CN100468632C - Water-cooling plasma shower - Google Patents
Water-cooling plasma shower Download PDFInfo
- Publication number
- CN100468632C CN100468632C CNB2006100651224A CN200610065122A CN100468632C CN 100468632 C CN100468632 C CN 100468632C CN B2006100651224 A CNB2006100651224 A CN B2006100651224A CN 200610065122 A CN200610065122 A CN 200610065122A CN 100468632 C CN100468632 C CN 100468632C
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- filament
- water cooled
- flange
- discharge
- cooled holder
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Abstract
The invention provides a plasma shower which can generates electron for neutralisation and is used in ion implantation process. It can neutralize the static accumulated on the implanted wafer thereby improving the performance of the ion implantation process and eliminating the harm caused by static accumulation for the implanted wafer.
Description
Technical field:
The present invention relates to ion implantor, be applied in the ion implantation technology of semiconductor technology, be used for, neutralize being injected into the accumulation of static electricity that produces on the wafer in ion implantation technology, improve the performance of ion implantation technology, eliminate accumulation of static electricity injecting the harm of wafer.Belong to field of semiconductor devices.
Background technology
In the ion implantation technology of semiconductor technology, a large amount of ions bombards wafer surface under through ion implantor acceleration and control, because these ions are charged particles, each particle bombardment will have the duplet ion that equates with ion band electric charge number to neutralize to wafer surface in the wafer.On the one hand, technology in some ion injection, wafer surface has the photoresist of graphics processing, this glue insulate, and in the process that ion injects, a part of ion is injected in the wafer by the vacancy of figure, remaining ion is then got on the photoresist, because the insulation of photoresist, the increase along with injecting amount of ions then produces accumulation of static electricity on photoresist; On the other hand, the technology of injecting at the ion of heavy dose, because it is big to inject line, also can produce accumulation of static electricity in wafer surface, this accumulation is a kind of harm to wafer not only, can influence the uniformity of ion injection etc. simultaneously, particularly along with injecting the more and more lower of ion energy, this influence is particularly evident, reduces the performance that ion injects.By carrying out the electronics neutralization, can well eliminate this influence to injecting wafer and ion beam.The ion shower device is exactly to produce the new device of this neutralization with electronics.
Summary of the invention
The purpose of this invention is to provide a kind of plasma shower, can produce the neutralization electronics.
The structure of described plasma shower comprises: draw pole plate, filament clamping mechanism, filament, aspirating pipeline, heater lead mechanism, flange insulation cushion, flange, water guide long tube, water cooled holder, two porcelain insulating pillars, radome, two magnet, two magnet mounting panels.Through hole, the filament clamping mechanism of described water cooled holder bottom and draw the pole plate one common peripheral and become a discharge working space to be called the discharge arc chamber.
The described pole plate of drawing is installed in the top end face of discharge arc chamber, and there is a circular hole center, is the plasma outlet of plasma shower.
Described filament clamping mechanism, clamping have clamping bar and the nut and the collets of filament, filament clamping, are used for the insulating mounting between filament and the water cooled holder.
Described filament is installed on the filament clamping mechanism, and the heating back produces hot electron.
Described aspirating pipeline connects the arc discharge through hole at the top from the flange to the water cooled holder, is used for from plenum system toward the indoor working gas of sending into of arc.
Described heater lead mechanism, an end links to each other with filament, and the other end passes flange and links to each other with filament supply, powers to filament.
The integral installation insulation cushion that described flange insulation cushion is the ion shower device, one side contacts with flange, and another side contacts with the equipment installed surface.
Described flange is used for fixing water cooled holder and heater lead mechanism and aspirating pipeline.
Described water guide long tube is connected with water cooled holder by the cutting ferrule joint, cooling water is delivered near the discharge arc chamber of water cooled holder bottom, with cooling discharge arc chamber cavity.
Described water cooled holder top design has the arc discharge through hole, has in the stock of support from the outer end until near the limbers the arc discharge through hole in order to the conducting cooling water, is again the securing supports of whole shower.The filament clamping mechanism, aspirating pipeline, heater lead mechanism and flange all assemble thereon.
Described insulation porcelain pillar is used for insulating and the anchored filament threading mechanism on water cooled holder.
It is permanent magnet magnetized that described radome both sides are equipped with thickness direction, is the external loop and the magnetic screen of magnetic circuit.
Described magnet is installed in the both sides of water cooled holder top arc discharge through hole by the magnet mounting panel, produces magnetic field to arc chamber.
With reference to Fig. 1, Fig. 2, the operation principle of shower is made an explanation.Partial enlarged drawing is the service area of the generation plasma of shower among Fig. 1, is operated in high vacuum environment, now its operation principle is specified.Through hole, the filament clamping mechanism of water cooled holder bottom and draw pole plate and be combined into a discharge arc chamber, vacuum system is taken the indoor gas of arc away by the circular hole of drawing on the pole plate on the one hand, aspirating pipeline is to discharge arc chamber transportation work gas on the other hand, and both are in certain balance point work.Gas pushing quantity is big, arc room pressure height then, and the little then arc of gas pushing quantity room pressure is low, can accurately control the pressure of discharge arc chamber by the air supply plant of periphery, makes it be operated in a pressure that is fit to produce arc discharge.This moment, peripheral filament heating power supply was powered to filament by heater lead mechanism, heat filament, and when the temperature of filament reaches uniform temperature, outside heat of emission electronics.Between filament and discharge arc chamber, be added with an arc voltage power supply, filament termination negative pole, arc chamber body connects positive pole.The hot electron of filament emission to the 14 chamber wall accelerated motions of discharge arc chamber, with the working gas molecular collision, makes gas molecule lose one or more electronics under the arc voltage effect of electric field, produces ionization.The electronics that comes out from gas molecule collision quickens also with next gas molecule collision, to cause next molecular ionization once more to the motion of arc chamber wall that so cascade causes arc discharge.The working gas that is in discharge arc chamber space is ionized, and becomes plasma.Magnet and radome, the district produces a suitable magnetic field at the discharge arc chamber, and ELECTRON OF MOTION is retrained, and prolongs the moving line that electronics arrives arc chamber wall, has improved the plasma density of arc chamber interior greatly.Because the arc room pressure is higher than the pressure of operate outside environment, plasma is outwards overflowing by the circular hole of drawing on the pole plate 1 under the effect of this pressure reduction, forms an ion plasma near outlet, realizes the plasma flood to ion beam.By arc chamber body is introduced water-cooling structure, form by water cooled holder and water guide long tube, the working temperature of mandatory down low discharge arc chamber plays thermal radiation external in the time of both can reducing the work of ion shower device, the various pollutions that produce in the time of can reducing the work of ion shower device again.
Advantage of the present invention, discharge arc chamber and water-cooling structure design are on same part, and be simple in structure, the cooling effectiveness height; By at discharge arc chamber both sides mounting permanent magnet, produce discharge magnetic field, improved plasma density; The design of plasma outlet can vertically be installed on the top.
Description of drawings
Fig. 1 is the structural representation of plasma shower.
Fig. 2 is the three-dimensional modeling figure of the structure of plasma shower.
Each parts are described below among the figure: draw pole plate 1, filament clamping mechanism 2, filament 3, aspirating pipeline 4, heater lead mechanism 5, flange insulation cushion 6, flange 7, water guide long tube 8, water cooled holder 9, two porcelain insulating pillars 10, radome 11, two magnet 12, two magnet mounting panels 13.
Embodiment
Below in conjunction with the drawings and specific embodiments, the invention will be described further, but not as the qualification to invention.
Draw the pole plate 1 general high purity graphite that adopts and make, the long service life cost is low; Filament clamping mechanism 2 is used for the insulating mounting of filament, and matrix generally adopts high-temperature insulation material to make, as ceramic material; Filament 3 adopts tungsten filament to be shaped and makes; Aspirating pipeline 4 is finished supplying gas from plenum system to discharge arc chamber 14, and the high-cleanness stainless steel pipe of polishing is made in adopting; Heater lead mechanism 5 adopts the copper or the aluminum that conduct electricity very well to make, and aerial lug design quick connector is realized mounting or dismounting fast.Filament connects design and flexibly connects bar, and adaptability is good, easily assembling; Flange insulation cushion 6 is finished the insulation of flange 7 and installed surface, generally adopts good seal performance, and the material that insulation property are good is as nylon; Flange 7 is finished the installation of shower, adopts good seal performance, and the aluminum that cost is low gets final product; Water cooled holder 9 is finished the conveying of cooling water, because the arc cell structure is arranged, requires thermal conductivity good, pollutes low material, generally also can adopt aluminium; Radome 11 requires magnetic conduction, can adopt pure iron or other electric conducting material; Magnet 12 is permanent magnet, and temperature tolerance is good, and magnet mounting panel 13 is realized the magnet installation, requires non-magnet material, distributes in order to avoid influence magnetic circuit.
Claims (1)
1. water-cooling plasma shower is characterized in that, comprises following parts: draw pole plate (1), filament clamping mechanism (2), filament (3), aspirating pipeline (4), heater lead mechanism (5), flange insulation cushion (6), flange (7), water guide long tube (8), water cooled holder (9), two porcelain insulating pillars (10), radome (11), two magnet (12), two magnet mounting panels (13);
Through hole, the filament clamping mechanism (2) of described water cooled holder (9) bottom and draw pole plate (1) and surround a discharge working space jointly and be called the arc chamber (14) that discharges;
The described pole plate (1) of drawing is installed in the top end face of discharge arc chamber, and there is a circular hole center, is the plasma outlet of plasma shower;
Described filament clamping mechanism (2), clamping have clamping bar and the nut and the collets of filament (3), filament clamping, are used for the insulating mounting between filament and the water cooled holder (9);
Described aspirating pipeline (4) is connected to the arc discharge through hole at the top of water cooled holder (9) from flange (7), is used for sending into working gas from plenum system in discharge arc chamber (14);
Described heater lead mechanism (5), an end links to each other with filament (3), and the other end passes flange (7) and links to each other with filament supply;
Described flange insulation cushion (6) is the integral installation insulation cushion of ion shower device, and one side contacts with flange (7), and another side contacts with the equipment installed surface;
Described flange (7) is used for fixing water cooled holder (9) and heater lead mechanism (5) and aspirating pipeline (4);
Described water guide long tube (8) is connected with water cooled holder (9) by the cutting ferrule joint, cooling water is delivered near the discharge arc chamber of water cooled holder (9) bottom, with cooling discharge arc chamber cavity;
Described water cooled holder (9) top design has the arc discharge through hole, in the stock of support, have from the outer end until the arc discharge through hole near the limbers, in order to the conducting cooling water, filament clamping mechanism (2), aspirating pipeline (4), heater lead mechanism (5) and flange (7) all assemble thereon;
Described insulation porcelain pillar (10) is used for going up insulation and anchored filament threading mechanism (5) in water cooled holder (9);
Described radome (11) both sides are equipped with thickness direction permanent magnet magnetized (12);
Described magnet (12) is installed in the both sides of water cooled holder (9) top arc discharge through hole by magnet mounting panel (13).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100651224A CN100468632C (en) | 2006-03-17 | 2006-03-17 | Water-cooling plasma shower |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100651224A CN100468632C (en) | 2006-03-17 | 2006-03-17 | Water-cooling plasma shower |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101038869A CN101038869A (en) | 2007-09-19 |
| CN100468632C true CN100468632C (en) | 2009-03-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100651224A Expired - Fee Related CN100468632C (en) | 2006-03-17 | 2006-03-17 | Water-cooling plasma shower |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100468632C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101764056B (en) * | 2008-12-04 | 2011-03-30 | 北京中科信电子装备有限公司 | Novel plasma shower set |
| CN103219217A (en) * | 2013-03-25 | 2013-07-24 | 中国电子科技集团公司第四十八研究所 | Faraday system for ion implanter target chamber and method for detecting ion beam current quality |
| CN103794453A (en) * | 2013-07-18 | 2014-05-14 | 北京中科信电子装备有限公司 | Dual-filament plasma shower device |
| CN111769042B (en) * | 2020-07-15 | 2023-06-27 | 济南晶正电子科技有限公司 | Ion implantation method |
-
2006
- 2006-03-17 CN CNB2006100651224A patent/CN100468632C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN101038869A (en) | 2007-09-19 |
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| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090311 Termination date: 20200317 |