CN101050057A - Borosillicate glass apparatus - Google Patents

Abstract

This invention provides a high-boron-silicon glass device. The high-boron-silicon glass comprises: SiO2 79-81, B2O3 12-13, Al2O3 2-3, Na2O 3-5, NaCl 0-0.5, Li2O 0-0.3 and CeO2 0-0.2. The high-boron-silicon glass device is prepared by: mixing the above components, melting in 1650-1700 deg.C electric ovens, and molding by blowing or pressing. The softening temperature, sudden temperature change and thermal expansion coefficient (alpha 0-300 deg.C) of the high-boron-silicon glass device are higher than 800 deg.C, higher than 220 deg.C and (32-34)X10 to the power-7deg.C, respectively. Besides, the high-boron-silicon glass device has such advantages as low thermal expansion coefficient, high chemical corrosion resistance, high thermal shock resistance, high usage temperature and good processability.

Description

A kind of high-boron-silicon glass instrument

Affiliated technical field

The invention belongs to glass production and make the field, particularly relate to a kind of high-boron-silicon glass instrument.

Background technology

Existing glassware comprises and burns device product and measuring device product, normally produces with low borosilicate glass or soda-lime glass moulding.Because the thermal expansivity of low borosilicate and soda-lime glass is bigger, bear the sudden turn of events temperature difference and be lower than 200 ℃, it is poor heat stability, corrosion resistance is low, the quality of the chemical solution that influence holds, and the cycle in work-ing life is short, measures and deposit high stability chemical reagent and standardized solution for requiring in high-temperature operation or the higher high-precision test, and low borosilicate glass and soda-lime-silica glass just can not be suitable for.At present, although the high-boron-silicon glass instrument is also arranged, it is big that ubiquity the type of furnace of founding, the deficiency that energy consumption is high, and it is low also to exist transparency simultaneously, or anti-hydrolysis, antiacid, or the defective of resistance to elevated temperatures difference.

Summary of the invention

For overcoming the deficiencies in the prior art part, the invention provides a kind of anti-hydrolysis, antiacid, resistant to elevated temperatures high-boron-silicon glass instrument, make it have very low thermal coefficient of expansion, good chemical resistance of concrete, thermal-shock resistance, the use temperature height has good lamp worker processing characteristics again.

The technical scheme that the present invention solves its technical problem employing is:

The component that high-boron-silicon glass is measured by weight percentage is:

SiO ₂ 79～81％

B ₂O ₃ 12～13％

AL ₂O ₃ 2～3％

Na ₂O 3～5％

Nacl 0～0.5％

Li ₂O 0～0.3％

CeO ₂ 0～0.2％

Above-mentioned component mixes the back and melts under 1650～1700 ℃ of temperature, through blowing or pressing process moulding, makes the high-boron-silicon glass instrument again.

Above-mentioned component mixes the back and melts in electric smelter.

The proportioning of high-boron-silicon glass each component of the present invention is undertaken by following principle:

SiO ₂Be the main body of glass skeleton, the SiO of high-boron-silicon glass ₂Content is greater than 79%, and the coefficient of expansion of glass just can reach α _{0-300 ℃}Be 32～34 * 10 ^-7/ ℃, so SiO ₂Should be more than 79% (weight percent); Yet work as SiO ₂After content was higher than 81% (weight percent), the glass melting temperature of glass batch was too high, and may cause crystallization, was unfavorable for the suitability for industrialized production of high-boron-silicon glass.So SiO ₂Preferably between 79～81% (weight percents).

B ₂O ₃Be the formation oxide compound of glass, it and SiO ₂Common formation glass body.It can not only reduce the coefficient of expansion of glass, and improves the thermostability and the chemical stability of glass, and when its content surpasses 13% (weight percent), glass easily produces phase-splitting, so SiO ₂Preferably between 12～13% (weight percents).

AL ₂O ₃Play the branch phasic property and the crystallization that can reduce this high-boron-silicon glass in glass, its existence makes glass have high chemical stability, thermostability and excellent material mechanical property, alleviates the erosion of glass to refractory materials.AL ₂O ₃The composition of introducing high-boron-silicon glass is between 2～3% (weight percents).

Na ₂O can improve the pre-arcing characterisitics of high-boron-silicon glass admixtion effectively, is the good fusing assistant of glass, but Na ₂O content increases the thermal expansivity of glass, can not introduce too much, in conjunction with the coefficient of expansion α of high-boron-silicon glass _{0-300 ℃}Be 32～34 * 10 ^-7/ ℃ scope, Na ₂O content is preferably between 3～5% (weight percents).

Nacl is the high temperature finings, and the gasification volatilization promotes glass clarifying when high temperature.General usage quantity is 0～1.5% of an admixtion, crosses and makes glass emulsification at most.In conjunction with the high-boron-silicon glass performance, Nacl is preferably between 0～0.5% (weight percent).

Li ₂O is strong fusing assistant, Li ₂O replaces Na ₂O or K ₂O reduces the coefficient of expansion of glass, and the crystallization tendency diminishes, but volume Li ₂O makes the crystallization tendency increase again, so content is defined as between 0～0.3% (weight percent).

CeO ₂Be finings and discoloring agent, make glass bright and clean, transparent, can make glass nondiscoloration under the severe radiation irradiation as glass metal.But its price is more expensive, and the introducing amount is defined as 0～0.2 (weight percent) %.

Beneficial effect of the present invention is: the softening temperature of high-boron-silicon glass instrument of the present invention＞800 ℃, bear sudden turn of events temperature approach＞220 ℃, thermalexpansioncoefficient _{0-300 ℃}Be 32～34 * 10 ^-7/ ℃, it is bright and clean, transparent that its thermal stability and chemical stability reach outward appearance well.

Embodiment

The invention will be further described below in conjunction with embodiment.

Embodiment one, is example with preparation high-boron-silicon glass beaker:

The component that high-boron-silicon glass is measured by weight percentage is:

SiO ₂ 80.5％

B ₂O ₃ 12.4％

AL ₂O ₃ 2.5％

Na ₂O 4％

Nacl 0.3％

Li ₂O 0.2％

CeO ₂ 0.1％

Described SiO ₂Adopt quartz sand, B ₂O ₃Adopt borax, Li ₂O adopts triphane, Na ₂O adopts SODIUMNITRATE, raw mineral materials is ground into 60～120 orders, weigh back (allowing a spot of impurity of bringing into by raw mineral materials) by above-mentioned component proportioning, mix, in the electric smelter of 1680 ℃ of temperature, melt, through blowing or pressing process moulding, after the detection, carry out red ink paste used for seals again and handle, after the detection, by the road kiln annealing of self acting electricity flint, promptly make coefficient of expansion α again _{0-300 ℃}Be 33～34 * 10 ^-7/ ℃, softening temperature is 820 ℃ a high-boron-silicon glass beaker, after detecting once more, and packing, warehouse-in.

Embodiment two, are example with preparation high-boron-silicon glass Erlenmeyer flask:

The component that high-boron-silicon glass is measured by weight percentage is:

SiO ₂ 81.0％

B ₂O ₃ 12.6％

AL ₂O ₃ 2.3％

Na ₂O 4％

Nacl 0.1％

Described SiO ₂Adopt quartz sand, B ₂O ₃Adopt boric acid, Na ₂O adopts SODIUMNITRATE, raw mineral materials is ground into 60～120 orders, weigh back (allowing a spot of impurity of bringing into by raw mineral materials) by above-mentioned component proportioning, mix, in the electric smelter of 1700 ℃ of temperature, melt, through blowing or pressing process moulding, after the detection, carry out lamp worker, red ink paste used for seals processing again, after the detection, by the road kiln annealing of self acting electricity flint, promptly make coefficient of expansion α again _{0-300 ℃}Be 32～33 * 10 ^-7/ ℃, softening temperature is 820 ℃ a high-boron-silicon glass worker Erlenmeyer flask, after detecting once more, and packing, warehouse-in.

Claims (2)

1, a kind of high-boron-silicon glass instrument, it is characterized in that: the component that high-boron-silicon glass is measured by weight percentage is:

SiO ₂ 79～81％

B ₂O ₃ 12～13％

AL ₂O ₃ 2～3％

Na ₂O 3～5％

Nacl 0～0.5％

Li ₂O 0～0.3％

CeO ₂ 0～0.2％

Above-mentioned component mixes the back and melts under 1650～1700 ℃ of temperature, through blowing or pressing process moulding, makes the high-boron-silicon glass instrument again.

2, a kind of high-boron-silicon glass instrument according to claim 1 is characterized in that: above-mentioned component mixes the back and melts in electric smelter.