CN204883046U - Speculum of adjustable focal length - Google Patents
Speculum of adjustable focal length Download PDFInfo
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- CN204883046U CN204883046U CN201520547629.8U CN201520547629U CN204883046U CN 204883046 U CN204883046 U CN 204883046U CN 201520547629 U CN201520547629 U CN 201520547629U CN 204883046 U CN204883046 U CN 204883046U
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- Prior art keywords
- substrate
- thin layer
- hole
- piezoelectric diaphragm
- deformation
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Abstract
The utility model provides a speculum of adjustable focal length, this speculum of includes the reflection stratum, the thin layer, and first base plate and actuating mechanism, the reflection stratum covers in the upper surface of thin layer, and first base plate is located between thin layer and the actuating mechanism, and the direction of height of first base plate sets up first through -hole, actuating mechanism includes the executor base plate and gets the piezoelectric diaphragm that the recovering deformation of electricity back was lost in electric back flexural deformation that bond and be fixed in the executor base plate, thin layer, first base plate and executor base plate enclose into a seal chamber, outside the piezoelectric diaphragm was located seal chamber, seal chamber transmitted the thin layer with the deformation of piezoelectric diaphragm. The utility model has the advantages of enable the mirror surface and take place two -way deformation, have concave mirror function and convex mirror function concurrently.
Description
Technical field
The utility model belongs to optical device field, relates to a kind of catoptron of adjustable focal length.
Technical background
Traditional automatic focusing camera adjusts optical focal length by mobile lens position.Although the precision that stepper motor, voice coil motor etc. can realize lens position moves and locates, volume, energy consumption are unfavorable for the application on the mini-plant such as mobile phone, panel computer.For addressing this problem, the optical device that can control focal length variations by electricity receives the concern of researchist.Mainly contain transmission-type and reflective two types at present.Transmission-type device such as liquid lens changes by electrostatic force the change that the curvature on drop surface realizes focal length.Reflective devices then realizes the change of focal length by changing catoptron reflecting surface curvature.At present, distorting lens can realize the control of optical aberration correction and optical focal length, but not designs for focus controlling due to distorting lens, with high costs.
Chinese patent application 200310111664.7 discloses a kind of deformable silicon-base reflector, as shown in Figure 1, comprise silicon chip 1 ' and glass sheet 2 ', silicon chip 1 ' is by bonding region 7 ', silicon fiml 3 ' and forming with at least one silicon mesa post 5 ' that silicon fiml 3 ' lower surface is connected as a single entity, the upper surface of silicon fiml 3 ' is reflecting surface, glass sheet 2 ' has lead-in wire 8 ', pressure welding point 9 ' and the drive electrode 6 ' corresponding with silicon mesa post 5 ', glass sheet 2 ' and silicon chip 1 ' are fixed by bonding region 7 ', when applying voltage to drive electrode 6 ', the static-electronic driving silicon mesa post 5 ' produced moves downward, thus drive silicon fiml 3 ' that deformation occurs.Silicon fiml 3 ' produces flexural deformation, realizes the focus control to light beam.The shortcoming of this catoptron has: 1, drive electrode can only make silicon mesa post move downward, and silicon fiml concave is deformed into concave mirror, and silicon fiml can only realize downward monodisplacement, cannot have concave mirror function and convex mirror function concurrently.2, static-electronic driving needs high voltage.
Utility model content
The minute surface existed to overcome prior art can only unidirectional deformation, the shortcoming of concave mirror function and convex mirror function cannot be had concurrently, the utility model provides one can make minute surface generation bidirectional deformation, has the catoptron of a kind of adjustable focal length of concave mirror function and convex mirror function concurrently.
A catoptron for adjustable focal length, comprises reflection horizon, thin layer, first substrate and driving mechanism, and reflection horizon is covered in the upper surface of thin layer, and first substrate is between thin layer and driving mechanism, and the short transverse of first substrate arranges the first through hole;
Driving mechanism comprises actuator substrate and recovers the piezoelectric diaphragm of deformation after obtaining electric rear Bending Deformation dead electricity, and piezoelectric diaphragm is bonded and fixed to actuator substrate; Thin layer, first substrate and actuator substrate surround a seal chamber; Piezoelectric diaphragm is positioned at outside seal chamber, and the deformation of piezoelectric diaphragm is delivered to thin layer by seal chamber.
When piezoelectric diaphragm obtain electric and there is arch or recessed Bending Deformation time, the dielectric distribution state in seal chamber changes, thus make thin layer and on reflection horizon follow piezoelectric diaphragm arch or recessed.The voltage direction of control inputs piezoelectric diaphragm can control piezoelectric diaphragm and arch or recessed deformation occur.Possess convex reflecting mirror function during the arch of reflection horizon, disperse function is risen to light beam; Possess concave mirror function when reflection horizon is recessed, convergence effect is play to light beam.
Further, piezoelectric diaphragm is coaxial with seal chamber.
Further, thin layer has second substrate, second substrate is on first substrate, and the short transverse of second substrate arranges the second through hole, and coaxially, the first through hole is greater than the second through hole for the first through hole and the second through hole; Thin layer exposes to the part of second substrate as reflector space, arranges reflection horizon in reflector space; First substrate and second substrate are rigid member.First substrate and second substrate are rigid member and refer to first substrate and second substrate and press in seal chamber when changing and deformation can not occur.Because second substrate is rigid member, then only have the film of reflector space deformation can occur, thus make the pressure reduction produced because of piezoelectric diaphragm deformation all act on reflector space, and the area of reflector space is less than the sectional area of seal chamber, be exaggerated when making the deformation of piezoelectric diaphragm be delivered to reflector space.
Further, the second through hole of second substrate is manhole.
Make the method for the catoptron of above-mentioned adjustable focal length, comprise the following steps:
1), prepare first substrate, the upper surface of first substrate arranges SiO
2layer is as thin layer; Reflection horizon is prepared at the upper surface of thin layer;
2) sputter one deck aluminium film, on the first substrate, spin coating photoresist on aluminium film, carries out exposure imaging to photoresist, graphically portals; Take photoresist as protective seam, by phosphoric acid solution, wet etching is carried out to aluminium film, aluminium film etches corresponding first window, then removes photoresist;
3), with aluminium film A for protective seam, inductive couple plasma ICP or deep reaction ion etching DRIE is carried out to the silicon of first substrate 3 and etches, etch into thin layer 2 and end, etch the first through hole;
4) the piezoelectric diaphragm Wear Characteristics of Epoxy Adhesive, by two sides being covered with electrode is received on diameter copper sheet, and this copper sheet is as actuator substrate;
5), by actuator substrate bonding to second substrate with close the first through hole, piezoelectric diaphragm exposes, and the catoptron of adjustable focal length completes.
Further, following steps are comprised in step 1):
(1.1), prepare second substrate, the shape of second substrate is identical with first substrate with thickness; Make thin layer between first substrate and second substrate, first substrate under, second substrate is upper;
(1.2), sputtered aluminum film on second substrate; Then spin coating photoresist on aluminium film, carries out exposure imaging to photoresist, graphically portals; Take photoresist as protective seam, by phosphoric acid solution, wet etching is carried out to aluminium film, aluminium film etches corresponding window; Removing photoresist; The diameter of window is less than the diameter of the first through hole.
(1.3) with aluminium film for protective seam, inductive couple plasma ICP or deep reaction ion etching DRIE is carried out to the silicon of second substrate and etches, etch into thin layer cut-off, etch the second through hole;
(1.4) in the reflector space that thin layer exposes to second substrate sputtering or vacuum evaporation silver, aluminium or golden reflection horizon as reflecting surface.
The utility model has the advantage of:
1. catoptron can realize the distortion of positive and negative both direction, not only can be used as concave mirror but also can be used as convex mirror use, has two-way focusing function.
2., by the setting of the first through hole, make the distortion of catoptron larger, increase focusing range.
3., compared to electrostatic means, driving voltage is lower.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of prior art.
Fig. 2 is the mirror structure schematic diagram only with first substrate.
Fig. 3 is the catoptron schematic diagram with first substrate and second substrate.
The fundamental diagram that Fig. 4 is the utility model when being convex mirror.
Fig. 5 is that the utility model is as fundamental diagram during concave mirror.
Fig. 6 is a kind of preparation technology's process flow diagram.
Embodiment
Embodiment 1
As shown in Figure 2, a kind of catoptron of adjustable focal length, comprises reflection horizon 4, thin layer 2, first substrate 3 and driving mechanism, reflection horizon 4 is covered in the upper surface of thin layer 2, first substrate 3 is between thin layer 2 and driving mechanism, and the short transverse of first substrate 3 arranges the first through hole;
Driving mechanism comprises actuator substrate 6 and recovers the piezoelectric diaphragm 5 of deformation after obtaining electric rear Bending Deformation dead electricity, and piezoelectric diaphragm 5 is bonded and fixed to actuator substrate 6; Thin layer 2, first substrate 3 and actuator substrate 6 surround a seal chamber 61; Piezoelectric diaphragm 5 is positioned at outside seal chamber 61, and the deformation of piezoelectric diaphragm 5 is delivered to thin layer 2 by seal chamber 61.
When piezoelectric diaphragm 5 electric and there is arch or recessed Bending Deformation time, the dielectric distribution state in seal chamber 61 changes, thus make thin layer 2 and on reflection horizon 4 follow piezoelectric diaphragm 5 and to arch up or recessed.The voltage direction of control inputs piezoelectric diaphragm 5 can control piezoelectric diaphragm 5 and arch or recessed deformation occur.Reflection horizon 4 possesses convex lens function when arching up.Reflection horizon 4 possesses concavees lens function time recessed.
Piezoelectric diaphragm 5 is coaxial with seal chamber 61.
Embodiment 2
The difference part of the present embodiment and embodiment 1 is: as shown in Figure 3, thin layer 2 has second substrate 1, second substrate 1 is on first substrate 3, and the short transverse of second substrate 1 arranges the second through hole, coaxially, the first through hole is greater than the second through hole for first through hole and the second through hole; Thin layer 2 exposes to the part of second substrate 1 as reflector space, arranges reflection horizon 4 in reflector space; First substrate 3 and second substrate 1 are rigid member.All the other structures are all identical with embodiment one.
First substrate 3 and second substrate 1 are rigid member and refer to first substrate 3 and second substrate 1 and press in seal chamber 61 when changing and deformation can not occur.Because second substrate 1 is rigid member, then only have the film of reflector space deformation can occur, thus make the pressure reduction produced because of piezoelectric diaphragm 5 deformation all act on reflector space, and the area of reflector space is less than the sectional area of seal chamber 61, be exaggerated when making the deformation of piezoelectric diaphragm 5 be delivered to reflector space, the scope of focusing is increased, as shown in Figure 4 and Figure 5.
Second through hole of second substrate 1 is manhole, thus makes reflector space rounded.
Embodiment 3
Make the method for the catoptron of the adjustable focal length in embodiment 1, comprise the following steps:
1), make first substrate 3, SiO is set at the upper surface of first substrate 3
2layer is as thin layer 2; Reflection horizon 4 is prepared at the upper surface of thin layer 2;
2), on first substrate 3, sputter one deck aluminium film A, spin coating photoresist on aluminium film A, carries out exposure imaging to photoresist, graphically portals; Take photoresist as protective seam, by phosphoric acid solution, wet etching is carried out to aluminium film A, aluminium film A etches corresponding first window, then removes photoresist;
3), with aluminium film A for protective seam, inductive couple plasma ICP or deep reaction ion etching DRIE is carried out to the silicon of first substrate 3 and etches, etch into thin layer 2 and end, etch the first through hole;
4) piezoelectric diaphragm 5 Wear Characteristics of Epoxy Adhesive, by two sides being covered with electrode is received on diameter copper sheet, and this copper sheet is as actuator substrate 6;
5), by actuator substrate 6 bond to close the first through hole on second substrate 1, piezoelectric diaphragm 5 exposes, and the catoptron of adjustable focal length completes.
Embodiment 4
Make the method for the catoptron of the adjustable focal length in embodiment 2, comprise the following steps:
Step as shown in (A)-(H) of Fig. 6:
(A) choose soi wafer, soi wafer has first substrate 3 and second substrate 1, has SiO between first substrate 3 and second substrate 1
2thin layer; The silicon layer of first substrate 3 and the silicon layer of second substrate 1 are respectively 100 micron thickness, middle SiO
2layer is 1 micron thickness;
(B) on second substrate 1, sputter the aluminium film B of one deck 0.4 micron thickness; Then spin coating photoresist on aluminium film B, carries out exposure imaging to photoresist, and figure dissolves the circular hole that diameter is 4 millimeters; Take photoresist as protective seam, by phosphoric acid solution, wet etching is carried out to aluminium film B, aluminium film B etches the circular hole of corresponding 4 mm dias; Removing photoresist;
(C) with aluminium film B for protective seam, inductive couple plasma ICP or deep reaction ion etching DRIE is carried out to the silicon of second substrate 1 and etches, etch into SiO
2layer cut-off, etches the second circular through hole 11;
(D) on first substrate 3, sputter the aluminium film A of one deck 0.4 micron thickness; Then spin coating photoresist on aluminium film, carries out exposure imaging to photoresist, and figure dissolves the circular hole that diameter is 8 millimeters; Take photoresist as protective seam, by phosphoric acid solution, wet etching is carried out to aluminium film A, aluminium film A etches the circular hole of corresponding 8 mm dias; Remove photoresist afterwards;
(E) in second substrate 1 sputtering or the silver of vacuum evaporation 200 nanometer, aluminium or golden reflection horizon 4 as reflecting surface;
(F) with aluminium film A for protective seam, inductive couple plasma ICP or deep reaction ion etching DRIE is carried out to the silicon of first substrate 3 and etches, etch into SiO
2layer cut-off, etches the first circular through hole 31;
(G) circular piezoelectric diaphragm 5 Wear Characteristics of Epoxy Adhesive two sides being covered with diameter 5 millimeters thick 50 microns of electrode is received on the copper sheet of diameter 10 millimeters thick 60 millimeters, and copper sheet, as actuator substrate 6, is prepared into piezo actuator;
(H) actuator substrate 6 is bonded to the back side of mirror body, piezoelectric diaphragm 5 exposes, and the catoptron of adjustable focal length completes.
Content described in this instructions embodiment is only enumerating the way of realization that utility model is conceived; protection domain of the present utility model should not be regarded as being only limitted to the concrete form that embodiment is stated, protection domain of the present utility model also and conceive the equivalent technologies means that can expect according to the utility model in those skilled in the art.
Claims (4)
1. a catoptron for adjustable focal length, is characterized in that: this catoptron comprises reflection horizon, thin layer, first substrate and driving mechanism, reflection horizon is covered in the upper surface of thin layer, and first substrate is between thin layer and driving mechanism, and the short transverse of first substrate arranges the first through hole; Driving mechanism comprises actuator substrate and recovers the piezoelectric diaphragm of deformation after obtaining electric rear Bending Deformation dead electricity, and piezoelectric diaphragm is bonded and fixed to actuator substrate; Thin layer, first substrate and actuator substrate surround a seal chamber; Piezoelectric diaphragm is positioned at outside seal chamber, and the deformation of piezoelectric diaphragm is delivered to thin layer by seal chamber.
2. the catoptron of adjustable focal length as claimed in claim 1, is characterized in that: piezoelectric diaphragm is coaxial with seal chamber.
3. the catoptron of adjustable focal length as claimed in claim 2, it is characterized in that: thin layer has second substrate, second substrate is on first substrate, and the short transverse of second substrate arranges the second through hole, coaxially, the first through hole is greater than the second through hole for first through hole and the second through hole; Thin layer exposes to the part of second substrate as reflector space, arranges reflection horizon in reflector space; First substrate and second substrate are rigid member.
4. the catoptron of adjustable focal length as claimed in claim 3, is characterized in that: the second through hole of second substrate is manhole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520547629.8U CN204883046U (en) | 2015-07-27 | 2015-07-27 | Speculum of adjustable focal length |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520547629.8U CN204883046U (en) | 2015-07-27 | 2015-07-27 | Speculum of adjustable focal length |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204883046U true CN204883046U (en) | 2015-12-16 |
Family
ID=54827403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520547629.8U Withdrawn - After Issue CN204883046U (en) | 2015-07-27 | 2015-07-27 | Speculum of adjustable focal length |
Country Status (1)
| Country | Link |
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| CN (1) | CN204883046U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105022163A (en) * | 2015-07-27 | 2015-11-04 | 宁波大学 | Focal length-adjustable reflector |
| CN112133813A (en) * | 2020-09-24 | 2020-12-25 | 京东方科技集团股份有限公司 | Display panel, display device and electronic equipment |
-
2015
- 2015-07-27 CN CN201520547629.8U patent/CN204883046U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105022163A (en) * | 2015-07-27 | 2015-11-04 | 宁波大学 | Focal length-adjustable reflector |
| CN105022163B (en) * | 2015-07-27 | 2017-09-19 | 宁波大学 | A kind of speculum of adjustable focal length |
| CN112133813A (en) * | 2020-09-24 | 2020-12-25 | 京东方科技集团股份有限公司 | Display panel, display device and electronic equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20151216 Effective date of abandoning: 20170919 |
|
| AV01 | Patent right actively abandoned |