CN101685178B - Diffraction light guide film and preparation method thereof - Google Patents
Diffraction light guide film and preparation method thereof Download PDFInfo
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- CN101685178B CN101685178B CN2008101488178A CN200810148817A CN101685178B CN 101685178 B CN101685178 B CN 101685178B CN 2008101488178 A CN2008101488178 A CN 2008101488178A CN 200810148817 A CN200810148817 A CN 200810148817A CN 101685178 B CN101685178 B CN 101685178B
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Abstract
The invention relates to a diffraction light guide film. The invention provides the diffraction light guide film which comprises a light entrance surface (1), a bottom surface (2) and a light emission surface (3). A plurality of grating pixel units are distributed at least one part of the bottom surface (2) or the light emission surface (3), wherein the spatial frequencies, the groove profile depths and the areas of any two grating pixel units are the same, and line orientations in the grating pixel units ensure that the light emission uniformity degree is 0.7-1. The invention also provides a preparation method of the diffraction light guide film. The light emission uniformity degree of the diffraction light guide film can reach more than 0.7, and while meeting the requirement of the light emission uniformity degree, the diffraction light guide film also has the advantage of simple manufacture.
Description
Technical field
The invention relates to a kind of diffraction light guide film and preparation method thereof.
Background technology
Module backlight is the indispensable part of liquid crystal indicator (LCD), and the backlight assembly that is installed in the routine in the small panel such as mobile phone, digital camera, PDA, notebook computer generally comprises light source, LGP, diffusion barrier, prismatic lens, reflector plate etc.LGP is used to the light that guides light source to produce, and the phototransformation that pointolite or line source are produced becomes equally distributed area source.
In recent years, along with popularizing and miniaturization of mobile electronic devices such as mobile phone, notebook computer, the competition in the module industry backlight is more and more fierce also, and lightness, slimming, low cost etc. require increasingly high.The design of novel optic plate also becomes industrial hot spot, and light, thin, emergent light good uniformity, brightness height are the targets that the development of novel optic plate is pursued.
Traditional LGP utilization be the principle of geometrical optics, design diffusion site when light incides the diffusion point, can become many light with a light scatter, thereby destroy the total reflection of light in the bottom surface of LGP, and part light is scattered out from exiting surface.Apart from the light source closer, the diffusion point is less and sparse, apart from light source at a distance; The diffusion point is bigger, closeer, makes the intensity of light source light less than the strength scattering through this distribution; The more weak place of light intensity, the light that scattering is more, thereby the homogeneity of realization light intensity.Also have at the upper and lower surfaces of LGP to add micro-prism structure, utilization also be refraction principle.It is the diffusion site that the LGP lower surface is adopted in lightweight and slimming in order to realize module backlight in addition, the design that has, and upper surface is paved with the form of microstructure, so just can save a prismatic lens and has reduced whole thickness.
But the LGP of classic method design exists the not high problem of output intensity uniformity coefficient.
Utilize the wave optics principle in recent years, replace the research of traditional diffusion point or microstructure that certain progress has been arranged with diffraction grating.The LGP of grating type utilizes the grating diffration characteristic, can control the angle of emergent light and the efficient of emergent light more accurately, thereby obtains uniformity coefficient preferably.
Disclosing a kind of LGP that utilizes diffraction grating to make in the prior art, is that a series of grating constants are the diffraction grating of 0.1-10 micron in the bottom of LGP.Through changing the cross section profile that grating accounts for wide ratio and grating, improve the intensity and the homogeneity of the light intensity of exit facet.
A kind of ultra-thin photoconductive coating film of diffraction grating of improvement is disclosed in the prior art; In the tiling of the surface of film grating pixel unit is arranged, each grating pixel unit is made up of the sub-pix structure, through changing the size of sub-pix structure; The orientation of grating; The cross section profile of grating, grating account for wide ratio, and the grating grooved degree of depth waits the purpose that reaches even light intensity.
Above-mentioned disclosed diffraction light guide plate needs the parameter of change more on same block of plate, changes in the time of such as the grooved degree of depth and grating cross section profile, and this brings great difficulty for design, making and reproduction process, and cost of manufacture is very high.
Summary of the invention
The purpose of this invention is to provide a kind of diffraction light guide film, can improve outgoing light homogeneity, can consider the actual conditions of production again, reduce manufacture difficulty, be implemented more easily in process of production.
The invention provides a kind of diffraction light guide film; This diffraction light guide film comprises incidence surface 1, bottom surface 2 and exiting surface 3; On at least a portion of said bottom surface 2 or said exiting surface 3, be distributed with a plurality of grating pixel unit; Wherein, the striped orientation of the grating in the identical said grating pixel unit of area of spatial frequency, the grooved degree of depth and the grating pixel unit of the grating in any two grating pixel unit makes that outgoing light homogeneity is 0.7-1.
The present invention also provides a kind of preparation method of diffraction light guide film; This diffraction light guide film comprises incidence surface 1, bottom surface 2 and exiting surface 3; This method comprises, at least a portion of said bottom surface 2 or said exiting surface 3, a plurality of grating pixel unit is set, wherein; The area of spatial frequency, the grooved degree of depth and the grating pixel unit of the grating in any two grating pixel unit is identical, and the striped orientation of the grating in the said grating pixel unit makes that outgoing light homogeneity is 0.7-1.
Diffraction light guide film outgoing light homogeneity provided by the invention can reach more than 0.7, and, when satisfying the outgoing light homogeneity requirement, also have the simple advantage of making.
Description of drawings
Fig. 1 is the structural representation of light-leading film of the present invention.
Fig. 2 is the synoptic diagram of the leaded light pattern of embodiments of the invention 1.
Fig. 3 is the synoptic diagram of the leaded light pattern of embodiments of the invention 2.
Embodiment
According to diffraction light guide film provided by the invention; This diffraction light guide film comprises incidence surface 1, bottom surface 2 and exiting surface 3; On at least a portion of said bottom surface 2 or said exiting surface 3, be distributed with a plurality of grating pixel unit; It is characterized in that spatial frequency, the grooved degree of depth of the grating in any two grating pixel unit are identical with area, the striped orientation of the grating in the said grating pixel unit makes that the outgoing light homogeneity of exiting surface is 0.7-1.
In light-leading film as shown in Figure 1, incidence surface 1 is positioned at left surface, and exiting surface 3 is positioned at upper side.
Wherein, said spatial frequency can be 1000 lines per millimeters-2000 lines per millimeter; It is 0.3-0.5 that said grating accounts for wide ratio, and the said grooved degree of depth can be 0.5 micron-2.5 microns, is preferably 0.5 micron-2.5 microns.
Selected film is a film well known in the art, for example one or more in polycarbonate (PC), PVC (PVC), tygon (PE), polyethylene terephthalate (PET) and the polyurethane (TPU).The thickness of light guiding film precursor can be the 125-1000 micron, is preferably the 125-300 micron.The ranges of indices of refraction of its selected film also is known in this field, can directly obtain when being purchased, and repeats no more at this.
Wherein, the length of side of said pixel cell can be the 40-320 micron, is preferably the 80-160 micron.Generally speaking, in general the relation of the area of pixel cell and the refractive index of membraneous material, thickness be, the refractive index of membraneous material, thickness are big more, and the area of pixel cell is big more.
The striped orientation of said grating is meant the direction of grating fringe, when confirming the striped orientation of grating, can the incident direction of light be that benchmark calculates, and the striped orientation range of said grating is-90 °-90 °.
When using diffraction light guide film provided by the invention, can use conventional light source, for example LED.
The relation that the striped orientation of spatial frequency, the grooved degree of depth and the grating of the grating in said any said grating pixel unit, grating account for wide ratio meets the rigorous coupled wave equation.
The rigorous coupled wave equation is meant a kind of Vector Diffraction Theory, is present the most widely used a kind of solution sub-wave length grating theory problem." Formulation for stable and efficient implementationof the rigorous coupled-wave analysis of binary gratings " (Journal of OpticalSociety of America; Vol.12; No.5; May1995 1068-1076) in the literary composition, has detailed argumentation to this theory.This theory is the basis with the Maxwell equation; Through the propagation of research electromagnetic wave in the periodic structure medium; From Maxwell equation, derive one group of nonlinear differential equation; And the combination boundary condition, through numerical evaluation, can obtain the corresponding relation between diffraction efficiencies at different levels and each grating parameter accurately.
Under the preferable case, said grating pixel unit only covers the 70-100% of the entire area of bottom surface 2; Perhaps said grating pixel unit only covers the 70-100% of the entire area of exiting surface 3.
Said each grating pixel unit can comprise two or more sub-pixs unit, and wherein, said sub-pix unit can comprise that a plurality of spatial frequencys, the grooved degree of depth are identical with area, the identical or different optical grating construction of striped orientation of grating.
Under the preferable case, grating pixel unit is square.
Preparation method according to diffraction light guide film provided by the invention; This diffraction light guide film comprises incidence surface 1, bottom surface 2 and exiting surface 3; This method comprises, at least a portion of said bottom surface 2 or said exiting surface 3, a plurality of grating pixel unit is set, wherein; The area of spatial frequency, the grooved degree of depth and the grating pixel unit of the grating in any two grating pixel unit is identical, and the striped orientation of the grating in the said grating pixel unit makes that outgoing light homogeneity is 0.7-1.
The method that a plurality of grating pixel unit are set at least a portion of said bottom surface 2 or said exiting surface 3 can comprise: according to leaded light design producing motherboard, electroforming and mold pressing; Wherein, said leaded light pattern is consistent with the pattern that said a plurality of pixel cells form.
According to the present invention; The method of striped orientation of confirming the grating of grating pixel unit can comprise; At first confirm the diffraction efficiency of each pixel cell; According to the rigorous coupled wave equation, confirm that angle and the grating between diffraction efficiency and the grooved degree of depth, spatial frequency, grating and the incident light accounts for the relational expression between the wide ratio then; Based on the theoretical calculating of rigorous coupled wave, confirm that grating accounts for wide ratio, the flute profile degree of depth, spatial frequency; Bring the diffraction efficiency of each pixel cell into said relational expression, obtain the angle between grating and the incident light; According to the incident light direction of each point, confirm the striped orientation of the grating of each pixel cell.
Wherein, the method for confirming the diffraction efficiency of each grating pixel unit is a known method, for example, can use lighttools to simulate film light intensity magnitude everywhere, calculates the size of required diffraction efficiency everywhere.
Said outgoing light homogeneity is to weigh the inhomogeneity parameter of exiting surface emergent light light intensity, is meant the minimum value and the peaked ratio of the light intensity of emergent light any on the exiting surface at 2.Outgoing light homogeneity just explains that more near 1 the light intensity magnitude of every place output on the LGP is approximate more, and the homogeneity of light intensity is also just good more.
Above-mentioned after confirming that angle and grating between diffraction efficiency and the grooved degree of depth, spatial frequency, grating and the incident light accounts for the relational expression between the wide ratio; Through calculating based on the rigorous coupled wave theory; Select the grating parameter of an appropriate for the leaded light pattern, comprise that grating accounts for wide ratio, the flute profile degree of depth, spatial frequency.When said suitable being meant, selected grating parameter can make grating in its striped orientation range, change, the scope of the diffraction efficiency that obtains was wideer than the scope of the diffraction efficiency of choosing other whens group.
After confirming above grating parameter, in conjunction with required everywhere diffraction efficiency, according to the rigorous coupled wave Equation for Calculating go out everywhere required grating and incident light between angle.Confirm because of radiation direction again, and then extrapolate the striped orientation of required grating everywhere.
The pixel cell of the striped of different gratings orientation is made up synthetic leaded light pattern.The said method that makes up be ability according to known method, repeat no more at this.
The method of making motherboard can be conventional method, for example, can the leaded light pattern light be carved on the photoresist through laser direct-writing technology or light variation image phototypesetting technology.
The purpose of said electroforming be the design transfer on photoresist surface to sheet metal.Said electroforming can be conventional method, and for example, said plating can be divided into three processes; First process is to the photoresist surface metalation, can use the silver-colored method of spray, or adopts chemical deposition; Chemical deposition comprises that elder generation cleans the sensitization processing to carving the glue surface, is the photoresist surface ionization, forms equally distributed ion particles; Re-use liquor argenti nitratis ophthalmicus and silver mirror reaction takes place, form the skim silver conductive layer, accomplish metal deposition process on the photoresist surface on the photoresist surface; Make the metal level thickening with the method for electroless plating then, after metal level and photoresist are peeled off, just had the relief type striped on the metal surface; And then the above-mentioned sheet metal that obtains done Passivation Treatment in passivating solution, make surface production layer of metal oxide; With electric plating method nickel deposited in the above,, directly be used for the work nickel plate of mold pressing then again through same several times process.Can confirm the composition of electroplate liquid according to the kind of the metal of want electroforming, for example, when electroformed nickel, electroforming solution contains water soluble nickel salt.
Said mold pressing is that the striped on the sheet metal is impressed on the thermoplastic film material.Said mold pressing can be conventional method, and for example, the work nickel plate that said electroforming is obtained wraps on the block press heated roller, and the mode through roll extrusion is pressed in the striped on the sheet metal on the film.
Embodiment 1
This embodiment is used to prepare light-leading film provided by the invention.
1, synthetic leaded light pattern
Choosing light source is the LED lamp, and PC film size is 30 millimeters * 40 millimeters * 0.3 millimeter, adopts lighttools to simulate film light intensity magnitude everywhere, calculates the size of required diffraction efficiency everywhere.
Through based on the theoretical repeatedly calculating of rigorous coupled wave, select one group of grating parameter, as grating account for that wide ratio is 0.4, the flute profile degree of depth is that 1.5 microns, spatial frequency are 2000 lines per millimeters.
After confirming above grating parameter, in conjunction with required everywhere diffraction efficiency, according to the rigorous coupled wave Equation for Calculating go out everywhere required grating and incident light between angle.Confirm because of radiation direction again, and then extrapolate required grating inclination angle size everywhere.Each pixel cell is made up synthetic leaded light pattern.
Wherein, the area of said diffraction structure accounts for 90% of lower surface entire area.This diffraction structure is made up of the diffraction grating pixel cell, and wherein, said pixel cell is a square, and the length of side is 80 microns.The grooved degree of depth is 1.5 microns, and frequency is 2000 lines per millimeters.
2, make motherboard
With photoresist (the auspicious red company in Suzhou, RZJ-396PG) being coated on thickness equably is on 2 millimeters the glass plate, it is 2 microns photographic plate that dry back forms photographic layer thickness.
Make of the form exposure of above-mentioned photographic plate with litho machine (American AB M company) with holographic pattern; Exposure energy is 300 milli Jiao/square centimeters, and in developer solution (sodium hydrate aqueous solution of 0.7 weight %), develops, and the temperature of developer solution is 20 ℃; Development time is 30 seconds, can make optical mask.
3, electroforming
Silver is sprayed on the surface with holographic pattern of the optical mask that step 2 is made.NaOH solution with 20 grams per liters cleans then; Potassium dichromate aqueous solution passivation with 10 grams per liters.As negative electrode, nickel block carries out electroforming as anode in electroforming solution with this optical mask.Said electroforming solution is the WS of nickel sulfamic acid of nickel chloride and 200 grams per liters of the boric acid that contains 100 grams per liters, 100 grams per liters, and the electric current of electroforming is 10 peaces, and the time is 180 minutes.The thickness of the nickel electrotyping plate that obtains is 50 microns.
4, mold pressing
The sheet metal that step 3 is made at block press (radium-shine company limited is entered in east, 800 types) is pressed in 30 millimeters * 40 millimeters * 0.3 millimeter PC, and (LG-DOW: PC201-05), the temperature of mold pressing is 140 ℃, and pressure is 250MPa, and the speed of mold pressing is 30 meters/minute.Remove sheet metal then, can make light-leading film of the present invention.
Measure outgoing light homogeneity:
Method is 9 methods of testing, promptly on light-emitting area, chooses 9 points, and minimum value is divided by maximal value, and the outgoing light homogeneity that adopts luminance test appearance (Japan opens up general health BM-7 YC meter) to record this light-leading film is 0.70.
Embodiment 2
This embodiment is used to prepare light-leading film provided by the invention.
According to preparing light-leading film with embodiment 1 identical method, difference is that the material of light-leading film is a PC (LG-DOW: PC201-05).Upper surface tiling at 20 millimeters * 30 millimeters * 0.3 millimeter light-leading film has diffraction structure, and the area of diffraction structure accounts for 90% of lower surface entire area.The length of side of each pixel cell is 120 microns, and pixel cell is made up of a plurality of sub-pixs unit, and the length of side of each sub-pix unit is 40 microns, and the grooved degree of depth is 1.5 microns, and frequency is 2000 line/microns.
Measuring outgoing light homogeneity according to embodiment 1 described method is 0.85.
Claims (8)
1. diffraction light guide film; This diffraction light guide film comprises incidence surface (1), bottom surface (2) and exiting surface (3); On at least a portion of said bottom surface (2) or said exiting surface (3), be distributed with a plurality of grating pixel unit; It is characterized in that the area of spatial frequency, the grooved degree of depth and the grating pixel unit of the grating in any two grating pixel unit is identical, the striped orientation of the grating in the said grating pixel unit makes that outgoing light homogeneity is 0.7-1.
2. diffraction light guide film according to claim 1, wherein, said film is a thermoplastic film.
3. diffraction light guide film according to claim 1, wherein, the relation that the striped of spatial frequency, the grooved degree of depth and the grating of the grating in said grating pixel unit orientation, grating account for wide ratio meets the rigorous coupled wave equation.
4. according to claim 1 or 3 described diffraction light guide films, wherein, said spatial frequency is 1000 lines per millimeters-2000 lines per millimeters, and it is 0.3-0.5 that said grating accounts for wide ratio, and the said grooved degree of depth is 0.5 micron-2.5 microns.
5. diffraction light guide film according to claim 1, wherein, said grating pixel unit only covers the 70-100% of the entire area of bottom surface (2).
6. diffraction light guide film according to claim 1, wherein, said grating pixel unit only covers the 70-100% of the entire area of exiting surface (3).
7. diffraction light guide film according to claim 1, wherein, said grating pixel unit is square.
8. the preparation method of the described diffraction light guide film of claim 1; This diffraction light guide film comprises incidence surface (1), bottom surface (2) and exiting surface (3); This method comprises; On at least a portion of said bottom surface (2) or said exiting surface (3), a plurality of grating pixel unit are set, according to leaded light design producing motherboard, electroforming and mold pressing; Said leaded light pattern is consistent with the pattern that said a plurality of pixel cells form; Wherein, The area of spatial frequency, the grooved degree of depth and the grating pixel unit of the grating in any two grating pixel unit is identical; The striped orientation of the grating in the said grating pixel unit makes that outgoing light homogeneity is 0.7-1, confirms that said leaded light method of patterning comprises, confirms the diffraction efficiency of each pixel cell; According to the rigorous coupled wave equation, confirm that angle and the grating between diffraction efficiency and the grooved degree of depth, spatial frequency, grating and the incident light accounts for the relational expression between the wide ratio then; Based on the theoretical calculating of rigorous coupled wave, confirm that grating accounts for wide ratio, the flute profile degree of depth, spatial frequency; Bring the diffraction efficiency of each pixel cell into said relational expression, obtain the angle between grating and the incident light; According to the incident light direction of each point, confirm the striped orientation of the grating of each pixel cell.
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| CN2008101488178A CN101685178B (en) | 2008-09-27 | 2008-09-27 | Diffraction light guide film and preparation method thereof |
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| CN101685178B true CN101685178B (en) | 2012-05-30 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102732916B (en) * | 2011-04-13 | 2016-06-08 | 山东泰宝包装制品有限公司 | A kind of fast electric casting process |
| CN105549146B (en) * | 2016-01-12 | 2020-06-05 | 昆山龙腾光电股份有限公司 | Light guide plate, manufacturing method thereof and backlight module |
| CN106842397B (en) * | 2017-01-05 | 2020-07-17 | 苏州苏大维格光电科技股份有限公司 | Resin holographic waveguide lens, preparation method thereof and three-dimensional display device |
| US10641942B2 (en) * | 2018-07-16 | 2020-05-05 | Shenzhen Guangjian Technology Co., Ltd. | Light projecting method and device |
| JP7227403B2 (en) * | 2019-04-28 | 2023-02-21 | レイア、インコーポレイテッド | Diffractive backlight manufacturing method |
| CN110371479A (en) * | 2019-07-24 | 2019-10-25 | 上海紫江喷铝环保材料有限公司 | A kind of radium-shine packaging material of pure white platinum and preparation method thereof |
| TWI723563B (en) * | 2019-10-02 | 2021-04-01 | 明基材料股份有限公司 | Light bar structure |
Citations (3)
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| US6906861B2 (en) * | 2000-11-03 | 2005-06-14 | Ovd Kinegram Ag | Light-diffracting binary grating structure |
| CN1641439A (en) * | 2004-01-14 | 2005-07-20 | 鸿富锦精密工业（深圳）有限公司 | Light guide board and its manufacturing method |
| CN101017218A (en) * | 2007-02-14 | 2007-08-15 | 苏州大学 | Photoconductive coating film of diffraction grating and manufacture method thereof |
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- 2008-09-27 CN CN2008101488178A patent/CN101685178B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6906861B2 (en) * | 2000-11-03 | 2005-06-14 | Ovd Kinegram Ag | Light-diffracting binary grating structure |
| CN1641439A (en) * | 2004-01-14 | 2005-07-20 | 鸿富锦精密工业（深圳）有限公司 | Light guide board and its manufacturing method |
| CN101017218A (en) * | 2007-02-14 | 2007-08-15 | 苏州大学 | Photoconductive coating film of diffraction grating and manufacture method thereof |
Non-Patent Citations (1)
| Title |
|---|
| Moharam et al.Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings.《Journal of Optical Society of America》.1995,第12卷(第5期),1068-1076. * |
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