CN101106138A - Nonvolatile memory array having modified channel region interface - Google Patents
Nonvolatile memory array having modified channel region interface Download PDFInfo
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- CN101106138A CN101106138A CNA200710127896XA CN200710127896A CN101106138A CN 101106138 A CN101106138 A CN 101106138A CN A200710127896X A CNA200710127896X A CN A200710127896XA CN 200710127896 A CN200710127896 A CN 200710127896A CN 101106138 A CN101106138 A CN 101106138A
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Abstract
The technology relates to nonvolatile memory with a modified channel region such as a raised source and drain or a recessed channel region.
Description
Technical field
The invention relates to nonvolatile memory, and particularly relevant for the nonvolatile memory with modified channel region interface, modified channel region interface for example is source electrode and the drain electrode or the recessed channel region of lifting.
Background technology
Be called the electrical programmable and the non-volatile memory technologies of can erasing of the charge storing structure of EEPROM and flash memory, be used in various modernizations and use.A plurality of memory units are used by EEPROM and flash memory.When the size of integrated circuit is dwindled, rise gradually based on the importance of the memory unit of charge-trapping dielectric layers, this is because the ability of adjustable dimension and the cause of work simplification.Comprise with industry for example based on the memory unit of charge-trapping dielectric layers and to be called PHINES, the structure of SONOS or NROM.These memory units come storage data by catch electric charge in charge-trapping dielectric layers (for example silicon nitride).When negative electrical charge was captured, the limit voltage of memory cell can increase.The limit voltage of memory cell reduces by removing negative electrical charge from electric charge capture layer.
Known non-volatile nitride single meta structure is the plane, so that oxide-nitride thing-oxide (ONO) structure is formed on the surface of substrate.Yet the structure on this plane has that the ability of micro size is not good, sequencing and erase operation for use power height, and the character of high pellet resistance value.This structure is illustrated in YEH, C.C. wait the people, " PHINES: the flash memory (PHINES:A Novel Low Power Program/Erase, Small Pitch, 2-Bit per Cell Flash Memory) of brand-new low-power sequencing/erase, closely-spaced, single memory cell dibit unit ", the electronic installation meeting, 2002, IEDM ' 02.Digest.International, 8-11, in December, 2002, number of pages: 931-934.
Therefore, need to revise the planar structure of this known non-volatile nitride single meta structure, to handle above-mentioned one or more shortcoming.
Summary of the invention
The present invention is relevant for a kind of nonvolatile memory with modified channel region interface.
According to a first aspect of the invention, propose a kind of Nonvolatile memory unit IC, it comprises charge-trapping structure, source electrode and drain region, and dielectric structure.The logic state that charge-trapping structure store charge is stored by Nonvolatile memory unit IC with control.In various embodiment, this charge-trapping structure stores (bit) or a multidigit.Source area is separated by channel region with the drain region, and channel region is the part of experience counter-rotating with the circuit of electrical connection source electrode and drain region.A plurality of parts of dielectric structure this circuit of electrical isolation under the situation that lacks electric field are to overcome dielectric structure.Dielectric structure to small part between charge-trapping structure and channel region, and to small part between charge-trapping structure and gate-voltage source.
The interface is with the part channel region separation therewith of described one or more dielectric structures.First end at this interface ends at a mid portion of source area, and second end at this interface ends at a mid portion of drain region.
In order to implement this interface, an embodiment is with source area and the drain region lifting substrate from Nonvolatile memory unit IC.In another embodiment, the substrate of the recessed Nonvolatile memory unit IC of this channel region.
According to a second aspect of the invention, propose a kind of manufacture method of Nonvolatile memory unit IC, it comprises following steps:
Form the logic state that the charge-trapping structure comes store charge to be stored by Nonvolatile memory unit IC with control, wherein in various embodiment, the charge-trapping structure stores one or more;
Source area and drain region that formation is separated by channel region; And
Form dielectric structure, its to small part between charge-trapping structure and channel region, and to small part between charge-trapping structure and gate-voltage source.
The part of the one or more dielectric structures of interfacial separation and channel region, and first end at this interface ends at the mid portion of source area, second end at this interface ends at the mid portion of drain region.
In order to implement this interface, an embodiment adds the layer of material substrate of integrated circuit so far, with source area and the drain region lifting substrate from Nonvolatile memory unit IC.Another embodiment forms groove in substrate, so that charge-trapping structure and dielectric structure are formed in this groove.
In other embodiments of the invention, charge storing structure is nanocrystalline structure but not charge-trapping structure.
In other embodiments of the invention, comprise a kind of ONO structure that for example is disclosed in this to the dielectric structure of small part between charge-trapping structure and channel region.
For foregoing of the present invention can be become apparent, preferred embodiment cited below particularly, and cooperate appended diagram, be described in detail below:
Description of drawings
Fig. 1 is the schematic diagram of Nonvolatile memery unit, and Nonvolatile memery unit has type recessed channel between source area and drain region.
Fig. 2 is the schematic diagram of Nonvolatile memery unit, and Nonvolatile memery unit has source area and the drain region of lifting from semiconductor substrate.
Fig. 3 A is in having the Nonvolatile memery unit of type recessed channel, and electronics is injected into the schematic diagram of charge storing structure from grid.
Fig. 3 B is in the Nonvolatile memery unit of source area with lifting and drain region, and electronics is injected into the schematic diagram of charge storing structure from grid.
Fig. 4 A is in having the Nonvolatile memery unit of type recessed channel, and electronics is injected into the schematic diagram of charge storing structure from substrate.
Fig. 4 B is in the Nonvolatile memery unit of source area with lifting and drain region, and electronics is injected into the schematic diagram of charge storing structure from substrate.
Fig. 5 A is in having the Nonvolatile memery unit of type recessed channel, and the interband hot electron is injected into the schematic diagram of charge storing structure.
Fig. 5 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the interband hot electron is injected into the schematic diagram of charge storing structure.
Fig. 6 A is in having the Nonvolatile memery unit of type recessed channel, and channel hot electron is injected into the schematic diagram of charge storing structure.
Fig. 6 B is in the Nonvolatile memery unit of source area with lifting and drain region, and channel hot electron is injected into the schematic diagram of charge storing structure.
Fig. 7 A is in having the Nonvolatile memery unit of type recessed channel, and the substrate heat electronics is injected into the schematic diagram of charge storing structure.
Fig. 7 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the substrate heat electronics is injected into the schematic diagram of charge storing structure.
Fig. 8 A is in having the Nonvolatile memery unit of type recessed channel, and the hole is injected into the schematic diagram of charge storing structure from grid.
Fig. 8 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the hole is injected into the schematic diagram of charge storing structure from grid.
Fig. 9 A is in having the Nonvolatile memery unit of type recessed channel, and the hole is injected into the schematic diagram of charge storing structure from substrate.
Fig. 9 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the hole is injected into the schematic diagram of charge storing structure from substrate.
Figure 10 A is in having the Nonvolatile memery unit of type recessed channel, and the interband hot hole is injected into the schematic diagram of charge storing structure.
Figure 10 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the interband hot hole is injected into the schematic diagram of charge storing structure.
Figure 11 A is in having the Nonvolatile memery unit of type recessed channel, and the raceway groove hot hole is injected into the schematic diagram of charge storing structure.
Figure 11 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the raceway groove hot hole is injected into the schematic diagram of charge storing structure.
Figure 12 A is in having the Nonvolatile memery unit of type recessed channel, and the substrate heat hole is injected into the schematic diagram of charge storing structure.
Figure 12 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the substrate heat hole is injected into the schematic diagram of charge storing structure.
Figure 13 A is in having the Nonvolatile memery unit of type recessed channel, in order to the schematic diagram of the reverse read operation of the data that read the right side that is stored in charge storing structure.
Figure 13 B is in the Nonvolatile memery unit of the source area with lifting and drain region, the schematic diagram of operating in order to the reverse read of the data that read the right side that is stored in charge storing structure.
Figure 14 A is in having the Nonvolatile memery unit of type recessed channel, is positioned at the schematic diagram of reverse read operation of data in the left side of charge storing structure in order to storage.
Figure 14 B is in the Nonvolatile memery unit of the source area with lifting and drain region, is positioned at the schematic diagram that the reverse read of data in the left side of charge storing structure is operated in order to storage.
Figure 15 A is in having the Nonvolatile memery unit of type recessed channel, in order to the schematic diagram of an interband read operation of the data that read the right side that is stored in charge storing structure.
Figure 15 B is in the Nonvolatile memery unit of source area with lifting and drain region, in order to the schematic diagram of an interband read operation of the data that read the right side that is stored in charge storing structure.
Figure 16 A is in having the Nonvolatile memery unit of type recessed channel, is positioned at the schematic diagram of interband read operation of data in the left side of charge storing structure in order to storage.
Figure 16 B is in the Nonvolatile memery unit of source area with lifting and drain region, is positioned at the schematic diagram of interband read operation of data in the left side of charge storing structure in order to storage.
Figure 17 is the manufacturing flow chart with Nonvolatile memory unit array of a type recessed channel, and it shows the various possible combination of the processing step of Figure 19 to 2 figure.
Figure 18 A is the manufacturing flow chart with NOR Nonvolatile memory unit array of the source area of lifting and drain region, and it shows the various possible combination of the processing step of Figure 24 to 27.
Figure 18 B is the manufacturing flow chart with NAND Nonvolatile memory unit array of the source area of lifting and drain region, and it shows the various possible combination of the processing step of Figure 28 to 30.
Figure 19 A to 19C is before Figure 22 or 23, in having the Nonvolatile memery unit of type recessed channel, in order to form the processing step of groove.
Figure 20 A to 20E is before Figure 22 or 23, forms before the groove, in order to the processing step of reduction of gate length in Nonvolatile memery unit.
Figure 21 A to 21E is before Figure 22 or 23, forms in Nonvolatile memery unit before the groove, in order to enlarge the processing step of grid length.
Figure 22 A to 22K is in Figure 19,20 or 21 later process ends steps, and in order to form the NOR Nonvolatile memory unit array, each NOR Nonvolatile memery unit is arranged in groove, so that each Nonvolatile memery unit has type recessed channel.
Figure 23 A to 23E is in Figure 19,20 or 21 later process ends steps, and in order to form the NAND Nonvolatile memory unit array, each NAND Nonvolatile memery unit is arranged in groove, so that each Nonvolatile memery unit has type recessed channel.
Figure 24 A to 24D is the beginning processing step before Figure 25 or 26, in order to the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.
Figure 25 A to 25B is the process ends step after Figure 24 and Figure 27 before, and its use epitaxial silicon is with the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.
Figure 26 A to 26C is the process ends step after Figure 24 and Figure 27 before, and its use polysilicon is with the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.
Figure 27 A to 27D is the process ends step before Figure 25 or 26, and in order to form the NOR Nonvolatile memory unit array, each NOR Nonvolatile memery unit all has the source area and the drain region of lifting.
Figure 28 A to 28D is the beginning processing step before Figure 29 or 30, and in order to form the NAND Nonvolatile memory unit array, each NAND Nonvolatile memery unit has the source area and the drain region of lifting.
Figure 29 A to 29B is in the later process ends step of Figure 28, and it uses epitaxial silicon to form the NAND Nonvolatile memory unit array, and each NAND Nonvolatile memery unit all has the source area and the drain region of lifting.
Figure 30 A to 30C is in the later process ends step of Figure 28 figure, and it uses polysilicon to form the NAND Nonvolatile memory unit array, and each NAND Nonvolatile memery unit all has the source area and the drain region of lifting.
Figure 31 is the calcspar that has as the illustrative nonvolatile memory integrated circuit of the modified channel region interface that is disclosed in this.
Figure 32 makes down dielectric structure have three layers of thin ONO structure for have the schematic diagram of the Nonvolatile memery unit of type recessed channel between source area and drain region thus.
Figure 33 has the schematic diagram of lifting from the Nonvolatile memery unit of the source area of semiconductor substrate and drain region, makes down dielectric structure have three layers of thin ONO structure thus.
Description of reference numerals
102,302,402,502,602,702,802,902,1002,1102,1202,1302,1402,1502,1602,2264,2722: grid/gate regions
104: dielectric structure
106: charge storing structure
108: charge storing structure/dielectric structure
110,210,304,404,804,904,1204,2280,2380,2560,2660,2960,3060: source electrode/source area
112,212,306,406,806,906,1206,2282,2382,2562,2662,2962,3062: drain region/drain electrode
114,214: channel region/raceway groove
116: source electrode and drain region
118: the interface
120: junction depth
122: body/this tagma
208: dielectric structure
218: the interface
220: junction depth
308,408,808,908,1208: this tagma
504,1104:p+ type source area
506,1106:p+ type drain region
508,708, this tagma of 1108:N type
604,704,1004,1304,1404,1504,1604:n+ type source area
606,706,1006,1306,1406,1506,1606:n+ type drain region
608,1008,1308,1408,1508, this tagma of 1608:P type
710,1210: well region
1900,2400,2800: substrate
1910,1912,2112,2290,2772: oxide
1922: photoresist
1930,1932,2232: groove
2040,2042,2440,2840: clearance wall
2250: dielectric material and charge storing structure
2260,2262: grid material
2270,2272: dielectric material
2410: dielectric material and charge storing structure
2412：ONO
2420,2650,2652,2820,3050,3052: polysilicon
The 2430:SiN/ oxide
2442,2842: the clearance wall sidewall
2550,2950: epitaxial silicon
2810: charge storing structure
2812：ONO
3100: memory array
3101: column decoder
3102: word line
3103: row decoder
3104: bit line
3105: bus-bar
3106: sensing amplifier and data input structure
3107: the data bus-bar
3108: bias arrangement supply voltage
3109: the bias arrangement state machine
3111: Data In-Line
3115: DOL Data Output Line
3150: integrated circuit
The 3208:ONO structure
Embodiment
Fig. 1 is the schematic diagram of Nonvolatile memery unit, and Nonvolatile memery unit has recessed raceway groove between source area and drain region.
Grid 102 is the word line of part in most embodiment, has grid voltage Vg.In certain embodiments, grid structure comprises material, and its work function is greater than the intrinsic work function of N type silicon, or greater than about 4.1eV, and preferably greater than about 4.25eV, for example greater than about 5eV.Representational grid material comprises P type polysilicon, titanium nitride, platinum and other high-work-function metals and material.The other materials with quite high work function that is fit to embodiments of the invention comprises: metal, and it is including but not limited to ruthenium (Ru), iridium (Ir), nickel (Ni) and cobalt (Co); Metal alloy, it is including but not limited to ruthenium-titanium and Ni-Ti; Metal nitride; And metal oxide, it is including but not limited to ruthenium-oxide (RuO
2).The high work function grid material produces the injection barrier of the electron tunneling extremely more higher than typical N type polysilicon bar.Have silicon dioxide as the injection barrier of the N type polysilicon bar utmost point of outer dielectric layer about 3.15eV.Therefore, embodiments of the invention use for grid and use and the material of using for outer dielectric layer, have an injection barrier, and it is higher than about 3.15eV, for example is higher than about 3.4eV, and preferably is higher than about 4eV.About having the P type polysilicon bar utmost point of the outer dielectric layer of silicon dioxide, its injection barrier approximately is 4.25eV, and for the unit with the N type polysilicon bar utmost point that contains the outer dielectric layer of silicon dioxide, the threshold values of the convergence unit that is produced is reduced about 2 volts.
The top edge of source electrode and drain region 116 is higher than the interface 118 between raceway groove 114 and dielectric structure 108.Yet, above the interface 118 between raceway groove 114 and the dielectric structure 108 maintains the lower limb of source electrode and drain region.Therefore, the zone line of source area 110 and drain region 112 is ended at the interface 118 between raceway groove 114 and dielectric structure 108.
Fig. 2 is the schematic diagram of a Nonvolatile memery unit, and Nonvolatile memery unit has source area and the drain region of lifting from semiconductor substrate.The Nonvolatile memery unit of Fig. 1 and Fig. 2 comes down to similarly.Yet the top edge of source area 210 and drain region 212 is positioned at the top of the top edge in this tagma 122.Therefore, the Nonvolatile memery unit of Fig. 2 is the source electrode of lifting and the embodiment of drain electrode.The zone line of source area 210 and drain region 212 is still ended at interface 218 between raceway groove 214 and dielectric structure 208.Source area 210 and drain region 212 be characterized as junction depth 220.
Fig. 3 A is in having the Nonvolatile memery unit of type recessed channel, and electronics is injected into the schematic diagram of charge storing structure from grid.
Fig. 3 B is in the Nonvolatile memery unit of source area with lifting and drain region, and electronics is injected into the schematic diagram of charge storing structure from grid.The bias arrangement of Fig. 3 B is similar to Fig. 3 A.
Fig. 4 A is in having the Nonvolatile memery unit of type recessed channel, and electronics is injected into the schematic diagram of charge storing structure from substrate.
Fig. 4 B is in the Nonvolatile memery unit of source area with lifting and drain region, and electronics is injected into the schematic diagram of charge storing structure from substrate.The bias arrangement of Fig. 4 B is similar to Fig. 4 A.
Fig. 5 A is in having the Nonvolatile memery unit of type recessed channel, and interband (band-to-band) hot electron is injected into the schematic diagram of charge storing structure.
Fig. 5 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the interband hot electron is injected into the schematic diagram of charge storing structure.The bias arrangement of Fig. 5 B is similar to Fig. 5 A.
Fig. 6 A is in having the Nonvolatile memery unit of type recessed channel, and channel hot electron is injected into the schematic diagram of charge storing structure.
Fig. 6 B is in the Nonvolatile memery unit of source area with lifting and drain region, and channel hot electron is injected into the schematic diagram of charge storing structure.The bias arrangement of Fig. 6 B is similar to Fig. 6 A.
Fig. 7 A is in having the Nonvolatile memery unit of type recessed channel, and the substrate heat electronics is injected into the schematic diagram of charge storing structure.
Gate regions 702 has the grid voltage Vg of 10V.N+ type source area 704 has the source voltage Vs of 0V.N+ type drain region 706 has the drain voltage Vd of 0V.This tagma 708 of N type has-the bulk voltage Vb of 6V.P type well region 710 has-the trap voltage Vw of 5V.Source area 704 is arranged in this well region 710 with drain region 706, and well region 710 is arranged in this tagma 708.
Fig. 7 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the substrate heat electronics is injected into the schematic diagram of charge storing structure.The bias arrangement of Fig. 7 B is similar to Fig. 7 A.
Fig. 8 A is in having the Nonvolatile memery unit of type recessed channel, and the hole is injected into the schematic diagram of charge storing structure from grid.
Fig. 8 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the hole is injected into the schematic diagram of charge storing structure from grid.The bias arrangement of Fig. 8 B is similar to Fig. 8 A.
Fig. 9 A is in the Nonvolatile memery unit of tool type recessed channel, and the hole is injected into the schematic diagram of charge storing structure from substrate.
Fig. 9 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the hole is injected into the schematic diagram of charge storing structure from substrate.The bias arrangement of Fig. 9 B is similar to Fig. 9 A.
Figure 10 A is in having the Nonvolatile memery unit of type recessed channel, and the interband hot hole is injected into the schematic diagram of charge storing structure.
Figure 10 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the interband hot hole is injected into the schematic diagram of charge storing structure.The bias arrangement of Figure 10 B is similar to Figure 10 A.
Figure 11 A is in having the Nonvolatile memery unit of type recessed channel, and the raceway groove hot hole is injected into the schematic diagram of charge storing structure.
Figure 11 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the raceway groove hot hole is injected into the schematic diagram of charge storing structure.The bias arrangement of Figure 11 B is similar to Figure 11 A.
Figure 12 A is in having the Nonvolatile memery unit of type recessed channel, and the substrate heat hole is injected into the schematic diagram of charge storing structure.
Figure 12 B is in the Nonvolatile memery unit of source area with lifting and drain region, and the substrate heat hole is injected into the schematic diagram of charge storing structure.The bias arrangement of Figure 12 B is similar to Figure 12 A.
Figure 13 A is in having the Nonvolatile memery unit of type recessed channel, in order to the schematic diagram of the reverse read operation of the data that read the right side that is stored in charge storing structure.
Figure 13 B is in the Nonvolatile memery unit of the source area with lifting and drain region, the schematic diagram of operating in order to the reverse read of the data that read the right side that is stored in charge storing structure.The bias arrangement of Figure 13 B is similar to Figure 13 A.
Figure 14 A is in having the Nonvolatile memery unit of type recessed channel, is positioned at the schematic diagram of reverse read operation of data in the left side of charge storing structure in order to storage.
Figure 14 B is in the Nonvolatile memery unit of the source area with lifting and drain region, is positioned at the schematic diagram that the reverse read of data in the left side of charge storing structure is operated in order to storage.The bias arrangement of Figure 14 B is similar to Figure 14 A.
Figure 15 A is in having the Nonvolatile memery unit of type recessed channel, in order to the schematic diagram of an interband read operation of the data that read the right side that is stored in charge storing structure.
Figure 15 B is in the Nonvolatile memery unit of source electrode with lifting and drain region, in order to the schematic diagram of an interband read operation of the data that read the right side that is stored in charge storing structure.The bias arrangement of Figure 15 B is similar to Figure 15 A.
Figure 16 A is in having the Nonvolatile memery unit of type recessed channel, is positioned at the schematic diagram of interband read operation of data in the left side of charge storing structure in order to storage.
Figure 16 B is in the Nonvolatile memery unit of source area with lifting and drain region, is positioned at the schematic diagram of interband read operation of data in the left side of charge storing structure in order to storage.The bias arrangement of Figure 16 B is similar to Figure 16 A.
Because the cause of the vertical and transverse electric field of combination, the interband electric current of the non-volatile memory cell structure of flowing through is with the charge storage state of the specific part of high accuracy decision charge storing structure.Bigger vertical and transverse electric field causes bigger interband electric current.A kind of bias arrangement is applied to various terminal, so that these band curvatures are to being enough to produce the interband electric current in non-volatile memory cell structure, to remain in the potential difference between the Nonvolatile memery unit node simultaneously enough low so that sequencing or erase can not produce.
In the example of bias arrangement, non-volatile memory cell structure by reverse bias, produces the knot of reverse bias with respect to active source area or drain region and this tagma.In addition, the voltage of grid structure causes these band curvatures to become to be enough to make the interband tunnelling to produce via non-volatile memory cell structure.High-dopant concentration in the non-volatile memory cell structure node (being source area or drain region in the embodiment of majority) therein.Wherein this structure node has the high charge density of the space charge region that is produced, and the voltage change of this space charge region in short distance, helps to produce rapid band curvature.The electronics that is positioned at this valence band on the side of knot of reverse bias is worn to the conduction band on the opposite side of the knot of reverse bias then via forbidden gap, and drifts to potential energy mound (potential hill) downwards, the N type node of more deep knot to reverse bias.Similarly, the potential energy mound is crossed in hole drift, away from the N type node of the knot of reverse bias, and towards the P type node of the knot of reverse bias.
The voltage control of gate regions is positioned near the voltage of part of the knot of the reverse bias the charge storing structure.When the voltage of grid structure becomes when more negative, the voltage of this part of knot that is positioned near the reverse bias of charge storing structure becomes more negative, causes the darker band curvature in the diode structure.Because the result of some combination at least of following (1) and (2), more interband electric currents can flow: (1) is cumulative lap between the electron energy level that is not occupied of the opposite side of electron energy level that the quilt of a side of bending energy band occupies and bending energy band; And (2) are by the narrower and small width (Sze, Physics of Semiconductor Devices, 1981) that blocks between the electron energy level that occupied and the electron energy level that do not occupied.
The clean negative or clean positive charge that is stored on the charge storing structure further influences the band curvature degree.According to Gauss law, when negative voltage is applied to gate regions with respect to the knot of reverse bias, experienced by part near the knot of the reverse bias of the part of charge storing structure with quite high net negative charge than highfield.Similarly, when positive voltage is applied to gate regions with respect to the knot of reverse bias, experienced by part near the knot of the reverse bias of the part of charge storing structure with quite high clean positive charge than highfield.
Demonstrate prudent balance about the different bias arrangement that reads and about sequencing and the bias arrangement of erasing.About reading, the substantial number that the potential difference between the tubercle point of reverse bias should not cause charge carrier by a dielectric material to charge storing structure and influence charge storage state (that is, programmable logical position standard).In comparison, about sequencing with erase, the potential difference between the tubercle point of reverse bias is enough to cause the substantial number of charge carrier to inject by a dielectric material and by the interband hot carrier influences charge storage state.
Figure 17 is the manufacturing flow chart with Nonvolatile memory unit array of type recessed channel, and it shows the various possible combination of the processing step of Figure 19 to 23.Figure 17 discloses following handling process combination: Figure 19 and 22; Figure 19 and 23; Figure 20 and 22; Figure 20 and 23; Figure 21 and 22; And Figure 21 and 23.These combinations are accompanied by back-end processing.
Figure 18 A and 18B are the manufacturing flow chart with Nonvolatile memory unit array of the source area of lifting and drain region.
Figure 18 A is the manufacturing flow chart with NOR Nonvolatile memory unit array of the source area of lifting and drain region, and it shows the various possible combination of the processing step of Figure 24 to 27.Figure 18 A discloses following handling process combination: Figure 24,25 and 27; And Figure 24,26 and 27.These combinations are accompanied by back-end processing.
Figure 18 B is the manufacturing flow chart with NAND Nonvolatile memory unit array of the source area of lifting and drain region, and it shows the various possible combination of the processing step of Figure 28 to 30.Figure 18 B discloses following handling process combination: Figure 28 and 29; And Figure 28 and 30.These combinations are accompanied by back-end processing.
Figure 19 A to 19C is before Figure 22 or 23, in the Nonvolatile memery unit with the raceway groove that is carved with groove, in order to form the processing step of groove.In Figure 19 A, oxide 1910 is deposited on the substrate 1900.Photoresist is deposited and carves with pattern, and is carved several parts that remove oxide with the photoresist of pattern in order to foundation photoresist pattern.In Figure 19 B, the residual residual oxide 1912 of photoresist 1922 protections.Residual photoresist is removed, and the substrate that not oxidized thing covers is etched.In Figure 19 C, groove 1930 is etched in the substrate 1900 of not oxidized thing 1912 coverings.
Figure 20 A to 20E is before Figure 22 or 23, forms before the groove, in order to the processing step of reduction of gate length in Nonvolatile memery unit.Figure 20 A to 20E is before Figure 22 or 23, in order to the processing step of reduction of gate length before the formation groove in Nonvolatile memery unit.Figure 20 A to 20C is similar to Figure 19 A to 19C.In Figure 20 D, clearance wall 2040 deposits so far in the groove, and is residual down than minor groove 1932.In Figure 20 E, the clearance wall part on side, the bottom of groove is etched, residual clearance wall 2042 down.This kind grid length dwindles the less grid length that can stay compared to Figure 19.
Figure 21 A to 21E is before Figure 22 or 23, forms in Nonvolatile memery unit before the groove, in order to enlarge the processing step of grid length.Figure 21 A to 21B is similar to Figure 19 A to 19B.In Figure 21 C, the residual photoresist of being carved with pattern is removed, and exposes the oxide 1912 of patterning.In Figure 21 D, the oxide of this patterning is etched, the residual oxide 2112 of less patterning down.In Figure 21 E, groove 2132 is etched recessed to the substrate 1900 of not oxidized thing 2112 coverings.The adjustment of this kind grid length ratio can stay the long grid length compared to Figure 19.
Figure 22 A to 22K is in Figure 19,20 or 21 later process ends steps, and in order to form the NOR Nonvolatile memory unit array, each NOR Nonvolatile memery unit is arranged in groove, so that each Nonvolatile memery unit has type recessed channel.In Figure 22 A, for example the dielectric material of ONO layer and charge storing structure 2250 are formed in the groove, thereby residual down than minor groove 2232.In Figure 22 B, deposit for example grid material 2260 of polysilicon.In Figure 22 C, grid material is etched, thereby residual grid material 2262 down is in the inside of groove.In Figure 22 D, for example the dielectric material 2270 of SiN is deposited on the grid material 2262.In Figure 22 E, this dielectric material is etched, and residual dielectric material 2272 down is in the inside of groove.In Figure 22 F, the oxide of residual patterning is removed.Point at this moment, grid material 2262 rise with piling up of oxide 2272 and are higher than the surface of substrate.In Figure 22 G, ion implantation forms source area 2280 and drain region 2282.In Figure 22 H, deposit for example oxide 2290 of HDP oxide.In Figure 22 I, for example by CMP, return and to soak (dip-back) or to eat-back the oxide of the surplus that removes capping oxide 2272.In Figure 22 J, remove oxide 2272.In Figure 22 K, deposition additional gate material and form gate regions 2264.
Figure 23 A to 23E is in Figure 19,20 or 21 later process ends steps, and in order to form the NAND Nonvolatile memory unit array, each NAND Nonvolatile memery unit is arranged in groove, so that each Nonvolatile memery unit has type recessed channel.In Figure 23 A, for example the dielectric material of ONO layer and charge storing structure 2250 are formed in the groove, thereby residual down than minor groove 2232.In Figure 23 B, deposit for example grid material 2260 of polysilicon.In Figure 23 C, superfluous grid material for example is removed by CMP, thereby exposes the ONO layer.In Figure 23 D, the oxide of residual patterning is removed.Point at this moment, grid material 2262 rise and are higher than the surface of substrate.In Figure 23 E, ion implantation forms source area 2380 and drain region 2382.
Figure 24 A to 24D is the beginning processing step before Figure 25 or 26, in order to the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.In Figure 24 A, for example the dielectric material of ONO layer and charge storing structure 2410 are deposited on the substrate 2400.In Figure 24 B, deposit for example grid material of polysilicon, for example the oxide material of SiN is deposited on the grid material, and forms photoetching (photolithographic) structure, and residual SiN 2430 down, polysilicon 2420 pile up with ONO's 2412.In Figure 24 C, form clearance wall 2440.In Figure 24 D, etched gap wall, and residual clearance wall sidewall 2442 down.
Figure 25 A to 25B is the process ends step after Figure 24 and Figure 27 before, and its use epitaxial silicon is with the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.In Figure 25 A, deposition epitaxial silicon 2550.In Figure 25 B, ion implantation forms source area 2560 and drain region 2562.
Figure 26 A to 26C is the process ends step after Figure 24 and Figure 27 before, and its use polysilicon is with the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.In Figure 26 A, deposit spathic silicon 2650.In Figure 26 B, eat-back this polysilicon to stay polysilicon 2652.In Figure 26 C, ion implantation forms source area 2660 and drain region 2662.
Figure 27 A to 27D is the process ends step before Figure 25 or 26, and in order to form the NOR Nonvolatile memory unit array, each NOR Nonvolatile memery unit all has the source area and the drain region of lifting.In Figure 27 A, deposit for example dielectric material of HDP oxide, and cover the structure that comprises clearance wall sidewall and oxide 2430.In Figure 27 B, for example by CMP, return and to soak (dip-back) or to eat-back the oxide of the surplus that removes capping oxide 2430, and residual oxide 2772 down is around the clearance wall sidewall.In Figure 27 C, remove oxide 2430.In Figure 27 D, deposition additional gate material is to form gate regions 2722.
Figure 28 A to 28D is the beginning processing step before Figure 29 or 30, and in order to form the NAND Nonvolatile memory unit array, each NAND Nonvolatile memery unit has the source area and the drain region of lifting.In Figure 28 A, for example the dielectric material of ONO layer and charge storing structure 2810 are deposited on the substrate 2800.In Figure 28 B, deposit for example grid material of polysilicon, form photolithographic structures, and the piling up of residual polysilicon 2820 down and ONO 2812.In Figure 28 C, form clearance wall 2840.At Figure 28 D, etching this gap wall, and residual clearance wall sidewall 2842 down.
Figure 29 A to 29B is in the later process ends step of Figure 28, and it uses epitaxial silicon to form the NAND Nonvolatile memory unit array, and each NAND Nonvolatile memery unit all has the source area and the drain region of lifting.In Figure 29 A, deposition epitaxial silicon 2950.In Figure 29 B, ion implantation forms source area 2960 and drain region 2962.
Figure 30 A to 30C is in the later process ends step of Figure 28, and it uses polysilicon to form the NAND Nonvolatile memory unit array, and each NAND Nonvolatile memery unit all has the source area and the drain region of lifting.Figure 30 A to 30C is the process ends step after Figure 24 and Figure 27 before, and its use polysilicon is with the source area and the drain region of the lifting that is formed on the Nonvolatile memery unit in the NOR array.In Figure 30 A, deposit spathic silicon 3050.In Figure 30 B, eat-back polysilicon to stay polysilicon 3052.In Figure 30 C, ion implantation forms source area 3060 and drain region 3062.
Figure 31 is the calcspar that has as the illustrative nonvolatile memory integrated circuit of the modified channel region interface that is disclosed in this.
Integrated circuit 3150 comprises the memory array 3100 that is positioned at the Nonvolatile memery unit on the semiconductor substrate.Each memory cell of array 3100 has modified channel region interface, the source area in for example type recessed channel district, or lifting and drain region.The memory cell of array 3100 may be other unit, and it is interconnected into an array, or is interconnected into poly array.Column decoder 3101 is connected to many word lines 3102, and it is along the row configuration of memory array 3100.Row decoder 3103 is connected to multiple bit lines 3104, and it is along the row configuration of memory array 3100.Address on bus-bar 3105 provides to row decoder 3103 and column decoder 3101.Sensing amplifier and data input structure 3106 are connected to row decoder 3103 via data bus-bar 3107.Data are via Data In-Line 3111, and the I/O port from the integrated circuit 3150, or from the data input structure to the square 3106 is provided in the inside of integrated circuit 3150 or other outside data sources.Data provide I/O port to the integrated circuit 3150 via DOL Data Output Line 3115 from the sensing amplifier on the square 3106, or provide to inside or other outside datum targets at integrated circuit 3150.Applying of bias arrangement state machine 3109 control bias arrangement supply voltages 3108 (for example erase and confirm to confirm voltage) with sequencing, and in order to sequencing, the configuration of erasing and reading memory cell.
Figure 32 makes down dielectric structure have three layers of thin ONO structure for have the schematic diagram of the Nonvolatile memery unit of type recessed channel between source electrode and drain region thus.The Nonvolatile memery unit of this similar Fig. 1, but this dielectric structure 108 (between charge storing structure 108 and channel region 114) is replaced by three layers of thin ONO structure 3208.ONO structure 3208 has little tunneled holes potential barrier, for example is less than or equals about 4.5eV, or preferably be less than or equal about 1.9eV.The approaching illustrative thickness range of ONO structure 3208 is as follows.About descending oxide:＜20 dusts, the 5-20 dust, or＜15 dusts.Nitride about the centre:＜20 dusts or 10-20 dust.About last oxide:＜20 dusts or 15-20 dust.Some embodiment of the memory cell of Figure 32 with SONONOS or band gap engineering (bandgapengineered, BE)-SONOS represents.The additional detail of the various embodiment of the thin ONO structure 3208 of three floor is disclosed in U.S. patent application case number 11/324,540, and it incorporates into for referencial use in this.
Figure 33 has the schematic diagram of lifting from the Nonvolatile memery unit of the source area of semiconductor substrate and drain region, makes down dielectric structure have three layers of thin ONO structure 3208 thus.
In sum, though the present invention discloses as above with a preferred embodiment, so it is not in order to limit the present invention.The persons of ordinary skill in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking appended the claim person of defining.
The present invention advocates that inventor Liao Yi beautiful jade is in the United States Patent (USP) provisional application case of on July 10th, 2006 application number 60/806,840 priority, the name of this case is called groove channel non-volatile memory cellular construction, manufacture method and method of operation (Recess-Channel Non-Volatile Memory Cell Structure, Manufacturing Methods and Operating Methods).
Claims (28)
1. Nonvolatile memory unit IC comprises:
The charge-trapping structure is used for store charge with the logic state of control by this Nonvolatile memory unit IC storage;
Separate with channel region source area and drain region; And
One or more dielectric structures, to small part between this charge-trapping structure and this channel region, and to small part between this charge-trapping structure and gate-voltage source,
The wherein part of these one or more dielectric structures of interfacial separation and this channel region, first end at this interface ends at the mid portion of this source area, and second end at this interface ends at the mid portion of this drain region.
2. circuit as claimed in claim 1, wherein because the substrate of this Nonvolatile memory unit IC is left in this source area and this drain region by lifting, make this first end at this interface end at the mid portion of this source area, and this second end at this interface end at the mid portion of this drain region.
3. circuit as claimed in claim 1, wherein because the substrate of recessed this Nonvolatile memory unit IC of this channel region, make this first end at this interface end at the mid portion of this source area, and this second end at this interface end at the mid portion of this drain region.
4. circuit as claimed in claim 1, wherein this charge-trapping structure stores one.
5. circuit as claimed in claim 1, wherein this charge-trapping structure stores multidigit.
6. circuit as claimed in claim 1 wherein comprises to small part this dielectric structure between this charge-trapping structure and this channel region:
Following silicon oxide layer;
Middle silicon nitride layer is positioned on this time silicon oxide layer; And
Last silicon oxide layer is positioned on this centre silicon nitride layer.
7. circuit as claimed in claim 6, wherein this time silicon oxide layer has the thickness of the thickness that is less than about 20 dusts, about 5 to 20 dusts or is less than the thickness of about 15 dusts.
8. circuit as claimed in claim 6, wherein this centre silicon nitride layer has the thickness that is less than about 20 dusts or the thickness of about 10 to 20 dusts.
9. circuit as claimed in claim 6 wherein should be gone up silicon oxide layer and have the thickness that is less than about 20 dusts or the thickness of about 15 to 20 dusts.
10. the manufacture method of a Nonvolatile memory unit IC comprises following steps:
Form the charge-trapping structure and come store charge, with the logic state of control by this Nonvolatile memory unit IC storage;
Source area and drain region that formation is separated by channel region; And
Form one or more dielectric structures, described one or more dielectric structures to small part between this charge-trapping structure and this channel region, and to small part between this charge-trapping structure and gate-voltage source,
The wherein part of the described one or more dielectric structures of interfacial separation and this channel region, first end at this interface ends at the mid portion of this source area, and second end at this interface ends at the mid portion of this drain region.
11. method as claimed in claim 10, wherein this formation step of these source electrodes and drain region comprises:
Add the substrate of layer of material, so that this substrate of this Nonvolatile memory unit IC is left in described source electrode and drain region by lifting to this integrated circuit.
12. method as claimed in claim 10 also comprises following steps;
In substrate, form groove, so that this formation step of this formation step of this charge-trapping structure and described one or more dielectric structures betides in this groove.
13. method as claimed in claim 10, wherein this charge-trapping structure stores one.
14. method as claimed in claim 10, wherein this charge-trapping structure stores multidigit.
15. method as claimed in claim 10, wherein this formation step to this dielectric structure of small part between this charge-trapping structure and this channel region comprises:
Form silicon oxide layer down;
Silicon nitride layer is on this time silicon oxide layer in the middle of forming; And
Silicon oxide layer is on this centre silicon nitride layer in the formation.
16. method as claimed in claim 15, wherein this time silicon oxide layer has the thickness of the thickness that is less than about 20 dusts, about 5 to 20 dusts or is less than the thickness of about 15 dusts.
17. method as claimed in claim 15, wherein this centre silicon nitride layer has the thickness that is less than about 20 dusts or the thickness of about 10 to 20 dusts.
18. method as claimed in claim 15 wherein should go up silicon oxide layer and have the thickness that is less than about 20 dusts or the thickness of about 15 to 20 dusts.
19. a Nonvolatile memory unit IC comprises:
Nanocrystalline structure is used for store charge with the logic state of control by this Nonvolatile memory unit IC storage;
Source area and drain region, it is separated by channel region; And
One or more dielectric structures, its to small part between this nanocrystalline structure and this channel region, and to small part between this nanocrystalline structure and gate-voltage source,
The wherein part of the described one or more dielectric structures of interfacial separation and this channel region, first end at this interface ends at the mid portion of this source area, and second end at this interface ends at the mid portion of this drain region.
20. circuit as claimed in claim 19, wherein because a substrate of this Nonvolatile memory unit IC is left in this source area and this drain region by lifting, make this first end at this interface end at the mid portion of this mid portion source area, and this second end at this interface end at the mid portion of this drain region.
21. circuit as claimed in claim 19, wherein because the substrate of recessed this Nonvolatile memory unit IC of this channel region, make this first end at this interface end at the mid portion of this source area, and this second end at this interface end at the mid portion of this drain region.
22. circuit as claimed in claim 19, wherein this nanocrystalline structure stores one.
23. circuit as claimed in claim 19, wherein this nanocrystalline structure stores multidigit.
24. the manufacture method of a Nonvolatile memory unit IC comprises following steps:
Form nanocrystalline structure and come store charge, with the logic state of control by this Nonvolatile memory unit IC storage;
Source area and drain region that formation is separated by channel region; And
Form one or more dielectric structures, its to small part between this nanocrystalline structure and this channel region, and to small part between this nanocrystalline structure and gate-voltage source,
The wherein part of the described one or more dielectric structures of interfacial separation and this channel region, first end at this interface ends at the mid portion of this source area, and second end at this interface ends at the mid portion of this drain region.
25. method as claimed in claim 24, wherein this formation step of this source area and this drain region comprises:
Add the substrate of layer of material, so that this substrate of this Nonvolatile memory unit IC is left in this source area and drain region by lifting to this integrated circuit.
26. method as claimed in claim 24 also comprises following steps:
In substrate, form groove, so that this formation step of this formation step of this nanocrystalline structure and described one or more dielectric structures betides in this groove.
27. method as claimed in claim 24, wherein this nanocrystalline structure stores one.
28. method as claimed in claim 24, wherein this nanocrystalline structure stores multidigit.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US80684006P | 2006-07-10 | 2006-07-10 | |
| US60/806,840 | 2006-07-10 |
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| CN2010105216019A Division CN102064198A (en) | 2006-07-10 | 2007-07-10 | Nonvolatile memory cell integrated circuit and manufacturing method thereof |
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| CN2010105216019A Pending CN102064198A (en) | 2006-07-10 | 2007-07-10 | Nonvolatile memory cell integrated circuit and manufacturing method thereof |
| CN201010521342XA Pending CN102097127A (en) | 2006-07-10 | 2007-07-10 | Operating method of nonvolatile memory with variable raceway channel region interface |
| CNA2007101278955A Pending CN101106137A (en) | 2006-07-10 | 2007-07-10 | Operation method of nonvolatile memory having modified channel region interface |
| CNA2007101278974A Pending CN101106139A (en) | 2006-07-10 | 2007-07-10 | Nonvolatile memory having raised source and drain regions |
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| CNA2007101278955A Pending CN101106137A (en) | 2006-07-10 | 2007-07-10 | Operation method of nonvolatile memory having modified channel region interface |
| CNA2007101278974A Pending CN101106139A (en) | 2006-07-10 | 2007-07-10 | Nonvolatile memory having raised source and drain regions |
| CNA2007101278940A Pending CN101106136A (en) | 2006-07-10 | 2007-07-10 | Nonvolatile memory unit IC and its making method |
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| CN103915483A (en) * | 2012-12-28 | 2014-07-09 | 瑞萨电子株式会社 | Field effect transistor with channel core modified to reduce leakage current and method of fabrication |
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| CN102891184B (en) * | 2011-07-19 | 2017-03-01 | 联华电子股份有限公司 | Nonvolatile memory with and preparation method thereof |
| TWI514551B (en) * | 2013-05-15 | 2015-12-21 | Toshiba Kk | Nonvolatile memory device |
| CN109545792B (en) * | 2018-11-29 | 2022-01-04 | 上海华力微电子有限公司 | SONOS storage structure and manufacturing method thereof |
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| TW200807726A (en) | 2008-02-01 |
| TWI360201B (en) | 2012-03-11 |
| CN101106137A (en) | 2008-01-16 |
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| TWI364112B (en) | 2012-05-11 |
| TWI336941B (en) | 2011-02-01 |
| TWI349337B (en) | 2011-09-21 |
| TW200805575A (en) | 2008-01-16 |
| TWI365512B (en) | 2012-06-01 |
| TW200805637A (en) | 2008-01-16 |
| CN101106139A (en) | 2008-01-16 |
| CN102064198A (en) | 2011-05-18 |
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| TW201218320A (en) | 2012-05-01 |
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