CN100437879C - Method for making auxiliary electrode of plasma plane display - Google Patents
Method for making auxiliary electrode of plasma plane display Download PDFInfo
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- CN100437879C CN100437879C CNB031093663A CN03109366A CN100437879C CN 100437879 C CN100437879 C CN 100437879C CN B031093663 A CNB031093663 A CN B031093663A CN 03109366 A CN03109366 A CN 03109366A CN 100437879 C CN100437879 C CN 100437879C
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- auxiliary electrode
- black slurry
- slurry bed
- electrode
- ruthenium
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Abstract
The present invention relates to a manufacturing technology of an auxiliary electrode of a plasma plane display, which comprises the following steps: in the manufacturing technology of the auxiliary electrode by a front base plate, a black slurry layer comprising ruthenium is coated on the front base plate and a transparent electrode; a silver slurry layer is coated on the black slurry layer. In the manufacturing technology of an auxiliary electrode of a plasma plane display, the area of the coated black slurry layer is larger than the area of the silver slurry layer, a photo etching manufacturing technology is carried out, and the formed auxiliary electrode can be well glued on the transparent electrode and the front base plate after the auxiliary electrode is defined.
Description
Technical field
(Plasma DisplayPanel PDP), particularly relates to a kind of manufacture method of flat plasma display auxiliary electrode to the present invention relates to a kind of flat plasma display.
Background technology
Flat plasma display (PDP) simply is divided into two kinds of direct-current discharge type (DC type) and AC discharge types (AC type) according to voltage driving mode.With reference to Fig. 1, in the manufacturing technology of conventional AC discharge type plasma panel display, mainly be on glass substrate 11,12, to make different active layers, again with both peripheral involution, and enclose a certain proportion of mist in the discharge cell betwixt.
In Fig. 1, be laid with many parallel transparency electrodes 111, auxiliary (bus) electrode 112 successively in the inboard of prebasal plate 11, and dielectric layer 113 and protective layer 114.Accordingly then be laid with many parallel addressing (address) electrode 121 on back of the body substrate 12, many barrier ribs that are arranged in parallel 122, and fluorophor 123 and dielectric 124 it should be noted that barrier rib 122 also can make clathrate.Transparency electrode 111 on the above-mentioned prebasal plate 11 is vertical mutually with the addressing electrode 121 of the back of the body on the substrate 12, its confluce constitutes a discharge cell, when when specific discharge cell applies voltage, the dielectric layer 113,124 of correspondence position discharges in the discharge cell of correspondence, and induced fluorescence body 123 radiates coloured light.
Fig. 2 is Fig. 1 cross-sectional view.With reference to Fig. 1, Fig. 2, in conventional AC discharge type plasma panel display 10, general elder generation forms many each intervals and horizontal transparency electrode 111 at prebasal plate 11 inner surfaces, forms auxiliary electrode 112 again on transparency electrode 111, uses the line impedence that reduces transparency electrode 111.In the prior art, three electrodes of normal use comprise two parallel transparency electrodes 111 (X electrode and Y electrode) adjacent on the prebasal plate 11 in each discharge cell 13, and the addressing electrode 121 on back of the body substrate 12 correspondence positions, form three-electrode structure.When applying a voltage to above-mentioned electrode, dielectric layer 113,124 discharges in corresponding discharge cell 13, make the mist of inclosure produce ultraviolet light (UV) because of discharge, relend the fluorophor 123 that applies by UV optical excitation discharge cell 13 places, order red (R), green (G), blue three-color phosphor such as (B) can produce visible light, and then show image.
Figure 3 shows that the view generally of the prebasal plate 11 of AC discharge type flat plasma display 10, only show that in this figure pair of parallel transparency electrode 111 is representative.In this figure, on prebasal plate 11, be laid with many parallel transparency electrodes 111, because the resistance value of transparency electrode 111 is higher, therefore on transparency electrode 111, be laid with auxiliary (bus) electrode 112 separately, cause discharge with auxiliary transparency electrode 111, and bear and reduce the high-resistance task of transparency electrode, the part of auxiliary electrode 112 wherein, as number in the figure 300 and 302 indicated parts, can extend this transparency electrode 111, in order to be connected, with the discharge of control transparency electrode 111 with the peripheral control circuit (not shown).
Because when forming dielectric layer 113, usually need the manufacturing process that heats, because the relation of thermal stress, the hypotenuse situation regular meeting of auxiliary electrode 112 causes start (peeling) of auxiliary electrode 112.But for the part that dielectric layer 113 covers, its situation about starting can be restrained by the covering of dielectric layer 113.Yet extend 300 and 302 parts of transparency electrode 111 for auxiliary electrode 112 as shown in Figure 3, situation about starting usually can cause the fracture of 300 and 302 parts.
Figure 6 shows that along the cutaway view of AA ' line among Fig. 5 by can obviously finding out among the figure, because the hypotenuse situation of auxiliary electrode 112, in the part that is not covered by dielectric layer 113, part shown in number in the figure 600 is because the influence of thermal stress has the situation that starts and produces.When starting situation when serious, usually can cause the fracture of this part.Because this extension is the usefulness that is connected with peripheral control circuit (not shown) as this panel, in case fracture, panel will lose tie point, therefore take place for fear of this situation, be badly in need of a kind of new upper substrate structure of invention to improve the problems referred to above.
Summary of the invention
The extension fracture takes place in method easily that form in view of the upper substrate auxiliary electrode of traditional flat plasma display in the foregoing invention background, causes panel can't be connected with peripheral circuit.Therefore, the invention provides a kind of manufacture method of new flat plasma display auxiliary electrode, can solve the problem that above-mentioned auxiliary electrode starts (peeling).
Main purpose of the present invention is to provide a kind of method of upper substrate auxiliary electrode manufacturing process, the area that the coated area that contains the black paste of ruthenium applies greater than the silver slurry on transparency electrode and prebasal plate during with the traditional fabrication auxiliary electrode, utilize the difference of both areas, make and carrying out after photoetching corrosion etching manufacturing process finishes, extend the part of transparency electrode for auxiliary electrode, its black slurry bed of material that contains ruthenium still can be longer or isometric than silver pulp layer.Can make two ends like this at auxiliary electrode, the silver pulp layer can't protrude in the black slurry bed of material that contains ruthenium, after etching is finished, can make the silver pulp layer because of longer than the black slurry bed of material that contains ruthenium, and preferable sticking on transparency electrode and the prebasal plate, therefore can in the subsequent thermal manufacturing process, not cause auxiliary electrode to extend transparency electrode and partly start.
The extension fracture takes place in method easily that form in view of the upper substrate auxiliary electrode of traditional flat plasma display in the foregoing invention background, causes panel can't be connected with peripheral circuit.Therefore, the invention provides a kind of manufacture method of new flat plasma display auxiliary electrode, can solve the problem that above-mentioned auxiliary electrode starts (peeling).
Main purpose of the present invention is to provide a kind of method of upper substrate auxiliary electrode manufacturing process, the area that the coated area that contains the black paste of ruthenium applies greater than the silver slurry on transparency electrode and prebasal plate during with the traditional fabrication auxiliary electrode, utilize the difference of both areas, make and carrying out after photoetching corrosion etching manufacturing process finishes, extend the part of transparency electrode for auxiliary electrode, its black slurry bed of material that contains ruthenium still can be longer or isometric than silver pulp layer.Can make two ends like this at auxiliary electrode, the silver pulp layer can't protrude in the black slurry bed of material that contains ruthenium, after etching is finished, can make the silver pulp layer because of longer than the black slurry bed of material that contains ruthenium, and preferable sticking on transparency electrode and the prebasal plate, therefore can in the subsequent thermal manufacturing process, not cause auxiliary electrode to extend transparency electrode and partly start.
According to the most preferred embodiment of the inventive method, make in the manufacturing process of auxiliary electrode at prebasal plate, at first can apply the black slurry bed of material that one deck contains ruthenium on prebasal plate and transparency electrode, then apply one deck silver pulp layer on the black slurry bed of material of ruthenium containing again.Method of the present invention promptly is to allow the coated black paste aspect that contains ruthenium amass greater than silver pulp layer area, then carries out photoetching corrosion etching manufacturing process again.Because when on containing the black slurry bed of material of ruthenium, applying the silver pulp layer, one section that reserves in the black slurry bed of material both sides that contain ruthenium is not covered by the silver pulp layer, therefore carrying out photoetching corrosion etching manufacturing process when auxiliary electrode is limited out, even the lateral erosion speed of the black slurry bed of material that contains ruthenium is greater than the silver pulp layer, but owing to the outstanding black slurry bed of material that contains ruthenium in both sides reserved part, therefore, extend the part of transparency electrode for auxiliary electrode, its black slurry bed of material that contains ruthenium still can be longer or isometric than silver pulp layer, thereby make adhering on transparency electrode and the prebasal plate that formed auxiliary electrode can be preferable.
Description of drawings
Preferred embodiment of the present invention will be done more detailed elaboration in conjunction with the accompanying drawings in the comment below, wherein for convenience of explanation for the purpose of, the device that the representative of same numeral shown in each figure is identical:
Figure 1 shows that a kind of prebasal plate of traditional flat plasma display and the combination schematic perspective view of back of the body substrate;
Figure 2 shows that a kind of traditional flat plasma display cross-sectional view;
Figure 3 shows that the view generally of conventional AC discharge type plasma panel display prebasal plate;
Figure 4 shows that the schematic diagram that on substrate and transparency electrode, forms auxiliary electrode according to traditional method;
Fig. 5 A is depicted as and according to conventional method Fig. 4 is carried out one photoetching corrosion manufacturing process auxiliary electrode is limited out;
Fig. 5 B is depicted as the amplification figure of auxiliary electrode among Fig. 5 A;
Fig. 6 is according to the conventional fabrication processes method, the situation that causes auxiliary electrode one end to start;
Fig. 7 A is depicted as the overall pattern of the glass substrate of the employed tool ito thin film of the method according to this invention;
Fig. 7 B is the end view of Fig. 7 A;
Fig. 8 A is depicted as the overall pattern of the transparency electrode of the method according to this invention formation;
Fig. 8 B is the end view of Fig. 8 A;
Fig. 9 A is depicted as the schematic diagram of the auxiliary electrode that preferred embodiment forms according to the present invention; And
Fig. 9 B is depicted as the top view of the auxiliary electrode that forms according to preferred embodiment of the present invention.
Embodiment
Do not limiting the following of spirit of the present invention and range of application, below promptly introducing enforcement of the present invention with an embodiment; Be familiar with this field skill personnel, after understanding spirit of the present invention, method of the present invention should be applied on the various flat plasma display.According to prebasal plate auxiliary electrode method of manufacturing technology of the present invention, be on traditional prebasal plate and transparency electrode, at first apply the black slurry bed of material that one deck contains ruthenium on prebasal plate and transparency electrode, then on the black slurry bed of material, apply one deck silver pulp layer again.And long-pending need of coated black paste aspect then proceeded follow-up photoetching corrosion etching manufacturing process again greater than silver pulp layer area, and auxiliary electrode is limited out.
Because when on the black slurry bed of material, applying the silver pulp layer, reserving one section in black slurry bed of material both sides is not covered by the silver pulp layer, therefore when limiting auxiliary electrode, extend the part of transparency electrode for auxiliary electrode, its black slurry bed of material still can be longer or isometric than silver pulp layer, thereby make adhering on transparency electrode and the prebasal plate that formed auxiliary electrode can be preferable.Below promptly illustrate that with an embodiment method of manufacturing technology of the present invention is applied on the traditional flat plasma display, but application of the present invention should be not limited only to the preferred embodiment of the following stated.
Preferred embodiment of the present invention is to use the described structure of Fig. 1 to be illustrated.General flat plasma display comprises prebasal plate 11 and back of the body substrate 12 at least, on the inner surface of prebasal plate 11, be provided with the transparency electrode 111 (being alleged X and Y electrode) of many arranged in parallel horizontal alignment, on each bar transparency electrode 111, be provided with auxiliary (bus) electrode 112.On above-mentioned electrode, make a dielectric layer 113, and on the dielectric layer 113 of prebasal plate 11, form a protective layer 114.Two substrates 11 like this and 12 are integral by involution, vacuumize and enclose mist and (be the special gas of certain proportion mixing finishing, as helium (He), neon (Ne), argon (Ar), xenon (Xe)) during program, addressing electrode 121 and the mutual vertical arrangement of the transparency electrode 111 (comprising X electrode and Y electrode) on the prebasal plate 11 are staggered to form corresponding discharge cell on the back of the body substrate 12.
When using auxiliary electrode 112 method of manufacturing technology of the present invention to form upper substrate structure, at first with reference to Fig. 7 A, the section of structure of a pristine glass substrate that is provided by glass substrate supplier place has been provided for it, and Fig. 7 B is its end view.Glass substrate mainly consist of transparent panel 72 and on ITO layer 74.The material of transparent panel 72 is the materials based on high light transmittances such as glass or quartz, and ITO layer 74 is the usefulness as the transparency electrode of flat plasma display, it can utilize the photoetching corrosion manufacturing process technology to form required transparent electrode pattern, and its method is as described below.
When the manufacturing process of carrying out prebasal plate constantly, at first on ITO layer 74, apply photoresist layer 76, be generally the UV-radiation-sensitive resin, then put limited the transparency electrode figure light shield on photoresist, utilize the ultraviolet ray transparent electrode pattern that desire limits to write that exposes.Then utilize developer solution to develop, the photoresist layer 76 of not desiring the place of protection is removed, expose ITO layer 74 partly.Then utilize patterned light blockage layer to be etching mask, remove the ITO layer 74 that exposes to the open air with wet type or dry-etching method till exposing partly transparent panel 72, its transparency electrode that limits 78 is shown in Fig. 8 A, wherein be positioned at and horizontally on the transparent panel 72 be transparency electrode 111, be alleged X of the present invention and Y electrode, being staggered to form corresponding discharge space, and Fig. 8 B is depicted as the top view of Fig. 8 A.
After the manufacturing process of finishing transparency electrode, then make auxiliary electrode, according to preferred embodiment of the present invention, auxiliary electrode is to be overlapped and formed by one deck black slurry bed of material and silver pulp layer, its method of manufacturing technology is to use twice printing manufacturing process to form, be illustrated in figure 9 as auxiliary electrode and form schematic diagram, wherein printing manufacturing technology steps in first road is to apply the black paste 78 that one deck contains ruthenium on transparency electrode 111 and transparent panel 72, then applies one deck silver slurry 80 again on this black paste 78.It should be noted that, because the black slurry bed of material 78 is different with the material of silver pulp layer 80, therefore the lateral erosion speed of developing is also inequality, so after the auxiliary electrode development is finished, can produce aforesaid hypotenuse situation, that is silver pulp layer 80 protrudes in outside the black slurry bed of material 78, and this kind situation is at formed auxiliary electrode two ends, go through repeatedly hot manufacturing process again after, the situation that can cause auxiliary electrode to start, shown in Figure 6 as described above.
For avoiding this situation about starting, the present invention is when applying the black slurry bed of material 78 with silver pulp layer 80, can painstakingly keep one section interval, zone 900 and 902 shown in Fig. 9 A, just silver pulp layer 80 is not to cover the black slurry bed of material 78 fully, and the black slurry bed of material 78 surface portions still are exposed in zone 900 shown in Fig. 9 A and 902 places.Then carry out photoetching corrosion etching manufacturing process, if the length of the hypothesis black slurry bed of material 78 on the x direction is D, and the length of silver pulp layer 80 on the x direction is carried out the length of exposed areas this moment when being c, be that the length on the x direction needs greater than c, but also can equal the length of c.
The zone that is not covered fully by this section, when carrying out photoetching corrosion etching manufacturing process, even the developing rate of the black slurry bed of material 78 is greater than silver pulp layer 80, but owing to the outstanding black slurry bed of material 78 in both sides reserved part, zone 900 and 902 shown in Fig. 9 A, therefore, after etching is finished, the black slurry bed of material 78 that forms auxiliary electrode in this zone still can be grown or isometric than silver pulp layer 80, makes adhering on transparency electrode and the prebasal plate that formed auxiliary electrode can be preferable.
Be depicted as the top view of Fig. 9 A with reference to Fig. 9 B, wherein the black slurry bed of material 78 covers transparency electrode 111 fully with silver pulp layer 80, in prebasal plate 11 two side portions, silver pulp layer 80 can be reserved one section zone 900 and 902 and not cover the black slurry bed of material 78, like this after finishing photoetching corrosion etching manufacturing process, the black slurry bed of material 78 has ledge 900 and 902, though therefore the black slurry bed of material 78 for the developing rate of photoetching corrosion etching manufacturing process greater than silver pulp layer 80, but owing to reserved area 900 and 902 when applying, therefore can make finish when developing the back at the two ends of auxiliary electrode because the black slurry bed of material than length is arranged, thereby preferable adheres on transparency electrode and the prebasal plate, therefore can in the subsequent thermal manufacturing process, not cause auxiliary electrode to extend starting of transparency electrode part.
Then after auxiliary electrode 112 is finished; on transparent panel 72, transparency electrode 111 and auxiliary electrode 112; form one dielectric layer according to traditional method of manufacturing technology, then form a protective layer more thereon, so just finished the prebasal plate of flat plasma display of the present invention.
As the technology of being familiar with this area personnel understood, the above is preferred embodiment of the present invention only, be not in order to limit scope of patent protection of the present invention; All other do not break away from the equivalence of being finished under the disclosed spirit and changes or modification, all should be included in the following scope of patent protection.
Claims (4)
1. the manufacture method of a flat plasma display auxiliary electrode, this auxiliary electrode is arranged on the prebasal plate of this plasma flat-panel screens, and many of tools are parallel to transparency electrode on the first direction on this prebasal plate, and this method comprises the following steps: at least
Applying a black slurry bed of material that contains ruthenium on this prebasal plate and on these many transparency electrodes;
Apply a silver pulp layer and contain on the black slurry bed of material of ruthenium in this, wherein the coated area of this silver pulp layer makes on this first direction less than this black slurry bed of material that contains ruthenium, and the ruthenium black mill base bed of material that contains that is positioned at these prebasal plate both sides comes out;
This contains the black slurry bed of material and the silver pulp layer of ruthenium patterning, to limit this auxiliary electrode; And
Develop this silver pulp layer and this contains the black slurry bed of material of ruthenium.
2. flat plasma display auxiliary electrode manufacture method according to claim 1, wherein this prebasal plate is a glass substrate.
3. flat plasma display auxiliary electrode manufacture method according to claim 1, wherein patterning this when containing the black slurry bed of material of ruthenium and silver pulp layer, the length that this black slurry bed of material that contains ruthenium exposes on this first direction is greater than the length of this silver pulp layer at this first direction.
4. flat plasma display auxiliary electrode manufacture method according to claim 1, wherein patterning this when containing the black slurry bed of material of ruthenium and silver pulp layer, the length that this black slurry bed of material that contains ruthenium exposes on this first direction equals the length of this silver pulp layer at first direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031093663A CN100437879C (en) | 2003-04-08 | 2003-04-08 | Method for making auxiliary electrode of plasma plane display |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031093663A CN100437879C (en) | 2003-04-08 | 2003-04-08 | Method for making auxiliary electrode of plasma plane display |
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| CN1536602A CN1536602A (en) | 2004-10-13 |
| CN100437879C true CN100437879C (en) | 2008-11-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB031093663A Expired - Fee Related CN100437879C (en) | 2003-04-08 | 2003-04-08 | Method for making auxiliary electrode of plasma plane display |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1197281A (en) * | 1997-03-06 | 1998-10-28 | 纳幕尔杜邦公司 | Plasma display panel device and method of fabricating the same |
| CN1232240A (en) * | 1998-03-24 | 1999-10-20 | 松下电器产业株式会社 | Plasma display board |
| US6156433A (en) * | 1996-01-26 | 2000-12-05 | Dai Nippon Printing Co., Ltd. | Electrode for plasma display panel and process for producing the same |
| US6355402B1 (en) * | 1999-11-15 | 2002-03-12 | Samsung Sdi Co., Ltd. | Electrodes in plasma display panel and manufacturing method thereof |
-
2003
- 2003-04-08 CN CNB031093663A patent/CN100437879C/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6156433A (en) * | 1996-01-26 | 2000-12-05 | Dai Nippon Printing Co., Ltd. | Electrode for plasma display panel and process for producing the same |
| US6333140B1 (en) * | 1996-01-26 | 2001-12-25 | Dai Nippon Printing Co., Ltd. | Electrode for plasma display panel and process for producing the same |
| CN1197281A (en) * | 1997-03-06 | 1998-10-28 | 纳幕尔杜邦公司 | Plasma display panel device and method of fabricating the same |
| US5851732A (en) * | 1997-03-06 | 1998-12-22 | E. I. Du Pont De Nemours And Company | Plasma display panel device fabrication utilizing black electrode between substrate and conductor electrode |
| CN1232240A (en) * | 1998-03-24 | 1999-10-20 | 松下电器产业株式会社 | Plasma display board |
| US6355402B1 (en) * | 1999-11-15 | 2002-03-12 | Samsung Sdi Co., Ltd. | Electrodes in plasma display panel and manufacturing method thereof |
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|---|---|
| CN1536602A (en) | 2004-10-13 |
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Granted publication date: 20081126 Termination date: 20130408 |