CN100587547C - Piezo-electricity driven deformable reflector and manufacturing method thereof - Google Patents
Piezo-electricity driven deformable reflector and manufacturing method thereof Download PDFInfo
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- CN100587547C CN100587547C CN200710171222A CN200710171222A CN100587547C CN 100587547 C CN100587547 C CN 100587547C CN 200710171222 A CN200710171222 A CN 200710171222A CN 200710171222 A CN200710171222 A CN 200710171222A CN 100587547 C CN100587547 C CN 100587547C
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Abstract
The invention relates to a deformable mirror with piezoelectric drive and a relative production method, belonging to optical device technical field, wherein four PZT piezoelectric drivers are arrangedabove a base, while the four PZT piezoelectric drivers are bonded with a silicon mirror with four support poles, the frame of the silicon mirror is connected with the base. When adds an adjustable voltage, the normal piezoelectric force generated by the PZT piezoelectric drivers can deform the central portion of the silicon mirror most to form a concave-convex face. The production method comprises (1) the production process of the silicon mirror with four support poles, (2) the production process of the base, (3), the production process of the PZT piezoelectric drivers and the Si-Au eutecticalloy bonding. The inventive deformable mirror is driven by normal piezoelectric force, which only needs to change external voltage to quickly and accurately adjust the focus of micro mirror. Comparedwith prior micro mirror structure, the invention has simple structure, easy array realization and focusing control.
Description
Technical field
The present invention relates to a kind of catoptron and manufacture method thereof of micro-optical device technical field, specifically is a kind of deformable mirror and manufacture method thereof of Piezoelectric Driving.
Background technology
Deformable mirror is undertaken the task that wavefront error is proofreaied and correct, and also obtained application on astronomical telescope and detailed survey camera not only as the core component of ADAPTIVE OPTICS SYSTEMS.In recent years also successfully in light beam purification, beam shaping, laser cavity many-sides such as the detection of aberration correction and medical science human eye aberration and correction all obtained application.Go out miniature, integrated deformable mirror in conjunction with the MEMS fabrication techniques and will become focus.Typical ADAPTIVE OPTICS SYSTEMS is to utilize Wavefront sensor to detect the wavefront distortion of incident light, sends control signal by controller to wavefront correction equipment then, and the action of control deformable mirror minute surface makes minute surface generation deformation.When mirror shape satisfied phase conjugation and concerns with the distortion phase place, distortion will be cancelled, and wavefront is restored, and imaging resolution is improved.According to the difference of type of drive, traditional deformable mirror can be divided into: driving type piezoelectric actuator, static driven formula, electromagnetic drive type, electrostriction drive-type, hot drive-type, hydraulic drive type etc.Wherein the deformable mirror response speed of driving type piezoelectric actuator is the fastest.The principle of work of the deformable mirror of driving type piezoelectric actuator is to utilize piezoelectric to make electrode, and when applying certain voltage to electrode, under the effect of piezoelectric effect, electrode can drive mirror surface corresponding deformation takes place.
Find through retrieval existing technical literature, the patent of Samsung Electro-Mechanics Co., Ltd---" diffractive thin-film piezoelectric micromirror and manufacture method thereof ", China's application number 200410089738, this patent is the diffractive thin-film piezoelectric micromirror that belongs to the work of piezoelectric working mode, this diffractive thin-film piezoelectric micromirror comprises that forming recess on it thinks that its center provides the silicon substrate of air gap, and piezoelectricity specular layer with band shape, two ends at its two ends along recess adhere to silicon substrate, simultaneously the bottom of heart part and recess separates therein, but and comprises when voltage is applied to piezoelectric material layer heart part vertical moving therein and so thin films of piezoelectric material layer of diffraction incident beam.Design by analyzing this deformable mirror as can be seen and manufacture craft etc. are still waiting to improve.
Summary of the invention
The objective of the invention is to overcome the deficiencies in the prior art, a kind of deformable mirror and manufacture method thereof of Piezoelectric Driving is provided.The size that the present invention only needs simply to be applied to the impressed voltage of the mach PZT piezoelectric ceramic actuator of section by change just can reach quick, the purpose of accommodation reflex mirror foci accurately, ratio deformable mirror structure in the past is simpler, easier array and zoom control, and it is many to have a drive electrode, the characteristics that deformation quantity is big.
The present invention is achieved by the following technical solutions:
The deformable mirror of the Piezoelectric Driving that the present invention relates to comprises silicon mirror surface, four PZT (piezoelectric ceramics) piezoelectric actuator, base with four support columns.Wherein, base is formed by glass substrate and silicon substrate bonding, be positioned at the bottom of entire emission mirror, above the base four PZT piezoelectric actuators, on four PZT piezoelectric actuators bonding have a silicon mirror surface of four support columns, the frame of silicon mirror surface links to each other with base, and total is in conjunction with compactness, and processing is simple.
Described PZT (piezoelectric ceramics) piezoelectric actuator, when applying the voltage that to regulate, the normal direction piezoelectric forces that produces makes the core generation plate deformation maximum of silicon mirror surface, forms a male and fomale(M﹠F), and the size of male and fomale(M﹠F) distortion and the size of piezoelectric forces have direct relation.Can form concave surface when applying positive voltage, the concave surface distortion increases along with the increase of voltage; Can form convex surface when applying negative voltage, the convex surface distortion increases along with the increase of voltage.So the focus of micro-reflector can be regulated fast and accurately by the size of impressed voltage.The deformable mirror of Piezoelectric Driving of the present invention is driven by the normal direction piezoelectric forces.
The manufacture method of the deformable mirror of Piezoelectric Driving involved in the present invention specifically comprises the steps:
1. with the manufacture craft of the silicon mirror surface of four support columns part;
2. the manufacture craft of base portion;
3. the manufacture craft of PZT piezoelectric actuator and Si-Au eutectic alloy bonding.
The manufacture craft of described mirror portion is specially: at first, be ready for the mask plate of photoetching treatment, utilize UV photoetching and developing technique with the mask plate structure design transfer that the designs silicon chip surface at mask plate.Secondly, with ICP-RIE (ion etching of induction coupling reaction) technology the silicon in the silicon chip is carried out the etching first time.Then, be ready for second mask plates of photoetching treatment again, utilize the UV photoetching technique and with ICP-RIE with the mask plate structure design transfer that designs to silicon chip, promptly the silicon in the silicon chip is carried out the etching second time with ICP-RIE, formation has the silicon mirror portion of four support columns, the last evaporation that carries out level crossing minute surface Al again forms catoptron.
The manufacture craft of described base portion is specially: at first, be ready for the mask plate of photoetching treatment, utilize UV photoetching and developing technique that the electrode that designs is shifted silicon face at the substrate that forms with glass substrate and silicon substrate bonding.
Mask plate in the manufacture craft of described base portion, its base is formed by anode linkage from top to bottom by glassy layer and silicon layer.
The Si-Au eutectic alloy bonding of described silicon catoptron and PZT driver is meant: the surface of the gold-plated film of silicon mirror back surface that processes and driver is also gold-plated, and form to drive by Si-Au eutectic alloy bonding and connect.
The deformable mirror of the Piezoelectric Driving that the present invention relates to, its principle are to utilize Piezoelectric Driving power drive to produce deformation to make micro-reflector generation deformation.Whole process can be made by the little manufacture method of based semiconductor silicon materials fully, and " diffractive thin-film piezoelectric micromirror and manufacture method thereof " in the background technology is to utilize the piezoelectricity specular layer of piezoelectric making to carry out work.Among the present invention based on microtome processing and fabricating piezoelectric actuator; Based on the micro-reflector that processing and fabricating on the silicon materials goes out, AM aluminum metallization is as specular layer on the silicon materials; It is easy that technology realizes, makes the entire device good integrity, and precision is higher.
Compare with background technology, micro-reflector of the present invention is the variable focal point micro-reflector of Piezoelectric Driving, on material, structure and technology, all existing deformable mirror is improved, whole micro-reflector only is made up of three parts, but simultaneously integrated four PZT piezoelectric actuators, when driving voltage when 0V is increased to 200V, micro-reflector can become 160nm from 0 linearity, be fit to regulate accurately fast; And based on the job operation of silicon technology, the micro reflector array that is very suitable for integrated making different scales only needs simply the size of the impressed voltage that applies by change just can regulate the micro-reflector focus fast and accurately, ratio micro-mirror structure in the past is simpler, easier array and Jiao Jiao control.The present invention can be applied in the fields such as optical communication.
Description of drawings
Fig. 1 is the structural representation of the deformable mirror of Piezoelectric Driving of the present invention;
Fig. 2 is the making process flow diagram of the silicon mirror portion of four support columns of band of the present invention;
Wherein: figure a is thick silicon chip, and b is photoetching for the first time of silicon chip process and etching, and c is that silicon chip is through photoetching for the second time and etching.
Embodiment
Below in conjunction with accompanying drawing embodiments of the invention are elaborated: present embodiment has provided detailed embodiment and process being to implement under the prerequisite with the technical solution of the present invention, but protection scope of the present invention is not limited to following embodiment.
As shown in Figure 1, the deformable mirror of the Piezoelectric Driving in the present embodiment produces normal force by piezoelectric actuator and drives, and concrete structure comprises: with the silicon mirror surface 1 of four support columns, four PZT piezoelectric actuator 2, base 3.Base 3 is positioned at the bottom of entire emission mirror, be four PZT piezoelectric actuators 2 above the base 3, on four PZT piezoelectric actuators 2 bonding have the silicon mirror surface 1 of four support columns, the frame of silicon mirror surface 1 links to each other with base 3, total is in conjunction with compactness, and processing is simple.
Described mirror surface 1 is all processed with silicon materials with base 3.
Described base 3 usefulness glass substrates and silicon substrate bonding form.The mach PZT piezoelectric actuator of cutting into slices, when applying the voltage that to regulate, the power that produces makes core generation plate deformation maximum, so form a male and fomale(M﹠F), the size of male and fomale(M﹠F) distortion and the size of piezoelectric forces have direct relation, can form concave surface when applying positive voltage, the concave surface distortion increases along with the increase of voltage; Can form convex surface when applying negative voltage, the convex surface distortion increases along with the increase of voltage.So the focus of micro-reflector can be regulated fast and accurately by the size of impressed voltage.The deformable mirror of the Piezoelectric Driving of present embodiment is driven by the normal direction piezoelectric forces.
The manufacture method of the deformable mirror of above-mentioned Piezoelectric Driving is divided into 4 sub-technologies: with between manufacture craft, base portion and the driver of the manufacture craft of the manufacture craft (as shown in Figure 2) of the silicon mirror portion of four support columns, base portion, PZT piezoelectric actuator and the Si-Au eutectic alloy bonding technology between driver and the catoptron.
As shown in Figure 2, with the manufacture craft of the silicon mirror portion of four support columns: mirror surface structure is processed on silicon chip, and this silicon wafer thickness is 2mm.Be specially: at first, be ready for the mask plate of photoetching treatment, utilize UV photoetching and developing technique the mask plate structure design transfer that designs silicon chip surface at mask plate.Secondly, with ICP-RIE (ion etching of induction coupling reaction) technology the silicon in the silicon chip is carried out the etching first time, etching depth is 1000 microns.Then, be ready for second mask plates of photoetching treatment again, utilize the UV photoetching technique and with ICP-RIE with the mask plate structure design transfer that designs to silicon chip, promptly the silicon in the silicon chip is carried out the etching second time with ICP-RIE, etching depth is 800 microns.It is the 1.8mm support column that formation has four height, and four height are pillar platform silicon catoptron (thickness the is about 200 microns) part that is connected with the PZT driver of 0.4mm, carries out the evaporation of mirror mirror Al at last again, and formation thickness is 200 microns catoptron.
The manufacture craft of base portion is: base is to process on the substrate of glass and silicon chip composition, and this substrate is formed by anode linkage by silicon chip and glass sheet, is respectively the Si layer of 200um and the glass substrate of 1000um from top to bottom.At first, utilize evaporation process to plate the gold of 0.1 micron thickness, utilize UV photoetching and developing technique to form gold electrode and lead solder-joint again in base central authorities.
The manufacture craft of PZT piezoelectric actuator: with the common microtome of cutting silicon chip, the height of processing four is 1.4mm, and area is the PZT piezoelectric actuator of 1mm * 1mmm.
Reach the Si-Au eutectic alloy bonding technology between driver and the catoptron between base portion and the driver: will all plate the gold of 100nm at the bottom of the base portion that process with driver, by the anode linkage machine, 550 ℃ of temperature, vacuum tightness is 760 millibars, the bonding time is 2 hours, realizes Si-Au eutectic alloy bonding; Same bonding conditions also realizes the Si-Au eutectic alloy bonding of driver and catoptron.Form the deformable mirror device of Piezoelectric Driving at last.
The single micro-mirror structure that present embodiment is made is of a size of 15*15mm
2, when driving voltage when 0V is increased to 200V, micro-reflector can become 160nm from 0 linearity, be fit to regulate accurately fast; And, be very suitable for the micro reflector array of integrated making different scales based on the job operation of silicon technology.In a word, this micro mirror only needs simply the size of the impressed voltage that applies by change just can regulate the micro-reflector focus fast and accurately, and simpler than in the past deformable mirror structure, easier array and zoom are controlled.
Claims (6)
1. the deformable mirror of a Piezoelectric Driving, comprise: with the silicon mirror surface of four support columns, four PZT piezoelectric actuators, base, it is characterized in that, base is formed by glass substrate and silicon substrate bonding, be positioned at the bottom of entire emission mirror, above the base four PZT piezoelectric actuators, on four PZT piezoelectric actuators bonding have a silicon mirror surface of four support columns, the frame of silicon mirror surface links to each other with base, when applying adjustable voltage, the normal direction piezoelectric forces that the PZT piezoelectric actuator produces makes the core generation plate deformation maximum of silicon mirror surface, forms a male and fomale(M﹠F).
2. the deformable mirror of Piezoelectric Driving according to claim 1 is characterized in that, described male and fomale(M﹠F) forms concave surface when applying positive voltage; When applying negative voltage, form convex surface.
3. the deformable mirror manufacture method of a Piezoelectric Driving is characterized in that, comprises the steps:
1. with the manufacture craft of the silicon mirror surface of four support columns part,
The manufacture craft of described silicon mirror surface part, be specially: at first, be ready for the mask plate of photoetching treatment, utilize UV photoetching and developing technique with the mask plate structure design transfer that designs silicon chip surface at mask plate, secondly, with induction coupling reaction ion etching technology the silicon in the silicon chip is carried out the etching first time, then, be ready for second mask plates of photoetching treatment again, utilize the UV photoetching technique and with induction coupling reaction ion etching technology with the mask plate structure design transfer that designs to silicon chip, promptly the silicon in the silicon chip is carried out the etching second time with induction coupling reaction ion etching technology, formation has the silicon mirror surface part of four support columns, the last evaporation that carries out level crossing minute surface Al again forms catoptron;
2. the manufacture craft of base portion,
The manufacture craft of described base portion is specially: at first, be ready for the mask plate of photoetching treatment, utilize UV photoetching and developing technique that the electrode that designs is shifted silicon face at the substrate that forms with glass substrate and silicon substrate bonding;
3. the manufacture craft of PZT piezoelectric actuator and Si-Au eutectic alloy bonding,
The manufacture craft of described PZT piezoelectric actuator is meant: with the common microtome of cutting silicon chip, processing four height is that 1.4mm, area are the PZT piezoelectric actuator of 1mmx1mm;
Described Si-Au eutectic alloy bonding is meant: between base portion and the driver and the Si-Au eutectic alloy bonding between driver and the silicon mirror surface part;
The Si-Au eutectic alloy bonding of described silicon mirror surface part and PZT piezoelectric actuator, be meant: with the gold-plated film of silicon mirror back surface that processes and the surface gold-plating of driver, form driving by Si-Au eutectic alloy bonding and connect, form the deformable mirror device of Piezoelectric Driving at last.
4. the deformable mirror manufacture method of Piezoelectric Driving according to claim 3 is characterized in that, in the manufacture craft of described silicon mirror surface part, mirror surface structure is processed on silicon chip, and this silicon wafer thickness is 2mm.
5. according to the deformable mirror manufacture method of claim 3 or 4 described Piezoelectric Driving, it is characterized in that in the manufacture craft of described silicon mirror surface part, etching depth is 1000 microns for the first time, etching depth is 800 microns for the second time.
6. the deformable mirror manufacture method of Piezoelectric Driving according to claim 3, it is characterized in that, in the manufacture craft of described base portion, base is to process on the substrate of glass and silicon chip composition, this substrate is formed by anode linkage by silicon chip and glass sheet, is respectively the Si layer of 200um and the glass substrate of 1000um from top to bottom.
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| CN111413794A (en) * | 2020-04-26 | 2020-07-14 | 罕王微电子（辽宁）有限公司 | Piezoelectric micro-mirror structure and preparation method thereof |
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