CN100377299C - Quartz cover positioning protection device - Google Patents
Quartz cover positioning protection device Download PDFInfo
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- CN100377299C CN100377299C CNB2005101262977A CN200510126297A CN100377299C CN 100377299 C CN100377299 C CN 100377299C CN B2005101262977 A CNB2005101262977 A CN B2005101262977A CN 200510126297 A CN200510126297 A CN 200510126297A CN 100377299 C CN100377299 C CN 100377299C
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- quartz cover
- positioning protection
- guard ring
- quartz
- protection device
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Abstract
The present invention relates to a positioning protection device for a quartz cover for protecting a reaction chamber of an etching machine, which comprises a quartz cover, an adjusting supporting frame and a positioning protection ring, wherein the positioning protection ring is positioned between the quartz cover and the adjusting supporting frame. The present invention has the advantages of simple structure and convenient production. By additionally arranged the adjusting supporting frame between the quartz cover and the adjusting supporting frame, the damage of the quartz cover due to misoperation can be avoided, the service lift of the quartz cover is extended, and the cost is saved. The inner side of the positioning protection ring of the quartz cover of the present invention is in a step-shaped structure, which can help an operator to accurately position the quartz cover, and the time in installing the quartz cover is shortened. The present invention can be widely applied to semiconductor devices or other devices.
Description
Technical field
The present invention relates to microelectronics technology, be specifically related to be used to protect the reaction cavity in etching machine quartz cover positioning protection device.
Background technology
Equipment is quite accurate complicated in the microelectronic industry, and the employed material of parts is more special, thus in the process of carrying out assembly and disassembly and use, all require operating personnel careful especially, to prevent the damage of parts.Even like this, because the vulnerability of quartz material also is difficult to avoid unexpected failure, in addition,, has not only brought difficulty, and prolonged installation time to assembling owing to lack positioner, more increased the risk that quartz cover is damaged.Secondly, because quartz cover involves great expense, and plasma etching industrial is for the having relatively high expectations of quartz cover, and so, each time damage all means scraps this part, has improved production cost.
The etching machine has experienced 6 inches, 8 inches, 12 inches development course; before 12 inches silicon chip erosion machines are used; the installing/dismounting of 8 inches etching machine quartz cover mainly relies on the service engineer of specialty; this etching machine is being adjusted between support 2 ' and the quartz cover 1 ' without any the part that plays protection and positioning action, as shown in Figure 1.Because clean room involves great expense, so offer the service clearance of etching machine in the clean room the inside narrow and small; Add the frangible characteristic of quartz material, improved the difficulty of maintenance greatly.There is following shortcoming in this kind mode: technical level of operators is had relatively high expectations, must be through strict training; In the installing/dismounting process, slight colliding with all can damage quartz cover and cause scrapping; Rely on operating personnel's perusal location, locate inaccurately, and increased the risk of damage parts.
Summary of the invention
(1) technical problem that will solve
The purpose of this invention is to provide a kind of simple in structure, saving cost, can avoid damaging and can realize the quartz cover positioning protection device of location because of misoperation causes quartz cover.
(2) technical scheme
In order to achieve the above object, the present invention takes following scheme:
The present invention includes quartz cover, adjust support, location guard ring, this location guard ring place quartz cover and adjust between the support.
Wherein, the inboard of described location guard ring is a step shape, and described location guard ring periphery is provided with several locating flanges.
Wherein, described locating flange is evenly distributed on location guard ring periphery.
Wherein, described locating flange is provided with through hole.
(3) beneficial effect
1) compared with the prior art, owing to adopt above scheme, the present invention is simple in structure, is convenient to produce; By in quartz cover and adjust and to increase the quartz cover guard ring between the support, the quartz cover of avoiding causing because of misoperation is damaged, and prolongs quartz cover useful life, saves cost.2) because the inboard of quartz cover of the present invention location guard ring is a step-like structure, can help the operator accurately to locate like this, shorten the time that quartz cover is installed.
Description of drawings
Fig. 1 is the adjustment support of existing etching machine and the mated condition stereogram of quartz cover;
Fig. 2 is a user mode stereogram of the present invention;
Fig. 3 is a user mode structural representation of the present invention;
Fig. 4 is the structural representation of circular orientation ring of the present invention;
Fig. 5 is a circular orientation ring of the present invention edge partial structurtes schematic diagram.
Among the figure: 1 ' quartz cover 2 ' is adjusted support 1 quartz cover 2 and is adjusted support 3 location guard ring 31 through holes 32 locating flanges
Embodiment
Following examples are used to illustrate the present invention, but are not used for limiting the scope of the invention.
Quartz cover location guard ring profile and structure chart are please referring to Fig. 2～Fig. 5.A kind of quartz cover location guard ring 3 places quartz cover and adjusts between the support, and the inboard of location guard ring 3 is a step-like structure, and described location guard ring 3 peripheries also are provided with four locating flanges 32.Locating flange 32 is provided with through hole 31.Described locating flange 32 is symmetrically distributed in location guard ring 3 peripheries.
By in quartz cover 1 and adjust and to increase quartz cover location guard ring 3 between the support 2, can prevent colliding with between the quartz cover 1 and adjustment support 2 in the installing/dismounting process, avoid quartz cover 1 impaired.In addition; in quartz cover 1 expanded by heating; owing to and have quartz cover location guard ring 3 to be separated by between the adjustment support 2; can avoid pushing up and adjust support 2 and make that quartz cover 1 is impaired because of thermal expansion because quartz cover location guard ring 3 usefulness elasticity preferably material make, as PVC, polytetrafluoroethylene etc.; in the present embodiment; quartz cover location guard ring 3 usefulness polytetrafluoroethylene are made, and elasticity is preferably arranged, and can well protect quartz cover 1.When quartz cover 1 is installed; by quartz cover location guard ring 3 upper flange through holes 31; be screwed and adjusting on the support 2; because internal diameter a big 1mm of external diameter of quartz cover location guard ring 3 than quartz cover; and guard ring 3 inboards, location are step-like structure, can help the operator accurately to locate quartz cover 1 like this.
Claims (4)
1. a quartz cover positioning protection device comprises quartz cover (1), adjusts support (2), it is characterized in that: comprise location guard ring (3), this location guard ring (3) places quartz cover (1) and adjusts between the support (2).
2. a kind of quartz cover positioning protection device as claimed in claim 1 is characterized in that: the inboard of described location guard ring (3) is a step shape, and described location guard ring periphery is provided with several locating flanges (32).
3. a kind of quartz cover positioning protection device as claimed in claim 2 is characterized in that: described locating flange (32) is evenly distributed on location guard ring (3) periphery.
4. a kind of quartz cover positioning protection device as claimed in claim 2 is characterized in that: described locating flange (32) is provided with through hole (31).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101262977A CN100377299C (en) | 2005-12-05 | 2005-12-05 | Quartz cover positioning protection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101262977A CN100377299C (en) | 2005-12-05 | 2005-12-05 | Quartz cover positioning protection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1851851A CN1851851A (en) | 2006-10-25 |
| CN100377299C true CN100377299C (en) | 2008-03-26 |
Family
ID=37133326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101262977A Active CN100377299C (en) | 2005-12-05 | 2005-12-05 | Quartz cover positioning protection device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100377299C (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11150075A (en) * | 1997-11-14 | 1999-06-02 | Chemitoronics Co | Diffusion equipment and impurity diffusion method into semiconductor crystal using the same |
| JP2003224115A (en) * | 2001-11-05 | 2003-08-08 | Tokyo Electron Ltd | Device and method for relaxing resonance of chamber in plasma process |
| CN2665913Y (en) * | 2003-07-22 | 2004-12-22 | 福谦科技股份有限公司 | Wafer reaction chamber adapter |
-
2005
- 2005-12-05 CN CNB2005101262977A patent/CN100377299C/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11150075A (en) * | 1997-11-14 | 1999-06-02 | Chemitoronics Co | Diffusion equipment and impurity diffusion method into semiconductor crystal using the same |
| JP2003224115A (en) * | 2001-11-05 | 2003-08-08 | Tokyo Electron Ltd | Device and method for relaxing resonance of chamber in plasma process |
| CN2665913Y (en) * | 2003-07-22 | 2004-12-22 | 福谦科技股份有限公司 | Wafer reaction chamber adapter |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1851851A (en) | 2006-10-25 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone, 100176 Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100016 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |