CN100392514C - Parallel Fs laser double photon photopolymerization micro-nano processing method and apparatus thereof - Google Patents
Parallel Fs laser double photon photopolymerization micro-nano processing method and apparatus thereof Download PDFInfo
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- CN100392514C CN100392514C CNB2006100853495A CN200610085349A CN100392514C CN 100392514 C CN100392514 C CN 100392514C CN B2006100853495 A CNB2006100853495 A CN B2006100853495A CN 200610085349 A CN200610085349 A CN 200610085349A CN 100392514 C CN100392514 C CN 100392514C
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Abstract
The present invention relates to a parallel femto-second laser double photon photopolymerization micro-nano processing method and an apparatus thereof, which belongs to micro-nano processing technology. The present invention is realized by that firstly, a pumping laser is started, lasers generated by the pumping laser are induced into a resonant cavity of a femto-second laser, and femto-second ultra-short pulse lasers generated after oscillation go through a regenerative amplifier to amplify the energy of the femto-second supershort pulse lasers; secondarily, after amplified lasers experience a full reflecting mirror, an attenuating mirror and an optical gate, the amplified lasers are coupled into a fiber array by fiber coupler, the femto-second lasers are focused in photosensitive resin which is placed on cover glass which is fixed on a three-dimensional scanning platform by microlens array, the entire processing process is monitored by CCD, and the fine adjustment of the three-dimensional scanning platform is realized by that the control of a computer control system is connected with a driver on the three-dimensional scanning platform.
Description
Technical field
The present invention is a kind of micro-nano process technology, adopts the parallel job operation of Fs laser double photon absorption and microlens array, is applicable to the preparation of multiple photosensitive resin material three-dimensional micro-nano structure.
Background technology
Along with the develop rapidly of MEMS (micro electro mechanical system) application, people not only carry out to directions such as minification and raising precision the requirement of microfabrication, and more and more develop towards the diversified direction of processing.The manufacturing technology that tradition is used for micromachine can not satisfy the requirement that it further develops.
1931, Goppert-Mayor proposed the two-photon absorption theory, and up to 1992, webb group just introduced micro processing field with the two-photon technology.1997, usefulness two-photon absorption technology such as Kawata were produced various three-dimensional microcosmic structural types first in photopolymer, and its spatial discrimination yardstick reaches micron dimension; Calendar year 2001, the S.Kawata of Osaka university has reported at NATURE and has adopted two-photon polymerized method to make 10 μ m length in the photosensitive resin the inside, the high bull of 7 μ m, resolution reaches 120nm, it is minimum in the world artificial animal model, also made the microsprings oscillator that diameter reaches sub-micron simultaneously, made the microfabrication of Fs laser double photon really begin to step into the fabrication phase of sub-micron function element.Because the Fs laser double photon photopolymerization technology has maskless, high-resolution, true advantages such as three-dimensional, cold working, caused domestic and international scientist's abundant concern, the Fs laser double photon photopolymerization technology has become one of the focus in present international material scientific research field so far.
The two-photon Micrometer-Nanometer Processing Technology is a core with microelectronics, micro-optic, micromechanics, integrate contemporary optics, electronics, laser technology, precision optical machinery, computer technology and intelligent control technology etc., become the research focus of femtosecond laser application technology aspect in recent years.The Fs laser double photon Micrometer-Nanometer Processing Technology at first is that femtosecond pulse is focused on the transparent photosensitive resin, causes two-photon polymerizedly, and liquid resin changes solid into.When laser spot when three-dimensional resinous moves, polymerization produces along the trace of focus.This makes us can use laser and directly makes any three-dimensional structure that is produced by computing machine that in resin not radiation exposed liquid resin melts in alcohol.
The femtosecond laser technology is incorporated into the two-photon absorption that realizes material in the three-dimensional fine processing, makes this novel Micrometer-Nanometer Processing Technology show a lot of good characteristics.(1) because square being directly proportional of two-photon absorption probability and light intensity, interior (the volume amount level will be λ so the photochemical reaction that two-photon absorption causes will be limited near the zone minimum very high focus of light intensity
3).The intensity of laser spatially generally is Gaussian distribution, if adjusting incoming laser beam, make the center intensity of focal spot just satisfy the multiphoton ionization threshold value of material, can make machining resolution break through the restriction of the beam diffraction limit, realize submicron order or the nanoscale operation of size less than wavelength; (2) femtosecond laser of incident only could obtain higher power density in the focal position, multi-photon takes place to be absorbed and ionization, thereby realize the hyperfine processing of any part on the material internal three dimensions, make the femtosecond laser process have strict space orientation selective power, realize real three-dimensional processing; (3) processing mode is not limited to traditional overlapped way, in the two-photon process as long as the scanning motion of accurately controlling laser beam foucing just can be realized " the writing direct " to material, thereby process the micro element that designs in advance apace.This has guaranteed that also the two-photon microfabrication has very strong flexibility simultaneously: do not need that the structure of system of processing is made any adjustment and just can realize the processing of new unit by changing designing a model of CAD.(4) compare with traditional photoetching technique, the two-photon Micrometer-Nanometer Processing Technology can realize contactless processing, has energy-conservation, cleanliness without any pollution, working (machining) efficiency height, precision machining, does not need series of advantages such as vacuum condition.
Yet Fs laser double photon photopolymerization is based on the micro-nano processing method of single beam, so working (machining) efficiency is very low, has limited requirements of large-scale production greatly, becomes a bottleneck that limits this method development.Nineteen eighty-two, Oikawa and Iga have proposed a kind of method for preparing microlens array, for the parallel processing of double-photon optical dimerization provides possibility.On this basis, people such as the Hong-Bo Sun of Osaka, Japan university have proposed the employing microlens array and have carried out the parallel micro-nano process technology of multiple spot in 2005, reached and surpassed 200 parallel processing by optimizing conditions of exposure, and prepared two-dimentional little alphabetical array and three-dimensional Microspring array in photosensitive resin, its resolution reaches 250nm.Therefore, the parallel Fs laser double photon photopolymerization technology based on microlens array is showing great superiority aspect the processing of batch micro-nano device.But, also exist following deficiency in preparation process: (1) is because the femtosecond laser beam Gaussian distributed, therefore light intensity is more and more littler along radial direction on the cross section of light beam, make the skewness that shines the light on the microlens array, cause on different lenticules, having the difference of light intensity, thereby cause the variation of the resolution of prepared micro element.(2) also have unnecessary femtosecond laser in the gap of microlens array and shine, thereby caused a large amount of losses of energy.
Summary of the invention
The purpose of this invention is to provide the Fs laser double photon photopolymerization micro-nano system of processing device that a kind of high precision micro-nano device is produced in enormous quantities, it is a kind of parallel double photon photopolymerization three-D micro-nano process technology that integrates femtosecond laser technology, array fibre technology and array microfocus lens technologies.
Job operation of the present invention realizes according to following step:
At first, open pump laser, the laser of its generation is incorporated in the resonator cavity of femto-second laser, the femtosecond ultra-short pulse laser of generation amplifies energy by regenerative amplifier through vibrating after.Then, behind laser process total reflective mirror after the amplification, decay mirror, the optical gate, by fiber coupler it is coupled in the fiber array, femtosecond laser is focused in the photosensitive resin that is placed on the cover glass by microlens array, cover glass is fixed on the 3-D scanning platform, realizes that by the driver of computer control system control linkage on the 3-D scanning platform fine motion of 3-D scanning platform is regulated.Whole process is monitored in real time by CCD.
Little first being processed, on cover glass, place the film of the dyestuff that mixed, open LASER Light Source, make the femtosecond laser that sees through microlens array can cause the generation of fluorescence, move in the horizontal direction the 3-D scanning platform, regulate microlens array, make fluorescence intensity basically identical, plane and cover glass place planes overlapping that the focus of each lens in the microlens array is formed promptly are described by observed each the focus place of CCD.Close optical gate this moment, dripping photosensitive resin on the cover glass.In manufacture process, by computing machine the selectivity exposure that realizes in the photosensitive resin is controlled in the coordination of optical gate and 3-D scanning platform, thereby photosensitive resin is solidified in the position of needs; Can control laser energy to realize different processing dimensions by regulating the decay mirror simultaneously.
Realize that device of the present invention is made of successively laser generating system, outside optical system and control system for processing.Because adopt parallel processing, the energy that former cause femto-second laser provides can not satisfy multiple spot and reach the double photon photopolymerization energy needed simultaneously, therefore energy is amplified, to satisfy the needs of processing by regenerative amplifier.The decay mirror is used for regulating the required laser energy of manufacture process, and optical gate is used for controlling the break-make of femtosecond laser, and fiber array and microlens array can be regulated each device count to be processed.Software control system can be coordinated the motion of 3-D scanning platform and the switch of optical gate on the one hand, to realize the two-photon excitation of rapidoprint on the tram, can adjust process velocity neatly on the other hand, change the time shutter, to satisfy different processing requests.
Propose the parallel micro-nano process technology of multiple spot with people such as traditional single beam Fs laser double photon photopolymerization micro-nano process technology and Hong-Bo Sun and compare, the micro-nano processing method that the present invention proposes has following technical advantage:
By fiber array and microlens array, can realize higher machining resolution, and can carry out real three-D micro-nano preparation of devices in large quantity; Can suitably select the number of optical fiber simultaneously according to the requirement of processing number of devices.
Owing to adopt fiber array, laser energy can almost be assigned in each root optical fiber fifty-fifty, can not be subjected to the influence of the Gaussian distribution of femtosecond laser, thereby make whole machining area have consistent machining resolution and machining precision.
Adopt the fiber array that mates with microlens array, laser energy can not shone in the slit of microlens array, significantly reduced the loss of energy, thereby can realize more large batch of processing.
Description of drawings
The device synoptic diagram of Fig. 1 parallel Fs laser double photon photopolymerization micro-nano processing
Fig. 2 microlens array schematic top plan view
1 pumping source, 2 femto-second lasers, 3 regenerative amplifiers, 4 total reflective mirrors, 5 decay mirrors, 6 optical gates, 7 fiber couplers, 8 fiber arrays, 9 microlens arrays, 10 cover glasses, 11 3-D scanning platforms, 12 photosensitive resins, 13CCD, 14 drivers, 15 computer control systems, 16 lenticules
Embodiment
Be explained as follows in conjunction with the device synoptic diagram of the parallel Fs laser double photon photopolymerization micro-nano of Fig. 1 example processing details and performance concrete device of the present invention:
The device of realization parallel Fs laser double photon photopolymerization micro-nano processing mainly is made up of laser generating system, outside optical system and control system for processing.Wherein laser generating system comprises pump light source 1, femto-second laser 2 and regenerative amplifier 3.Outside optical system comprises that light modulation system and light beam focus on system, and main element has total reflective mirror 4, decay mirror 5, optical gate 6, fiber coupler 7, fiber array 8 and microlens array 9 etc.Control system for processing comprises two parts, and promptly micro-nano system of processing and software control system mainly are made up of cover glass 10,3-D scanning platform 11, photosensitive resin 12, CCD13, driver 14, computer control system 15.Above-mentioned each element connects and composes the parallel Fs laser double photon photopolymerization micro-nano system of processing successively.
Add man-hour, the laser that pump laser 1 is produced is incorporated into the resonator cavity of femto-second laser 2, and the femtosecond ultra-short pulse laser that the vibration back produces realizes producing in enormous quantities needed higher light intensity through behind the regenerative amplifier 3 energy being amplified to provide.Behind laser process total reflective mirror 4 after the amplification, decay mirror 5, the optical gate 6, by fiber coupler 7 it is coupled in the fiber array 8, the femtosecond laser that comes out from fiber array is focused on the photosensitive resin 12 that is placed on the cover glass 10 by microlens array 9, and cover glass is fixed on the 3-D scanning platform 11.Whole process is by CCD 13 monitoring, and the fine motion of 3-D scanning platform 11 is regulated and realized by the driver 14 of computer control system 15 control linkages on 3-D scanning platform 11.
Fig. 2 is the microlens array schematic top plan view, and each dot is wherein represented a lenticule 16.Used array fibre is corresponding to selected microlens array.
Claims (4)
1. parallel Fs laser double photon photopolymerization micro-nano processing method, it is characterized in that: at first, open pump laser, the laser of its generation is incorporated in the resonator cavity of femto-second laser, the femtosecond ultra-short pulse laser of generation amplifies energy by regenerative amplifier through vibrating after; Then, behind laser process total reflective mirror after the amplification, decay mirror, the optical gate, by fiber coupler it is coupled in the fiber array, femtosecond laser is focused in the photosensitive resin that is placed on the cover glass by microlens array, cover glass is fixed on the 3-D scanning platform, whole process is monitored by CCD, and the fine motion of 3-D scanning platform is regulated and realized by the driver of computer control system control linkage on the 3-D scanning platform.
2. parallel Fs laser double photon photopolymerization micro-nano processing method according to claim 1, it is characterized in that: little first being processed, on cover glass, place the film of the dyestuff that mixed, open LASER Light Source, make the generation that causes fluorescence through the femtosecond laser of microlens array, move in the horizontal direction the 3-D scanning platform, regulate microlens array, make fluorescence intensity basically identical, close optical gate this moment, dripping photosensitive resin on the cover glass by observed each the focus place of CCD.
3. parallel Fs laser double photon photopolymerization micro-nano processing method according to claim 1 is characterized in that: in manufacture process, the coordination of optical gate and 3-D scanning platform is controlled the selectivity exposure that realizes in the photosensitive resin by computing machine; Control laser energy to realize different processing dimensions by regulating the decay mirror.
4. realize the device of the described parallel Fs laser double photon photopolymerization micro-nano processing method of claim 1, it is characterized in that by laser generating system, outside optical system and control system for processing are formed successively, wherein laser generating system is by the pump light source (1) that links to each other successively, femto-second laser (2) and regenerative amplifier (3) are formed, outside optical system is by the total reflective mirror (4) that links to each other successively, decay mirror (5), optical gate (6), fiber coupler (7), fiber array (8) and microlens array (9) are formed, cover glass in the control system for processing (10), 3-D scanning platform (11), photosensitive resin (12), CCD (13) links to each other successively, and computer control system (15) links to each other with 3-D scanning platform (11) through driver (14).
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| CN101220332B (en) * | 2007-11-28 | 2012-03-21 | 江苏大学 | Method and device for nervus damnification and regeneration renovation by using femtosecond laser |
| CN101458451B (en) * | 2008-12-31 | 2012-01-11 | 北京航空航天大学 | Light path structure suitable for femtosecond laser two-photon mirco-nano processing system |
| WO2012037780A1 (en) * | 2010-09-21 | 2012-03-29 | 中国科学院理化技术研究所 | Laser micro/nano processing system and method |
| CN102909477A (en) * | 2012-10-31 | 2013-02-06 | 北京工业大学 | Method and device for preparing large area of micro gratings on surface of target material by utilizing ultra-fast laser |
| CN104155851B (en) * | 2014-08-01 | 2017-11-07 | 南方科技大学 | A kind of Fs laser double photon polymerization micro/nano processing system and method |
| CN105671628B (en) * | 2016-02-01 | 2018-04-20 | 昝涵今 | A kind of laser heats the device and its growing method of the big thin slice of growing by zone melting or Special-shaped warp monocrystalline |
| CN108123011A (en) * | 2018-01-11 | 2018-06-05 | 温州大学激光与光电智能制造研究院 | Laser making herbs into wool equipment and its method |
| CN112846487A (en) * | 2021-01-11 | 2021-05-28 | 浙江师范大学 | Ultrafast laser multi-focus large-space parallel processing device and method |
| CN113031149B (en) * | 2021-04-06 | 2022-03-18 | 上海大学 | Ultra-long three-dimensional nano optical fiber preparation system and method based on micro-fluidic control type two-photon laser direct writing technology |
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Assignee: Nantong Johnson Photoelectric Technology Co., Ltd. Assignor: Jiangsu University Contract record no.: 2010320000557 Denomination of invention: Parallel Fs laser double photon photopolymerization micro-nano processing method and apparatus thereof Granted publication date: 20080604 License type: Exclusive License Open date: 20061115 Record date: 20100507 |
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