CN100465794C - Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus - Google Patents
Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus Download PDFInfo
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- CN100465794C CN100465794C CNB2006100323751A CN200610032375A CN100465794C CN 100465794 C CN100465794 C CN 100465794C CN B2006100323751 A CNB2006100323751 A CN B2006100323751A CN 200610032375 A CN200610032375 A CN 200610032375A CN 100465794 C CN100465794 C CN 100465794C
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Abstract
The invention discloses a step-and-scan photoetching machine's isolation system simulation test device; it divides the whole test device into the internal world and the outside world. The outside world mostly complete the simulation of the photoetching machine's precision scanning movements, it lets the workpiece platform and the mask plate have the curve movement according to the schedule speed and acceleration, it completely reappears the true photoetching machine's step-and-scan movement, the internal world is mainly to install the optics system and the workpiece platform and the mask plate, and finishes the last photoetching service. Internal world and the outside world can be joined by the six degrees of freedom precision initiative vibration damper, it depresses the vibration of that the outside world passes to the internal world and this can ensure the internal world's quiet. The invention can let the core part-installation source system's work platform is in the range that the design allows. It improves the silicon's photoetching precision, at the same time; it has precise positioning and synchronous control of step-and-scan photoetching machine's isolation system simulation test device.
Description
Technical field
The present invention relates to a kind of vibrating isolation system simulation test device, particularly relate to the precision positioning technology of the accurate vibration isolation system of litho machine in a kind of microelectronic manufacturing technology field and work stage, mask platform, this system can be used for step-by-step scanning photo-etching device and other Precision Position Location Systems.
Background technology
Integrated circuit Super-Precision ﹠ Minuteness Processing technology comprises procedures up to a hundred such as photoetching, etching, oxidation, diffusion, doping, sputter, technology is very complicated, equipment requirements is high, wherein, the photoetching technique that realizes the ultra micro pattern imaging is the core driving force that promotes the development of IC technology level always, litho machine is an of paramount importance key equipment in the integrated circuit equipment, and its investment has accounted for more than 30% of production line gross investment.Along with resolution and reliability requirement are more and more higher, the manufacture difficulty of litho machine is also increasing.
A litho machine is made up of workbench and vibration insulating system, Precision Position Location System, measuring system, light-source system and accuracy-control system usually, and the quality of workbench and vibration insulating system performance thereof is one of key factor that influences the litho machine lithographic accuracy, in the photoetching course of work in occupation of consequence.Litho machine ultraprecise work stage is one of core component of litho machine, and its kinematic accuracy directly influences the resolving power of litho machine, and speed and acceleration directly influence the work efficiency of litho machine.Common workbench has linear electric motors formula, electromagnetic type, piezoelectric type, friction-driven formula and ball screw type, wherein the most widely used is linear electric motors formula and piezoelectric type, generally as the coarse motion motion of workbench, piezoelectric type is usually used in the fine motion setting movement of workbench to the linear electric motors formula.The structural representation of step-by-step scanning photo-etching device, whole litho machine can be divided into four major parts: vibration isolation system, kinematic system, optical system and complete machine support.Vibration isolation system comprises rubber layer and three vibration dampers, mainly finishes the decay of extraneous vibration interference and the Active Compensation of internal vibration; Optical system is finished the exposure of silicon chip; Each parts of complete machine stent support; Kinematic system then is the core component of whole litho machine.
Litho machine in the course of the work, because subsystems such as work stage and mask platform have higher acceleration of motion and movement velocity, the big inertia that moving component produces and other external factor will cause the vibration of litho machine working centre part-workbench (installation light-source system), thus the quality of influence exposure.In the photo-etching machine exposal process, how accurately to guarantee its static and dynamic relatively stable be a very critical technical problems.In order to guarantee that litho machine has high precision in the course of the work, the generation vibration and the exposed portion of motion parts must be isolated, modern scanning photoetching machine has adopted vibration to isolate and the active damping technology.Litho machine must carry out work on a workbench that possesses good anti-vibration performance, otherwise any small vibration, all can have influence on the serviceability of litho machine as one's voice in speech or the nigh caused vibration of walking about of personnel.This just has higher requirement to the working environment and litho machine self design of litho machine.Litho machine is an electromechanical equipment extremely closely, require very quietly installing under the environmental baseline, and in the frequency band range of broad, have vibration damping, the vibration isolation ability.From the present minimum feature that reaches of litho machine, there is not high-precision anti-vibration performance workbench, just can not reach such lithographic accuracy.
Compare with traditional litho machine, the image quality of efficient step-by-step scanning photo-etching device also depends on the Kinematic Positioning and the dynamic synchronization performance of work stage and mask platform except the influence that is subjected to the optical system quality.The running precision of work stage, mask platform, speed, acceleration and Kinematic Positioning and scan-synchronized performance are the key factors that influences complete machine photoetching quality and throughput rate.As seen, realize above-mentioned motion requirement, just must construct a sufficiently high motion hardware system of precision and design supporting with it high performance motion control arithmetic (strategy).Therefore, thereby choose reasonable design hardware control system guarantees the dynamic locating accuracy of work stage and mask platform multiaxial motion system and the precision that is synchronized with the movement, and make it by predetermined speed, accelerating curve motion, also be a key content of vibration isolation test platform Design of Motion Control System.
Summary of the invention
Technical matters to be solved by this invention provide a kind of can be within the scope that design is allowed the vibration control of the workbench of working centre part-installation light-source system, thereby improve the lithographic accuracy of silicon chip, also can carry out the stepped scanning photoetching machine vibration isolation system analoy experimental apparatus of precision positioning, synchro control etc. simultaneously.
In order to solve the problems of the technologies described above, the technical solution used in the present invention is as follows: a kind of stepped scanning photoetching machine vibration isolation system analoy experimental apparatus, on pedestal, be installed with the lower-left column, the bottom right column, XA locating platform and XB locating platform are installed in an end of lower-left column and bottom right column upper surface respectively, be separately installed with upper left column and upper right column at described lower-left column and the other end of bottom right column upper surface, linear electric motors mount pad two ends are separately fixed at the upper surface of described upper left column and upper right column, a plurality of vibration dampers are installed in the upper surface of pedestal, workbench is the upper surface of described a plurality of vibration dampers directly, left front mask platform column, left back mask platform column, right front mask platform column, right back mask platform column is fixedly mounted on the described workbench, left side mask platform base and right mask platform base are installed in described left front mask platform column respectively, left back mask platform column, right front mask platform column, right back mask platform column upper surface, the mask cushion is fixed on the centre of described left mask platform base and right mask platform base; The Y2 locating platform is fixed on the upper surface of described linear electric motors mount pad, the mask platform linking arm is fixed on above the mover of Y2 locating platform, mask platform is installed in first air-bearing, described first air-bearing is installed on the described mask cushion by the first vacuum air cushion, and described first air-bearing is fixedly mounted on the mask platform linking arm; Left-hand rotation fishplate bar and right-hand rotation fishplate bar are installed in respectively above the mover of described XA locating platform and XB locating platform, web joint is installed in the upper surface of described left-hand rotation fishplate bar and right-hand rotation fishplate bar, the Y1 locating platform is installed in the upper surface of web joint, the work stage linking arm is fixed on above the mover of Y1 locating platform, work stage is installed on second air-bearing, described second air-bearing is installed on the described workbench by the second vacuum air cushion, and second air-bearing is fixedly connected on the described work stage linking arm.
Adopt the litho machine vibrating isolation system simulation test device of technique scheme, movement characteristic and structural principle according to step-by-step scanning photo-etching device, the whole test device is divided into the inner world and external world two large divisions, the accurate step-scan campaign of simulation litho machine is mainly finished in the external world, make work stage and mask platform by predetermined speed, accelerating curve motion, the step-scan campaign of reproducing real litho machine fully; Optical system, work stage and mask platform are installed by the inner world, for finishing last photoetching service.The inner world is connected by the high precision active damper that can realize 6DOF with the external world, and purpose is that the part reduction as far as possible of going in the inner world is passed in the vibration that the external world is produced, to guarantee the peace and quiet in the inner world.
Design a kind of work stage Precision Position Location System of H type, adopted precision ball screw locating platform and bilateral synchronized drive technology, can carry out two-dimentional rectilinear motion and small rotation, be installed in the external world.
Design a kind of mask platform drive system that adopts linear electric motors to carry out precise motion and location, can carry out motion in one dimension, be installed in the external world.
Designed a kind of linking arm and air supporting coupling arrangement, work stage has been connected in the precision positioning drive system of H type.
Designed a kind of linking arm and air supporting coupling arrangement, mask platform has been connected in the linear electric motors precision positioning drive system.
Designed a kind of grouan structure of uniqueness, to satisfy the needs that various parts are installed.
The present invention can reproduce the motion feature of step-by-step scanning photo-etching device fully, reach the Primary Location precision of step-by-step scanning photo-etching device requirement, and can study the influence that the inner world is vibrated by the kinematic parameter and the extraneous vibration environment parameter that change its positioning system.Do not need to install expensive light-source system in addition, result of study not only can be for China be that development with step-by-step scanning photo-etching device of Chinese independent intellectual property right is provided fundamental basis and instructed, and can be used for instructing the synchro control and the precision positioning research of other field.
In sum, the present invention be a kind of can be within the scope that design is allowed the vibration control of the workbench of working centre part-installation light-source system, thereby improve the lithographic accuracy of silicon chip, also can carry out the stepped scanning photoetching machine vibration isolation system analoy experimental apparatus of precision positioning, synchro control etc. simultaneously.
Description of drawings
Fig. 1 is a structural representation front view of the present invention;
Fig. 2 is a structural representation left view of the present invention;
Fig. 3 stereographic map of the present invention.
Embodiment
Referring to Fig. 1, Fig. 2 and Fig. 3, on pedestal 1, lower-left column 2 is installed by screw retention, bottom right column 25, XA locating platform 4 and XB locating platform 24 are installed in an end of lower-left column 2 and bottom right column 25 upper surfaces respectively by screw, by screw upper left column 8 and upper right column 20 are installed respectively at lower-left column 2 and the other end of bottom right column 25 upper surfaces, linear electric motors mount pad 11 two ends are respectively by the upper surface of screw retention at upper left column 8 and upper right column 20, four vibration dampers 3 are installed in the upper surface of pedestal 1, the upper surface of workbench 19 direct four vibration dampers 3, left front mask platform column 7, left back mask platform column 29, right front mask platform column 21, right back mask platform column is installed on the workbench 19 by screw retention, left side mask platform base 12 and right mask platform base 18 are installed in left front mask platform column 7 by screw respectively, left back mask platform column 29, right front mask platform column 21, right back mask platform column upper surface, mask cushion 17 is by the centre of screw retention at left mask platform base 12 and right mask platform base 18; Y2 locating platform 13 is by the upper surface of screw retention at linear electric motors mount pad 11, mask platform linking arm 26 by screw retention on the mover of Y2 locating platform 13, mask platform 14 is installed on first air-bearing 15, first air-bearing 15 is installed on the mask cushion 17 by the first vacuum air cushion 16, and first air-bearing 15 is installed on the mask platform linking arm 26 by screw retention; Left-hand rotation fishplate bar 5 and right-hand rotation fishplate bar 23 are installed in above the mover of XA locating platform 4 and XB locating platform 24 by screw respectively, web joint 22 is installed in the upper surface of left-hand rotation fishplate bar 5 and right-hand rotation fishplate bar 23 by screw, Y1 locating platform 6 is installed in the upper surface of web joint 22 by screw, work stage linking arm 28 by screw retention on the mover of Y1 locating platform 6, work stage 10 is installed on second air-bearing 9, second air-bearing 9 is installed on the workbench 19 by the second vacuum air cushion 27, and second air-bearing 9 is connected on the work stage linking arm 28 by screw retention.
Referring to Fig. 1, Fig. 2 and Fig. 3, whole stepped scanning photoetching machine vibration isolation system analoy experimental apparatus is divided into the inner world and external world two large divisions when designing, the external world comprises pedestal 1 as shown in Figure 1, lower-left column 2, bottom right column 25, XA locating platform 4, left-hand rotation fishplate bar 5, Y1 locating platform 6, web joint 22, right-hand rotation fishplate bar 23, XB locating platform 24, and the linear electric motors mount pad 11 among Fig. 2, Y2 locating platform 13, mask platform linking arm 26, the first air-bearings 15, work stage linking arm 28, the second air-bearings 9.The inner world comprises workbench 19 as shown in Figure 2, four mask platform columns are left front mask platform column 7, left back mask platform column 29, right front mask platform column 21, right back mask platform column, two mask platform bases are left mask platform base 12 and right mask platform base 18, mask cushion 17, mask platform 14, the first vacuum air cushion 16, the work stage 10 and the second vacuum air cushion 27; The external world and inner Global Access are crossed 4 the high precision active vibration isolation devices 3 that can realize the 6DOF vibration damping and are coupled together, and the whole inner world is carried out main passive vibration isolation, and the fundamental purpose of vibration isolation is exactly to reduce the vibration in the inner world.
As shown in Figure 1, pedestal 1 is the basis of whole test platform, lower-left column 2, bottom right column 25 by screw retention on pedestal, XA locating platform 4 and XB locating platform 24 are installed in an end of lower-left column 2 and bottom right column 25 upper surfaces respectively, and lower-left column 2 and bottom right column 25 other ends are installed upper left column 8 and upper right column 20 with screw respectively.Then the linear electric motors mount pad 11 shown in Fig. 2 is passed through the upper surface of upper left column 8 of screw retention and upper right column 20 at two ends, the Y2 locating platform 13 shown in Fig. 2 is directly by the upper surface of two row's screw retention at linear electric motors mount pad 11.Left-hand rotation fishplate bar 5 as shown in Figure 1 and right-hand rotation fishplate bar 23 are installed in above the mover of XA locating platform 4 and XB locating platform 24 respectively by screw, web joint 22 is directly installed on the upper surface of left-hand rotation fishplate bar 5 and right-hand rotation fishplate bar 23 by screw, and Y1 locating platform 6 also is installed in the upper surface of web joint 22 by screw.
4 vibration dampers 3 as shown in Figure 1 directly are installed in the upper surface of pedestal 1 by screw, the workbench 19 in the world, inside as shown in Figure 2 is placed directly in the upper surface of 4 vibration dampers 3 shown in Fig. 1.Left front mask platform column 7 as shown in Figure 2, left back mask platform column 29, right front mask platform column 21, right back mask platform column connect firmly on workbench 19 by screw, two left mask platform bases 12 and right mask platform base 18 are installed in four left front mask platform columns 7, left back mask platform column 29, right front mask platform column 21, right back mask platform column upper surface respectively by screw, and mask cushion 17 is just by the centre of screw retention at two left mask platform bases 12 and right mask platform base 18.
During installation, leveling granite base 1 as shown in fig. 1 is installed on the ground of handling well at first, 4 vibration dampers 3 is installed according to the installation site of vibration damper.Installation workbench 19 as shown in Figure 2 after 4 vibration dampers 3 installation leveling.As shown in Figure 1 lower-left column 2 and bottom right column 25 are installed then, adjust between the two the depth of parallelism and position degree, again upper left column 8 and upper right column 20 are installed in the relevant position of lower-left column 2 and bottom right column 25 respectively, linear electric motors mount pad 11 as shown in Figure 2 is installed afterwards, mix up and pedestal 1 between the depth of parallelism.As shown in Figure 24 left front mask platform columns 7, left back mask platform column 29, right front mask platform column 21, right back mask platform column, two left mask platform bases 12 and right mask platform base 18 in the inner world are installed, mask cushion 17, the depth of parallelism of attention leveling workbench 19 upper surfaces and mask cushion 17 upper surfaces within the limits prescribed.After whole marble member installs, carry out leveling and fine setting, guarantee the depth of parallelism and the verticality of correlation surface and pedestal upper surface, in order to Precision Position Location System is installed.
Finish after above-mentioned every work, carry out the installation of Precision Position Location System, XA locating platform 4 and XB locating platform 24 as shown in Figure 1 at first are installed, and guarantee their relative positional accuracy, then left-hand rotation fishplate bar 5 and right-hand rotation fishplate bar 23 are installed in respectively above the mover of XA locating platform 4 and XB locating platform 24, the upper surface of web joint 22 at left-hand rotation fishplate bar 5 and right-hand rotation fishplate bar 23 is installed, again Y1 locating platform 6 is installed in the upper surface of web joint 22.Work stage linking arm 28 as shown in Figure 2, connects firmly mounted work stage 10, second air-bearing 9 and the second vacuum air cushion 27 as shown in Figure 2 of debugging on work stage linking arm 28 by second air-bearing, 9 usefulness screws under the situation that source of the gas is connected on the mover of Y1 locating platform 6 then by screw retention.Second air-bearing 9 as shown in Figure 2 connects work stage 10 and workbench 19, allows work stage 10 to carry out two-dimentional rectilinear motion and small rotation, the motion of simulating the step-by-step scanning photo-etching device work stage at the upper surface of workbench 19.
Installation Y2 locating platform 13 as shown in Figure 2 is on linear electric motors mount pad 11, mask platform linking arm 26, connects firmly mounted mask platform 14, first air-bearing 15 and the first vacuum air cushion 16 as shown in Figure 2 of debugging on mask platform linking arm 26 by first air-bearing, 15 usefulness screws under the situation that source of the gas is connected on the mover of Y2 locating platform 13 then by screw retention.First air-bearing 15 as shown in Figure 2 connects mask platform 14 and mask cushion 17, allows mask platform 14 to carry out the one dimension rectilinear motion at the upper surface of mask cushion 17, simulates the motion of step-by-step scanning photo-etching device mask platform.
Referring to Fig. 1, Fig. 2 and Fig. 3, during use, open source of the gas earlier, open the total system power supply again, start each several part; End-of-job is at first turned off system power supply, closes source of the gas again.Keep environment clean, do not use for a long time, must air-bearing partly be covered with polybag.Do not bring into use again after not using for a long time, clean out environment, work front opening source of the gas blows half an hour at least.
The energising of vibration damper and related accessories thereof, set parameters as requested, vibration damper is started working, static parameter that at this moment can the testing inner world and change the external environment vibration state and study influence to the vibration of the inner world.Open industrial computer then, set the kinematic parameter of work stage and mask platform drive system, drive work stage, mask platform according to the speed of setting, accelerating curve motion, the vibration acceleration and the change in displacement of while test environment, and preserve for research and use.In addition, can also change means such as stepping rate, synchronous scanning speed, increase load, increase external interference and test the influence of the variation of external environment, seek the principal element and the solution that influence the litho machine internal vibration inner world worktable vibration characteristics.
Claims (1)
1, a kind of stepped scanning photoetching machine vibration isolation system analoy experimental apparatus, it is characterized in that: on pedestal (1), be installed with lower-left column (2), bottom right column (25), XA locating platform (4) and XB locating platform (24) are installed in an end of lower-left column (2) and bottom right column (25) upper surface respectively, be separately installed with upper left column (8) and upper right column (20) at described lower-left column (2) and the other end of bottom right column (25) upper surface, linear electric motors mount pad (11) two ends are separately fixed at the upper surface of described upper left column (8) and upper right column (20), a plurality of vibration dampers (3) are installed in the upper surface of pedestal (1), workbench (19) is directly installed on the upper surface of described a plurality of vibration damper (3), left front mask platform column (7), left back mask platform column (29), right front mask platform column (21), right back mask platform column is fixedly mounted on the described workbench (19), left side mask platform base (12) is installed in described left front mask platform column (7), left back mask platform column (29) upper surface, right mask platform base (18) is installed in described right front mask platform column (21), right back mask platform column upper surface, mask cushion (17) is fixed on the centre of described left mask platform base (12) and right mask platform base (18); Y2 locating platform (13) is fixed on the upper surface of described linear electric motors mount pad (11), mask platform linking arm (26) is fixed on above the mover of Y2 locating platform (13), mask platform (14) is installed on first air-bearing (15), described first air-bearing (15) is installed on the described mask cushion (17) by the first vacuum air cushion (16), and described first air-bearing (15) is fixedly mounted on the mask platform linking arm (26); Left-hand rotation fishplate bar (5) and right-hand rotation fishplate bar (23) are installed in respectively above the mover of described XA locating platform (4) and XB locating platform (24), web joint (22) is installed in the upper surface of described left-hand rotation fishplate bar (5) and right-hand rotation fishplate bar (23), Y1 locating platform (6) is installed in the upper surface of web joint (22), work stage linking arm (28) is fixed on above the mover of Y1 locating platform (6), work stage (10) is installed on second air-bearing (9), described second air-bearing (9) is installed on the described workbench (19) by the second vacuum air cushion (27), and second air-bearing (9) is fixedly connected on the described work stage linking arm (28).
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| CNB2006100323751A CN100465794C (en) | 2006-10-09 | 2006-10-09 | Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus |
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| CNB2006100323751A CN100465794C (en) | 2006-10-09 | 2006-10-09 | Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus |
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| CN100465794C true CN100465794C (en) | 2009-03-04 |
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Families Citing this family (2)
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| CN104076613B (en) * | 2013-03-27 | 2016-12-28 | 上海微电子装备有限公司 | Step-by-step scanning photo-etching device based on circular masks and exposure method thereof |
| CN106768540A (en) * | 2016-12-23 | 2017-05-31 | 苏州东菱智能减振降噪技术有限公司 | A kind of damping efficiency test platform |
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