CN100519487C - 抛光瓷砖表面二氧化硅抗污涂层的制备方法 - Google Patents
抛光瓷砖表面二氧化硅抗污涂层的制备方法 Download PDFInfo
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- CN100519487C CN100519487C CNB2006100993541A CN200610099354A CN100519487C CN 100519487 C CN100519487 C CN 100519487C CN B2006100993541 A CNB2006100993541 A CN B2006100993541A CN 200610099354 A CN200610099354 A CN 200610099354A CN 100519487 C CN100519487 C CN 100519487C
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 89
- 238000000034 method Methods 0.000 title claims abstract description 73
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 43
- 235000012239 silicon dioxide Nutrition 0.000 title claims description 40
- 238000005498 polishing Methods 0.000 claims abstract description 55
- 238000000576 coating method Methods 0.000 claims abstract description 52
- 239000007788 liquid Substances 0.000 claims abstract description 50
- 239000011248 coating agent Substances 0.000 claims abstract description 45
- -1 fluorosilicon compound Chemical class 0.000 claims abstract description 24
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 15
- 239000000839 emulsion Substances 0.000 claims description 117
- 229910052710 silicon Inorganic materials 0.000 claims description 101
- 239000010703 silicon Substances 0.000 claims description 101
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 100
- 150000001875 compounds Chemical class 0.000 claims description 93
- 239000011449 brick Substances 0.000 claims description 46
- 229960001866 silicon dioxide Drugs 0.000 claims description 41
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 39
- 238000000227 grinding Methods 0.000 claims description 36
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- 238000002360 preparation method Methods 0.000 claims description 16
- PRPAGESBURMWTI-UHFFFAOYSA-N [C].[F] Chemical compound [C].[F] PRPAGESBURMWTI-UHFFFAOYSA-N 0.000 claims description 15
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 10
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 9
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 9
- 229920002313 fluoropolymer Polymers 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- 238000006116 polymerization reaction Methods 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims description 6
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
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- 229910052801 chlorine Inorganic materials 0.000 claims description 3
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- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 claims description 3
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- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 3
- 239000011737 fluorine Substances 0.000 claims 3
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- 241000870659 Crassula perfoliata var. minor Species 0.000 description 1
- BVTJGGGYKAMDBN-UHFFFAOYSA-N Dioxetane Chemical compound C1COO1 BVTJGGGYKAMDBN-UHFFFAOYSA-N 0.000 description 1
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- 241000165940 Houjia Species 0.000 description 1
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Landscapes
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
№ | SiO<sub>2</sub>含量Wt% | pH值 | 粒子直径范围nm | 备注 |
1 | 20或25 | 2—4 | 10—30 | 酸性硅溶胶 |
2 | 20或25或30 | 6.5—7.5 | 10—20 | 中性硅溶胶 |
3 | 40或50 | 9.0—10.0 | 20—3040—6070—100 | 碱性高浓度硅溶胶 |
4 | 40 | 9.0—10.0 | 40—6070—100 | 碱性大粒径硅溶胶 |
5 | 30—40 | 9.0—10.0 | 80—120 | 碱性大颗粒抛光专用硅溶胶 |
项目 | 指标 | 项目 | 指标 |
外观 | 乳白兰光液体 | 固含量(wt%) | 48±2 |
最低成膜温度(MFFT) | 14-23℃ | 粘度(mPa.s) | 600-1500 |
PH值(酸碱度) | 7.5-9.0 | 残余单体(溴值%) | ≤1.0 |
稀释稳定性 | 20%水溶液通过 | 化学稳定性(5%的氯化钙乳液) | 1:5无絮凝等变质现象 |
机械稳定性 | 3000r/min半小时通过 | 冻融稳定性 | 5个循环通过 |
序号 | 项目 | 指标 |
1 | 外观 | 乳白微带蓝相液体 |
2 | 固体含量,WT% | 55±2% |
3 | 粘度,mpa.s | 1000-2500 |
4 | 玻璃化温度,℃ | 28 |
5 | 最低成膜温度℃ | 16 |
6 | 平均粒径μm | 0.3-0.5 |
7 | 离子性 | 阴离子 |
序号 | 项目 | 指标 | 检测方法 |
1 | 外观 | 乳白色液体 | 目测 |
2 | 粘(23℃±1℃)mPa.s | 1000-3000 | GB/T2794 |
3 | 固体含量% | 53.0-55.0 | GB/T1725 |
4 | PH值 | 3-5 | 企业标准 |
5 | 玻璃化温度℃ | 28 | 计算值 |
6 | 最低成膜温度℃ | 16 | GB/T9267 |
7 | 离子性质 | 阴离子 | |
8 | 挥发性有机化合物g/L≤ | 30 | GB18582-2001附录A |
9 | 游离甲醛g/kg≤ | 0.08 | GB18582-2001附录B |
项目 | 指标 | 项目 | 指标 |
外观 | 乳白色泛兰液体 | 固含量(wt%) | 45±2 |
最低成膜温度(MFFT) | 15-20℃ | 粘度(mPa.s) | 500-1000 |
PH值(酸碱度) | 8.0-9.5 | 残余单体(溴值%) | ≤1.0 |
稀释稳定性 | 20%水溶液通过 | 化学稳定性(5%的氯化钙乳液) | 1∶1通过 |
机械稳定性 | 4000r/min半小时通过 | 冻融稳定性 | 5个循环通过 |
硅溶胶 | 硅丙乳液 | 苯丙乳液 | 聚四氟乙烯乳液 | |
固含量(Wt%) | 25 | 30 | 30 | 30 |
pH值 | 10.0 | 9.8 | 9.7 | ≥8.0 |
粒径 | 10~20(nm) |
№ | 氟硅有机化合物 | 交联剂 | 甲基硅油 | 甲苯(溶剂) | 所对应的与表1所列复方硅溶胶的使用配组情况 |
1 | 2 | 0.02 | 5 | 93 | 与表4的№2、№3分别配组 |
2 | 5 | 0.1 | 5 | 90 | 与表4的№1配组 |
Claims (17)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006100993541A CN100519487C (zh) | 2006-02-06 | 2006-07-17 | 抛光瓷砖表面二氧化硅抗污涂层的制备方法 |
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CN101838503B (zh) * | 2010-02-26 | 2014-06-25 | 佛山市柯林瓷砖护理用品有限公司 | 抛光砖、石材、人造石翻新用抛光剂 |
CN104016725A (zh) * | 2014-05-04 | 2014-09-03 | 姚燕春 | 有色抛光砖洁亮工艺 |
CN103964901B (zh) * | 2014-05-04 | 2015-09-23 | 佛山市三水宏源陶瓷企业有限公司 | 一种抛光砖抛釉砖加工工艺 |
CN106283687A (zh) * | 2016-08-12 | 2017-01-04 | 张太平 | 一种抗污厨师服 |
CN106283688A (zh) * | 2016-08-12 | 2017-01-04 | 张太平 | 一种防油织物及其制造方法 |
CN107200606A (zh) * | 2017-06-05 | 2017-09-26 | 安徽省亚欧陶瓷有限责任公司 | 一种防污外墙瓷砖的制备方法 |
CN108276906A (zh) * | 2018-01-10 | 2018-07-13 | 佛山市简陶瓷有限公司 | 一种用于防滑大理石瓷砖的防污剂 |
CN110818390A (zh) * | 2018-08-07 | 2020-02-21 | 重庆市忠县古屋建材有限公司 | 一种青瓦及其烧制工艺 |
CN110527385A (zh) * | 2019-09-12 | 2019-12-03 | 广州迪瑞夫建筑材料有限公司 | 一种用于水泥基地坪的抛光助剂 |
CN110607132B (zh) * | 2019-09-29 | 2023-09-15 | 清远市宏图助剂有限公司 | 一种瓷砖抛光液用硅烷偶联剂、及其制备方法和及瓷砖抛光液组合物 |
CN111548654B (zh) * | 2020-04-23 | 2022-07-29 | 清远市宏图助剂有限公司 | 一种持久性陶瓷防污液及其使用方法 |
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