CN101017218A - Photoconductive coating film of diffraction grating and manufacture method thereof - Google Patents
Photoconductive coating film of diffraction grating and manufacture method thereof Download PDFInfo
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Abstract
This invention discloses one infraction grating guide conductive film, wherein, one side of surface is set with grating pixel units and the invention is characterized by the following: the grating pixel unit is composed of sub pixel structure with each one determined by infraction grating, space frequency, tank depth guide light direction and intensity. The process method comprises the following steps: a, designing guide pattern infraction structure distribution; b, distributing the pixel structure on guide pattern with each unit formed with sub pixel element and each one infraction grating taking, space frequency alternated; c, etching; d, through casting to process metal nickel board for printing on coat layer of PET or PC film.
Description
Technical field
The present invention relates to light-guiding film and the manufacture method thereof used in a kind of backlight module, be specifically related to a kind of light directing film that has diffraction grating.
Background technology
Backlight module is a LCD display, necessary device in the devices such as liquid crystal display module that mobile phone, PDA, digital camera etc. adopt and keyboard illumination, its market globalizes, along with the develop rapidly that shows industry, the backlight module of light-type, ultrathin type, low energy consumption becomes this area research development trend, light guide plate is an optical module important in the backlight module, the quality of its structure and performance directly affects the quality of backlight quality, therefore, how to manufacture and design the focus that high performance light guide plate is current domestic and international research.
A kind of main back lighting is a side-light type module backlight, by light source (Light source), light guide plate (Light guide plate), diffusion barrier (diffuser), prismatic lens (prism sheet), reflecting plate (reflector) is formed, light source is placed on module side backlight, after light enters light guide plate from the side, line source or pointolite are changed into the area source that is evenly distributed, the light harvesting effect of the equal light action of process diffusion barrier and prismatic lens improves the brightness and the uniformity coefficient of light source again, this module is applicable to small panel, as notebook computer, mobile phone, digital cameras etc., this side-light type module thickness backlight is generally at 1～3mm.
All big enterprises have not only stepped up the lightweight to LCD, the research of slimming, and, constantly making great efforts to improve backlight module, make itself and LCD more supporting.At present, the shortcoming of the optical plate of making is both at home and abroad, and thickness is bigger, and the efficiency of light energy utilization is on the low side.Along with the miniaturization of mobile phone, notebook computer, require module lightweight backlight, slimming, low cost, therefore, in the research and development of new round module backlight, the research and development of the design of novel optical plate and related industry manufacturing technology are hot spots for competition.The development of light weight, ultrathin light guide plate is brand-new problem in this field.
Traditional optical plate method for making has: printing-type and non-printing-type, wherein non-printing-type are divided into etching, LIGA processing procedure and micro-cutting processing.
1, printing-type: some printing-type light guide plate is utilized high diverging light source material (SiO
2And TiO
2) printing coatings, be coated on the light guide plate bottom in the mode of net-point printing (screen printing).
2, etching technique: early stage non-printing process is an etching technique, and this processing procedure is that leaded light network point distribution pattern is transferred on the mould of mirror process with photosensitive-ink or dry film photoresistance, develops after exposing, and carries out chemical etching with etching solution.The shortcoming of chemical etching is that etching solution influences optical surface, causes its optical scattering characteristic to show fully.Adopt the laser beam etching at present, overcome the characteristics of chemical etching, effectively the depth-to-width ratio of network point.
3, LIGA processing procedure: utilize mask exposure development method transfer printing in the manufacture of semiconductor on the photoresistance film in the site pattern, utilize the hot reflux processing procedure to make the photoresistance surface form slick and sly hemispherical or semi-cylindrical in configuration, mode with electroforming deposits die on photoresistance again, the light guide plate that the method makes can be done effective adjusting to the ejaculation of light source according to the design of light guide plate pattern, makes the luminous zone reach uniformity coefficient.In addition, the leaded light pattern has optical mirror plane and micro nature, more can make the loss of luminous energy reach minimum, helps the lifting of briliancy.
4, micro-cutting processing: on mould, cut the long groove structure of V-arrangement with diamond, the ditch both sides have mirror surface and are used for destroying original total reflection effect, luminous energy is penetrated by light guide plate is positive, the width of the long ditch of control V-type and the variation of the degree of depth, adjust the light distribution of exiting surface, utilize cutting way to make light guide plate and can improve briliancy and have advantage easy to make.If use cutting way to make and the similar minute surface of prismatic lens at exiting surface, can save prismatic lens and diffusion sheet, reach the effect that increases briliancy.
The leaded light mode of above-mentioned optical plate all is based on geometric optical theory, and manufacture all is single sheet production, and production efficiency is low, the cost height.
In order to enhance productivity, need to seek the new batch that is suitable for and make institute's light guide plate and preparation method thereof.In recent years, the optical plate research of relevant employing diffraction grating had had considerable progress.U.S. Pat 7058056 discloses a kind of light guide plate that has diffraction grating, in the bottom surface of light guide plate grating constant is that the diffraction grating of 2 μ m is as light element, reach the effect of the even outgoing of light source by the area that changes the diffraction grating unit, but, the scope of the adjustable output intensity of this mode is very limited, the efficiency of light energy utilization is low, still needs prismatic lens.U.S. Pat 6773126 discloses a kind of light guide plate that diffraction light is penetrated that has, and adopts the mode in optical plate bottom tiling diffraction grating unit, reaches change light source homogeneity with the grooved degree of depth, the shape of diffraction grating.
The light guide plate that has diffraction grating is fit to adopt the impression mode to make, and as adopting the volume to volume impression, operation is easy, can make continuously, helps reducing cost, and can make thinner light guide plate.But how to improve outgoing uniformity of light and brightness, remain present urgent problem.
Summary of the invention
The object of the invention provides a kind of light directing film that has diffraction grating, by architecture advances, improves the homogeneity and the brightness of light-guiding film, to be suitable for using the conventional method for stamping massive duplication production light-guiding film of volume to volume.
For achieving the above object, the technical solution used in the present invention is: a kind of photoconductive coating film of diffraction grating, side surface at film, be provided with the grating pixel unit of tiling, described grating pixel unit is made up of the sub-pix structure, diffraction grating orientation in each sub-pix, spatial frequency, the grooved degree of depth are definite according to direction that derives light and light intensity, and described diffraction grating orientation range is one 90 ° to 90 °, spatial frequency greater than 1000/millimeter, the grooved degree of depth is 150 nanometers～400 nanometers.
Different with the area or the grooved degree of depth of simple change grating, when design technical scheme of the present invention, the inventor notices, the parameter of describing the diffraction optics characteristic of optical plate can have: the position (X of diffraction grating unit (pixel), Y), the size and the distribution of grating pixel (grating pixel), grating fringe orientation, grating fringe density (spatial frequency) and grating depth (diffraction efficiency or brightness).Thereby, the orientation of grating pixel, the difference of spatial frequency, will influence derives light intensity.For the optical plate of diffraction grating, the light of outgoing divides zero order light and diffraction light from the grating, and zero order light is obeyed reflection law and refraction law, and diffracted ray is deferred to grating equation, and the exit direction of diffraction light is all the time perpendicular to the grating grid line.Zero order light and incident light are in the plane of incidence, and the difference that diffraction is orientated along with grating, the direction of outgoing can be the space all directions.Therefore, the grating spatial frequency is determined the size of the angle of diffraction light (derivation light), the spatial dimension of grating orientation decision derivation light.
According to above-mentioned thinking, the present invention proposes a kind of method of improving diffraction grating photoconduction film uniformity: light-guiding film is made up of the diffraction grating pixel of tiling, a grating pixel resolves into sub-pix (sub-pixel), grating orientation in the sub-pix, the difference of spatial frequency cause that the direction that derives light changes and light intensity changes, thereby, the combination of the sub-pix by different grating orientation or spatial frequency can improve the homogeneity of light-guiding film leaded light.The light element that the present invention will disperse is originally changed into the diffraction grating combination of tiling, thus, those skilled in the art can be based on the derivation light intensity requirement and the uniformity requirement of light guide plate, go out diffraction efficiency of grating and groove depth, empty relation frequently according to the rigorous coupled wave Theoretical Calculation, described groove depth is at 150nm～400nm, described empty frequently greater than 1000 lines/mm, described grating is oriented to-90 and spends to 90 degree, and angle changes greater than 0.1 degree.
In the technique scheme, according to the photoconduction uniformity requirement, the structure distribution of described grating pixel unit is determined by grating equation, refraction law; Under the condition that grating flute profile dutycycle and base material refractive index are determined, leaded light intensity is determined by the orientation of the diffraction grating in the leaded light pattern, different structure grating area occupied ratio.
A kind of optimized technical scheme is, described grating pixel unit be square, be tiled on the whole substrate surface, grating pixel unit is made of sub-pix.
Wherein, described sub-pix structure is the column distributed combination with different grating orientations; Also can be by the different empty column structures of frequently forming.
Further technical scheme at the impression face of described light directing film, also is provided with transparent high refractor.By change dielectric characteristic on the grating face, with the scope of the total internal reflection that increases film, strengthen the light characteristic of derivation light of the light guiding surface of light guiding film.
The method for making of photoconductive coating film of diffraction grating of the present invention is that a surface making diffraction grating at light directing film comprises the following steps:
(1) according to the photoconduction uniformity requirement, the diffraction grating structure of design leaded light pattern distributes, and derives direction of light and is determined by grating equation, refraction law; Under the condition that grating flute profile dutycycle and base material refractive index are determined, leaded light intensity is determined by the orientation of the diffraction grating in the leaded light pattern, different structure grating area occupied ratio;
(2) with the leaded light pattern that obtains in the step (1), according to the different sequences of dot structure one-tenth arranged evenly, corresponding to different diffraction grating structures, wherein, described diffraction grating structure is to be made of unit pixel, each unit pixel is made of sub-pix, and the orientation of the diffraction grating in each sub-pix, spatial frequency are determined according to required light distribution;
(3) utilize the photoetching of light variation image photo-composing system to the photoresist material the leaded light pattern structure distribution that obtains in the step (2);
(4) with the leaded light pattern on the photoresist, make metal nickel plate, metal nickel plate is wrapped on the cylinder,, obtain required photoconductive coating film of diffraction grating being coated with the impression that cated PET or PC film heat, pressurize by electroforming.
Further technical scheme is, the high refractor of coating or evaporation layer of transparent on the impression face of described light directing film.The material of described high refractor is selected from SiO
2, TiO
2Or ZnS.
Because the utilization of technique scheme, the present invention compared with prior art has following advantage as a kind of manufacture method of light-guiding film:
1. improve the leaded light homogeneity: diffraction grating is tiled in whole light-leading film surface, the adjustment of diffraction grating orientation, spatial frequency is with respect to the adjustment of grooved and groove depth simultaneously, be easy to control, homogeneity and the visual field that can effectively improve leaded light help the accurate leaded light homogeneity of adjusting light guiding film.
2. interference photoetching method is convenient reliable: the present invention adopt the light variation image photo-composing system with the pattern structure photoetching to the photoresist material, the noise specific energy of the leaded light pattern of input is guaranteed, simultaneously, two beam interferometer light except the normal of incident angle and photoresist material symmetrically, other characteristics are identical, and interference region is overlapped, therefore, help obtaining the diffraction grating and the high-quality leaded light pattern of high-diffraction efficiency, interference photoetching method is convenient reliable.
3. be easy to make: make by lithography on the photoresist have the embossment structure diffraction grating after, again micro relief profile leaded light pattern is fabricated on the metal nickel plate by electroforming, the embossment color depth is easy to carry out the imprinting and copying of volume to volume generally at the 0.15-4.0 micron on film.
4. raising light guide effect: increase high refractive index layer on the diffraction grating embossment structure, according to total internal reflection condition, establishing the light-guiding film material is PET, its light refractive index n=1.43, and then the critical angle of total internal reflection is 45 degree, adopts this high refractor (as TiO
2) behind the layer, light refractive index is about 1.80-1.90, then the critical angle of total internal reflection is the 37-33 degree, has increased the number of times of deriving light.Another effect of high refractive index layer is exactly, and improved diffraction efficiency of grating, thereby, strengthened leaded light brightness.
Description of drawings
Accompanying drawing 1a be among the embodiment one diffraction grating when different space frequency to the synoptic diagram that influences of photoconductive property;
Accompanying drawing 1b be among the embodiment one diffraction grating when different gratings orientation to the synoptic diagram that influences of photoconductive property;
Accompanying drawing 2 is that guide structure among the embodiment one is by the structural representation of the diffraction grating of different qualities tiling;
Accompanying drawing 3 be among the embodiment one in single dot structure, on different sub-pixs, adopt the different empty leaded light pattern diagram of diffraction grating structures frequently;
Accompanying drawing 4 be among the embodiment one in single dot structure, on different sub-pixs, adopt the different empty leaded light pattern diagram of diffraction grating structures frequently;
Accompanying drawing 5 is among the embodiment one, is used for DMD laser light of the present invention and becomes image light etching system structural drawing.
Wherein: 1, laser instrument; 2, beam expander; 3, catoptron: 4, spatial light modulator DMD; 5,6, miniature optical imaging system; 7, phase grating beam splitter; 8,9, interferometric optical imaging system; 10, photoresist material; 11, photoetching platform.
Embodiment
Below in conjunction with drawings and Examples the present invention is further described:
Embodiment one: to shown in the accompanying drawing 5, a kind of digitalized intervention etching system, moulding system of utilizing carries out the making of photoconduction pattern on film, to prepare the method for photoconductive coating film of diffraction grating, comprise the following steps: referring to accompanying drawing 1
(1) according to the photoconduction uniformity requirement, the diffraction structure of design leaded light pattern distributes, and derives direction of light and is determined by grating equation, refraction law; Under the condition that grating flute profile dutycycle and base material refractive index are determined, the intensity of leaded light is determined by orientation, the area occupied ratio of the diffraction grating in the leaded light pattern;
Diffraction light is vertical with grid line all the time with the plane that incident light is constituted, and therefore, rotating grating is orientated, and can change the attitude of diffraction light, by the variation of grating orientation, can adjust the derivation uniformity of light, increases the angle of visibility of optical plate.Referring to accompanying drawing 1a and accompanying drawing 1b.
Grating spatial frequency height, then the angle of diffraction to incident light is big, and is strong to the dispersive power of white light, thereby the diversity of deriving light increases; Otherwise the radiating area of deriving light diminishes.Therefore, rationally adjust the spatial frequency of grating, can improve the leaded light homogeneity, referring to accompanying drawing 4.
(2) with the leaded light pattern that generates in the step (1), according to the different sequences of dot structure one-tenth arranged evenly, corresponding to different diffraction grating structures.Wherein, described diffraction grating structure is to be made of pixel cell, and each unit pixel is made of sub-pix, and orientation, the spatial frequency of the diffraction grating in each sub-pix all can change, shown in accompanying drawing 3,4.
(3) the leaded light pattern structure that obtains in the step (2) is distributed, the interference lithography that utilizes light variation image photo-composing system (referring to accompanying drawing 5) is to the photoresist material.Wherein, described light variation image photo-composing system comprises: the laser beam that laser instrument 1 produces is through beam expander 2 collimations, project digital micro-mirror (digital micro-mirror device by catoptron 3, DMD) on 4, photoconduction pattern machine as calculated exports on the DMD, light beam is after spatial modulation, by an optical imaging system 5,6 project to the photoconduction pattern on the phase grating beam splitter 7, laser beam is beamed into two bundle light, again by optical imaging system 8,9 converge to two-beam on the photoresist material 10, two-beam is interfered mutually, form meticulous interference fringe, phase grating beam splitter 7 is placed on the precise rotating platform, the rotation of turntable will change the orientation of interference fringe on photoresist material 10, by computer software control recording materials platform 11, DMD4 and turntable and optoelectronic switch form the photoconduction pattern on photoresist material 10.
(4) spatial frequency of change phase grating beam splitter, then interference fringe changes at interval, the scope that changes is the 0.4-2 micron, after treatment, acquisition has the unit pixel of diffraction grating structure, and the phase grating beam splitter is placed on the precise rotating platform, and the rotation of turntable will change the orientation of interference fringe on the photoresist material, by computer software control platform, DMD, turntable and optoelectronic switch, on the photoresist material, form microstructure with the combination of sub-pix diffraction grating.
With the leaded light pattern on the photoresist, make metal nickel plate by electroforming, metal nickel plate is wrapped on the cylinder, to being coated with the impression that cated PET or PC film (50-300 micron) heat, pressurize, the grating on the nickel version is transferred on the film surface.
(5) on the grating surface of impression face, coating or the high refractor of evaporation layer of transparent are (as SiO
2, TiO
2Or ZnS), with the ability of the total internal reflection that increases film, strengthen the guiding property of light guiding film.
The pixel cell of this method is the 40-320 micron, and the structure minimum dimension of sub-pix is 10 microns.
Embodiment two: a kind of method of improving diffraction grating photoconduction film uniformity comprises the following steps:
(1) according to the photoconduction uniformity requirement, the diffraction grating structure of design leaded light pattern distributes, and derives direction of light and is determined by grating equation, refraction law; Under the condition that grating flute profile dutycycle and base material refractive index are determined, leaded light intensity is determined by the orientation of the diffraction grating in the leaded light pattern, different structure grating area occupied ratio; Be acquisition leaded light homogeneity, the employing digital micro-mirror (digital micro-mirrordevice DMD) as input medium, makes up the diffraction grating pixel, has obtained the leaded light pattern of different light guide structures,
(2) with the leaded light pattern that generates in the step (1), according to the different sequences of dot structure one-tenth arranged evenly, corresponding to different diffraction grating structures.Wherein, described diffraction grating structure is to be made of unit pixel, and each unit pixel is made of sub-pix, and orientation, the spatial frequency of the diffraction grating in each sub-pix all can change.
(3) utilize the photoetching of light variation image photo-composing system to the photoresist material the leaded light pattern structure distribution that obtains in the step (2).
(4) with the leaded light pattern on the photoresist, make metal nickel plate, metal nickel plate is wrapped on the cylinder, being coated with the impression that cated PET or PC film heat, pressurize by electroforming.
In the technique scheme, pixel cell be square, be tiled on the whole substrate surface, unit grating pixel is made of sub-pix, the sub-pix structure can be the column distributed combination with different gratings orientation, also by the different empty column structures of frequently forming.
Light variation image photo-composing system in step (3) can utilize existing light variation image photo-composing system to realize (method for making of ZL01134159.9 digital 3 D and light variation image and laser photocomposing system).Because in this programme, each pixel cell inside also has meticulous sub-pix structure, thereby, to the also corresponding raising of the performance requirement of light variation image photo-composing system, here the light variation image photo-composing system is, comprise laser instrument, be subjected to the TTL signal controlling optoelectronic switch, beam expander, digital micro-mirror (digital micro-mirrordevice, DMD), phase grating beam splitter, interference imaging system peace stage movement system.The light beam that laser instrument produces projects on the DMD through the beam expander collimation, the diffraction grating Pixel Information of desire photoetching machine as calculated exports on the DMD, light beam is after the spatial light modulation of DMD, by an optical imaging system with the spatial modulation image projection to the phase grating beam splitter, the phase grating beam splitter is beamed into two bundle light with laser beam, by optical imaging system two-beam is converged on the photoresist material again, two-beam is interfered mutually, form meticulous interference fringe, the control exposure, the interference fringe orientation, spatial frequency makes up with different sub-pixs, can obtain diffraction grating of different nature.
Here, DMD is the device that light beam is carried out spatial amplitude (intensity), and it is by computing machine input and display image.The minimum pixel unit of DMD and optical imaging system should guarantee to form sharply defined image on final unit pixel.
Optical imaging system before the beam splitting is a kind of optical system that the modulation signal (optical imagery) of DMD output can be dwindled, and the minification of this optical system is 1-10 times, and illumination should guarantee to incide the homogeneity of light field on the DMD at the spot diameter on the DMD.Optical imaging system after position phase beam splitting element, precise rotating platform and the beam splitting has constituted interference system jointly, on the photoresist material, formation is by the fine structure that carries interference fringe of the image of DMD input, here, position phase beam splitting element mainly refers to defraction grating device, it mainly is diffracted into the energy of light on the positive and negative one-level light, and interference fringe is formed by positive and negative one-level interference of light.
In the technique scheme, described fine structure can be various graphics combine, contains the diffraction grating structure (grating orientation, empty variation frequently) of different qualities in each figure.Described is relief type photoresist material.Through the metallization aftertreatment, can on metal nickel plate, form the relief type grating fringe, this metallograph can be used for the mode of volume to volume, (as PET, impresses out this leaded light embossment striped on PC), duplicates light directing film thereby can produce expeditiously at pressure sensitive.
Claims (9)
1. photoconductive coating film of diffraction grating, it is characterized in that: at a side surface of film, be provided with the grating pixel unit of tiling, described grating pixel unit is made up of the sub-pix structure, diffraction grating orientation in each sub-pix, spatial frequency, the grooved degree of depth determine according to direction that derives light and light intensity, and described diffraction grating orientation range is-90 ° to 90 °, spatial frequency greater than 1000/millimeter, the grooved degree of depth is 150 nanometers～400 nanometers.
2. photoconductive coating film of diffraction grating according to claim 1 is characterized in that: according to the photoconduction uniformity requirement, the structure distribution of described grating pixel unit is determined by grating equation, refraction law; Under the condition that grating flute profile dutycycle and base material refractive index are determined, leaded light intensity is determined by the orientation of the diffraction grating in the leaded light pattern, different structure grating area occupied ratio.
3. photoconductive coating film of diffraction grating according to claim 1 is characterized in that: described grating pixel unit be square, be tiled on the whole substrate surface, grating pixel unit is made of sub-pix.
4. photoconductive coating film of diffraction grating according to claim 3 is characterized in that: described sub-pix structure is the column distributed combination with different grating orientations.
5. photoconductive coating film of diffraction grating according to claim 3 is characterized in that: described sub-pix structure is by the different empty column structures of frequently forming.
6. photoconductive coating film of diffraction grating according to claim 1 is characterized in that: at the impression face of described light directing film, also be provided with transparent high refractor.
7. the method for making of a photoconductive coating film of diffraction grating is made diffraction grating on a surface of light directing film, comprises the following steps:
(1) according to the photoconduction uniformity requirement, the diffraction grating structure of design leaded light pattern distributes, and derives direction of light and is determined by grating equation, refraction law; Under the condition that grating flute profile dutycycle and base material refractive index are determined, leaded light intensity is determined by the orientation of the diffraction grating in the leaded light pattern, different structure grating area occupied ratio;
(2) with the leaded light pattern that obtains in the step (1), according to the different sequences of dot structure one-tenth arranged evenly, corresponding to different diffraction grating structures, wherein, described diffraction grating structure is to be made of unit pixel, each unit pixel is made of sub-pix, and the orientation of the diffraction grating in each sub-pix, spatial frequency are determined according to required light distribution;
(3) utilize the photoetching of light variation image photo-composing system to the photoresist material the leaded light pattern structure distribution that obtains in the step (2);
(4) with the leaded light pattern on the photoresist, make metal nickel plate, metal nickel plate is wrapped on the cylinder,, obtain required photoconductive coating film of diffraction grating being coated with the impression that cated PET or PC film heat, pressurize by electroforming.
8. method for making according to claim 7 is characterized in that: the high refractor of coating or evaporation layer of transparent on the impression face of described light directing film.
9. method for making according to claim 8 is characterized in that: the material of described high refractor is selected from SiO
2, TiO
2Or ZnS.
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| CN101750664B (en) * | 2008-12-12 | 2012-05-23 | 比亚迪股份有限公司 | Diffractive light guide film and preparation method thereof |
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