CN100440543C - Stress sensor chip based on SOI - Google Patents
Stress sensor chip based on SOI Download PDFInfo
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- CN100440543C CN100440543C CNB2005101171164A CN200510117116A CN100440543C CN 100440543 C CN100440543 C CN 100440543C CN B2005101171164 A CNB2005101171164 A CN B2005101171164A CN 200510117116 A CN200510117116 A CN 200510117116A CN 100440543 C CN100440543 C CN 100440543C
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000013078 crystal Substances 0.000 claims abstract description 28
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 28
- 239000010703 silicon Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000005259 measurement Methods 0.000 claims abstract description 13
- 238000005538 encapsulation Methods 0.000 claims abstract description 12
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 12
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 10
- 238000009413 insulation Methods 0.000 claims abstract description 8
- 238000012360 testing method Methods 0.000 claims description 6
- 230000007812 deficiency Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000012212 insulator Substances 0.000 abstract 1
- 238000011326 mechanical measurement Methods 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
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- Thin Film Transistor (AREA)
Abstract
The present invention discloses a stress sensor chip based on a silicon chip of an insulator, which belongs to the technical fields of high-temperature mechanical measurement and integrated circuit manufacture, encapsulation and measurement. A silicon substrate is provided with a SiO2 insulating layer which is provided with a stress sensitive element layer. The present invention has the advantages that the sensor chip can measure the stress of entire six directions. Meanwhile, a stress sensor manufactured by an SOI substrate does not use a reverse biased p-n knob as insulation, the insulating property can still be maintained under a high temperature environment, the working reliability of the sensor chip is guaranteed, and the sensor chip can work under the high temperature environment of 600 DEG C. Meanwhile, the stress sensor chip manufactured by the SOI composed of two kinds of monocrystalline silicon of different crystal directions can regenerate the stress condition of a practical integrated circuit chip and accurately measure the entire six stress components acting on the chip when a tube core of a measured integrated circuit is replaced for stress measurement.
Description
Technical field
The invention belongs to high-temperature mechanics measures and integrated circuit manufacturing, encapsulation and field of measuring technique.Be particularly related to a kind of stress sensor chip based on SOI (SOI).
Background technology
Although the integrated level of integrated circuit is improving constantly, the area of integrated circuit and complexity still along with to the raising of function and performance requirement in continuous increase.Integrated circuit all can produce tremendous influence at the later stress of encapsulation to the reliability and the performance of integrated circuit, special situation for large tracts of land, small-feature-size or multilayer and the encapsulation of multicore sheet, in encapsulation process, can form stress between chip and adhesive, adhesive and the package substrate, make chip produce complicated stress distribution after encapsulation, these stress can be to the performance (for example channel resistance, mismatch) and the reliability generation significant effects such as (for example fractures) of integrated circuit.Along with the increase of the dwindling of integrated circuit characteristic size, chip area and the use of multilayer and the encapsulation of multicore sheet, the problem that stress causes becomes more and more serious.
In order to reduce and to eliminate the influence that these stress produce, must accurately reproduce and measure the stress distribution situation.In order to measure the stress of integrated circuit (IC) chip, must use the identical testing sensor chip in crystal orientation and size and measured integrated circuit (IC) chip to replace the position of measured chip, just can make sensor chip experience stress process and stress distribution and chip under test identical, the stress state of accurate response and reproduction chip under test.The Sensitive Apparatus of measuring stress can adopt piezo-resistance or Metal-oxide-semicondutor field effect transistor (MOSFET) triode.The former has technology and is easy to realize that the subsequent conditioning circuit characteristic of simple still in order to obtain the resistance of suitable resistance, need take bigger area usually, causes measurement spatial resolution lower; Adopt MOSFET can reduce the area that sensor unit takies as the stress sensitive device, thereby improve measurement spatial resolution, the zone is very useful comparatively rapidly for STRESS VARIATION, but the manufacture process relative complex.
Owing to during integrated circuit is made adopt silicon chip based on (100) crystal orientation as substrate more, therefore identical for the stress distribution that guarantees sensor chip with tested integrated circuit (IC) chip, sensor chip should adopt the silicon chip in (100) crystal orientation as substrate, and make the two that identical size be arranged, by the stress distribution of reasonable Arrangement senser measured chip.Yet use the silicon chip in (100) crystal orientation an important shortcoming to be arranged as stress sensor chip, the strain gauge that just is based on (100) crystal orientation silicon chip can only be measured four in whole 6 components of stress, comprise three direct stress and inplane shear stress, be that two other shear stress components can't be measured, cause using (100) silicon chip can not realize the measurement of whole components of stress as sensor chip.Based on the stress sensor chip of (111) crystal orientation silicon chip, can measure whole six components of stress; If place encapsulation but the sensor chip that uses (111) crystal orientation replaces measured chip, then can be different and stress distribution that cause (111) sensor chip to bear is different fully with the stress distribution of (100) chip under test by the mechanical property of (111) silicon chip and (100) silicon chip, thereby can't accurately reproduce the stress of reality (100) chip.
In addition, adopt pressure drag or the MOSFET stress measurement chip made on the body silicon materials, its serviceability temperature is restricted.This mainly be since on the body silicon materials insulation of device mainly rely on back-biased pn knot to form to isolate and insulation, but in high-temperature work environment, back-biased pn knot and substrate leakage leakage current significantly increase, and the insulating capacity of the anti-knot of pn partially descends rapidly, has a strong impact on the performance of transducer.
Summary of the invention
The objective of the invention is to propose a kind of stress sensor chip based on SOI.It is characterized in that: the sensor chip of described measurement silicon chip stress is to make silicon dioxide insulating layer 2 on the silicon substrate 1, and makes stress sensitive element layer 3 on the silicon dioxide insulating layer 2.
Described silicon substrate 1 is the SOI monocrystalline silicon in (100) crystal orientation, therefore can reproduce the stress state in the common integrated circuit.
Described stress sensitive element 3 is piezo-resistance or MOSFET device, adopts the monocrystalline silicon in (100) or (111) crystal orientation to make.
The thickness of the silicon dioxide layer of described soi wafer and stress sensitive element layer is at 20-5000nm;
The substrate layer of described soi wafer can carry out any doped in concentrations profiled; The stress sensitive element layer is for according to stress sensitive component type doped n type or p type silicon;
Described two kinds of sensers are by making with the process of IC process compatible.
Characteristics of the present invention are: it is made based on soi wafer, even at high temperature still can keep insulating properties, realizes the high temperature reliability of sensor chip; Substrate and device layer adopt different crystal orientations silicon, as substrate is (100) crystal orientation, the stress sensitive element layer is (111) crystal orientation, sensor chip replaces measured chip in encapsulation after, can reproduce same stress distribution accurately, and the stress sensitive element layer adopts (111) crystal orientation silicon to make the stress sensitive device on it can measure whole components of stress.If the stress sensitive element layer also adopts the silicon in (100) crystal orientation, then can realize the measurement of 4 components of stress under the hot environment.Therefore, the present invention has taken into account the advantage of accurately reproducing stress distribution and measure whole six components of stress on sensor chip, and has possessed the ability to work under the hot conditions.
Description of drawings
Fig. 1 is the structural representation of the stress sensor chip of silicon chip.
Fig. 2 is for being used for the piezoresistance sensor structural representation that 4 components of stress are measured on (100) monocrystalline silicon.
Fig. 3 is for being used for the piezoresistance sensor structural representation that whole 6 components of stress are measured on (111) monocrystalline silicon.
Embodiment
The present invention proposes a kind of stress sensor chip based on SOI.Below in conjunction with description of drawings operation principle of the present invention.
Figure 1 shows that the structural representation of the stress sensor chip of soi wafer.In Fig. 1, on silicon substrate 1, make silicon dioxide insulating layer 2, and make stress sensitive element layer 3 on the silicon dioxide insulating layer 2.And the insulation that soi wafer is realized between stress sensitive element layer and the substrate by oxidation insulating layer 2, even at high temperature still can keep insulating properties, guaranteed the reliability of sensor chip work, therefore the IC that overcomes on the common silicon chip passes through the insulation that anti-inclined to one side PN junction is realized stress sensitive element layer and substrate, and temperature is faced with anti-inclined to one side leakage current increase counter stress senser layer when raising performance exerts an influence.Substrate 1 and stress sensitive element layer 3 adopt different crystal orientations silicon, substrate is (100) crystal orientation, the stress sensitive element layer is (111) crystal orientation, because the thickness of substrate is far longer than oxide layer and stress sensitive element layer thickness sum, thinks based on (100) silicon chip manufacturing so entire chip can be similar to; In present IC made, what use in most cases was (100) crystal orientation silicon chip, so sensor chip replaces measured chip in encapsulation after, can reproduce same stress distribution accurately on the stress sensitive device of stress sensitive element layer; The stress sensitive element layer of actual sensed stress adopts (111) crystal orientation silicon, relevant theory analysis then shows on the silicon of (111) crystal orientation can measure whole six components of stress, and this has just overcome the deficiency that (100) crystal orientation silicon upper stress Sensitive Apparatus can only be measured four components of stress.
Figure 2 shows that and be used for the pressure drag structural representation that 4 components of stress are measured on (100) monocrystalline silicon; Figure 3 shows that and be used for the pressure drag structural representation that whole 6 components of stress are measured on (111) monocrystalline silicon.The shadow region is a p type pressure drag among Fig. 2, and the shadow region is a n type pressure drag among Fig. 3.By measuring the variation of pressure drag, can obtain the numerical value of the corresponding components of stress.Above-mentioned stress sensor chip has been realized resultant stress measurement and high temperature measurement, the characteristic that it utilizes piezo-resistance resistance or MOSFET channel resistance resistance can change when being subjected to stress, the SOI stress sensor chip is replaced measured chip and places encapsulation, the stress distribution that chip under test stands can be rendered on the sensor chip, cause the variation of piezo-resistance or MOSFET channel resistance, thereby realize corresponding force measurement by measuring resistance.The monocrystalline silicon that adopts (100) crystal orientation is during as top layer, and pressure drag or MOSFET are manufactured on (100) monocrystalline silicon, and this situation can be worked under hot environment, measures 4 stress; When adopting (111) top layer to make pressure drag or MOSFET, not only can be operated in hot environment, can also rely on (111) monocrystalline silicon to realize 6 direction stress measurements.Use because the silicon dioxide insulating layer among the SOI is used as isolated insulation, no longer need back-biased pn knot, therefore can be operated in the above hot environment of 600 degree.Therefore the present invention have highly sensitive, resultant stress component measurement, can work in hot conditions, with advantage such as IC process compatible.
Claims (2)
1. stress sensor chip based on SOI, the substrate of described stress sensor chip (1) is the monocrystalline silicon in (100) crystal orientation, utilize of the insulation of the intrinsic silicon dioxide insulating layer (2) of SOI as measuring element and substrate, utilize device layer monocrystalline silicon on the silicon dioxide insulating layer as stress sensitive element (3) layer, therefore can reproduce the stress state in the common integrated circuit; It is characterized in that: the substrate of described SOI can carry out any doped in concentrations profiled, SOI is by the insulation between silicon dioxide insulating layer (2) realization stress sensitive element layer and the substrate, even under high temperature more than 600 ℃, still can keep insulating properties, guaranteed the reliability of sensor chip work; Substrate (1) and stress sensitive element (3) adopt different crystal orientations silicon, substrate is (100) crystal orientation, the stress sensitive element layer is (111) crystal orientation, can measure whole six components of stress, and this has just overcome the deficiency that (100) crystal orientation silicon upper stress Sensitive Apparatus can only be measured four components of stress; And realized that resultant stress measures and measuring under the high temperature more than 600 ℃.
2. according to the described stress sensor chip of claim 1 based on SOI, it is characterized in that, described stress sensitive element (3) is piezo-resistance or MOSFET device, the characteristic that it utilizes piezo-resistance resistance or MOSFET channel resistance resistance can change when being subjected to stress, stress sensor chip is replaced measured chip and places encapsulation, the stress distribution that chip under test stands can be rendered on the sensor chip, cause the variation of piezo-resistance or MOSFET channel resistance, thereby realize corresponding force measurement by measuring resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101171164A CN100440543C (en) | 2005-11-01 | 2005-11-01 | Stress sensor chip based on SOI |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101171164A CN100440543C (en) | 2005-11-01 | 2005-11-01 | Stress sensor chip based on SOI |
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| CN1755946A CN1755946A (en) | 2006-04-05 |
| CN100440543C true CN100440543C (en) | 2008-12-03 |
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| CNB2005101171164A Expired - Fee Related CN100440543C (en) | 2005-11-01 | 2005-11-01 | Stress sensor chip based on SOI |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2806543C (en) * | 2010-11-24 | 2016-05-17 | The Governors Of The University Of Alberta | A novel embedded 3d stress and temperature sensor utilizing silicon doping manipulation |
| CN102175363A (en) * | 2010-12-31 | 2011-09-07 | 东莞市百赛仪器有限公司 | Pressure strain device manufactured by sputtering silicon film with ion beams and method thereof |
| CN104101763B (en) * | 2013-04-03 | 2017-11-14 | 中芯国际集成电路制造(上海)有限公司 | A kind of sensor-on-chip |
| CN104779249B (en) * | 2015-04-03 | 2018-01-02 | 泰州市齐大涂料助剂有限公司 | The structure and preparation method of a kind of strain film |
| DE102021200720B4 (en) | 2021-01-27 | 2023-08-03 | Infineon Technologies Ag | TRANSISTOR-BASED STRESS SENSOR AND METHOD FOR DETERMINING A GRADIENT-COMPENSATED MECHANICAL STRESS COMPONENT |
| CN113555293B (en) * | 2021-07-21 | 2023-06-27 | 中国电子科技集团公司第三十八研究所 | Method for testing temperature stress field of silicon substrate type transceiver component |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05340828A (en) * | 1992-05-18 | 1993-12-24 | Fujikura Ltd | Semiconductor pressure sensor |
| JPH0745582A (en) * | 1993-07-31 | 1995-02-14 | Sony Corp | Semiconductor structure and manufacture of semiconductor structure |
| JP2002208708A (en) * | 2001-01-11 | 2002-07-26 | Denso Corp | Semiconductor pressure sensor and its manufacturing method |
| CN1664510A (en) * | 2005-03-17 | 2005-09-07 | 西安交通大学 | SOI technology based integrated multi-sensor chip |
-
2005
- 2005-11-01 CN CNB2005101171164A patent/CN100440543C/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05340828A (en) * | 1992-05-18 | 1993-12-24 | Fujikura Ltd | Semiconductor pressure sensor |
| JPH0745582A (en) * | 1993-07-31 | 1995-02-14 | Sony Corp | Semiconductor structure and manufacture of semiconductor structure |
| JP2002208708A (en) * | 2001-01-11 | 2002-07-26 | Denso Corp | Semiconductor pressure sensor and its manufacturing method |
| CN1664510A (en) * | 2005-03-17 | 2005-09-07 | 西安交通大学 | SOI technology based integrated multi-sensor chip |
Non-Patent Citations (2)
| Title |
|---|
| 一种新型单晶硅SOI高温压力传感器. 李育刚等.传感技术学报，第4期. 2002 |
| 一种新型单晶硅SOI高温压力传感器. 李育刚等.传感技术学报，第4期. 2002 * |
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| CN1755946A (en) | 2006-04-05 |
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