CN101046374A - Non-destructive measurement method of nanometer cantilever thickness based on force curve of atomic force microscope - Google Patents
Non-destructive measurement method of nanometer cantilever thickness based on force curve of atomic force microscope Download PDFInfo
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- CN101046374A CN101046374A CN 200710057125 CN200710057125A CN101046374A CN 101046374 A CN101046374 A CN 101046374A CN 200710057125 CN200710057125 CN 200710057125 CN 200710057125 A CN200710057125 A CN 200710057125A CN 101046374 A CN101046374 A CN 101046374A
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Abstract
The non-destructive measurement method of nanometer cantilever thickness based on force curve of atomic force microscope includes the first scanning measurement to obtain the 3D topographic information of the nanometer cantilever area and the distance between the upper surface and the base of the nanometer cantilever; the subsequent reducing the scanning range to locate the probe of the atomic force microscope precisely and to load and unload vertically with the probe until the lower surface of the nanometer cantilever contacts with the base and the force curve exhibits turnover, and recording the real-time force curve of the atomic force microscope during loading and unloading to obtain the distance between the lower surface and the substrate of the nanometer cantilever; and finally subtracting the data obtained in the foregoing steps to calculate the nanometer cantilever thickness. The said method may be also used in measuring other dimensions of nanometer structure.
Description
Technical field
The present invention relates to a kind of little/the naiio-electro-meclianical systems measuring method.Particularly relate to a kind of nano beam etc. of can realizing and have the non-destruction precision measurement of the nanostructure thickness of levitation gap, the non-destructive measurement method based on the nanometer cantilever thickness of force curve of atomic force microscope that can also directly apply to that this class nanostructured levitation gap high-precision measures simultaneously.
Background technology
(Nanoelectromechanical systems NEMS) is the emerging technology field that grows up to naiio-electro-meclianical systems on microelectromechanical systems (MEMS) basis, also be the important component part of nanometer technology simultaneously.Nano beam be most basic among the NEMS also be the most representative nanostructured, be the basis of many nano functional devices, as resonator, biology sensor and radio-frequency devices etc.The size of nano beam structure is at nanoscale, and the measuring method of its multiple key property still is in conceptual phase at present, and the prerequisite precision measurement of nano beam structure geometric parameter often of these key properties research, such as to the precision measurement of nanometer cantilever thickness etc.In field of nanometer technology, the widespread use scanning electron microscope is measured the thickness of nano beam now, this method is that the scanning electron microscope image according to beam section obtains its one-tenth-value thickness 1/10, often need to destroy sample structure, generally be after utilizing same process flow to process a collection of structure with same size, wherein a part is used for doing this destructive thickness measure, but same process flow can not guarantee all structures that process and have identical size characteristic that therefore this method often can not obtain the actual thickness that target is treated geodesic structure.
Thickness in nanostructured influences under the little situation measurement result, the thickness measure that can adopt said method to be similar to, but at the thickness of nanostructured measurement result is influenced under the bigger situation, just must carry out accurate measurement to it.With the example that is measured as of nano beam Young modulus, Young modulus is one of important Mechanics of Machinery parameter of nano beam, is used for estimating and characterizing NEMS processing technology and nano beam working performance of devices.The thick geometric parameter that waits of length and width of beam must be at first accurately obtained in the measurement of nano beam Young modulus, and the thickness of nano beam is the most remarkable to the influence of measurement result, cube being inversely proportional to of Young modulus and one-tenth-value thickness 1/10, because the thickness of nano beam itself is in nanometer scale, so the deviation of thickness measurements will produce very big influence to the accurate measurement of nano beam Young modulus.At this moment just need carry out precision measurement, to improve nano beam structure characterisitic parameter measuring reliability to the thickness of nano beam.Therefore, accurately measure the thickness of nano beam, significant in the NEMS measuring technology.
Summary of the invention
Technical matters to be solved by this invention is, provide a kind of nano beam etc. of can realizing to have the non-destruction precision measurement of the nanostructure thickness of levitation gap, can also directly apply to the non-destructive measurement method based on the nanometer cantilever thickness of force curve of atomic force microscope of the precision measurement of this class nanostructured levitation gap height simultaneously.
The technical solution adopted in the present invention is: a kind of non-destructive measurement method of the nanometer cantilever thickness based on force curve of atomic force microscope, at first obtain the three-dimensional appearance information in nano beam zone, obtain the distance between nano beam upper surface and the substrate by scanning survey; Dwindle sweep limit then, with atomic force microscope probe accurately be positioned at both-end prop up admittedly the surface geometry center of nano beam or nanometer semi-girder upper surface the end both one of the position on, and utilize atomic force microscope probe to carry out vertical loading/unloading, lower surface and substrate until nano beam come in contact, be to occur turnover in the force curve, the force curve of real time record atomic force microscope in the load/unload process obtains the distance between nano beam lower surface and the substrate; At last, according to the data that obtain in above-mentioned two steps, calculate the thickness of nano beam.The committed step of the technical solution adopted in the present invention is:
At first, rap the three-dimensional appearance in mode scanning nano beam zone by employing, make surface structure and nano beam substrate on two sides that nano beam is complete appear in the scan image simultaneously, thereby can calculate distance between nano beam upper surface and the substrate according to the image sectional view.
Then, behind the force curve by real time record atomic force microscope in the load/unload process, force curve is converted to load-displacement curve, thereby therefrom extracts the distance of nano beam lower surface and substrate.
At last, by calculating between distance between nano beam upper surface and the substrate and nano beam lower surface and the substrate, obtain the thickness of nano beam apart from the difference of the two.
Simultaneously, the distance of nano beam lower surface that extracts by force curve of atomic force microscope and substrate is the height of this nano beam structure levitation gap.
The present invention is based on the non-destructive measurement method of the nanometer cantilever thickness of force curve of atomic force microscope, have following characteristics:
1. method of the present invention is a kind of non-destructive measurement method, does not destroy the structure of nano beam device to be measured in the measurement, and has nano level high measurement accuracy.
2. utilize the precision measurement ability of atomic force microscope to physical dimension in the nano beam structure plane (length and width), method of the present invention can realize the precision measurement of this class nano beam structure three-dimensional geometry size.
3. for the structures such as micron beam of distance within atomic force microscope Z axle measurement range in gap between upper surface and the substrate, its thickness also can adopt method of the present invention accurately to measure.
4. method of the present invention not only can be applied to the accurate measurement of this class suspended nano structure or micrometer structure thickness, can also directly apply to the precision measurement of levitation gap height in this class formation simultaneously.
Description of drawings
Fig. 1 is atomic force microscope micro-cantilever " a sensitivity demarcation force curve ";
Fig. 2 is the atomic force microscope micro-cantilever deflection voltage limit hour " a consistent force curve ";
Fig. 3 is that the atomic force microscope micro-cantilever deflection voltage limit is when big " turnover force curve ";
Fig. 4 is turning point computing method synoptic diagram.
Wherein:
1: starting point 2: straight-line segment 1
3: turning point 4: straight-line segment 2
Embodiment
Make a detailed description below in conjunction with embodiment and accompanying drawing non-destructive measurement method the nanometer cantilever thickness based on force curve of atomic force microscope of the present invention.
Method among the present invention mainly realizes based on AFM (atomic force microscope), needs the spring constant of known atomic force microscope micro-cantilever.After adjusting the reflector laser signal of atomic force microscope micro-cantilever each time, must demarcate its sensitivity, demarcation can be carried out on the surface of adamas or sapphire smooth samples such as (it is infinitely great that hardness can be considered).
The sensitivity of atomic force microscope micro-cantilever is after demarcating, at first adopt the three-dimensional appearance that raps mode scanning Liang Qu, complete surface structure of beam and beam substrate on two sides are appeared in the picture rich in detail simultaneously, preserve image, according to the distance between image sectional view calculating beam upper surface and the substrate.And then dwindle sweep limit, the atomic force micro-cantilever beam probe is positioned at the surface geometry center (or upper surface end of semi-girder) of two-end fixed beam, the force curve pattern that enters atomic force microscope vertically adds/unloads, adjust the deflection voltage limit of micro-cantilever, lower surface and the substrate that guarantees tested beam comes in contact (be in the force curve occur turnover), and record adds/force curve in the uninstall process.
Then the force curve of AFM is converted to the load-displacement curve of tested nano beam, the intersection point (starting point) of the horizontal component in the force curve and first straight-line segment that occurs subsequently is the atomic force microscope micro-cantilever and occurs being deflected to zero point (micro-cantilever is stressed to be zero) first with sample after interacting, and the intersection point (turning point) of first straight-line segment of force curve and second straight-line segment is the lower surface of nano beam and the contact point first of substrate.By accurately determining the position of above-mentioned starting point and turning point, can try to achieve the lower surface of nano beam and the distance between the substrate.By calculating between distance between beam upper surface and the substrate and beam lower surface and the substrate, can obtain the thickness of nano beam at last apart from the difference of the two.When adopting this method to measure nanometer cantilever thickness, can also obtain the plane geometry size (length and width) of nano beam by AFM, in fact this method can realize nano beam structure three-dimensional geometry Parameter Precise Measuring.
In the specific implementation process, as shown in Figure 3,, can in adding uninstall process, be had the force curve of starting point and turning point simultaneously, i.e. " turnover force curve " by the deflection voltage limit of atomic force microscope micro-cantilever rationally is set.1 is starting point among the figure, and 3 is turning point, and 2 is that to represent the straight- line segment 1,4 of nano beam elastic bending in the force curve be the straight-line segment 2 of representing nano beam to contact with substrate in the force curve.Introduce the actual measurement step in concrete the enforcement below:
Step 1: the sensitivity of demarcating the atomic force microscope micro-cantilever.Fig. 1 is atomic force microscope micro-cantilever " a sensitivity demarcation force curve ".
Step 2: rap scanning nano beam under the pattern, preserve scan image.Upper surface-the substrate that obtains beam from the cross-section analysis of AFM scan image is apart from d
Total
Step 3: needle point accurately is positioned the geometric center (or upper surface end of semi-girder) of two-end fixed beam upper surface, AFM is switched to the force curve pattern.It is a smaller value that the AFM micro-cantilever deflection voltage limit is set, and guarantees to record in the flexural measurement as shown in Figure 2 " consistent force curve ", the reserve force curve data.
Step 4: it is a higher value that the AFM micro-cantilever deflection voltage limit is set, and guarantees to record in the flexural measurement as shown in Figure 3 " section graph curve ", the reserve force curve data.
Step 5: follow-up data is handled, and comprises following a few part:
1) utilizes least square fitting " sensitivity demarcation force curve ", calculate its slope;
2) utilize least square fitting " consistent force curve ", calculate its slope;
3) utilize two straight-line segments before and after the turning point in the least square fitting " section graph curve ", calculate its slope respectively;
4) with the slope of " consistent force curve " and " sensitivity demarcation force curve " respectively and the slope ratio of two straight-line segments of " section graph curve ".If equate respectively, can reach a conclusion: represent the elastic bending process of beam and the contact condition of beam and substrate before and after the turning point of " section graph curve " respectively.
Step 6: the position of judging " turnover force curve " middle starting point and turning point.By the relative position of starting point and turning point, try to achieve beam lower surface-substrate apart from d
BlankFig. 4 is turning point computing method synoptic diagram, draws the matched curve of straight-line segment 2 on the basis of Fig. 3 force curve, as below straight line among Fig. 4.The difference of the fitting a straight line by calculating " turnover force curve " and straight-line segment 2 can be judged the position of turning point.The computing method of starting point can the match horizontal linear, and calculates the intersection point of its extended line and straight-line segment 1, with this intersection point as real starting point, rather than the minimum point of " turnover force curve ".
Step 7: the one-tenth-value thickness 1/10 t=d that calculates beam
Total-d
Blank
This measuring method can also directly apply to the precision measurement of similar structures levitation gap height, and the nano beam lower surface that extracts by force curve and the distance of substrate are the height of levitation gap.
The present invention all combinations and method open and that disclose can be by using for reference this paper disclosure, although combination of the present invention and method are described by preferred embodiment, but those skilled in the art obviously can be spliced method and apparatus as herein described in not breaking away from content of the present invention, spirit and scope or change, or increase and decrease some parts, more particularly, the replacement that all are similar and change apparent to those skilled in the artly, they are regarded as being included in spirit of the present invention, scope and the content.
Claims (5)
1. the non-destructive measurement method based on the nanometer cantilever thickness of force curve of atomic force microscope is characterized in that, at first obtains the three-dimensional appearance information in nano beam zone by scanning survey, obtains the distance between nano beam upper surface and the substrate; Dwindle sweep limit then, with atomic force microscope probe accurately be positioned at both-end prop up admittedly the surface geometry center of nano beam or nanometer semi-girder upper surface the end both one of the position on, and utilize atomic force microscope probe to carry out vertical loading/unloading, lower surface and substrate until nano beam come in contact, be to occur turnover in the force curve, the force curve of real time record atomic force microscope in the load/unload process obtains the distance between nano beam lower surface and the substrate; At last, according to the measurement data that obtains in above-mentioned two steps, calculate the thickness of nano beam.
2. the non-destructive measurement method of the nanometer cantilever thickness based on force curve of atomic force microscope according to claim 1, it is characterized in that, rap the three-dimensional appearance in mode scanning nano beam zone by employing, make surface structure and nano beam substrate on two sides that nano beam is complete appear in the scan image simultaneously, thereby can calculate distance between nano beam upper surface and the substrate according to the image sectional view.
3. the non-destructive measurement method of the nanometer cantilever thickness based on force curve of atomic force microscope according to claim 1, it is characterized in that, behind the force curve by real time record atomic force microscope in the load/unload process, force curve is converted to load-displacement curve, thereby therefrom extracts the distance of nano beam lower surface and substrate.
4. the non-destructive measurement method of the nanometer cantilever thickness based on force curve of atomic force microscope according to claim 1, it is characterized in that, by calculating between distance between nano beam upper surface and the substrate and nano beam lower surface and the substrate, obtain the thickness of nano beam apart from the difference of the two.
5. the non-destructive measurement method of the nanometer cantilever thickness based on force curve of atomic force microscope according to claim 1, it is characterized in that the nano beam lower surface that extracts by power atomic force microscope curve and the distance of substrate are the height of nano beam structure levitation gap.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101566550B (en) * | 2009-05-15 | 2011-08-31 | 天津大学 | Method for adding force curve functional module on metrological atomic force microscope |
| CN106558098A (en) * | 2016-10-28 | 2017-04-05 | 上海大学 | A kind of method that full-view stereo microcell figure is set up under SEM environment |
| CN108287220A (en) * | 2018-01-11 | 2018-07-17 | 天津大学 | A kind of experimental provision measured for transparent substrates film surface and interface mechanical characteristic |
| CN108317988A (en) * | 2018-04-19 | 2018-07-24 | 南京腾元软磁有限公司 | Sample thickness in-situ measurement method based on transmission electron microscope surface imaging |
| CN110794172A (en) * | 2019-11-13 | 2020-02-14 | 北京机械设备研究所 | Method and device for measuring thickness of film grown on substrate |
| CN115930787A (en) * | 2022-10-06 | 2023-04-07 | 山东申华光学科技有限公司 | Method and system for detecting coating quality of coating machine based on machine vision |
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2007
- 2007-04-11 CN CN 200710057125 patent/CN101046374A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101566550B (en) * | 2009-05-15 | 2011-08-31 | 天津大学 | Method for adding force curve functional module on metrological atomic force microscope |
| CN106558098A (en) * | 2016-10-28 | 2017-04-05 | 上海大学 | A kind of method that full-view stereo microcell figure is set up under SEM environment |
| CN106558098B (en) * | 2016-10-28 | 2019-08-06 | 上海大学 | The method of full-view stereo microcell figure is established under a kind of SEM environment |
| CN108287220A (en) * | 2018-01-11 | 2018-07-17 | 天津大学 | A kind of experimental provision measured for transparent substrates film surface and interface mechanical characteristic |
| CN108317988A (en) * | 2018-04-19 | 2018-07-24 | 南京腾元软磁有限公司 | Sample thickness in-situ measurement method based on transmission electron microscope surface imaging |
| CN110794172A (en) * | 2019-11-13 | 2020-02-14 | 北京机械设备研究所 | Method and device for measuring thickness of film grown on substrate |
| CN115930787A (en) * | 2022-10-06 | 2023-04-07 | 山东申华光学科技有限公司 | Method and system for detecting coating quality of coating machine based on machine vision |
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