CN101130187B - Substrate cleaning device, substrate cleaning method and substrate manufacture method - Google Patents
Substrate cleaning device, substrate cleaning method and substrate manufacture method Download PDFInfo
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- CN101130187B CN101130187B CN2007101114368A CN200710111436A CN101130187B CN 101130187 B CN101130187 B CN 101130187B CN 2007101114368 A CN2007101114368 A CN 2007101114368A CN 200710111436 A CN200710111436 A CN 200710111436A CN 101130187 B CN101130187 B CN 101130187B
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- brush
- substrate
- rotating shaft
- described brush
- principal axis
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Abstract
The present invention can wash big base board uniformly with high washing force. An upper brush (20) is arranged with a rotary axis (21) and rotates by the drive of a motor (22). A bearing block (23a, 23b) supports the rotary axis (21) of the upper brush (20) with rotatable mode. A guiding device (24a, 24b) guides the bearing block (23a, 23b) to the direction of the axis of the rotary axis (21). Because of keeping the upper brush (20) move to the axis direction of the rotary axis (21) on the one hand as well as making the brush rotate on the other hand, even though the upper brush (20) occurs bend when rotating, it is able to make the upper brush (20) move to the axis direction of the rotary axis (21) during rotating process, so as to eliminate the bend of the upper brush (20). Thus, the present invention can prevent the rotary axis (21) from deflecting, and fixes the upper brush (20) through the pressure contacting to the base board (1).
Description
Technical field
The invention relates to base plate cleaning device, the substrate-cleaning method of display panel substrate etc. of a kind of cleaning FPD (Flat Panel Display) device usefulness and the manufacture of substrates that uses these base plate cleaning devices and substrate-cleaning method, the present invention is especially about a kind of use brush (brush) and for cleaning large substrate base plate cleaning device, substrate-cleaning method and the manufacture of substrates that uses these base plate cleaning devices and substrate-cleaning method preferably.
Background technology
In the manufacturing process of the display panel substrate that various panel display apparatus such as liquid crystal indicator or plasma display system are used, utilize soups such as development or etching to handle, on substrate, form circuit pattern or chromatic filter (color filter) etc.At this moment,, then can't form circuit pattern or chromatic filter etc. well if on substrate, have spot or foreign matter, therefore, when substrate is sent into manufacturing process and before or after soup is handled, must cleaning base plate.Comprise the cleaning of substrate and a series of processing that soup is handled, while use drum conveyor substrate transferring mechanisms such as (Roller Conveyor) to come moving substrate to carry out mostly.
The cleaning of substrate, spot, foreign matter or the soup etc. that generally are to use rinse water (pure water) to wash on the substrate carry out, still, when spot or foreign matter more for a long time, during the higher cleaning force of perhaps special expectation, then use brush mechanically to remove spot or foreign matter on the substrate.As the technology that one side moving substrate uses brush to come cleaning base plate on one side, the technology that has patent documentation 1 to be disclosed to patent documentation 3.
[patent documentation 1] Japanese patent laid-open 10-337541 communique
[patent documentation 2] Japanese patent laid-open 10-307406 communique
[patent documentation 3] Japanese patent laid-open 11-128852 communique
Substrate maximizes along with the big pictureization of in recent years panel display apparatus, therefore must make the width of brush and substrate correspondingly elongated.Yet if make brush elongated, the deadweight of brush can increase, thereby it is crooked that brush is produced.Therefore, the rotating shaft of brush can be partial to, and brush is contacted with the pressure meeting change of substrate, thereby causes cleaning base plate equably.
Summary of the invention
Problem of the present invention is to clean large substrate equably with high cleaning force.And problem of the present invention is to make high-quality large substrate.
Base plate cleaning device of the present invention possesses: brush, establish across the width of substrate, while and rotate and be contacted with substrate; Travel mechanism relatively moves substrate and brush; And the brush maintaining body, described brush maintaining body has: clutch shaft bearing, rotatably support an end of the rotating shaft of described brush; First guider guides this clutch shaft bearing to the direction of principal axis of the rotating shaft of described brush; Second bearing is provided with respectively with this clutch shaft bearing, and rotatably supports the other end of the rotating shaft of described brush; Second guider is provided with respectively with this first guider, and guides this second bearing to the direction of principal axis of the rotating shaft of described brush; This brush maintaining body keeps the two ends of the rotating shaft of described brush to move respectively toward the direction of principal axis of rotating shaft mutually, and makes the direction of principal axis displacement of the past rotating shaft of described brush in the rotation, thereby eliminates the bending of described brush.And, substrate-cleaning method of the present invention is, brush is set across the width of substrate, substrate and described brush are relatively moved, utilize a brush maintaining body to carry out following actions, this brush maintaining body has: clutch shaft bearing, rotatably support an end of the rotating shaft of described brush; First guider guides this clutch shaft bearing to the direction of principal axis of the rotating shaft of described brush; Second bearing is provided with respectively with this clutch shaft bearing, and rotatably supports the other end of the rotating shaft of described brush; And second guider, be provided with respectively with this first guider, and the direction of principal axis to the rotating shaft of described brush guides this second bearing, utilize this brush maintaining body to keep the two ends of the rotating shaft of described brush to move respectively mutually on one side to the direction of principal axis of rotating shaft, make described brush rotation on one side, and make brush be contacted with substrate, so that the described brush in the rotation is toward the direction of principal axis displacement of rotating shaft, thereby eliminate the bending of described brush.
Since be to make the brush rotation while keeping brush to move to the direction of principal axis of rotating shaft, thus crooked even if brush produces before rotation, brush is indexed on the direction of principal axis of rotating shaft, thereby eliminates the bending of brush.Therefore, can prevent the deflection of the rotating shaft of brush, make brush be contacted with the pressure fixing of substrate.
Further, in the base plate cleaning device of the present invention, maintaining body has: a plurality of bearings, support the two ends of the rotating shaft of described brush respectively; And a plurality of guiders, guide each this bearing respectively to the direction of principal axis of the rotating shaft of described brush.And substrate-cleaning method of the present invention is to utilize different bearings to support the two ends of the rotating shaft of brush respectively, and utilizes different guiders to guide each bearing respectively to the direction of principal axis of the rotating shaft of brush.The simple structure of bearing and guider has been used in utilization, can keep brush to move to the direction of principal axis of rotating shaft.But the present invention is not limited to bearing and guider, also can use other mechanisms to keep brush to move to the direction of principal axis of rotating shaft.
Further, base plate cleaning device of the present invention possesses traverse mechanism, and this traverse mechanism makes brush come and go predetermined distance on the direction of principal axis of rotating shaft.And, substrate-cleaning method of the present invention, comprise: brush is set across the width of substrate, substrate and brush are relatively moved, make the brush rotation and make brush be contacted with substrate while keep the two ends of the rotating shaft of brush to move respectively to the direction of principal axis of rotating shaft.This method is to make brush come and go predetermined distance on the direction of principal axis of rotating shaft.By making brush on the direction of principal axis of rotating shaft, come and go predetermined distance, and make brush contact substrate equably on the width of substrate.
The manufacture method of substrate of the present invention, be to use above-mentioned arbitrary base plate cleaning device or substrate-cleaning method to come cleaning base plate after, the soup stipulated is handled.Clean large substrate equably with high cleaning force, can on substrate, form circuit pattern or chromatic filter etc. well.
[effect of invention]
According to base plate cleaning device of the present invention and substrate-cleaning method, make the brush rotation while keeping brush to move to the direction of principal axis of rotating shaft, and make brush be contacted with substrate, can prevent the deflection of the rotating shaft of brush with this, make brush be contacted with the pressure fixing of substrate, therefore can clean large substrate equably with high cleaning force.
Further, according to base plate cleaning device of the present invention and substrate-cleaning method, utilize bearing to support the rotating shaft of brush, and utilize the direction of principal axis pilot bearing of guider, can utilize simple structure to keep brush to move to the direction of principal axis of rotating shaft with this to the rotating shaft of brush.
Further, according to base plate cleaning device of the present invention and substrate-cleaning method, make brush on the direction of principal axis of rotating shaft, come and go predetermined distance, can make brush on the width of substrate, be contacted with substrate equably, therefore can clean large substrate more equably with this.
According to the manufacture method of substrate of the present invention, can clean large substrate equably with high cleaning force, thereby on substrate, form circuit pattern or chromatic filter etc. well.Therefore, can make high-quality large substrate.
Description of drawings
Fig. 1 is the figure of schematic configuration of the base plate cleaning device of expression the present invention one example.
Fig. 2 is the stereogram of major part of the base plate cleaning device of the present invention's one example.
Fig. 3 (a) is the figure of the installment state of expression drive tab 23a, and Fig. 3 (b) is the figure of the installment state of expression drive tab 23b.
Fig. 4 is the flow chart of one of manufacturing process example of the TFT substrate of expression liquid crystal indicator.
Fig. 5 is the flow chart of an example of manufacturing process of the base plate of color light filter of expression liquid crystal indicator.
1: substrate 10: cylinder
20: go up brush 21: rotating shaft
22: motor 23a, 23b: drive tab
24a, 24b: guider 25: transverse slat
26a, 26b: stringer board 27a, 27b: cam
28: connection shaft 29: motor
30: following brush 31: rotating shaft
32: motor 33a, 33b: drive tab
40: plate 41: connecting rod
42: crank disk 43: motor
A, B: arrow
The specific embodiment
Fig. 1 is the summary construction diagram of the base plate cleaning device of expression the present invention one example.And Fig. 2 is the stereogram of major part of the base plate cleaning device of the present invention's one example.Base plate cleaning device comprises cylinder 10, goes up brush 20, motor 22, go up the brush maintaining body, down brush 30, motor 32, down the brush maintaining body, go up the brush elevating mechanism and go up the brush traverse mechanism and constitute.
In Fig. 1, substrate 1 carries on a plurality of cylinders 10, moves to the substrate moving direction shown in the arrow A by the rotation of cylinder 10.Each cylinder 10 is opened fixing interval in the substrate moving direction sky and is provided with, and the speed with regulation is rotated by not shown driving mechanism.
In addition, in this example, substrate 1 is moved under level, however the present invention be not limited thereto, also can make substrate 1 with respect to level and with the direction of substrate moving direction quadrature or be inclined to respect to the substrate moving direction under the state of predetermined angular and move.
As shown in Figure 2, below reaching above the substrate 1 that moves utilizing cylinder 10, dispose brush 20 and following brush 30.Last brush 20 has rotating shaft 21, and the driving of the motor 22 by being installed in rotating shaft 21 1 ends is rotated.Equally, following brush 30 has rotating shaft 31, and the driving of the motor 32 by being installed in rotating shaft 31 1 ends is rotated.In the time of between substrate 1 is by last brush 20 and following brush 30, be contacted with substrate 1, come cleaning base plate 1 with this while last brush 20 and following brush 30 rotate.
In Fig. 1 and Fig. 2, last brush maintaining body comprises drive tab 23a, 23b, guider 24a, 24b, transverse slat 25 and stringer board 26a, 26b and constitutes. Drive tab 23a, 23b rotatably support the rotating shaft 21 of brush 20.
Fig. 3 (a) is the figure of the installment state of expression drive tab 23a, and Fig. 3 (b) is the figure of the installment state of expression drive tab 23b.Shown in Fig. 3 (a), drive tab 23a is installed on the transverse slat 25 by guider 24a, is connected with stringer board 26a on transverse slat 25.On the other hand, shown in Fig. 3 (b), drive tab 23b is installed on the stringer board 26b by guider 24b.Transverse slat 25 and stringer board 26a, 26b are disposing in the mode parallel with the direction of principal axis of rotating shaft 21, and guider 24a, 24b are to direction of principal axis pilot bearing piece 23a, the 23b of rotating shaft 21.With this, last brush maintaining body keeps going up brush 20 and can move to the direction of principal axis of rotating shaft 21.
Owing to be to make brush 20 rotations while keeping brush 20 to move to the direction of principal axis of rotating shaft 21, even if therefore going up brush 20 produces crooked before rotation, also can in rotary course, make brush 20 be indexed to the direction of principal axis of rotating shaft 21, thereby eliminate the bending of going up brush 20.Therefore, can prevent the deflection of rotating shaft 21, make brush 20 be contacted with the pressure fixing of substrate 1.
In Fig. 2, following brush maintaining body comprises drive tab 33a, 33b and constitutes. Drive tab 33a, 33b rotatably support down the rotating shaft 31 of brush 30. Drive tab 33a, 33b are fixed on the not shown transverse slat or stringer board.
In addition, in this example, though drive tab 33a, the 33b of brush maintaining body fix down, also can make down the brush maintaining body identical with the structure of last brush maintaining body, brush 30 can move to the direction of principal axis of rotating shaft 31 and keep down.
In Fig. 1 and Fig. 2, last brush elevating mechanism comprises cam 27a, 27b, connection shaft 28 and motor 29 and constitutes.Cam 27a, 27b link by connection shaft 28, and the driving of the motor 29 by being installed in connection shaft 28 1 ends is rotated.As shown in Figure 2, cam 27a is connected to the lower end of stringer board 26a, and cam 27b is connected to the lower end of stringer board 26b.When cam 27a, 27b rotated by the driving of motor 29, the stringer board 26a, the 26b that are connected on cam 27a, the 27b moved up and down.With this, last brush elevating mechanism moves up and down brush 20, thereby adjusts the height of going up brush 20.
According to this example, can utilize the brush elevating mechanism critically to adjust the height of brush 20, thereby can critically adjust the pressure that brush 20 is contacted with substrate 1.
In addition, in this example, the elevating mechanism at following brush 30 is not set, but can same elevating mechanism be set yet at following brush 30.
In Fig. 1 and Fig. 2, last brush traverse mechanism comprises plate 40, connecting rod 41, crank disk 42 and motor 43 and constitutes.Plate 40 be installed in drive tab 23b above, and on plate 40, linking an end of connecting rod 41.And the other end of connecting rod 41 is linked to crank disk 42, and when crank disk 42 rotated by the driving of motor 43, connecting rod 41 came and went drive tab 23b and moves on the direction shown in the arrow B.With this, last brush traverse mechanism makes brush 20 come and go the action of predetermined distance repeatedly on the direction of principal axis of rotating shaft 21.By making brush 20 on the direction of principal axis of rotating shaft 21, come and go predetermined distance, can make brush 20 on the width of substrate, be contacted with substrate 1 equably.
According to example discussed above, make brush 20 rotations and make brush 20 be contacted with substrate 1 while keeping brush 20 to move to the direction of principal axis of rotating shaft 21, can prevent the deflection of rotating shaft 21 with this, make brush 20 be contacted with the pressure fixing of substrate 1, therefore can clean large substrate 1 equably with high cleaning force.
Further, utilize drive tab 23a, 23b to support the rotating shaft 21 of brush 20, and utilize guider 24a, 24b pilot bearing piece 23a, 23b on the direction of principal axis of rotating shaft 21, can keep brush 20 to move with simple structure with this to the direction of principal axis of rotating shaft 21.But the present invention is not limited thereto, and also can use other mechanisms to keep brush 20 to move to the direction of principal axis of rotating shaft 21.
Further, make brush 20 on the direction of principal axis of rotating shaft 21, come and go predetermined distance, can make brush 20 on the width of substrate, be contacted with substrate 1 equably, therefore can clean large substrate 1 more equably with this.
In addition, in example discussed above, the traverse mechanism at following brush 30 is not set, still, can same traverse mechanism be set yet at following brush 30.At this moment, if brush 20 direction opposite towards each other with following brush 30 moved, the power from the substrate width direction of brush 30 down that then substrate 1 bore is born from the power on the substrate width direction of last brush 20, with substrate 1 is cancelled out each other, therefore, even if brush 30 was contacted with the pressure grow of substrate 1 under last brush 20 reached, substrate 1 can not be offset on the width of substrate yet.Therefore, can strengthen the pressure that last brush 20 and following brush 30 are contacted with substrate 1, thus the raising cleaning force.
In example discussed above, be to use cylinder 10 to come moving substrate 1, still, also can replace moving substrate 1 and move to go up brush 20 and brush 30 down, with this make substrate 1 and last brush 20 and down brush 30 relatively move.
Fig. 4 is the flow chart of one of manufacturing process example of the TFT substrate of expression liquid crystal indicator.Form in the operation (step 101) at film, utilize sputtering method or PCVD (CVD, Chemical Vapor Deposition) method etc. forms films such as the electric conductor film of the transparency electrode of using as liquid crystal drive or insulator film on glass substrate.In resist-coating operation (step 102), utilize cylinder rubbing method etc. and coating photosensitive resin material (photoresist), form at film and form the photoresist film in the operation (step 101) on the formed film.In exposure process (step 103), use contiguous formula (proximity) exposure device or projection aligner etc., with the pattern transfer of light shield to the photoresist film.In developing procedure (step 104), utilize bath formula (shower) development method etc. that developer solution is supplied on the photoresist film, remove the redundance of photoresist film.In etching work procedure (step 105), utilize Wet-type etching, remove at film and form the part of not covered in the formed film in the operation (step 101) by the photoresist film.In stripping process (step 106), utilize stripper and peel off the photoresist film of in etching work procedure (step 105), finishing the shade effect.Before or after above-mentioned each operation, can implement the matting and the drying process of substrate as required.Repeatedly repeat these operations, on glass substrate, form tft array.
And Fig. 5 is the flow chart of one of manufacturing process example of the base plate of color light filter of expression liquid crystal indicator.Form in the operation (step 201) at black matrix", by resist-coating, exposure, development, etching, processing such as peel off, on glass substrate, form black matrix".Form in the operation (step 202) at colored pattern, utilize decoration method, pigment dispersion method, print process, galvanoplastic etc., on glass substrate, form colored pattern.This operation is at the colored pattern of R, G, B and carry out repeatedly.Form in the operation (step 203) at diaphragm, on colored pattern, form diaphragm, form in the operation (step 204), on diaphragm, form ELD at ELD.Before above-mentioned each operation, operation is midway or after the operation, can implement the matting and the drying process of substrate as required.
Use base plate cleaning device of the present invention or substrate-cleaning method and behind the cleaning base plate, develop, etching, soup such as peel off and handle, can clean large substrate equably with high cleaning force thus, on substrate, form circuit pattern or chromatic filter etc. well.Therefore, can make high-quality large substrate.
Claims (4)
1. base plate cleaning device is characterized in that this base plate cleaning device comprises:
Brush is established across the width of substrate, while and rotate and be contacted with substrate;
Travel mechanism relatively moves substrate and described brush; And
The brush maintaining body, described brush maintaining body has:
Clutch shaft bearing rotatably supports an end of the rotating shaft of described brush;
First guider guides this clutch shaft bearing to the direction of principal axis of the rotating shaft of described brush;
Second bearing is provided with respectively with this clutch shaft bearing, and rotatably supports the other end of the rotating shaft of described brush;
Second guider is provided with respectively with this first guider, and guides this second bearing to the direction of principal axis of the rotating shaft of described brush;
This brush maintaining body keeps the two ends of the rotating shaft of described brush to move respectively toward the direction of principal axis of rotating shaft mutually, and makes the direction of principal axis displacement of the past rotating shaft of described brush in the rotation, thereby eliminates the bending of described brush.
2. substrate-cleaning method is characterized in that it comprises:
Brush is set across the width of substrate,
Substrate and described brush are relatively moved,
Utilize a brush maintaining body to carry out following actions, this brush maintaining body has:
Clutch shaft bearing rotatably supports an end of the rotating shaft of described brush;
First guider guides this clutch shaft bearing to the direction of principal axis of the rotating shaft of described brush;
Second bearing is provided with respectively with this clutch shaft bearing, and rotatably supports the other end of the rotating shaft of described brush; And
Second guider is provided with respectively with this first guider, and guides this second bearing to the direction of principal axis of the rotating shaft of described brush,
Utilize this brush maintaining body to keep the two ends of the rotating shaft of described brush to move respectively mutually on one side to the direction of principal axis of rotating shaft, make described brush rotation on one side and make brush be contacted with substrate, so that the described brush in the rotation is toward the direction of principal axis displacement of rotating shaft, thereby eliminate the bending of described brush.
3. the manufacture method of a substrate is characterized in that it uses base plate cleaning device as claimed in claim 1 and behind the cleaning base plate, the soup of stipulating is handled.
4. the manufacture method of a substrate is characterized in that it uses substrate-cleaning method as claimed in claim 2 and behind the cleaning base plate, the soup of stipulating is handled.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006227778A JP4919733B2 (en) | 2006-08-24 | 2006-08-24 | Substrate cleaning apparatus, substrate cleaning method, and substrate manufacturing method |
| JP2006227778 | 2006-08-24 | ||
| JP2006-227778 | 2006-08-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101130187A CN101130187A (en) | 2008-02-27 |
| CN101130187B true CN101130187B (en) | 2011-08-17 |
Family
ID=39127684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101114368A Expired - Fee Related CN101130187B (en) | 2006-08-24 | 2007-06-20 | Substrate cleaning device, substrate cleaning method and substrate manufacture method |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4919733B2 (en) |
| CN (1) | CN101130187B (en) |
| TW (1) | TWI373378B (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7962990B2 (en) * | 2008-10-01 | 2011-06-21 | Applied Materials, Inc. | Brush box cleaner module with force control |
| CN101722476B (en) * | 2008-10-27 | 2012-05-23 | 中芯国际集成电路制造(上海)有限公司 | Chemically mechanical polishing and cleaning machine |
| CN102010140B (en) * | 2010-09-30 | 2012-07-04 | 东莞宏威数码机械有限公司 | Lifting device of roller brush |
| CN102581046A (en) * | 2012-02-06 | 2012-07-18 | 生田（苏州）精密机械有限公司 | Moving mechanism of brush of dry brushing machine |
| US9704729B2 (en) * | 2013-06-13 | 2017-07-11 | K.C. Tech Co., Ltd. | Substrate cleaning apparatus and method and brush assembly used therein |
| JP6279276B2 (en) * | 2013-10-03 | 2018-02-14 | 株式会社荏原製作所 | Substrate cleaning apparatus and substrate processing apparatus |
| CN107159602A (en) * | 2017-05-03 | 2017-09-15 | 深圳市华星光电技术有限公司 | Substrate cleaning apparatus |
| CN108067447B (en) * | 2017-12-13 | 2020-01-17 | 武汉华星光电技术有限公司 | Wiping mechanism and substrate cleaning device |
| CN108480158B (en) * | 2018-03-30 | 2020-12-01 | 宁波高新区神台德机械设备有限公司 | Paint spraying device |
| CN109227294A (en) * | 2018-10-23 | 2019-01-18 | 广东和氏工业技术集团股份有限公司 | Improve the precise polished equipment of frictional force |
| CN111014118A (en) * | 2019-12-28 | 2020-04-17 | 蚌埠中光电科技有限公司 | Displacement adjusting device of liquid crystal substrate cleaning device |
| CN112337829B (en) * | 2020-09-27 | 2022-06-07 | 重庆大学 | Dirt removing device for inner wall of observation window of small gear box |
| JP7329867B2 (en) * | 2021-03-31 | 2023-08-21 | 株式会社サワーコーポレーション | FILM CLEANING APPARATUS AND FILM CLEANING METHOD |
| CN114283686B (en) * | 2021-12-28 | 2023-11-28 | Tcl华星光电技术有限公司 | Manufacturing method of display panel |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1574237A (en) * | 2003-05-30 | 2005-02-02 | 精工爱普生株式会社 | Chemical processing apparatus, chemical processing method, and method for manufacturing circuit substrate |
| CN1778478A (en) * | 2004-10-22 | 2006-05-31 | 芝浦机械电子株式会社 | Substrate processing apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6044542B2 (en) * | 1980-11-14 | 1985-10-04 | 株式会社山武 | Servo type proportional pressure control valve |
| JPH02122100A (en) * | 1988-10-24 | 1990-05-09 | Kokosho Kotetsu Kofun Yugenkoshi | Shiftable brush roll |
| JP2752442B2 (en) * | 1989-06-28 | 1998-05-18 | 三菱電機株式会社 | Visual information processing device |
| JP2004000865A (en) * | 2002-06-03 | 2004-01-08 | Audio Technica Corp | Dust collecting apparatus |
-
2006
- 2006-08-24 JP JP2006227778A patent/JP4919733B2/en not_active Expired - Fee Related
-
2007
- 2007-06-20 CN CN2007101114368A patent/CN101130187B/en not_active Expired - Fee Related
- 2007-06-21 TW TW96122333A patent/TWI373378B/en not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1574237A (en) * | 2003-05-30 | 2005-02-02 | 精工爱普生株式会社 | Chemical processing apparatus, chemical processing method, and method for manufacturing circuit substrate |
| CN1778478A (en) * | 2004-10-22 | 2006-05-31 | 芝浦机械电子株式会社 | Substrate processing apparatus |
Non-Patent Citations (3)
| Title |
|---|
| JP特开2003-334499A 2003.11.25 |
| JP特开平10-337543A 1998.12.22 |
| JP特开平11-216430A 1999.08.10 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101130187A (en) | 2008-02-27 |
| TWI373378B (en) | 2012-10-01 |
| JP4919733B2 (en) | 2012-04-18 |
| TW200810844A (en) | 2008-03-01 |
| JP2008049263A (en) | 2008-03-06 |
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