CN100473498C - 采用终点检测系统对同一种膜质进行研磨的方法 - Google Patents
采用终点检测系统对同一种膜质进行研磨的方法 Download PDFInfo
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- CN100473498C CN100473498C CNB200610116939XA CN200610116939A CN100473498C CN 100473498 C CN100473498 C CN 100473498C CN B200610116939X A CNB200610116939X A CN B200610116939XA CN 200610116939 A CN200610116939 A CN 200610116939A CN 100473498 C CN100473498 C CN 100473498C
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CNB200610116939XA CN100473498C (zh) | 2006-10-09 | 2006-10-09 | 采用终点检测系统对同一种膜质进行研磨的方法 |
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CNB200610116939XA CN100473498C (zh) | 2006-10-09 | 2006-10-09 | 采用终点检测系统对同一种膜质进行研磨的方法 |
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CN101161414A CN101161414A (zh) | 2008-04-16 |
CN100473498C true CN100473498C (zh) | 2009-04-01 |
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CNB200610116939XA Expired - Fee Related CN100473498C (zh) | 2006-10-09 | 2006-10-09 | 采用终点检测系统对同一种膜质进行研磨的方法 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER NAME: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI |
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Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090401 Termination date: 20201009 |