CN101135657A - X射线分析设备 - Google Patents

X射线分析设备 Download PDF

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Publication number
CN101135657A
CN101135657A CNA200710148846XA CN200710148846A CN101135657A CN 101135657 A CN101135657 A CN 101135657A CN A200710148846X A CNA200710148846X A CN A200710148846XA CN 200710148846 A CN200710148846 A CN 200710148846A CN 101135657 A CN101135657 A CN 101135657A
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CN
China
Prior art keywords
ray
rays
sample
collimator
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA200710148846XA
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English (en)
Chinese (zh)
Inventor
笹山则生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SEIKO NANOTECHNOLOGY Inc
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SEIKO NANOTECHNOLOGY Inc
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Filing date
Publication date
Application filed by SEIKO NANOTECHNOLOGY Inc filed Critical SEIKO NANOTECHNOLOGY Inc
Publication of CN101135657A publication Critical patent/CN101135657A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CNA200710148846XA 2006-08-29 2007-08-29 X射线分析设备 Pending CN101135657A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006232192A JP5100063B2 (ja) 2006-08-29 2006-08-29 Ｘ線分析装置
JP2006232192 2006-08-29

Publications (1)

Publication Number Publication Date
CN101135657A true CN101135657A (zh) 2008-03-05

Family

ID=39151528

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA200710148846XA Pending CN101135657A (zh) 2006-08-29 2007-08-29 X射线分析设备

Country Status (3)

Country Link
US (1) US7508907B2 (enExample)
JP (1) JP5100063B2 (enExample)
CN (1) CN101135657A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106872502A (zh) * 2016-12-28 2017-06-20 中国科学院长春光学精密机械与物理研究所 一种带光束调整的edxrf检测装置
CN109029310A (zh) * 2018-08-10 2018-12-18 深圳市善时仪器有限公司 一种高性能微焦点x射线测厚仪

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE532723C2 (sv) * 2007-05-03 2010-03-23 Lars Lantto Anordning för alstring av röntgenstrålning med stort reellt fokus och behovsanpassat virtuellt fokus
JP2012024339A (ja) * 2010-07-23 2012-02-09 Fujifilm Corp 放射線画像撮影システム及びコリメータユニット
CN102543243B (zh) 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
JP5598926B2 (ja) * 2011-09-26 2014-10-01 株式会社リガク Ｘ線回折測定データの解析方法
JP6096419B2 (ja) * 2012-04-12 2017-03-15 株式会社堀場製作所 Ｘ線検出装置
JP6096418B2 (ja) * 2012-04-12 2017-03-15 株式会社堀場製作所 Ｘ線検出装置
JP6082634B2 (ja) * 2013-03-27 2017-02-15 株式会社日立ハイテクサイエンス 蛍光ｘ線分析装置
JP6397690B2 (ja) * 2014-08-11 2018-09-26 株式会社日立ハイテクノロジーズ Ｘ線透過検査装置及び異物検出方法
JP6745621B2 (ja) * 2016-03-24 2020-08-26 株式会社日立ハイテクサイエンス 放射線分析装置、及び放射線分析方法
JP2023128230A (ja) * 2022-03-03 2023-09-14 国立研究開発法人産業技術総合研究所 Ｘ線分光装置及びｘ線分光システム
CN115389538B (zh) * 2022-08-09 2023-12-29 深圳市埃芯半导体科技有限公司 X射线分析装置及方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2237241Y (zh) * 1996-02-17 1996-10-09 中国航天工业总公司 一种x射线荧光分析仪
JP2003337110A (ja) * 2002-05-21 2003-11-28 Japan Science & Technology Corp 擬接触型キャピラリーを用いる微小領域ｘ線分析方法及びその装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2742415B2 (ja) * 1987-11-27 1998-04-22 株式会社日立製作所 Ｘ線分析装置
JPH09329557A (ja) * 1996-06-11 1997-12-22 Seiko Instr Inc マイクロ蛍光ｘ線分析装置
JP2002195963A (ja) * 2000-12-25 2002-07-10 Ours Tex Kk Ｘ線分光装置およびｘ線分析装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2237241Y (zh) * 1996-02-17 1996-10-09 中国航天工业总公司 一种x射线荧光分析仪
JP2003337110A (ja) * 2002-05-21 2003-11-28 Japan Science & Technology Corp 擬接触型キャピラリーを用いる微小領域ｘ線分析方法及びその装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106872502A (zh) * 2016-12-28 2017-06-20 中国科学院长春光学精密机械与物理研究所 一种带光束调整的edxrf检测装置
CN109029310A (zh) * 2018-08-10 2018-12-18 深圳市善时仪器有限公司 一种高性能微焦点x射线测厚仪

Also Published As

Publication number Publication date
US20080056442A1 (en) 2008-03-06
JP2008058014A (ja) 2008-03-13
US7508907B2 (en) 2009-03-24
JP5100063B2 (ja) 2012-12-19

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C53 Correction of patent of invention or patent application
CB02 Change of applicant information

Address after: Tokyo, Japan, Japan

Applicant after: Hitachi High Tech Science Corp.

Address before: Chiba, Chiba, Japan

Applicant before: Seiko Nanotechnology Inc.

COR Change of bibliographic data

Free format text: CORRECT: APPLICANT; FROM: SEIKO NANOTECHNOLOGY INC. TO: HITACHI HIGH TECH SCIENCE CORP.

C12 Rejection of a patent application after its publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20080305