CN101101448A - Light spot energy barycenter rectification module and its measurement method and device - Google Patents
Light spot energy barycenter rectification module and its measurement method and device Download PDFInfo
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- CN101101448A CN101101448A CNA2007100424189A CN200710042418A CN101101448A CN 101101448 A CN101101448 A CN 101101448A CN A2007100424189 A CNA2007100424189 A CN A2007100424189A CN 200710042418 A CN200710042418 A CN 200710042418A CN 101101448 A CN101101448 A CN 101101448A
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Abstract
The invention discloses a facula energy barycenter correction module and an energy measuring method and device of using the facula energy barycenter correction module. And the module comprises beam splitter and split beam image inverter. And the module can eliminate the measure errors caused by position variation of inner energy barycenter of detection facula generated by inequal local reflectivity of the tested object from some position measuring systems, thus improving accuracy, repeatability, and adaptability to tested objects and linearity of the position measuring system.
Description
Technical field
The present invention relates to measuring method and the device of a kind of light spot energy barycenter rectification module and the carrying out of using this light spot energy barycenter rectification module, especially for eliminating in some position measuring system because measurand local reflectance inequality or variation cause light spot energy barycenter rectification module, focusing leveling measuring method and the device thereof of measuring error.
Background technology
Litho machine is one of visual plant of producing of large scale integrated circuit, and as shown in Figure 1, its function is to make figure on the mask plate 1 transfer to silicon chip 5 by a certain percentage by optical imaging system 2 (to comprise substrate, plated film and photoresist; Make a general reference all objects that is exposed here) on.Wherein 3a, 3b are focusing and leveling measuring system, it mainly is responsible for measuring the surface position information of silicon chip 5, so that with the work stage 4 of carrying silicon chip 5 zone that is exposed of silicon chip 5 is within the depth of focus of litho machine imaging system, and the figure on the mask plate 1 is transferred on the silicon chip 5 ideally always.
Along with improving constantly depth of focus, the resolution of litho machine constantly reduces, measuring accuracy to litho machine interior focusing leveling system is also more and more higher with the requirement that can measure measurement performances such as exposure area in real time, the focusing leveling measuring method that is adopted in the step-by-step scanning photo-etching device of main flow is the method for utilizing photoeletric measuring system to measure at present, as: based on the Morie fringe of grating and the photoelectric measurement method of 4 quadrant detector (U.S. Pat 5191200), photo-detection method (U.S. Pat 6765647B1) based on slit and 4 quadrant detector, based on pin hole and area array CCD (Charge Coupled Device, Charge Coupled Device (CCD)) photo-detection method (U.S. Pat 6081614) and based on PSD (Position Sensitive device, position sensitive detector) photoelectric measurement method is (referring to Chinese patent, application number: CN200610117401.0 and Focusing and leveling system using PSDs for the wafer steppers.Proc.SPIE, 1994,2197:997-1003.).
In the said method,, generally be to adopt CCD to detect the method for the peak value of the energy barycenter of hot spot or light spot energy in order to improve measuring accuracy and processing speed for the third measuring method; And the 4th kind of focusing and leveling method based on PSD always utilizes PSD to survey the energy barycenter of hot spot.Survey the energy barycenter of hot spot or the photoelectric measurement method of peak value for those, the local corresponding reflectivity unequal factor of measurand (as silicon chip) within the spot measurement zone can cause the measuring error of focusing and leveling measuring system.It is this because the measuring error that the local reflectance variation produces is relevant with factors such as spot size and reflectance varies value and region of variation sizes, this generally speaking measuring error all is sub-micron and micron dimension, this is for the focusing and leveling measuring system of 10 nanometer scale measuring accuracy, this error very seriously and not is allowed to, also have other can cause the light spot energy barycenter factor of hot spot internal blas more in addition, as because the variation of the beam mode that the vibrations of Transmission Fibers cause, these all can cause measuring error.
Now a kind of focusing and leveling measuring system based on PSD that is disclosed with Chinese patent CN200610117401.0 is that example illustrates the present invention, its synoptic diagram as shown in Figure 2, this system be used for measuring between the upper surface of silicon chip 5 or this upper surface and projection objective 2 lower surfaces relative along the Z direction and around X, Y rotation (Rx, three-dimensional position Ry) or pattern information.Wherein Z is to the optical axis direction that is projection objective 5, and XYZ is a right hand Cartesian coordinates.As shown in Figure 2, the detecting light beam that light source 7 sends is through Shaping Module 8 shaping back lighting hot spot thing masks 9, and the effect of this hot spot thing mask 9 mainly is to produce the light spot shape and the layout of design at silicon chip 5 upper surfaces or projection objective 2 lower surfaces.Illuminated hot spot thing mask 9 is imaged onto silicon chip 5 upper surface places by optical projection system 10 or is respectively silicon chip 5 upper surfaces and projection objective 2 lower surface places, produces desired detection hot spot.It had carried the Z information of silicon chip 5 upper surfaces or projection objective 2 lower surfaces after corresponding detecting light beam was projected object lens 2 lower surfaces and the reflection of silicon chip 5 upper surfaces, then the hot spot at silicon chip 5 upper surfaces and projection objective 2 lower surface places is detected imaging system 11 once more and surveys optical module 12 and is imaged onto on the PSD detector 13, since single measurement point only need measure Z to information, Rx, Ry is calculated by multimetering, so detector 13 is PSD detectors of one dimension.Promptly can obtain relative Z, Rx, Ry information between silicon chip 5 upper surfaces or silicon chip 5 upper surfaces and projection objective 2 lower surfaces from the information of PSD detector 13 output.For focusing and leveling measuring system based on PSD, it is to utilize the variation of the position of measurand or pattern and the position of energy barycenter on the PSD detector that cause surveying hot spot also correspondingly changes from principle, and the change in location of surveying light spot energy barycenter by the output of PSD detector can obtain the position of measurand or the information of morphology change.That is to say that if having other factors to cause to survey the position change of light spot energy barycenter, it is the position of measurand or the variation of pattern that this focusing and leveling measuring system is thought by mistake, thereby has just caused measuring error.These cause measuring other factors of the energy barycenter change in location of hot spot, one of them is because the uneven and variation of measurand local reflectance in the sample area of a measurement hot spot, and the factor that causes these local reflectance inequalities has a lot, the lines different as the reflectivity that has existed on the silicon chip face, such as the bonding jumper in the metal level etc., and the equal factor of the final reflectivity that causes owing to the scattering of groove, these factors all can cause the change in location of the energy barycenter of surveying hot spot, and litho machine will form figure just on silicon chip, and have groove etc. on the silicon chip crossed of etching, and these figures are Protean with groove for different technology.That is to say that if the flat measuring system of focusing key is responsive to these figures and groove, this focusing and leveling measuring system is to be used for the less relatively litho machine of the higher relatively depth of focus of resolution at all so.Other cause the factor of this type of focusing and leveling measuring system measuring error to also have such as foregoing because measuring beam patterns of change that the Transmission Fibers vibrations cause or the like.
In essence, the light spot energy barycenter change in location is distinguishing on the PSD detector that the change in location of the detection light spot energy barycenter on the PSD detector that the position of measurand or morphology change cause and other factors such as local reflectance inequality cause, and the former is moved on the PSD detector by facula position integral body and causes; The latter then is that the integral position of surveying hot spot does not become, just because the energy barycenter of hot spot at the inner relative position of hot spot change has taken place.Based on this understanding and cognition, the present invention provided a kind of can keep the former (signal just) and eliminate latter's's (being the sum of errors noise) solution, thereby improved the focusing and leveling measuring system of these classes or the measurement performance of other position measuring systems.
Summary of the invention
The object of the present invention is to provide a kind of high performance focusing leveling measuring method and device, this measuring method and device can be eliminated the influence of the change in location of the detection light spot energy barycenter that causes such as factors such as local reflectance inequality or variation on the measurand to the measuring system measurement performance.
In order to reach described purpose, the invention provides a kind of light spot energy barycenter rectification module, comprise beam splitter, detecting light beam is divided into some divided beams; Image inverter, the reversing divided beams;
In above-mentioned light spot energy barycenter rectification module, described beam splitter to the described detecting light beam of major general is divided into two bundle divided beams.
In above-mentioned light spot energy barycenter rectification module, described a branch of at least divided beams is by the reversing at least one axle of described image inverter.
In above-mentioned light spot energy barycenter rectification module, the energy between the divided beams of described relative reversing equates.
In above-mentioned light spot energy barycenter rectification module, described light spot energy barycenter rectification module also can comprise the bundling device of synthetic divided beams;
In above-mentioned light spot energy barycenter rectification module, equate from the energy between the light beam of the relative reversing of described bundling device output.
In above-mentioned light spot energy barycenter rectification module, described image inverter is an inversion prism.
In above-mentioned light spot energy barycenter rectification module, described image inverter is by the reflector group that is no less than two groups, and this number phase difference that is no less than the catoptron in two groups the reflector group is an odd number.
In above-mentioned light spot energy barycenter rectification module, described image inverter is by the reflector group that is no less than two groups, and this is no less than light beam is reflected in two groups the reflector group number of times and differs and be odd number.
Another program of the present invention provides a kind of measurement mechanism, comprising: measurand, carry the work stage of this measurand; The detection imaging system and the detection optical module of the hot spot imaging of measurand will be surveyed, with one receive by the photodetector of imaging facula, it is characterized in that: also comprise foregoing light spot energy barycenter rectification module, this light spot energy barycenter rectification module is corrected the position of the energy barycenter of surveying hot spot.
In above-mentioned focusing and leveling measurement apparatus, described light spot energy barycenter rectification module is arranged between described measurand and the described detector.
In above-mentioned focusing and leveling measurement apparatus, described light spot energy barycenter rectification module is arranged between described detection optical module and the described detector.
In above-mentioned focusing and leveling measurement apparatus, described light spot energy barycenter rectification module is arranged between described detection imaging system and the described detection optical module.
Another scheme of the present invention is to use the measuring method of light spot energy barycenter rectification module, and its substantive distinguishing features is that described measuring method comprises the following steps:
(1) provides a detecting light beam;
(2) the information back reflection on the detecting light beam detection silicon chip is to light spot energy barycenter rectification module;
(3) detecting light beam in light spot energy barycenter rectification module beam splitting, inverted image, close bundle;
(4) surveying hot spot becomes to arrive on the detector.
In above-mentioned measuring method, described detecting light beam is carried out beam splitting, inverted image, is closed bundle by beam splitter, image inverter, bundling device respectively.
In above-mentioned measuring method, described detection hot spot arrives on the detector by surveying imaging system and surveying optical module.
The present invention is by having following advantage and good effect:
1. make the focusing and leveling system that detects based on luminous energy center of gravity or peak value insensitive to measurand, this class focusing and leveling measuring system is real to be used and actual production thereby can make, rather than can only measure the silicon chip of zero layer.
2. performances such as the precision that focusing and leveling measures and the linearity have been improved; It can be used among the little litho machine of resolution height and depth of focus;
3. simple to operate and cost is low.
Description of drawings
Embodiments of the invention and accompanying drawing provide as follows:
Fig. 1 is the structural diagrams intention of general litho machine;
Fig. 2 is a kind of focusing and leveling measurement apparatus structural diagrams intention based on the PSD detector in the prior art;
Fig. 3 is a focusing and leveling measurement apparatus structural diagrams intention of utilizing light spot energy barycenter rectification module one preferred embodiment of the present invention;
Fig. 4 is the light spot energy distribution schematic diagram in the focusing and leveling measurement apparatus of a preferred embodiment of the present invention;
Fig. 5 is the focusing and leveling measurement apparatus structural drawing that utilizes another preferred embodiment of light spot energy barycenter rectification module of the present invention;
Fig. 6 is a kind of image inverter structural representation of light spot energy barycenter rectification module of the present invention;
Fig. 7 is the focusing leveling measuring method process flow diagram that utilizes light spot energy barycenter rectification module of the present invention.
Embodiment
Below with reference to accompanying drawing light spot energy barycenter rectification module of the present invention and using method thereof are described in further detail.
Fig. 3 is the focusing and leveling measurement apparatus structural drawing of a preferred embodiment of the present invention.Project detecting light beam on the measurand silicon chip 5 by the position and the pattern information of having carried silicon chip 5 after the silicon chip reflection, cause surveying local reflectance inequality in the hot spot owing to having the different zone of reflectivity on the silicon chip 5, promptly the different zone of reflectivity is arranged in hot spot inside, position L1 place, the change of the local reflectance of hot spot inside has also just caused the change in location of light spot energy barycenter with respect to hot spot itself, and this light spot energy barycenter changes the measuring error that has also just caused whole measuring system.The present invention is in focusing and leveling measuring system, surveying insertion one light spot energy barycenter rectification module 14 between optical module 12 and the PSD detector 13, the relative position that this light spot energy barycenter rectification module 14 promptly can be eliminated the energy barycenter of hot spot inside changes and the measuring error brought, and concrete principle is as described below.
Describe measuring method of the present invention in detail below with reference to Fig. 3 and Fig. 7.In Fig. 3, project detecting light beam on the measurand silicon chip 5 by the position and the pattern information (step S10) of having carried silicon chip 5 after the silicon chip reflection, by the detecting light beam after silicon chip 5 reflection earlier by imaging system 11 with survey that optical module 12 is laggard goes into hot spot energy barycenter rectification module 14 (step S20), wherein this light spot energy barycenter rectification module 14 comprises a beam splitter 15, image inverter 16 and bundling device 17.At first detecting light beam is divided into two divided beams by the energy beam splitter 15 in the rectification module 14: a divided beams reverses on Z-direction by image inverter 16 its hot spots of back, and another divided beams directly penetrates without any processing; This two divided beams arrives to be synthesized behind bundling device 17 and is a branch of light (step S30) then, and the last imaging of this Shu Hecheng light forms surveys hot spot measured (S40) to the PSD detector 13.Equate promptly can eliminate fully offset as long as guarantee the energy of two beam splitting light components from bundling device 17 output beams in the measurement mechanism in the present invention owing to the uneven light spot energy barycenter that causes of local reflex.In conjunction with object lesson: the splitting ratio of supposing beam splitter 15 is A: B, that is to say that beam splitter 15 is divided into two divided beams to the detecting light beam at L1 place, major general position, and image inverter 16 and bundling device are σ to the percent of pass of a wherein beam splitting
1, bundling device is σ to the percent of pass of another beam splitting
2If, and satisfy following relational expression: A σ
1=B σ
2, that is to say to make light spot energy distribution (distributing) the inverted image beam splitting that is arranged in L5 place, position and do not have the total energy value of the beam splitting of inverted image to equate from the light beam light spot energy of bundling device output.The synoptic diagram that light spot energy distributes as shown in Figure 4, wherein the shadow region represents that the high light spot energy of reflectivity distributes, white space represents that the low light spot energy of reflectivity distributes.Fig. 4 (A) expression does not enter the light spot energy distribution plan of image inverter 16, the high light spot energy of reflectivity this moment distributes and is positioned at the top of central shaft O axle, at this time with respect to the uniform situation of hot spot internal reflection rate, have after the high situation of local reflectance, whole light spot energy barycenter will upwards be offset; Fig. 4 (B) expression enters the light spot energy distribution plan behind the image inverter 16, light beam reverses on Z-direction by image inverter 16 its hot spots of back, below and Fig. 4 (A) that the light spot energy distribution that reflectivity is high at this moment is positioned at the O axle distribute about the O rotational symmetry, Fig. 4 (C) expression arrives the light spot energy distribution plan of bundling device 17, we can see that arriving the high light spot energy of bundling device 17 reflectivity distributes about the O rotational symmetry, turn back to the hot spot geometric center behind the last light spot energy barycenter rectification, promptly this can eliminate the influence of skew of the luminous energy center of gravity of the hot spot inside that the local reflex inequality causes fully.
Bundling device among Fig. 3 is exactly that the symmetry of beam splitter is used, beam splitter/combiner can be polarization can be unpolarized beam splitter also, but consider the utilization ratio of luminous energy, need select polarization beam splitting/bundling device as far as possible.Beam splitter is comparatively common, and design of the present invention do not have strict requirement to the performance of beam splitter, promptly can find the beam splitter/combiner that satisfies above-mentioned requirements in the off-the-shelf, here just not to beam splitting/close the bundle module to have been described.
Wherein, light spot energy barycenter rectification module 14 can be arranged on by silicon chip 5 light reflected and inject to optional position in the light path before the PSD detector 13, can also be arranged at imaging system 11 and survey between the optical module 12 or the position such as be positioned at before the imaging system 11 such as light spot energy barycenter rectification module 14, light spot energy barycenter rectification can be carried out in these positions.Disclosed the measurement mechanism structural drawing of another preferred embodiment of the present invention as Fig. 5, its measuring method is identical with the measuring method of the foregoing description, has just no longer specifically described here.In the measurement mechanism of this embodiment, light spot energy barycenter rectification module 14 is arranged at imaging system 11 and surveys between the optical module 12, entered light spot energy barycenter rectification module 14 and survey optical module 12 by imaging system 11 back orders earlier by the detecting light beam after silicon chip 5 reflections, wherein detecting light beam is divided into two divided beams by the energy beam splitter 15 in the rectification module 14: two divided beams rotate on Z-direction by an image inverter 16 its hot spots of back simultaneously, last two divided beams light spot energies reach shown in Fig. 4 (C), the light spot energy of reflectivity inequality distributes and equates and about the O rotational symmetry, as described in the above embodiments, last light spot energy barycenter is remedied to the geometric center along the Z axle of hot spot forever, and promptly this can eliminate the influence of skew of the luminous energy center of gravity of the hot spot inside that the local reflex inequality causes fully.
And be the inverted image module for image inverter, can be inversion prism, as general sieve prism or benhain prism etc.But these inverted image mould device cost are relatively all higher and relatively poor to the adaptive faculty of the requirement of concrete utilization structure.Owing in this focusing and leveling, only survey the information of its one dimension, promptly when carrying out inverted image, also only need to go up inverted image and get final product at one dimension (as along the Z axle) for single sensing point.According to this characteristic, the inventor has designed by two reflector group, comprises the inverted image module that three catoptrons constitute altogether, has saved manufacturing and assembly cost greatly, and the structural drawing of this inverted image module as shown in Figure 6.In Fig. 6, a reflector group of inverted image module is made up of catoptron 20, and another reflector group is made up of catoptron 21 and catoptron 22.Be divided into two divided beams after a branch of light is by beam splitter 15, a divided beams enters bundling device 17 after by catoptron 20; Another divided beams is reflected and enters bundling device 17 after 22 reflections of mirror 21 and catoptron.Only consider the situation in the XZ face here, setting X is the direction of propagation of light beam, and Z is for measuring dimension.The coordinate of light beam becomes X by XZ in the time of then promptly can drawing a divided beams at an easy rate and arrive bundling device 17 according to the image-forming principle of plane mirror
1Z
1, the coordinate of light beam became X by XZ when another divided beams arrived bundling device 17
2Z
2, X as shown in Figure 6
1, X
2With X in the same way, but Z
1With Z
2Oppositely.Energy when therefore arriving bundling device as if two divided beams equates, how then no matter enter bundling device 17 changes the energy barycenter position interior with respect to hot spot itself of hot spot before, finally the energy barycenter of hot spot is positioned at the geometric center of hot spot along the Z axle forever when 17 li of bundling devices come out, and changes the measuring error of bringing thereby also just eliminated the inner centre of gravity place of hot spot fully.That is to say that the splitting ratio when beam splitter is C: during D, catoptron 20 and bundling device are σ to total transmitance of this first beam splitting
3, catoptron 21 and catoptron 22 and bundling device are σ to total transmitance of this second beam splitting
4, then as long as guarantee to satisfy relational expression: C σ
3=D σ
4, the energy of two divided beams compositions equates in the time of can guaranteeing from beam splitter 17 output beams; In addition, need also to guarantee that the angle a when equivalent optical path that two divided beams pass through and two divided beams arrive bundling device 17 is the operating angle a of bundling device 17 in the luminous energy barycenter rectification module, eliminated the effect that the inner centre of gravity place of hot spot changes the measuring error of bringing thereby can reach.This shows here and serve as not only low cost of manufacture of inverted image mould device, and the requirement of assembling is also relatively very low by 3 catoptrons.Certainly the needs according to the actual machine structure also can adopt non-3 catoptron to serve as image inverter, if guarantee the number of times phase difference of the catoptron that two beam splitting are passed through be odd number promptly can guarantee both finally from the coordinate of bundling device output in one direction direction promptly realize relative inverted image on the contrary.
In addition, module of the present invention can also be eliminated the influence to the linearity of measuring system of the coma of its front optical system and astigmatism and other non-centrosymmetrical aberrations, and then can improve performances such as the linearity of this focusing and leveling measuring system and measuring accuracy.Concrete principle is: for these systems that detects based on light spot energy barycenter, those non-centrosymmetrical aberrations also can cause surveys the skew of light spot energy barycenter position in hot spot inside, module of the present invention is certainly eliminated the influence of these factors, and then can improve performances such as the linearity of whole measuring system and measuring accuracy.In addition as can be seen, because module of the present invention is only with the influence to measure of system performance of the non-centrosymmetrical aberration of eliminating its front optical system, so this light spot energy barycenter rectification module should be placed on as much as possible, ideally be to be placed on the and then position of detector front near position of detector.
That more than introduces only is based on preferred embodiment of the present invention, can not limit scope of the present invention with this, and the present invention can also be applied to belong to surface topography or position measurement field and association area thereof.Any method of the present invention is done replacement, the combination, discrete of step well know in the art, and the invention process step is done well know in the art being equal to change or replace and all do not exceed exposure of the present invention and protection domain.
Claims (16)
1, a kind of light spot energy barycenter rectification module comprises:
Beam splitter is divided into some divided beams with detecting light beam;
Image inverter, the reversing divided beams.
2, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: described beam splitter to the described detecting light beam of major general is divided into two bundle divided beams.
3, light spot energy barycenter rectification module as claimed in claim 2 is characterized in that: described a branch of at least divided beams reverses on an axle at least by described image inverter.
4, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: the energy between the divided beams of described relative reversing equates.
5, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: described light spot energy barycenter rectification module also comprises the bundling device of synthetic divided beams.
6, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: equate from the energy between the light beam of the relative reversing of described bundling device output.
7, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: described image inverter is an inversion prism.
8, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: described image inverter is by the reflector group that is no less than two groups, and this number phase difference that is no less than the catoptron in two groups the reflector group is an odd number.
9, light spot energy barycenter rectification module as claimed in claim 1 is characterized in that: described image inverter is by the reflector group that is no less than two groups, and the number of times phase difference of the reflection of light beam in being no less than two groups reflector group is an odd number.
10, a kind of measurement mechanism comprises: measurand, carry the work stage of this measurand; The detection imaging system and the detection optical module of the hot spot imaging of measurand will be surveyed, with a pick-up probe, it is characterized in that: also comprise light spot energy barycenter rectification module as claimed in claim 1, this light spot energy barycenter rectification module is corrected the position of the energy barycenter of surveying hot spot.
11, focusing and leveling measurement apparatus as claimed in claim 10 is characterized in that: described light spot energy barycenter rectification module is arranged between described measurand and the described detector.
12, focusing and leveling measurement apparatus as claimed in claim 11 is characterized in that: described light spot energy barycenter rectification module is arranged between described detection optical module and the described photodetector.
13, focusing and leveling measurement apparatus as claimed in claim 11 is characterized in that: described light spot energy barycenter rectification module is arranged between described detection imaging system and the described detection optical module.
14, a kind of employing device as claimed in claim 10 carries out measuring method, it is characterized in that described measuring method comprises the following steps:
(1) provides a detecting light beam;
(2) the information back reflection on the detecting light beam detection silicon chip is to light spot energy barycenter rectification module;
(3) detecting light beam in light spot energy barycenter rectification module beam splitting, inverted image, close bundle;
(4) surveying hot spot arrives on the detector.
15, focusing leveling measuring method as claimed in claim 14 is characterized in that: described detecting light beam is carried out beam splitting, inverted image, is closed bundle by beam splitter, image inverter, bundling device respectively.
16, focusing leveling measuring method as claimed in claim 14 is characterized in that: described detection hot spot arrives on the detector by surveying imaging system and surveying optical module.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103543610A (en) * | 2012-07-12 | 2014-01-29 | 上海微电子装备有限公司 | Calibration method for focusing and leveling light spot position |
| CN103869627A (en) * | 2012-12-11 | 2014-06-18 | 上海微电子装备有限公司 | Focusing and leveling method used for projection photoetching machine |
| CN104977821A (en) * | 2014-04-09 | 2015-10-14 | 上海微电子装备有限公司 | Track correction focusing and levelling apparatus and track correction focusing and levelling method based on pre-scanning |
-
2007
- 2007-06-22 CN CNB2007100424189A patent/CN100492178C/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103543610A (en) * | 2012-07-12 | 2014-01-29 | 上海微电子装备有限公司 | Calibration method for focusing and leveling light spot position |
| CN103543610B (en) * | 2012-07-12 | 2015-09-30 | 上海微电子装备有限公司 | A kind of focusing levelling light spot position calibration method |
| CN103869627A (en) * | 2012-12-11 | 2014-06-18 | 上海微电子装备有限公司 | Focusing and leveling method used for projection photoetching machine |
| CN103869627B (en) * | 2012-12-11 | 2016-03-09 | 上海微电子装备有限公司 | For the focusing and leveling method of projection mask aligner |
| CN104977821A (en) * | 2014-04-09 | 2015-10-14 | 上海微电子装备有限公司 | Track correction focusing and levelling apparatus and track correction focusing and levelling method based on pre-scanning |
| CN104977821B (en) * | 2014-04-09 | 2017-06-27 | 上海微电子装备有限公司 | A kind of trajectory corrector focusing leveling device and method based on prescan |
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| CN100492178C (en) | 2009-05-27 |
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