A (en) | 2006-09-16 |
KR100926855B1 (ko) | 2009-11-13 |
US20090023094A1 (en) | 2009-01-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: EASTMAN KODAK COMPANY (US) 343 STATE STREET, ROCHE Free format text: FORMER OWNER: TOKYO APPLIED CHEMISTRY INDUSTRIAL CO., LTD. Effective date: 20110513 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: KANAGAWA PREFECTURE, JAPAN TO: STATE OF NEW YORK, THE USA |
|
TR01 | Transfer of patent right |
Effective date of registration: 20110513 Address after: American New York Patentee after: Eastman Kodak Co. Address before: Kanagawa, Japan Patentee before: Tokyo Ohka Kogyo Co., Ltd. |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101222 Termination date: 20131129 |