CN100570820C - The diagnostic method of electrostatic chuck and vacuum treatment installation - Google Patents
The diagnostic method of electrostatic chuck and vacuum treatment installation Download PDFInfo
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- CN100570820C CN100570820C CNB2007101812815A CN200710181281A CN100570820C CN 100570820 C CN100570820 C CN 100570820C CN B2007101812815 A CNB2007101812815 A CN B2007101812815A CN 200710181281 A CN200710181281 A CN 200710181281A CN 100570820 C CN100570820 C CN 100570820C
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
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Abstract
The invention provides a kind of diagnostic method of electrostatic chuck, it utilizes simple method that the life-span of electrostatic chuck is predicted.When the electrostatic chuck that is arranged on mounting table top in utilization carries out Electrostatic Absorption to substrate and this substrate is carried out plasma treatment, termly substrate is carried out diagnosis scheme as identical plasma treatment, the pressure of the backside gas that the gap between the surface of subtend electrostatic chuck and the back side of substrate is supplied with is adjusted, make the temperature of each substrate at this moment become set point of temperature, write down the pressure of this adjusted backside gas, to the pressure of this backside gas through the time change and monitor, thus, can predict the life-span of electrostatic chuck easily.
Description
Technical field
The present invention relates to the temperature adjusting performance of the electrostatic chuck that when substrate is carried out vacuum treatment, uses through the time change the technology of diagnosing.
Background technology
In the vacuum treatment installation that carries out etching, the processing of CVD equal vacuum, as being used for substrate is remained on unit on the mounting table, can not use vacuum cup (vacuum chuck), in order to suppress the damage (scar, bending etc.) of mechanical chuck, generally use electrostatic chuck in addition substrate.
Such electrostatic chuck 100 for example as shown in figure 11, is arranged on the surface element as the mounting table 102 in the container handling 103 of vacuum tank, constitutes the thin slice that is made of dielectric 122 and the electrode 121 that is arranged on its inside.Not shown power supply links to each other with this electrode 121, by applying voltage to this electrode 121, utilizes electrostatic force that the substrate 110 that is positioned on the electrostatic chuck 100 is adsorbed.
Above this electrostatic chuck 100, be provided with gas tip 104, when the time from gas supply pipe 105 supply processing gases, the high frequency that utilizes never illustrated power supply to supply with, between this gas tip 104 and mounting table 102, make and handle gaseous plasmaization, carry out the etching of substrate 110.
For example in etching work procedure, because heat input from plasma, the temperature of substrate 110 rises, therefore, make circulation in the refrigerant flow path 106 of for example cooling water in being arranged on mounting table 102 of cryogen source 107, be used to substrate 110 be maintained for example treatment temperatures of tens degree from input of the heat of plasma and balance to the heat release of mounting table 102 (cooling of being undertaken by mounting table 102).In addition, surface at electrostatic chuck 100, exist concavo-convex on the microcosmic, therefore, make in the gap of refrigerating gas (so-called backside gas (backsidegas)) between substrate 110 and electrostatic chuck 100 as temperature adjustment gas and circulate, the heat of substrate 110 is sidelong heat to electrostatic chuck 100 by this refrigerating gas.
But when continuous use electrostatic chuck 100, promptly the processing block number when substrate 110 becomes for a long time, shown in Figure 12 (a), the surface of dielectric 122 since with the contacting and loss of substrate 110, become level and smooth, therefore, the contact area with substrate 110 is increased to S2 by S1.Therefore, the heat that transmits to electrostatic chuck 100 from substrate 110 by this contact portion becomes big, and therefore, shown in Figure 12 (b), the temperature of substrate 110 can little by little descend.This variations in temperature is especially remarkable in the low processing of the pressure of refrigerating gas.The temperature of substrate 110 has surplus (margin) slightly with respect to the treatment state of substrate 110, therefore, when bringing into use electrostatic chuck 100, flow of the cold-producing medium of mounting table 102 sides etc. is adjusted, make the temperature of substrate 110 become design temperature, after this, keep this state to use continuously usually.
But, when the temperature of substrate 110 declines to a great extent,, can take place badly in batches for example when descending 10 ℃～15 ℃ the time, therefore need predict the life-span of electrostatic chuck 100.In addition, because refrigerating gas is the part of the heat transfer medium between substrate 110 and the electrostatic chuck 100, so, descend by the pressure that makes it, can suppress temperature and descend, but under the ongoing state of abrasion on the surface of electrostatic chuck 100, more with the ratio that the heat of the contact portion of substrate 110 is transmitted, therefore, the variations in temperature of substrate 110 is very blunt with respect to the pressure variation of refrigerating gas.Therefore, the benefit of correct operation of in fact carrying out refrigerating gas is few, and actual conditions are not carry out such correct operation.
As electrostatic chuck 100, known have 2 types: utilize the electrostatic force that produces between the surface of substrate 110 and electrostatic chuck 100 to adsorb Johnson La Bieke type (hereinafter referred to as " JR type ") of substrate 110; And utilize the electrostatic force that between substrate 110 and electrode 121, produces to adsorb the coulomb type of substrate 110.In the electrostatic chuck 100 of JR type, value of current flowing is big in the electrode 121, the absorption affinity instability, and on the other hand, in the coulomb type, current value is little and stable, therefore, uses the electrostatic chuck 100 of coulomb type.In the electrostatic chuck 100 of JR type, the current value that causes because of the increase of above-mentioned contact area through the time change greatly, therefore this current value can be used as the index in life-span.Relative therewith, in the electrostatic chuck 100 of coulomb type, through the time change little, therefore can not be with the index of this current value as the life-span.
In addition, in the plasma processing apparatus of reality, prepare to have a plurality of processing schemes, the design temperature of substrate 110 has also been prepared in advance multiple, surplus to this temperature also not all is the same, therefore, can not adopt the method that the temperature of substrate 110 is judged as the index in life-span.
In patent documentation 1, record the technology of before use characteristic of electrostatic chuck being predicted, but the index that is to use is electric current, voltage etc., and in the use of electrostatic chuck, can not its life-span be predicted, therefore can not solve above-mentioned problem.
[patent documentation 1] TOHKEMY 2003-133404 ((0027), Fig. 8)
Summary of the invention
The present invention makes under these circumstances, its purpose be to provide can to the temperature adjusting performance of electrostatic chuck through the time change diagnostic method, vacuum treatment installation of diagnosing and the storage medium that stores the computer program that can implement said method.
The invention provides a kind of diagnostic method of electrostatic chuck, to be arranged on the mounting table in the vacuum tank, be used to utilize electrostatic force substrate is adsorbed maintenance electrostatic chuck temperature adjusting performance through the time deterioration diagnose, it is characterized in that, comprising:
Operation (a) utilizing electrostatic chuck that substrate is adsorbed to keep and being used to adjust to supply between the surface of the back side of substrate and electrostatic chuck under the state of temperature adjustment gas of temperature of substrate, is implemented substrate is carried out vacuum treated operation repeatedly;
Operation (b), clip this operation (a), the atmosphere that the exposure of substrates that will be kept by electrostatic chuck absorption generates in the processing scheme of using diagnosis usefulness and the temperature of this substrate detected, pressure to above-mentioned temperature adjustment gas is adjusted, make temperature detection value become set point of temperature, and the force value of temperature adjustment gas at this moment is stored in the storage part; With
Operation (c) according to the force value of the temperature adjustment gas of storing in the above-mentioned storage part, is diagnosed the deterioration of the temperature adjusting performance of above-mentioned electrostatic chuck.
Preferred above-mentioned operation (b) clips above-mentioned operation (a) and carries out repeatedly.
The preferred operation (c) that the deterioration of the temperature adjusting performance of above-mentioned electrostatic chuck is diagnosed is carried out according to the time series data of the force value of the temperature adjustment gas of being obtained by the operation of carrying out repeatedly (b).
Operation (c) to the deterioration of the temperature adjusting performance of above-mentioned electrostatic chuck is diagnosed can comprise whether the force value of exchanging the wet body is lower than the operation that set point is judged.
The substrate of the processing scheme of the above-mentioned diagnosis usefulness of advantageous applications is a substrate of safeguarding usefulness.
The detection of the temperature of aforesaid substrate is undertaken by the temperature detecting part that is arranged on the mounting table.
Perhaps, the substrate of above-mentioned maintenance usefulness is equipped with temperature detecting part, and the temperature of aforesaid substrate is detected by this temperature detecting part.
The temperature detection value of said temperature test section is obtained after substrate is taken out of from vacuum tank, when the temperature detection value of substrate departs from set point of temperature, change the pressure of temperature adjustment gas, once more aforesaid substrate is exposed to the atmosphere of the processing scheme generation of using diagnosis usefulness, and obtain temperature detection value, carry out the diagnosis of above-mentioned electrostatic chuck thus.
Above-mentioned vacuum treatment can be to use the processing of plasma.
The surface of above-mentioned electrostatic chuck can be ground after forming dielectric powder by spraying plating.
The surface of above-mentioned electrostatic chuck can constitute: constitute by having with the annular convex of the roughly the same profile of aforesaid substrate with at a plurality of columns that interior all sides of this protuberance formed and formed the height identical with raised part, the gas of said temperature adjustment usefulness circulates between the column of interior all sides of raised part.
The invention provides a kind of vacuum treatment installation, be used under the state of the temperature adjustment gas of supplying with the temperature that is used to adjust substrate between the surface of the back side of the substrate of the adsorbed maintenance of electrostatic chuck on the mounting table in being set at vacuum tank and electrostatic chuck, substrate is carried out vacuum treatment, it is characterized in that, comprising:
The temperature detecting part that the temperature of substrate is detected;
The pressure detecting portion that the pressure of above-mentioned temperature adjustment gas is detected;
The pressure adjustment part that the pressure of above-mentioned temperature adjustment gas is adjusted;
Be used to store the storage part of the detected pressure value of this pressure detecting portion;
Performance element, clip the vacuum treatment that the polylith substrate is implemented successively, the atmosphere that will be generated in the processing scheme of using diagnosis usefulness by the exposure of substrates that above-mentioned electrostatic chuck absorption keeps, and the pressure of exchanging the wet body by above-mentioned pressure adjustment part is adjusted, make the temperature detection value of said temperature test section become set point of temperature, the detected pressure value of above-mentioned pressure detecting portion of this moment is stored in the storage part; With
According to the detected pressure value of the temperature adjustment gas of storing in the above-mentioned storage part, the diagnosis unit that the deterioration of the temperature adjusting performance of above-mentioned electrostatic chuck is diagnosed.
The substrate of the processing scheme of the above-mentioned diagnosis usefulness of advantageous applications is a substrate of safeguarding usefulness.
Preferred above-mentioned diagnosis unit is according to the time series data of the force value that clips the temperature adjustment gas that above-mentioned vacuum treatment obtains, and the deterioration of the temperature adjusting performance of above-mentioned electrostatic chuck is diagnosed.
Preferred above-mentioned diagnosis unit comprises whether the force value of exchanging the wet body is lower than the unit that set point is judged.
The invention provides a kind of storage medium, it stores the program that is used for vacuum treatment installation, and this vacuum treatment installation makes the electrostatic chuck absorption on the mounting table that is arranged in the vacuum tank keep substrate, this substrate is carried out vacuum treatment, it is characterized in that:
Said procedure makes up step in the mode of the diagnostic method of implementing above-mentioned electrostatic chuck.
The present invention is when supplying with between substrate and electrostatic chuck that thereby temperature adjustment gas maintains design temperature with substrate and this substrate carried out vacuum treatment, to monitoring for the force value that substrate is maintained the needed temperature adjustment gas of design temperature, according to this force value, for example by this force value and set point are compared, temperature adjusting performance to electrostatic chuck is diagnosed, therefore, can before arriving in useful life of electrostatic chuck, tackle, thereby can suppress the harmful effect that the variations in temperature because of substrate produces processing substrate.
Description of drawings
Fig. 1 is the longitudinal section of an example of expression vacuum treatment installation of the present invention.
Fig. 2 is the stereogram of an example of expression electrostatic chuck of the present invention.
Fig. 3 is the concept map of an example of the control part of expression first execution mode of the present invention.
Fig. 4 is the key diagram that is carried out forecast method the life-span of electrostatic chuck of the present invention.
Fig. 5 is the key diagram of the flow process of expression first execution mode of the present invention.
Fig. 6 is the concept map of an example of the control part of expression first execution mode of the present invention.
Fig. 7 is the stereogram of an example of the temperature detecting part of expression second execution mode of the present invention.
Fig. 8 is the concept map of an example of the control part of expression second execution mode of the present invention.
Fig. 9 is the key diagram of the flow process of expression second execution mode of the present invention.
Figure 10 is the key diagram of an example of the surface texture of expression electrostatic chuck of the present invention.
Figure 11 is the longitudinal section of the known substrate board treatment of expression.
Figure 12 is the key diagram for the worsening reason of electrostatic chuck.
Symbol description
The 2A control part
3a is the running program usually
The 3b diagnostic program
4 storage parts
30 mounting tables
34 electrostatic chucks
36 through holes
39 breather chamber
52 even outside line paths
53 test sides
56 pressure detecting portion
57 radiation thermometers
60 temperature sensors
61 memories
Embodiment
[first execution mode]
With reference to Fig. 1～Fig. 3, first execution mode of the diagnostic method that is used to implement electrostatic chuck of the present invention is described.Vacuum treatment installation 2 shown in Figure 1 for example is the device that wafer W is carried out plasma treatment, for example comprises: become the container handling 21 that the vacuum tank of confined space constitutes by inside; The mounting table 30 that bottom surface central authorities in this container handling 21 set; With the upper electrode 40 that above mounting table 30, is provided with in the mode relative with this mounting table 30.
Above-mentioned container handling 21 is by electrical grounding, and in addition, exhaust apparatus 23 is connected with the exhaust outlet 22 of the bottom surface of container handling 21 by blast pipe 24.Not shown pressure adjustment part is connected with this exhaust apparatus 23, and this pressure adjustment part constitutes: according to from the signal of control part 2A described later to carrying out vacuum exhaust in the container handling 21 and it being maintained the vacuum degree of expectation.The side of container handling 21 is provided with the conveyance mouth 25 of wafer W, and this conveyance mouth 25 can be opened and closed by gate valve 26.
Mounting table 30 constitutes by lower electrode 31 with from the supporter 32 of this lower electrode 31 of supported underneath.In supporter 32, be formed with the cold-producing medium savings portion 37 that is used to put aside as the cold-producing medium of temperature adjustable fluid as the temperature adjustment unit, cold-producing medium is by supply pipe 37a and discharge pipe 37b from the outside, in cold-producing medium savings portion 37, flow, thus the body part of mounting table 30 is cooled to predefined fiducial temperature, for example 20 ℃.Be provided with electrostatic chuck 34 on the top of mounting table 30, wafer W be positioned on the mounting table 30 by this electrostatic chuck 34.Electrostatic chuck 34 is made of insulating material (dielectric) 34a and the electrode foil 34b that is embedded among this insulating material 34a, and this electrode foil 34b is connected with high-voltage DC power supply 35 by switch 35a.Switch 35a is switched to high-voltage DC power supply 35 sides from the ground connection side, apply voltage from this high-voltage DC power supply 35 to electrode foil 34b, thus, produce static at electrode foil 34b and between being positioned in below the wafer W on this electrostatic chuck 34, make the wafer W that is positioned on the mounting table 30 by electrostatic chuck 34 Electrostatic Absorption.
As shown in Figure 2,, be formed with flat breather chamber 39, be used to supply with gas supply pipe 38 as the thermal conductivity gases such as He (helium) gas of temperature adjustment gas and connect the bottom surface of container handlings 21 and be connected with this breather chamber 39 in the inside of lower electrode 31.This temperature adjustment gas is called backside gas (backside gas) to be described, on on above-mentioned breather chamber 39, be formed with the through hole 36 of a lot of upper sheds on electrostatic chuck 34, the backside gas that is transported to breather chamber 39 from above-mentioned gas supply pipe 38 is fed into by through hole 36 gap of wafer W and electrostatic chuck 34, will be delivered to mounting table 30 sides of cooling by the heat that plasma is transferred to wafer W by backside gas.In addition, in Fig. 1, this breather chamber 39 and through hole 36 etc., part is omitted for simplicity of illustration.
The base end side of above-mentioned gas supply pipe 38 is connected with gas source 51 with the temperature adjustment with valve V by the pressure adjustment part 50 that is made of the pressure-regulating valve as the pressure adjustment unit.In addition on gas supply pipe 38, be provided with and be used for pressure detecting portion 56 that the pressure by pressure adjustment part 50 adjusted gases is detected.
In addition, mode with the bottom surface that connects mounting table 30 and container handling 21, be formed with infrared ray path 52, and, the position corresponding with this infrared ray path 52 on electrostatic chuck 34 also is formed with the open-work 34c as the part of infrared ray path 52, the upper end of the infrared ray path 52 in mounting table 30 (wafer W side), with with in the container handling 21 with this infrared ray path 52 outer distolateral between the mode of obstruction airtightly, be provided with penetrating window 54.In the outside of container handling 21, be provided with as the test side 53 of reception from the radiation thermometer 57 of the ultrared temperature detecting part of this infrared ray path 52.By infrared ray path 52, this infrared ray is received by above-mentioned test side 53 from the infrared ray of the back side of wafer W radiation, detects the temperature of wafer W by radiation thermometer 57, and this temperature detection value is sent to control part 2A described later.In addition, in this example, this infrared ray path 52 only is the cavity, but optical fiber etc. for example also can be set, and makes infrared ray pass through its inside.
In addition, as shown in Figure 3, in this vacuum treatment installation 2, be provided with the control part 2A as the diagnosis unit that for example is made of computer, this control part 2A comprises program 3, storage part 4 and CPU5.
In said procedure 3, store: the common running program 3a that is used to carry out the plasma treatment of wafer W; Be used for to the temperature adjustment function of electrostatic chuck 34 through the time change diagnose, in other words be exactly to be used for diagnostic program 3b that the life-span of electrostatic chuck 34 is predicted.
In turning round usually with program 3a, store the scheme that is used for wafer W is carried out various processing, according to this scheme, the voltage of kind, flow and high frequency electric source 40a, the 31a of previously described processing gas, frequency etc. are controlled, wafer W is carried out plasma treatment.In addition, as described later, utilize the temperature of the wafer W in the processing of radiation thermometer 57 article on plasma bodies to measure, can control, make this temperature become the treatment temperature of in above-mentioned scheme, indicating by the pressure of the above-mentioned 50 pairs of backside gas in pressure adjustment part.
Promptly, 3b gives the account in greater detail to this diagnostic program, the surface of the electrostatic chuck 34 of Electrostatic Absorption wafer W, as previously described shown in Figure 12 (a), increase along with service time (the processing block number of wafer W), this surface is because become level and smooth gradually with the friction of wafer W, therefore, increase gradually with the contact area of wafer W.As mentioned before, wafer W contact by physics with electrostatic chuck 34 and with the gap of electrostatic chuck 34 in the backside gas that circulates carry out heat exchange, along with the increase of the processing block number of wafer W, the heat conduction of being undertaken by this physics contact becomes big gradually.Therefore, shown in Fig. 4 (a), pressure adjustment part 50 is controlled, made still when the pressure of this backside gas reaches certain area of low pressure, to be difficult to the temperature certain (making the pressure (flow) of backside gas reduce gradually) of wafer W stably control.Therefore, with the limit (lower limit) pressure that is able to the pressure stability of backside gas ground is controlled life-span that is judged as electrostatic chuck 34 period of 5Torr (666.6Pa) for example.
When continuing to use electrostatic chuck 34 when surpassing this period in life-span, the heat conduction that produces because of wafer W and contacting of electrostatic chuck 34 further becomes big, can not as processing scheme is indicated, adjust the temperature of the wafer W in handling, therefore, the temperature of wafer W can descend gradually, and processing is exerted an influence.Shown in Figure 12 (b), (that is, compared with the heat exchange of wafer W and backside gas, contact the big processing of ratio of the heat exchange that produces because of the physics with electrostatic chuck 34) in the processing that the pressure of gas is low overleaf as previously described, this decrease of temperature is remarkable.On the other hand, along with the pressure that makes backside gas raises, decrease of temperature becomes gently, but the heat exchange of backside gas and wafer W (diffusion velocity of the molecule in the gas) has the limit, therefore this decrease of temperature can not be eliminated, all such problem can be produced in office where the managing.
But in the various schemes of being carried out with program 3a by common running, treatment temperature is different in each scheme, batch varied because of wafer W.Therefore, when turning round usually,, also can become the big data of error, but, can access the high-precision data in the life-span of the electrostatic chuck 34 of representing this figure by carrying out such diagnostic program 3b even the pressure of backside gas is monitored with program 3a.
This diagnosis program 3b, particularly, constitute: for example according to certain specific diagnosis scheme, the wafer W of safeguarding usefulness is carried out plasma treatment, measure the temperature of wafer W, and, the aperture (pressure of backside gas) of the pressure adjustment part 50 of backside gas is adjusted, make wafer W in the plasma treatment of this moment reach the set point of temperature of setting in scheme in diagnosis.That is,, treatment conditions are fixed, measure the pressure of backside gas, thus, can know because of the wafer W in the plasma treatment to contact the heat conducting degree that produces with the physics of electrostatic chuck 34, be the surface state of electrostatic chuck 34 for wafer W.
The force value of this adjusted backside gas is stored in the storage part 4.
By for example diagnosing according to diagnostic program 3b termly, the data of the force value of the backside gas of storage increase gradually in the storage part 4, therefore, can access the pressure of the backside gas shown in Fig. 4 (a) passing (through the time change).The passing of the pressure of this backside gas can utilize 2 functions etc. approximate simply, therefore, can predict the life-span of electrostatic chuck 34 in advance before arriving period in life-span.
This diagnostic program 3b, for example gives the alarm by alarm generating unit 6 when close on the period that reaches the life-span (end-of-life) according to the passing of the pressure of this backside gas, and output is used to urge the information of changing electrostatic chuck 34 on display part 7.The period in life-span that perhaps, also can on display part 7, always show electrostatic chuck 34.
In addition, this diagnostic program 3b can constitute after running whenever puts rules into practice number of times with program 3a usually and automatically perform, and perhaps also can carried out period arbitrarily by the operator.
These programs 3a, 3b (also comprise with the input operation of processing parameter and show relevant program) are stored in computer-readable storage medium for example among floppy disk, CD, the MO storage part 2B such as (photomagneto disks) and be installed among the control part 2A.
Then, use the effect of the diagnostic method of above-mentioned 2 pairs of electrostatic chucks 34 of the present invention of vacuum treatment installation to describe.
At first, in this vacuum treatment installation 2, with program 3a wafer W is carried out plasma treatment according to above-mentioned common running.About concrete step, all same except the operation of the temperature measuring of diagnostic program 3b described later and step S54 described later, therefore omit.Usually program 3a is used in running, according to various schemes, a plurality of wafer W is carried out continuously as vacuum treated plasma treatment, for example etch processes.Then, according to step described later, carry out the processing of diagnostic program 3b.In addition, such as previously described, in this turns round with program 3a usually, also can carry out the operation of step S54, the temperature of wafer W is proofreaied and correct.
(step S51: wafer W move into)
At first, gate valve 26 is opened, utilized not shown transport mechanism that wafer W is moved into and handle in the container 21.After flatly being positioned in this wafer W on the mounting table 30, switch 35a is switched to high-voltage DC power supply 35 sides, with the wafer W Electrostatic Absorption on mounting table 30.After this, make transport mechanism withdraw from and gate valve 26 is closed from container handling 21.
(step S52: the temperature adjustment of wafer W)
Then, supply with backside gas from gas supply pipe 38 by through hole 36.
(step S53: plasma treatment)
Utilize exhaust apparatus 23 by carrying out exhaust in 24 pairs of container handlings 21 of blast pipe, after remaining on the specified vacuum degree in the container handling 21, in container handling 21, supply with processing gas from handling gas source 46.Then, supply with first high frequency, make and handle gaseous plasmaization to upper electrode 40, and, supply with second high frequency to lower electrode 31, plasma is incorporated on the wafer W, wafer W is carried out plasma treatment.This plasma has been treated to maintenance and has carried out, and therefore, as handling gas, uses for example Ar (argon) gas, C
5F
8Gas or with Ar gas and O
2The gas of gas combination.
(step S54: the temperature measuring of wafer W)
In this plasma was handled, wafer W was owing to import from the heat of plasma, and temperature rises.On the other hand, wafer W is cooled owing to electrostatic chuck 34 (by the heat conduction that produces with contacting of electrostatic chuck 34 and the heat conduction of being undertaken by backside gas) etc., and therefore, by the balance of heat input and heat release, variations in temperature reaches equilibrium temperature.At this moment, according in above-mentioned infrared ray path 52 from below the infrared ray that comes of radiation, utilize radiation thermometer 57 to detect the temperature of wafer W, the pressure of backside gas is adjusted, make the detected value of temperature of this wafer W become set point of temperature by the adjustment of pressure adjustment part 50.In addition, in this operation, for example the pressure of backside gas is adjusted, made the temperature of wafer W become set point of temperature, also can monitor the temperature of wafer W by the operator, and the pressure (pressure adjustment part 50) of backside gas is adjusted by PID control etc.
(step S55: the pressure of record backside gas)
Will be in above-mentioned steps S54 the pressure record of adjusted backside gas in storage part 4.
(step S56: plasma treatment finishes)
Then, thus after stopping the generation of the plasma in high frequency electric source 40a, 31a power supply the stopping container handling 21, stop to supply with and handling gases from handling gas source 46.Then,, remaining gas is removed, wafer W is taken out of from container handling 21 by carrying out exhaust in 23 pairs of container handlings 21 of exhaust apparatus.
(step S57: the prediction in the period in life-span of electrostatic chuck 34)
Such as previously described, by the number of times that this diagnostic program 3b is stipulated repeatedly, the data of the pressure of the backside gas that writes down in step S55 accumulate gradually, can know the passing of the pressure of backside gas.According to the passing of the pressure of this backside gas, the life-span of electrostatic chuck 34 is predicted.That is,, obtain the approximate expression of the pressure of backside gas, the passing of the pressure of backside gas is in the future predicted according to the pressure data of accumulation.So, such as previously described when time in period in life-span of distance electrostatic chuck 34 during less than the set point of regulation (when the life-span of electrostatic chuck 34, closed on period), show alarm or urge the information of changing electrostatic chuck 34.
In the period in life-span of the electrostatic chuck 34 of this prediction, error is big after a little while when the data that write down in step S55, and along with these data increase gradually, precision increases gradually.
According to above execution mode, in diagnostic program 3b, record for the temperature with wafer W is adjusted into set point of temperature the backside gas of supplying with to the electrostatic chuck 34 and the gap of wafer W pressure through the time change, therefore, can according to this through the time change the life-span of electrostatic chuck 34 predicted, thereby can suppress the decrease in yield of the wafer W that causes because of the temperature anomaly in handling with simple method.In addition, because can always monitor the life-span of this electrostatic chuck 34, so can formulate the long term purchase plan of electrostatic chuck 34.
In this example, as mentioned above, the life-span of electrostatic chuck 34 is to try to achieve approximate expression from the passing of the pressure of the backside gas of accumulation, predict according to this approximate expression, for example also can utilize following method: when the pressure data that obtained when electrostatic chuck 34 (changed several times), the passing curve of the pressure of the backside gas of using this moment and the method for trying to achieve; Or in advance will be than the adjustment lower limit of the pressure of backside gas big value to a certain degree as set point, the method that gives the alarm when following etc. for this set point when the pressure of backside gas; Method that gives a warning when perhaps poor (variable quantity of the pressure of backside gas) of the force value of the backside gas that is obtaining in clipping 2 diagnostic program 3b that a plurality of common runnings carry out with program 3a is less than certain set point etc.
This diagnostic program 3b, as mentioned before, after the common running of the goods wafer W being carried out repeatedly stipulated number is with program 3a, carry out, but also can when using electrostatic chuck 34 for the first time, (during replacing) carry out, carry out to turn round usually after the A-stage of this electrostatic chuck 34 is confirmed and use program 3a.That is, electrostatic chuck 34 has subtle difference because of the difference of individuality, therefore, when changing electrostatic chuck 34, can confirm (deviation between the individuality of electrostatic chuck 34 is investigated) to this subtle difference by diagnostic program 3b.In addition, by the affirmation of this A-stage, it is many that the data number of the passing of the pressure of backside gas becomes, so Life Prediction becomes more reliable, and can suppress because of the bad decrease in yield that causes of the initial stage of electrostatic chuck 34.
In this example, in order to measure the temperature of the wafer W in the plasma treatment, use radiation thermometer 57 and utilize, but also can for example use the fluorescence thermometer and utilize brightness decay with the corresponding fluorophor of temperature from the infrared ray of wafer W irradiation.Promptly, (temperature is high more greatly because the fluorescent lifetime of fluorophor is subjected to Temperature Influence, the vibration of atom is big more, therefore, emitting of excitation energy is fast more, the decay of fluorescent lifetime is fast more), so, for example can constitute: in the infrared ray path 52 in above-mentioned example not shown optical fiber is set, further near the front end of this optical fiber (wafer W) coating or paste Fluoropher thin film, to this fluorophor irradiation exciting light, monitor luminous intensity, according to the die-away time of fluorescent lifetime the temperature of wafer W being measured.
In addition, except above-mentioned temperature-measuring method, also can use for example temperature of mensuration such as thermocouple, thermistor wafer W.
In above-mentioned example, carry out diagnostic program 3b termly, and the passing of the force value of at that time backside gas monitored, thus to predicting the period in life-span of electrostatic chuck 34, but also can be in turning round usually with program 3a, under the many situations of number of times (frequency) that the scheme of certain regulation is carried out, the passing of at that time force value is monitored, thereby the life-span is predicted.In this case, even do not carry out diagnostic program 3b, also can predict the life-span of electrostatic chuck 34.
At this, the article on plasma body is handled and is described, because plasma has the easier characteristic that focuses on the bight of the planar portions compared, so compare the central part of wafer W, the easier end that concentrates on wafer W of plasma, as a result, the temperature of the end of wafer W has the high trend of temperature than the central part of wafer W.Therefore, previously described backside gas is separately supplied with to the central part and the end of wafer W, and the pressure of the backside gas of supplying with to the end of wafer W is improved, and thus, can keep the interior temperature of face of wafer W equably.Be shown in Fig. 6 simply with forming such example of structure.
Fig. 6 represents following example of structure: for the central part and the end of wafer W, respectively according to the detected pressure value of pressure detecting portion 56a and pressure detecting portion 56b, utilize pressure adjustment part 50 that backside gas is separately supplied with to through hole 36a and 36b.In addition, the central part of wafer W and the temperature of end are detected from infrared ray path 52a and 52b by test side 53a and 53b.The pressure of the central part of wafer W and the temperature of end and backside gas is sent to control part 2A and storage part 4 respectively, respectively the pressure of the backside gas of the central part of wafer W and end is adjusted, and carries out each above-mentioned step S51～S57.In this case, breather chamber 39 constitutes: utilize the next door 33 of ring-type to be divided into central part and end and supply with backside gas.In addition, same with previously described Fig. 3, in Fig. 6,, omit and represent for the quantity of through hole 36a, 36b.
Such as previously described, when the pressure of backside gas hangs down, process along with the processing time, the temperature of wafer W can decline to a great extent, therefore, increase along with the processing block number of wafer W, the deviation of the temperature in the face of wafer W also becomes big, but respectively the pressure of backside gas is controlled in the central part and the end of wafer W, therefore as mentioned above,, the deviation that can suppress the temperature in the wafer W face, and, because the number of pressure data increases, so can predict the life-span of electrostatic chuck 34 more reliably.
In addition, in this example, the control of the pressure that the central part and the end parts of wafer W driven into capable backside gas, but also can constitute: a plurality of positions that radially are divided in wafer W are for example controlled the pressure of backside gas at 3 positions.
[second execution mode]
Then, with reference to Fig. 7～Fig. 9 second execution mode of the present invention is described.Fig. 7 represents to be formed with the temperature measuring wafer W as the temperature detecting part of thermistor equitemperature detecting element.With on the surface of wafer W, be provided with a plurality of temperature sensors 60 and the memory 61 that is used to preserve the temperature data of measuring by this temperature sensor 60 in this temperature measuring.By this temperature measuring is carried out plasma treatment with wafer W, measure the temperature in the plasma treatment, after this can read temperature data and obtain temperature the plasma treatment from this memory 61.
In this embodiment, control part 2A also comprises the program 3 that is made of with program 3a and diagnostic program 3b common running.About common running program 3a, similarly play a role with above-mentioned execution mode, but radiation thermometer 57 is set, therefore, the temperature of the wafer W in the plasma treatment is along with the increase in processing time, compare with the temperature that scheme is indicated, can descend gradually.
Same with above-mentioned execution mode, use program 3a, the surface of electrostatic chuck 34 to become level and smooth by repeatedly turning round usually repeatedly, the heat conduction that produces because of electrostatic chuck 34 and contacting of wafer W increases, therefore, shown in Fig. 4 (b), can think that the temperature of wafer W drops to t2 from the t1 at initial stage.
After this, as periodic maintenance, above-mentioned temperature measuring is carried out the plasma treatment of standard scheme (diagnosis scheme) with wafer W as the part of diagnostic program 3b.Then, the pressure of backside gas is adjusted (reduction) to P2 from P1, make the temperature of the wafer W in the above-mentioned processing get back to t1.The pressure of this moment is stored in the storage part 4.
Carry out this diagnostic program 3b by interval in accordance with regulations, the temperature of wafer W is adjusted to t1 from t2, on the other hand, the pressure of backside gas adjusted to stage by stage P1, P2 ..., Pn.In this embodiment, can predict that also the pressure of backside gas becomes the period of the lower limit P0 that can adjust, therefore such as previously described, also can change electrostatic chuck 34 to warning period in life-span, show in advance to urge.In this example, also can be same with above-mentioned execution mode, the approximate expression that utilization is tried to achieve from the data that obtain, to the method that monitors with difference or to application of the data that obtain in the past etc. as the set point of threshold value, the life-span of electrostatic chuck 34 is predicted.
In addition, in this embodiment, can make diagnostic program 3b have the effect that common running is proofreaied and correct with the pressure of the backside gas among the program 3a.Promptly, can so that: according to the corresponding relation of the pressure adjusted value (P1 and P2's is poor) of the temperature correction value in the standard scheme of diagnostic program 3b (t1 and t2's is poor) and backside gas, can carry out prediction to a certain degree to the corresponding relation in other scheme of in turning round usually, implementing with program 3a, promptly, in other scheme, also can predict the pressure that needs the backside gas of adjustment for the temperature of wafer W is proofreaied and correct, therefore, by carrying out this diagnostic program 3b, will proofread and correct with the pressure of the backside gas among the program 3a common running.In addition, also can so that: according to the change amount identical, similarly common running is adjusted with the pressure of the backside gas among the program 3a with the pressure of adjusted backside gas in diagnostic program 3b.
Then, with reference to Fig. 9 the effect of this second execution mode is described.
As mentioned above, the common running of wafer W being carried out repeatedly stipulated number with program 3a after, carry out diagnostic program 3b according to following step.
(step S91: temperature measuring is moved into wafer W)
Same with above-mentioned step S51, temperature measuring is positioned on the mounting table 30 with wafer W, and with the wafer W Electrostatic Absorption on mounting table 30.
(step S92: plasma treatment)
Then, S53 is same with step, and this temperature measuring is carried out plasma treatment with wafer W.
(step S93: the temperature data accumulation)
The temperature of utilization in the temperature sensor 60 article on plasma bodies that temperature measuring is provided with on wafer W are handled measured, and this temperature is kept in the memory 61.
(step S94: temperature measuring is taken out of with wafer W)
Then, according to the path opposite, wafer W is taken out of the outside of handling container 21 with the path that wafer W is moved into.
(step S95: temperature data obtain)
To read at the temperature data that this temperature measuring is preserved in the memory 61 of wafer W, and be sent to control part 2A.
(step S96: the affirmation of temperature)
Whether to the temperature that obtains in above-mentioned steps S95 is that predetermined design temperature is judged.When this temperature is not design temperature, after the pressure of backside gas adjusted, repeat the later step of above-mentioned steps S91 once more, and temperature is confirmed, make it become design temperature.When being design temperature, then carry out step S97.
(step S97: the pressure of record backside gas)
Same with above-mentioned step S58, the pressure of the backside gas that will set in step S96 is stored in the storage part 4.In addition, as mentioned above, the pressure of backside gas of this moment can be used in the common running after this carried out correction with the pressure of the backside gas of program 3a.
(step S98: the prediction in the period in life-span of electrostatic chuck 34)
Then, S57 is same with step, according to the passing of pressure of the backside gas of record, to predicting the period in life-span of electrostatic chuck 34.
According to above execution mode, except the effect that can obtain the first above-mentioned execution mode, can also obtain following effect.That is, when the temperature of the wafer W in the article on plasma body is handled is measured, do not need to carry out in addition the transformation of device etc., can use existing temperature measuring wafer W, so can predict the life-span of electrostatic chuck 34 easily.
In addition, in above-mentioned step S96, also can obtain the dependency relation (for example having changed under the situation several times the data before preserving etc.) of the pressure of the temperature of wafer W and backside gas in advance at electrostatic chuck 34, according to this dependency relation, determine the pressure of backside gas.In this case, in step S96, carry out the adjustment of backside gas after, carry out next procedure S97.
In this example, also can be shown in Figure 6 as previously described, for the central part and the end of wafer W, according to the detected pressure value of pressure detecting portion 56a and pressure detecting portion 56b, separately supply with respectively to through hole 36a and 36b.In this case, temperature measuring can be arranged on the central part and the end of wafer W with the temperature sensor 60 of wafer W, the central part of wafer W and the temperature of end are measured.
In above-mentioned each example, shape about the surface of electrostatic chuck 34, shown in Figure 2 as previously described, on the macroscopic view as the plane, backside gas circulates in the small gap of electrostatic chuck 34 and wafer W, but also can: as shown in figure 10, for example be provided with the protuberance 70 that has with the ring-type of the roughly the same profile of the diameter of wafer W from the teeth outwards, be provided with a plurality of columns 71 with this protuberance 70 equal heights in interior all sides of this protuberance 70, backside gas is in 71 circulations of this column.In such structure, the temperature of wafer W is cooled off strong by backside gas, and therefore, the minimizing gradient of the pressure of backside gas shown in Figure 4 diminishes, but in such electrostatic chuck 34, also can predict the life-span.
In addition, also can: form the powder that the material by the insulating material 34a of this electrostatic chuck 34 constitutes on the surface of electrostatic chuck 34 by spraying plating, after this use grinding stone to grind, perhaps the attrition process that the grinding-material of abrasive grains suspension is carried out by use forms.In the electrostatic chuck 34 of such structure, also can predict the life-span.
In above-mentioned each example, to utilizing plasma treatment that wafer W is heated, utilize backside gas that the situation of its cooling is illustrated, but also can use in the technology that the temperature of the technology of this processing beyond the plasma treatment, for example wafer W rises along with processing.In addition, also can be applied to by handling the wafer W cooling, utilize backside gas that wafer W is heated, thus the technology that the temperature of wafer W is controlled, for example among the CVD etc.In this case, increase along with the processing block number of wafer W, the temperature of wafer W rises gradually, therefore, become the structure that the pressure that makes backside gas rises gradually along with the process of time, for example will make the life-span as electrostatic chuck 34 such as period that wafer W breaks because of the hypertonia of backside gas.
Claims (15)
1. the diagnostic method of an electrostatic chuck, to be arranged on the mounting table in the vacuum tank, utilize electrostatic force substrate is adsorbed maintenance electrostatic chuck temperature adjusting performance through the time deterioration diagnose, it is characterized in that, comprising:
Operation (a) utilizing electrostatic chuck that substrate is adsorbed to keep and being used to adjust to supply between the surface of the back side of substrate and electrostatic chuck under the state of temperature adjustment gas of temperature of substrate, is implemented substrate is carried out vacuum treated operation repeatedly;
Operation (b), clip this operation (a), the atmosphere that the exposure of substrates that will be kept by electrostatic chuck absorption generates in the processing scheme of using diagnosis usefulness and the temperature of this substrate detected, pressure to described temperature adjustment gas is adjusted, make temperature detection value become set point of temperature, and the force value of temperature adjustment gas at this moment is stored in the storage part; With
Operation (c) according to the force value of the temperature adjustment gas of storing in the described storage part, is diagnosed the deterioration of the temperature adjusting performance of described electrostatic chuck.
2. the diagnostic method of electrostatic chuck as claimed in claim 1 is characterized in that:
Described operation (b) clips described operation (a) and carries out repeatedly.
3. the diagnostic method of electrostatic chuck as claimed in claim 2 is characterized in that:
The operation (c) that the deterioration of the temperature adjusting performance of described electrostatic chuck is diagnosed is carried out according to the time series data of the force value of the temperature adjustment gas of being obtained by the operation of carrying out repeatedly (b).
4. the diagnostic method of electrostatic chuck as claimed in claim 1 or 2 is characterized in that:
Operation (c) to the deterioration of the temperature adjusting performance of described electrostatic chuck is diagnosed comprises whether the force value of exchanging the wet body is lower than the operation that set point is judged.
5. the diagnostic method of electrostatic chuck as claimed in claim 1 or 2 is characterized in that:
The substrate of using the processing scheme of described diagnosis usefulness is a substrate of safeguarding usefulness.
6. the diagnostic method of electrostatic chuck as claimed in claim 1 or 2 is characterized in that:
The detection of the temperature of described substrate is undertaken by the temperature detecting part that is arranged on the mounting table.
7. the diagnostic method of electrostatic chuck as claimed in claim 5 is characterized in that:
The substrate of described maintenance usefulness is equipped with temperature detecting part, and the temperature of described substrate is detected by this temperature detecting part.
8. the diagnostic method of electrostatic chuck as claimed in claim 7 is characterized in that:
The temperature detection value of described temperature detecting part is obtained after substrate is taken out of from vacuum tank, when the temperature detection value of substrate departs from set point of temperature, change the pressure of temperature adjustment gas, once more described exposure of substrates is diagnosed the atmosphere of the processing scheme generation of usefulness in use, and obtain temperature detection value.
9. the diagnostic method of electrostatic chuck as claimed in claim 1 or 2 is characterized in that:
Described vacuum treatment is to use the processing of plasma.
10. the diagnostic method of electrostatic chuck as claimed in claim 1 or 2 is characterized in that:
Grind after forming dielectric powder by spraying plating on the surface of described electrostatic chuck.
11. the diagnostic method of electrostatic chuck as claimed in claim 1 or 2 is characterized in that:
The surface of described electrostatic chuck constitutes by having with the annular convex of the roughly the same profile of described substrate with at a plurality of columns that interior all sides of this protuberance formed and formed the height identical with described protuberance, and described temperature adjustment gas circulates between the column of interior all sides of described protuberance.
12. vacuum treatment installation, be used under the state of the temperature adjustment gas of supplying with the temperature that is used to adjust substrate between the surface of the back side of the substrate of the adsorbed maintenance of electrostatic chuck on the mounting table in being set at vacuum tank and electrostatic chuck, substrate is carried out vacuum treatment, it is characterized in that, comprising:
The temperature detecting part that the temperature of substrate is detected;
The pressure detecting portion that the pressure of described temperature adjustment gas is detected;
The pressure adjustment part that the pressure of described temperature adjustment gas is adjusted;
Be used to store the storage part of the detected pressure value of this pressure detecting portion;
Performance element, clip the vacuum treatment that the polylith substrate is implemented successively, the atmosphere that will be generated in the processing scheme of using diagnosis usefulness by the exposure of substrates that described electrostatic chuck absorption keeps, and the pressure of exchanging the wet body by described pressure adjustment part is adjusted, make the temperature detection value of described temperature detecting part become set point of temperature, the detected pressure value of described pressure detecting portion of this moment is stored in the storage part; With
According to the detected pressure value of the temperature adjustment gas of storing in the described storage part, the diagnosis unit that the deterioration of the temperature adjusting performance of described electrostatic chuck is diagnosed.
13. vacuum treatment installation as claimed in claim 12 is characterized in that:
The substrate of using the processing scheme of described diagnosis usefulness is a substrate of safeguarding usefulness.
14., it is characterized in that as claim 12 or 13 described vacuum treatment installations:
Described diagnosis unit is according to the time series data of the force value that clips the temperature adjustment gas that described vacuum treatment obtains, and the deterioration of the temperature adjusting performance of described electrostatic chuck is diagnosed.
15., it is characterized in that as claim 12 or 13 described vacuum treatment installations:
Described diagnosis unit comprises whether the force value of exchanging the wet body is lower than the unit that set point is judged.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
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| JP2006293040 | 2006-10-27 | ||
| JP2006293040A JP5003102B2 (en) | 2006-10-27 | 2006-10-27 | Electrostatic chuck diagnostic method, vacuum processing apparatus, and storage medium |
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| CN101170057A CN101170057A (en) | 2008-04-30 |
| CN100570820C true CN100570820C (en) | 2009-12-16 |
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| JP (1) | JP5003102B2 (en) |
| KR (1) | KR100924849B1 (en) |
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| KR20110082166A (en) | 2008-10-07 | 2011-07-18 | 가부시키가이샤 알박 | Substrate managing method |
| CN102187447B (en) * | 2008-10-20 | 2013-03-27 | 创意科技股份有限公司 | Method for inspecting electrostatic chuck, and electrostatic chuck apparatus |
| JP5445335B2 (en) * | 2010-05-31 | 2014-03-19 | 東京エレクトロン株式会社 | Substrate processing apparatus data acquisition method and substrate processing system |
| JP5776090B2 (en) * | 2010-07-21 | 2015-09-09 | 株式会社 天谷製作所 | Deposition process |
| JP5879069B2 (en) | 2011-08-11 | 2016-03-08 | 東京エレクトロン株式会社 | Method for manufacturing upper electrode of plasma processing apparatus |
| US8592786B2 (en) * | 2012-03-23 | 2013-11-26 | Varian Semiconductor Equipment Associates, Inc. | Platen clamping surface monitoring |
| CN103794527B (en) * | 2012-10-30 | 2016-08-24 | 中微半导体设备(上海)有限公司 | Electrostatic chuck heating means |
| JP6010433B2 (en) * | 2012-11-15 | 2016-10-19 | 東京エレクトロン株式会社 | Substrate mounting table and substrate processing apparatus |
| KR102174964B1 (en) * | 2014-09-30 | 2020-11-05 | 스미토모 오사카 세멘토 가부시키가이샤 | Electrostatic chuck device |
| US10184183B2 (en) * | 2016-06-21 | 2019-01-22 | Applied Materials, Inc. | Substrate temperature monitoring |
| JP2019075477A (en) * | 2017-10-17 | 2019-05-16 | 株式会社ディスコ | Chuck table mechanism |
| CN109724712B (en) * | 2017-10-31 | 2021-04-30 | 上海微电子装备（集团）股份有限公司 | Temperature detection device, manufacturing method thereof and laser surface annealing equipment |
| JP6646700B2 (en) | 2018-03-19 | 2020-02-14 | 株式会社不二製作所 | Surface treatment method for treated product made of hard brittle material |
| CN111448647B (en) * | 2018-03-26 | 2023-08-01 | 日本碍子株式会社 | Electrostatic chuck heater |
| CN111009454B (en) * | 2018-10-05 | 2024-05-17 | 东京毅力科创株式会社 | Plasma processing apparatus, monitoring method, and recording medium |
| CN113808928A (en) * | 2021-08-04 | 2021-12-17 | 北京华卓精科科技股份有限公司 | Laser annealing method and porous sucker with automatic cooling function |
| KR102648439B1 (en) | 2021-11-25 | 2024-03-18 | 명지대학교 산학협력단 | Function evaluation system |
| CN116254514A (en) * | 2022-12-30 | 2023-06-13 | 北京北方华创微电子装备有限公司 | Semiconductor process equipment and process control method thereof |
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| JP2630118B2 (en) * | 1990-07-02 | 1997-07-16 | 株式会社日立製作所 | Vacuum processing method and device |
| JPH06124916A (en) * | 1992-10-12 | 1994-05-06 | Ryoden Semiconductor Syst Eng Kk | Dry etching device |
| US6140612A (en) * | 1995-06-07 | 2000-10-31 | Lam Research Corporation | Controlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuck |
| US5810933A (en) * | 1996-02-16 | 1998-09-22 | Novellus Systems, Inc. | Wafer cooling device |
| JP4030030B2 (en) | 1998-04-24 | 2008-01-09 | キヤノンアネルバ株式会社 | Method and apparatus for detecting suction force of electrostatic chuck holder |
| US6853953B2 (en) * | 2001-08-07 | 2005-02-08 | Tokyo Electron Limited | Method for characterizing the performance of an electrostatic chuck |
| AU2003294379A1 (en) * | 2002-12-20 | 2004-07-29 | Tokyo Electron Limited | Method and apparatus for determining consumable lifetime |
| CN100382275C (en) * | 2004-10-29 | 2008-04-16 | 东京毅力科创株式会社 | Substrate mounting table, substrate processing apparatus and substrate temperature control method |
| JP4642550B2 (en) * | 2004-10-29 | 2011-03-02 | 東京エレクトロン株式会社 | Substrate mounting table, substrate processing apparatus, and substrate temperature control method |
| JP4551256B2 (en) * | 2005-03-31 | 2010-09-22 | 東京エレクトロン株式会社 | Mounting table temperature control device, mounting table temperature control method, processing device, and mounting table temperature control program |
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| JP5003102B2 (en) | 2012-08-15 |
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| TWI419253B (en) | 2013-12-11 |
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