CN101109903A - 在线监控透镜散光的方法 - Google Patents
在线监控透镜散光的方法 Download PDFInfo
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- CN101109903A CN101109903A CNA2006100290692A CN200610029069A CN101109903A CN 101109903 A CN101109903 A CN 101109903A CN A2006100290692 A CNA2006100290692 A CN A2006100290692A CN 200610029069 A CN200610029069 A CN 200610029069A CN 101109903 A CN101109903 A CN 101109903A
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CN200610029069A CN101109903B (zh) | 2006-07-18 | 2006-07-18 | 在线监控透镜散光的方法 |
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CN200610029069A CN101109903B (zh) | 2006-07-18 | 2006-07-18 | 在线监控透镜散光的方法 |
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CN101109903A true CN101109903A (zh) | 2008-01-23 |
CN101109903B CN101109903B (zh) | 2010-05-12 |
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CN200610029069A Expired - Fee Related CN101109903B (zh) | 2006-07-18 | 2006-07-18 | 在线监控透镜散光的方法 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102591135A (zh) * | 2011-10-12 | 2012-07-18 | 上海华力微电子有限公司 | 一种连续曝光时透镜受热引起图形变化的监控方法 |
CN103517630A (zh) * | 2012-06-18 | 2014-01-15 | Juki株式会社 | 部件检查装置 |
CN110708463A (zh) * | 2019-10-09 | 2020-01-17 | Oppo广东移动通信有限公司 | 对焦方法、装置、存储介质及电子设备 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3774588B2 (ja) * | 1999-04-06 | 2006-05-17 | キヤノン株式会社 | 投影露光装置の波面測定方法、及び投影露光装置 |
EP1434092A1 (en) * | 2002-12-23 | 2004-06-30 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7791727B2 (en) * | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
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2006
- 2006-07-18 CN CN200610029069A patent/CN101109903B/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102591135A (zh) * | 2011-10-12 | 2012-07-18 | 上海华力微电子有限公司 | 一种连续曝光时透镜受热引起图形变化的监控方法 |
CN103517630A (zh) * | 2012-06-18 | 2014-01-15 | Juki株式会社 | 部件检查装置 |
CN110708463A (zh) * | 2019-10-09 | 2020-01-17 | Oppo广东移动通信有限公司 | 对焦方法、装置、存储介质及电子设备 |
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CN101109903B (zh) | 2010-05-12 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131216 |
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Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
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Effective date of registration: 20131216 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corp. Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Hua Hong NEC Electronics Co.,Ltd. |
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