CN100367471C - Vaporizer and semiconductor processing apparatus - Google Patents

Abstract

A vaporizer includes a vaporizing chamber (110) configured to vaporize a liquid material and thereby form a gas material. A spray portion (120) is configured to spray the liquid material in the vaporizing chamber. A delivery part (130) is configured to deliver the gas material from the vaporizing chamber to a gas outlet (131SO). A heating portion (112, 132) is configured to heat the vaporizer. The delivery part (130) includes a filter member (113) covering the gas outlet and configured to allow the gas material to pass therethrough. A shield plate (134) is disposed to cover the filter member on a side farther from the gas outlet.

Description

Gasifier and semiconductor processing device

Technical field

The present invention relates to a kind ofly be used for the gasifier that the gasified liquid raw material generates gas raw material, and the semiconductor processing device that utilizes it.Here, as semiconductor processes, mean for by on the processed substrate of the glass substrate of wafer or LCD (LCD (Liquid crystal display)) or FPD (flat-panel monitor (Flat Panel Display)) usefulness etc., pattern with regulation forms semiconductor layer, insulating barrier, conductive layer etc., come on this processed substrate, to make semiconductor device or comprise the structure of the wiring that is connected with semiconductor device, electrode etc., and the various processing of enforcement.

Background technology

Usually, as the film formation technology of semiconductor device, known CVD (chemical vapor deposition) method.In the operation of making semiconductor device, under the situation that constitutes capacitor,, require high-k and few leakage current for thin dielectric film in order to realize the highly integrated of device.For this reason, under the situation that forms such thin dielectric film, use the film technique of organo metallic material as raw material.

In above-mentioned film technique, as the raw material that is organo metallic material, generally, using was the raw material of liquid originally, perhaps by the liquable raw material of appropriate solvent.This raw material is gasificated into vaporific in gasifier (material gasification device), offers in the reative cell as film formation device.In gasifier, organo metallic material need gasify fully with Undec temperature.But, in practice, perhaps produce the residual mist that does not gasify, perhaps the analyte of organo metallic material produces as particulate.For this reason, the problem place that reduces with regard to the quality that has become the film of film forming in reative cell of these mists or particulate.

Like this, all the time, known the formation that outlet at gasifier is provided with filter and removes mist elimination or particulate (for example, with reference to the spy open flat 7-94426 communique, the spy opens flat 8-186103 communique, No. 6210485 communique of United States Patent (USP)).In addition, also known such structure, the stream setting of gasified raw material with gasification board vertical or that hinder the such angle of stream to be provided with, is provided with heater and promotes gasification (for example, opening flat 6-310444 communique with reference to the spy) in the inside of this gasification board.

In addition, known the interior face portion of the relative configuration in vaporizer with the raw material spray direction, be provided with can independently temperature controlled gasification face with the inner face of other vaporizer gasifier (for example, opening the 2002-110546 communique, particularly the structure of its Fig. 7 and Fig. 8) with reference to the spy.Set the temperature of this gasification face, make than surface temperature height in other.In existing structure, when spraying raw material in the inner face segment set of relative configuration with the spray direction of raw material, the temperature reduction that has owing to face portion in being somebody's turn to do produces the not possibility of residue after gasifying.Utilize this gasifier, can reduce so not residue after gasifying, can realize the increase of amount of vaporization.

But, in above-mentioned existing gas raw material feed system, stop up because mist and particulate can produce the mesh of filter.The conductibility that produces short-term thus reduces, and the internal pressure of gasifier rises simultaneously.For this reason, the gasification efficiency of the quantity delivered of gas raw material or gasifier reduces.Therefore,, must carry out the cleaning or the exchange of filter continually, the problem that this reduces with regard to the actual job rate with device in order to ensure the quantity delivered and the gasification efficiency of gas raw material.

On the other hand, state in the use in the method for gasification board of existing internal heater, if, need be arranged so that the ventilation path of gas raw material is stretched out extensively in order to improve the catch rate of the mist that is undertaken by gasification board.In this case, the gasification efficiency with gasifier reduces such problem.In addition, utilize such gasification board, also have the problem that almost can not expect the seizure effect of particulate.

In addition, can independently control in the gasifier of gasification face of temperature the temperature of the interior face portion of the relative configuration of independent control with the spray direction of raw material in above-mentioned existing setting.By like this, can improve the gasification efficiency of the raw material in the vaporizer.But, for more not influencing with the discontiguous mist of this gasification face.For this reason, have such problem, can not suppress without this gasification face and directly discharge not residue after gasifying or particulate to gas export mouth as the outlet of vaporizer.

Summary of the invention

The objective of the invention is to, provide a kind of and can reduce the mist in the gas raw material and the gasifier of particulate.

The present inventor studies this kind gasifier in development process of the present invention, and the result obtains following opinion.

Promptly, the gas raw material that generates by gasification in the first gasification portion of gasifier etc. pass through configurating filtered parts in the path (the second gasification portion), with this filter element heating, make the actual temperature identical that reach with the heating-up temperature of the first gasification portion, in the residual mist that in catching gas raw material, is comprised, can gasify again thus.By like this, can catch mist residual in the gas raw material or particulate, highly purified gas raw material can be provided.In addition, because the residual mist of catching gasifies by the filter element that heats again, stop up so also can reduce the mesh of filter element.For this reason, also can keep the gasification efficiency in the gasifier for a long time, suppress the rising of the internal pressure of gasifier.Therefore, also can reduce the frequency of maintenance, improve the actual job rate of device.

But, as the mode of heating of filter element, consider: at the outer setting heater block of filter element, heater block is set, situation about heating from filter interior from the situation of external heat filter element with in the inside of filter element.Under the former situation, come the heating and filtering parts by radiant heat or conduction heat, but can not in the stream of gas raw material, dispose heater block, so require the formation of even hot filtration apparatus parts.If the non-uniform temperature of filter component, the heating-up temperature of the residual mist of seizure can produce deviation, has to produce local mesh possibility of jamming in filter element.For example, even will make as the outer edge heating of the installation position of filter component and reach the higher temperature of ratio that can not cause raw material to decompose,, cools off the central portion of filter the temperature reduction because contacting with gas or mist.For this reason, have such problem, the mist that can not gasify causes mesh to stop up.

First viewpoint of the present invention is, a kind of supply structure of gasified raw material is provided, and has: the first gasification portion of gasified raw material; The gas raw material that is gasified in this first gasification portion pass through second set in the path gasification portion, in the described second gasification portion, have: at the described filter element that disposes in by the path with aeration; Heat transfer part with the position thermo-contact outside the outer edge of described filter element, conducts the heat that heater block takes place.

As according to first viewpoint, by the first gasification portion with raw material in case after the gasification, can be by the second gasification portion residual mist in the gasifying gas raw material once more, so can reduce mist in the gas raw material.In addition, by heat transfer part, the heat that heater block took place is transmitted to the position outside the outer edge of filter element, thus can make that the temperature of filter element is even, the result, in filter element, can be more equably or at the wideer area mist that gasifies.In addition, adhere to, stop up so can reduce the mesh of filter element owing to be difficult to produce local the concentrated of raw material.In this case, can suppress the rising etc. of the internal pressure of the reduction of the gasification efficiency in the gasifier or the first gasification portion, so but can significantly increase power lifetime of gasifier.In addition, can make the attended operation of cleaning or exchange etc. become easy.In addition, owing to can catch mist or the particulate that the first gasification portion is taken place by filter element, so can carry out the high-quality processing of using gases raw material.

Here, as filter element, can enumerate and for example have the filter element that the structure of the plate structure of a plurality of pores, conpressed fibers shape material, mesh (mesh) structure etc. were constructed, had in many spaces (porous).

And, preferably, the above-mentioned heat transfer part of a plurality of positions difference thermo-contact of a plurality of and filter element is set.By like this, can further improve the temperature homogeneity of filter element.Preferably, the position of the filter component of these a plurality of heat transfer parts of thermo-contact, decentralized configuration equably roughly on above-mentioned cross section (with the imaginary plane of the path direction quadrature of gas raw material) by the path.Here, preferred, also heat the outer edge of filter element.

In addition, as above-mentioned heat transfer part, can be any one in following each parts: set on the parts of heater block or built-in heater block towards the outstanding projection of filter element, other parts that between the parts of heater block or built-in heater block and filter element, inserted, set towards the outstanding projection of the parts of heater block or built-in heater block on filter element.In addition, preferred, fixed parts such as hold-down screw are set, the parts of be used for interfixing heater block or built-in heater block, heat transfer part, filter element at least two.

In this case, preferred, carry out temperature control based on the temperature of described heat transfer part or described filter element.By carrying out temperature control based on reception from the heat transfer part of the heat of heater block or the temperature of filter element, the temperature that can improve filter element is controlled.For example, can be in the temperature detecting point of the internal configurations temperature sensor of heat transfer part or filter element, based on the output of this temperature sensor, wait by temperature-control circuit and to control heater block.In addition, also can on heat transfer part or filter element, the heater block that is different from chamber be set.In this case, preferred, the heat transfer part that is caused by this heater block or the temperature Be Controlled of filter element make to become the temperature identical with chamber.

The supply structure that second viewpoint of the present invention is a gasified raw material has: the first gasification portion of gasified raw material; Second set on the path gasification portion that passes through at the gas raw material of this first gasification portion gasification in the described second gasification portion, comprising: at the described filter element with aeration that disposes on by the path; The heater block that inside disposed at this filter element.

As according to second viewpoint, by the internal configurations heater block at filter element, heating and filtering parts effectively can reduce simultaneously the deviation of its surface temperature.For this reason, can catch mist or solid content by filter element, the residual mist that will adhere to gasifies equably.As a result, can prevent again in the filter element that local residual mist piles up and cause that mesh stops up, and can prevent to produce particulate again.

Here, in first and second viewpoints, the first gasification portion can be made of for example existing known gasifier.As this gasifier, can enumerate gasifier: vaporizer with inner face of heating with following parts; Aerosolizing part to this vaporizer internal spraying raw material.In addition, the second gasification portion can be made of the institutes such as line filter that the downstream connected at gasifier.And the supply structure as gasified raw material also can be arranged on the above-mentioned first gasification portion and the second gasification portion in the single gasifier simultaneously.

The 3rd viewpoint of the present invention is reaction treating device (semiconductor processing device), has: the supply structure of above-mentioned any gasified raw material of being put down in writing; Make reative cell by this supply structure institute gas supplied raw material reaction.By like this, can reduce amount, so can improve the processing quality in the reative cell by particulates such as mist in the supply structure institute gas supplied raw material of gasified raw material or solid contents.As this reaction treating device, broadly comprise the device that in reative cell, makes gas raw material various processing that reaction is carried out by use thermal source homenergic, for example semiconductor gas phase film formation device, liquid crystal gas phase film formation device, compound semiconductor gas phase film formation device, vapor phase etchant device etc.Particularly, under the situation as gas phase film formation device (CVD device), having can high-quality film forming effect.

The 4th viewpoint of the present invention is a gasifier, has: the vaporizer that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; At described vaporizer opening, be used for sending the unloading part of gas raw material to the raw material supplying circuit, it is characterized in that having: at filter element described unloading part setting, that have aeration; Heat transfer part is with the outer edge position thermo-contact in addition of described filter element, the conduction heat that heater block took place.

By like this, in the unloading part of gasifier residual mist gasify once more, and solid content is captured.For this reason, can reduce the mist in the gas supplied raw material or the amount of solid content.Here, in filter element, by the heat of the position conduction heater block of heat transfer part beyond the outer edge, so can reduce the temperature deviation of filter element.For this reason, can access more uniform gasification again, can reduce the local raw material of filter element and pile up (mesh obstruction).In addition, owing to can catch mist or the particulate that vaporizer takes place, so can carry out the high-quality processing of using gases raw material.

In this case, preferred, carry out temperature control based on the temperature of described heat transfer part or described filter element.By carrying out temperature control based on reception from the heat transfer part of the heat of heater block or the temperature of filter element, the temperature that can improve filter element is controlled.For example, can be in the temperature detecting point of the internal configurations temperature sensor of heat transfer part or filter element, based on the output of this temperature sensor, wait by temperature-control circuit and to control heater block.In addition, also can on heat transfer part or filter element, the heater block that is different from chamber be set.In this case, preferred, the heat transfer part that is caused by this heater block or the temperature of filter element are controlled as the temperature identical with chamber.

And, preferred, be provided with a plurality of above-mentioned heat transfer part of distinguishing thermo-contact with a plurality of positions of filter element.By like this, can further improve the temperature homogeneity of filter element.Preferably, the position of the filter element of these a plurality of heat transfer part thermo-contacts, decentralized configuration substantially equably on the cross section of above-mentioned unloading part (with from the direction plane orthogonal of vaporizer) to unloading part.

The 5th viewpoint of the present invention is a kind of gasifier, has: the vaporizer that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; At unloading part described vaporizer opening, that be used for sending gas raw material, it is characterized in that having: at the filter element with aeration of described unloading part setting to the raw material supplying circuit; Heater block in the internal configurations of this filter element.

In the 5th viewpoint, preferred, between the inside of described vaporizer and described filter element, dispose shutter.By the configuration shutter, the mist that enters unloading part from vaporizer is difficult to direct contact filtration parts.For this reason, can be reduced in the amount that the former state that do not gasify in the vaporizer is directly passed through the residual mist of unloading part.As a result, can avoid on filter element, adhering to mist again, not pile up with gasifying, can avoid again seizing more heat and reducing local temperature from filter element.

In addition, preferred, described filter element is for removably to constitute by only unloading or decomposing described unloading part.By like this, even be regardless of other component part, for example aerosolizing part or the vaporizer integral body of separating gasifier, also can be by only unloading or decomposing unloading part, come or unload or install filter element.For this reason, can easily carry out attended operations such as the cleaning of filter element or exchange.

The 6th viewpoint of the present invention is a kind of gasifier, has: the vaporizer that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; At unloading part described vaporizer opening, that be used for sending gas raw material, it is characterized in that having to the raw material supplying circuit: shutter, in the position configuration of contiguous described vaporizer for guaranteeing flow-through opening portion and covering described unloading part; Heat transfer part, with this shutter thermo-contact, the conduction heat that heater block took place.

As according to the 6th viewpoint, at the position configuration shutter of contiguous vaporizer, make to cover unloading part, can prevent that thus the residual mist or the particulate of gasification directly do not arrive unloading part at vaporizer.For this reason, can reduce residual mist or the particulate that arrives the feed line road.In addition, owing to the heat of heater block is transmitted to shutter, can realize gasification by the shutter of heating by heat transfer part.For this reason, by utilizing the shutter residual mist that gasifies, can improve gasification efficiency.And, by the gas raw material of vaporizer or shutter gasification, import the inner space of unloading part by above-mentioned flow-through opening portion, send very soon to the raw material supplying circuit.

In this case, preferred, have the described heat transfer part of the position thermo-contact beyond the outer edge with described shutter.By like this, can improve the temperature homogeneity of shutter.In addition, preferred, have temperature control unit, carry out temperature control based on the temperature of described heat transfer part or described shutter.

The 7th viewpoint of the present invention is a gasifier, has: the vaporizer that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; At unloading part described vaporizer opening, that be used for sending gas raw material, it is characterized in that having:, make and guarantee flow-through opening portion and cover described unloading part at the shutter of the position configuration of being close to described vaporizer to the raw material supplying circuit; Heater block in the internal configurations of this shutter.

As according to the 7th viewpoint, by position configuration shutter, make to cover unloading part at contiguous vaporizer, can prevent that the residual mist or the particulate of gasification directly do not arrive unloading part at vaporizer.For this reason, can reduce residual mist or the particulate that arrives the feed line road.In addition, owing to internal configurations heater block, so also can realize gasification by the shutter of heating at shutter.For this reason, by utilizing the shutter residual mist that gasifies, can improve gasification efficiency.And, by the gas raw material of vaporizer or shutter gasification, import the inner space of unloading part by above-mentioned flow-through opening portion, send very soon to the raw material supplying circuit.

The 8th viewpoint of the present invention is a kind of gasifier, has: the vaporizer with the gasification face that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; Heat the heater block of the described gasification face of described vaporizer; At unloading part described vaporizer opening, that be used for sending gas raw material to the raw material supplying circuit, it is characterized in that, be different from described gasification face, be close to the shutter that described vaporizer configuration is blocked, make and to guarantee from described vaporizer to the flow-through opening portion of described unloading part and cover described unloading part, described shutter heats by described heater block or the heater block that is different from described heater block, and the design temperature of described shutter is identical with the design temperature of described gasification face.

As according to the 8th viewpoint, be set at the temperature identical by heating-up temperature with gasification face with shutter, can be at shutter place gasification mist.For this reason, can stop to unloading part by shutter to flow into residual mist or solid content, improve gasification efficiency.

In this case, preferred, disperse configuration and the inner face of described unloading part and a plurality of heat conduction posts of described shutter thermo-contact at described unloading part.By disperse a plurality of heat conduction posts of configuration and its inner face and shutter thermo-contact at unloading part, can catch, gasifying enters the residual mist of unloading part by flow-through opening portion.For this reason, can further realize the raising of gasification efficiency and the reduction of particulate.

Preferably, described shutter constitutes, and can not pass through described unloading part by described flow-through opening portion linearity ground from described vaporizer.By like this, can suppress by flow-through opening portion enter the mist of unloading part or solid content thus downstream effluent go out.Particularly, enter the mist of unloading part, can further improve gasification efficiency by contacting with the inner face of unloading part to gasify.

The 9th viewpoint of the present invention is a kind of gasifier, has: the vaporizer that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; At unloading part described vaporizer opening, that be used for sending gas raw material, it is characterized in that having: at the filter element of described unloading part configuration to the raw material supplying circuit; Shutter in the heating of the position configuration of contiguous described vaporizer makes and guarantees flow-through opening portion and cover described filter element.

As according to the 9th viewpoint, when unloading part is provided with filter element, shutter is set in the position of contiguous vaporizer, make to cover filter element.By like this, can suppress residual mist or particulate and directly arrive filter element, the mesh that can reduce filter element stops up., can safeguard easily that the shutter residual mist that gasifies by heating simultaneously is so can improve gasification efficiency for this reason.

The tenth viewpoint of the present invention is a kind of gasifier, has: the vaporizer with the gasification face that is used for gasified raw material; Aerosolizing part to this vaporizer spraying raw material; Heat the heater block of the described gasification face of described vaporizer; At unloading part described vaporizer opening, that be used for sending gas raw material to the raw material supplying circuit, it is characterized in that, be provided with: at the filter element of described unloading part configuration; The shutter that blocks at the described vaporizer side described vaporizer of vicinity configuration, that be different from described gasification face of described filter element, make and to guarantee from described vaporizer to the flow-through opening portion of described unloading part and cover described filter element, described filter element and described shutter heat by described heater block or the heater block that is different from described heater block, the design temperature of described filter element and described shutter is identical with the design temperature of described gasification face.

As according to the tenth viewpoint, be set at the temperature identical by heating-up temperature with gasification face with filter element and shutter, can be at filter element and shutter place gasification mist.For this reason, can stop by filter element and shutter to flow into residual mist or solid content, in addition, can limit the arrival amount of residual mist, improve gasification efficiency by shutter to filter element to unloading part.

Preferably, described shutter constitutes, and makes the illusion straight line that imports described flow-through opening portion from described vaporizer can not arrive described filter element.By like this, can reduce from vaporizer and directly pass through filter element by the residual mist that flow-through opening portion enters unloading part.For this reason, the mesh that can further reduce filter stops up, and particularly, can be suppressed on the part of filter and concentrate the such phenomenon of deposit.

Preferably, between described filter element and described shutter, the whole surperficial setting that spreads all over described filter element can be by the interval of gas raw material.By like this, owing to the gas raw material that enters unloading part from flow-through opening portion can be by whole of filter element, so can guarantee the transmission of gas raw material.Simultaneously, concentrate seizure mist or solid content,, can reduce and cause filter element mesh possibility of jamming in this part in the part of filter element.In this case, preferred, between filter element and shutter is in the scope of 1～100mm at interval, particularly, be more preferably in the scope of 1～10mm, and most preferably be about 5mm.

Preferably, dispose described shutter, make, cover whole of described filter element from described vaporizer side.By like this, prevented from directly to face filter element from mist or solid content that vaporizer enters.Particularly, more preferably shutter constitutes, and spreads all over complete circumferentially outer circumferential side and further stretches out comparing with the outer rim of filter element.

Preferably, the outer edge of described filter element is fixed on the inner face of described unloading part.

Preferably, described flow-through opening portion is set to, spread all over described shutter around full week, be communicated with described vaporizer and described filter element.By like this, can be with gas raw material from flow-through opening portion to filter element circulated gases raw material successfully, simultaneously, the deflection of the mist that is caused by filter element or the catching position of solid content also can reduce.Here, preferred, above-mentioned gap is in the scope from 0.5mm to 100mm, particularly, be more preferably below 10mm, and most preferably be about about 2mm.

Preferably, described flow-through opening portion be arranged on described shutter around.By like this, shutter can be constituted simple structure, simultaneously, near the maintenances such as cleaning shutter or the flow-through opening portion become easy.In this case, preferred, the A/F of flow-through opening portion (distance of the shutter and the inner face of the unloading part that is in its outer circumferential side) is below the above 10mm of 0.5mm, particularly, more than the 1mm, most preferably is about about 2mm more preferably.

In addition, the stream of the gas raw material from the vaporizer to the unloading part comprises: by the first stream portion of the A/F defined of above-mentioned open communication portion; The second stream portion by the interval defined of filter element that is communicated with this first stream portion and shutter.In this case, preferred, constitute, the mist or the solid content that enter from the first stream portion can not enter the second stream portion of arrival by straight line.In addition, under the fixing situation in the outer edge of filter element, the stream of above-mentioned gas raw material comprises the 3rd stream portion by the gap defined of the outer edge of shutter and filter element, the 3rd stream portion set into, be communicated with the first stream portion and the second stream portion.In this case, preferred, constitute, by forming the 3rd stream portion, the mist or the solid content that enter from the first stream portion can not enter the second stream portion of arrival by straight line.

Preferably, described filter element is the board-like material that the pore of a plurality of perforations is set in the path direction of gas raw material.By constituting filter element, can in filter element, easily accommodate the configuration heater block with so simple board-like material.In addition, owing to also can improve the heat conductivity of filter element itself, so also improve the uniformity of the Temperature Distribution of filter element easily.Preferably, this pore is to connect apart from the big shape in ratio open footpath, for example, has the diameter about 0.1～1.0mm, the perforation distance in 5～15mm scope, is used to guarantee the catch rate of residual mist.

The 11 viewpoint of the present invention is a reaction treating device, has: above-mentioned any one described gasifier; Make the reative cell of the gas raw material reaction of giving from this gasifier.By like this,, can improve the processing quality in the reative cell owing to can reduce the mist from the gas raw material that gasifier is given or the amount of particulate.As this reaction treating device, be by in reative cell, making the gas raw material reaction with the arbitrary form that applies heat energy etc., and the device that carries out all processing, broadly comprise for example semiconductor processing devices such as semiconductor gas phase film formation device, liquid crystal gas phase film formation device, compound semiconductor gas phase film formation device, vapor phase etchant device.Particularly, under the situation of gas phase film formation device (CVD device), be effective.

Description of drawings

Fig. 1 is the summary sectional view of the gasifier structure of expression embodiments of the present invention 1.

Fig. 2 A is the summary inner side figure of structure of unloading part of the gasifier of expression execution mode 1, and Fig. 2 B, C, D are the inner side figure of the modification of expression execution mode 1.

Fig. 3 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 2.

Fig. 4 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 3.

Fig. 5 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 4, and Fig. 5 C is the summary sectional view of the modification of expression heater block.

Fig. 6 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 5.

Fig. 7 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 6.

Fig. 8 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 7.

Fig. 9 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 8.

Figure 10 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 9.

Figure 11 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 10.

Figure 12 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 11.

Figure 13 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 12.

Figure 14 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 13.

Figure 15 is the summary longitudinal section of the gasifier of expression embodiments of the present invention 14.

Figure 16 is the cross-sectional view of expression along the gasifier of the execution mode 14 of the A-A line of Figure 15.

Figure 17 A, B are the summary longitudinal sections of the gasifier of expression embodiments of the present invention 15 and execution mode 16.

Figure 18 A, B are the summary longitudinal sections of the gasifier of expression embodiments of the present invention 17 and execution mode 18.

Figure 19 is the summary longitudinal section of the gasifier of expression embodiments of the present invention 19.

Figure 20 A, B are the general positive map and the summary lateral views of the modification of expression aerosolizing part.

Figure 20 C, D are the general positive map and the summary lateral views of other modification of expression aerosolizing part.

Figure 21 is the summary pie graph of the reaction treating device (semiconductor processing device) of expression embodiments of the present invention.

Figure 22 is the summary pie graph that the inside of expression raw material supplying portion constitutes.

Figure 23 is the summary pie graph of the reaction treating device (semiconductor processing device) of expression other execution mode of the present invention.

Figure 24 is the gasifier of expression execution mode 2 and the interior pressure time history plot of the vaporizer that existing gasifier compares.

Embodiment

Below, with reference to accompanying drawing embodiments of the present invention are described.And, in the following description,, give identical symbol for composed component with roughly the same function and formation, only carry out repeat specification in the case of necessary.

＜execution mode 1 〉

Fig. 1 is the summary sectional view of structure of the gasifier of expression embodiments of the present invention 1.This gasifier 100 has gasification face 110B that is equivalent to the first gasification portion and the vaporizer 110 that constitutes gasification space 110A.For to gasification space 110A spraying liquid raw material, set aerosolizing part 120.The unloading part 130 that is equivalent to the second gasification portion is releasably installed with respect to vaporizer 110.In order to detect the interior pressure of gasification space 110A, set the detection pipe arrangement 139 that Pressure gauge (absolute pressure vacuum gauge: not shown) has been installed.At the peristome of the vaporizer 110 that is communicated with pipe arrangement 139, filter element 139x is installed.Filter element 139x prevents that mist or solid content from entering into Pressure gauge.Filter element 139x connects airtight fixing by the relative edge of opening of installing component 139y.

The heater blocks such as heater 112 that vaporizer 110 has framework wall 111 and is provided with in framework wall 111.Framework wall 111 has the peristome 111a that aerosolizing part 120 has been installed.Aerosolizing part 120 has raw material supplying pipe 121, the liquid charging stocks such as raw material that it is supplied with the organic metal raw material or dissolved the organic metal raw material in solvent.Aerosolizing part 120 also has: supply with spraying such as argon gas with gas (for example Ar, Ne, N ₂) spraying with gas supply pipe 122; The spray nozzle 123 that above-mentioned raw materials spraying is nebulized.Spray nozzle 123 is from each pore ejection raw material (liquid, for example organo metallic material) and spraying gas, vaporific thus ejection.

Unloading part 130 is parts of sending to supply lines 141 at the gas raw material of gasification space 110A gasification.Unloading part 130 has sidewall 131, forms inner space 130A on the gasification space 110A of sidewall 131 side recess shape ground.In the 130A of inner space, set the heat transfer part of the outstanding column of protuberance shape.At heater blocks 132 such as sidewall 131 inside (accepting hole 131a is with reference to Fig. 2) configuration heaters.The inner space 130A of unloading part 130 is communicated with above-mentioned gasification space 110A and supply lines 141.And, if unloading part 130 is the positions in the face of gasification space 111A, also can be configured in any side of gasification space 110A.

In the 130A of inner space, configurating filtered parts 133, feasible mouthful (gas vent) 131SO that sends that covers towards supply lines 141.As filter element 133, can use the filter element that constitutes by filter with aeration.For example, can enumerate the filter element that porous material, the filter with a plurality of pores, the material that presses solidly fiber, mesh (mesh) material etc. are constituted.More particularly, can use the filtering material that the metallic fiber (for example stainless steel fibre) of high temperature resistant (for example, about 180 ℃～350 ℃, but suitably setting according to the gasification temperature or the decomposition temperature of raw material) is fixed into nonwoven fabrics shape or sintering shape.For example, the diameter of above-mentioned metallic fiber is about 0.1～3.0mm.Particularly, preferred, use heat conductivity agglomerated material high, that sintering is spherical and other bulk material constitutes.As the constituent material of bulk material, can enumerate non-ferrous metal materials such as nonmetallic materials such as pottery, quartz or stainless steel, aluminium, titanium, nickel and their alloy material etc.And, about the scope of the aforesaid way of the structure of filter element and material, be general in described below whole execution modes.

Fig. 2 A is the situation of above-mentioned unloading part 130 is seen in expression from gasification space 110A side inner side figure.The outer edge of filter element 133 contacts and is connected and fixed with sidewall on every side 131, the feasible flow area that covers above-mentioned inner space 130A fully.More particularly, the outer edge of filter element 133 is fixed on the sidewall 131 by hold-down screw 138 grades.Position beyond the above-mentioned outer edge of filter element 133 sets from the outstanding to the inside heat transfer part 135,137 of sidewall 131.More particularly, filter element 133 is by heat transfer part 135,137 and sidewall 131 thermo-contacts.That is, heat transfer part 135,137 also has the function as the holding components of supporting filter element 133.Heat transfer part 135,137 is made of the good metal of heat conductivity (for example stainless steel etc.).The cross section of heat transfer part 135 constitutes oval-shaped column, and the cross section of heat transfer part 137 constitutes circular column.These heat transfer parts 135,137 are heated by the heater blocks such as heater of configuration in sidewall 131 in the example shown in the figure.But heat transfer part also can be made of heater block itself, and in addition, also it doesn't matter to imbed heater block in the inside of heat transfer part.

At the gasification space 110A of filter element 133 side configuration shutter 134.Shutter 134 is made of heat conductivity metal materials such as for example stainless steels.Shutter 134 is faced with gasification space 110A, makes directly not to be attached on the filter element 133 from the raw material mist of spray nozzle 123 sprayings etc.By like this, can suppress the temperature reduction of filter element 133, the mist that will adhere to positively gasifies, and stops up so can reduce the mesh of filter element 133.Here, configuration shutter 134 makes basic plane earth cover filter element 133.Between shutter 134 and filter element 133, spread all over filter element 133 whole, form spatial portion (the perhaps gas passage portion) 130D that the raw material that makes gasification diffuses through.Spatial portion 130D heats by heating shutter 134 and filter element 133 by heat transfer part 135,137.

Around shutter 134 134b of flow-through opening portion is set, by the 134b of flow-through opening portion, is communicated with gasification space 110A and inner space 130A, the gas raw material of gasification can be sent efficiently.In addition, on shutter 134, form peristome 134a in spray nozzle 123 sides.Strengthen the aperture area in above-mentioned gap by peristome 134a, so, from gasification space 110A to the easy flowing gas raw material of the inner space 130A that disposes filter element 133.Because form peristome 134a, the spray angle scope of spray nozzle 123 is defined in fact, so in spray nozzle 123 sides, the mist of spraying from spray nozzle 123 is difficult to directly arrive unloading part 130.

Fig. 2 B, C, D are the inner side figure of the modification of expression shutter.In the shutter 134 ' shown in Fig. 2 B,, form peristome 134a ' continuously or on whole periphery ground along periphery in the position that overlaps with filter element 133.At the shutter shown in Fig. 2 C 134 " in, form a plurality of peristome 134a discretely along periphery ", make corresponding with the peripheral part of filter element 133.And formed peristome can be slot-shaped (situation that also comprises concentric circles) on shutter.

In the shutter 134X shown in Fig. 2 D, do not form peristome at itself, so shutter 134X covers the integral body of filter element 133.In this case, by the 134b of flow-through opening portion (A sees figures.1.and.2) around the shutter, gasification space 110A and inner space 130A can fully be communicated with.And like that, if shutter 134X covers the integral body of filter element 133, the residual mist that just has raw material is difficult to directly be attached to the advantage on the filter element 133 shown in Fig. 2 D.

Shutter 134 is fixed on the heat transfer part 135 by liner 136 with above-mentioned filter element 133.Liner 136 is made of the metals such as parts, for example Al or stainless steel of good thermal conduction, pottery etc.And hold-down screw 136a is a fixed part, and shutter 134 and liner 136 are fixed on the heat transfer part 135.Also can use identical therewith fixed part, be used for filter element 133 is fixed to heat transfer part 137.Filter element 133 and shutter 134 receive heater block 132 liberated heats from thermo-contact by heat transfer part 135 and liner 136, and simultaneously, reception is heated thus from the radiant heat of the inner face of the framework wall 111 of the vaporizer 110 of contiguous gasification space 110A.

In this embodiment, the raw material of supplying with from raw material supplying pipe 121 is sprayed to gasification space 110A by spray nozzle 123.Here, the mist of the raw material of spraying, a part awing gasifies, and simultaneously, another part is heated, gasifies by arriving the inner face by the framework wall 111 of heater block 112 heating.For gasified raw material, vaporizer 110, the particularly inner face of framework wall 111, by heater block 112 be heated to decomposition temperature than raw material low, than the high temperature range of the gasification temperature of raw material.This temperature for example is about 100～350 ℃.

Like this, the gas raw material in that gasification space 110A generates passes through filter element 133 around shutter 134, import to inner space 130A.In the gas raw material in importing to inner space 130A, be included in the trickle residual mist that does not gasify among the gasification space 110A.These residual mists arrive filter element 133, are captured, and utilize here from heater block 132 and heat by the heat that heat transfer part 135,137 is transmitted to filter element 133, once more gasification.Preferably, filter element 133 also is heated to and the identical temperature range of above-mentioned vaporizer essence.

And preferred, above-mentioned heat transfer part 135,137 spreads all over filter element 133 on the flowing path section of gas raw material integral body is decentralized configuration substantially equably.By like this, the heating and filtering parts 133 more equably, can improve the gasification efficiency of residual mist, and in addition, the silk screen that can further reduce filter element stops up.

In illustrated embodiment, the outer edge of filter element contacts (being connected and fixed) with the inner face of unloading part, and this outer edge also receives heat and heats from this inner face thus.And, also can come the heating and filtering parts by heater block being set at above-mentioned heat transfer part.

Shutter 134 prevents from directly to arrive filter element 133 from the mist of spray nozzle 123 sprayings.For this reason, prevented this situation: filter element 133 seizes heat by a large amount of mists, and result's ability of adhering to mist that causes gasifying partly reduces at assigned position.Therefore, prevented owing to cause mesh in this position and stop up, and cause the sendout of gas raw material to reduce or vaporizer in pressure rise.

In the above-described embodiment, unloading part 130 constitutes, and by unloading lower wall 131 from framework wall 111, can unload filter element 133 simply.Therefore, when problem such as mesh obstruction takes place, can be very easy to and promptly unload, clean filter element 133 in filter element 133, perhaps exchange new filter element.For this reason, can shorten preventive maintenance time, improve the actual job rate of device, also improve productivity ratio.

In the present embodiment, to shutter 134 conduction heats, also heat shutter 134 by heat transfer part 135,137.For this reason, if the raw material mist in the vaporizer 110A directly contacts shutter 134, also at the surface of shutter 134 gasification mist.But if contact the gasification mist on shutter 134, owing to seized the gasification heat, the temperature of shutter 134 reduces.The temperature reduction amount of shutter 134 is corresponding with the amount of the liquid charging stock of spraying, also changes along with the mist quantitative changeization that contacts with shutter 134.Usually, the design temperature of the relative vaporizer 110 of the temperature of shutter 134 will hang down about 5～15 ℃.

Above-mentioned filter element 133 also can be configured in relative shutter 134 and be positioned near the position of sending side.For example, usually, the interval 130D of filter element 133 and shutter 134 is in the scope of 1～100mm, particularly, and preferably in the scope of 1～50mm, more preferably in the scope of 2～10mm.Typically, most preferably above-mentioned distance is about about 5mm.If above-mentioned distance is littler than above-mentioned scope, the transmission reduction of gas raw material, in addition, residual mist also narrows down to the actual adhering range of filter element 133.In this case, has the worry of on the part of filter element 133, concentrating the accumulation solid content.In addition, big if above-mentioned distance becomes, just improved the conductibility of gas raw material, the solid content of the part of filter element 133 adheres to and also obtains relaxing, but can cause the maximization of gasifier.

Preferably, as the A/F of the above-mentioned flow-through opening 134b of portion at the outer rim of shutter 134 and the interval between the sidewall 131 of its outer circumferential side configuration, guaranteeing on the conductive basis of gas raw material, is below the above 10mm of 0.5mm, more than the 1mm more preferably.But if strengthen above-mentioned A/F, the danger that mist directly arrives filter element 133 just increases, so most preferably be about about 2mm.

In addition, the gap (flow path width of inner space 130A) between the filter element 133 of the outer rim of preferred shutter 134 and portion space 130A side configuration within it is in the scope of 0.5mm～100mm, in addition, is more preferably in the scope of 0.5mm～10mm.In addition, most preferably this is about about 2mm at interval.If this diminishes at interval, the conductibility of gas raw material reduces.On the contrary, if become big at interval, the mist that enters from the 130B of flow-through opening portion directly arrives filter element 133 easily.

130 gas raw material stream comprises from vaporizer 110A to unloading part: by the first stream portion of the A/F defined of the above-mentioned open communication 134b of portion; The second stream portion that is communicated with this first stream portion by the interval defined of filter element 133 and shutter 134.In this case, preferred, constitute, the mist or the solid content that enter from the first stream portion can not enter the second stream portion of arrival by straight line.Under the situation of the fixing outer edge of filter element 133, the stream of above-mentioned gas raw material comprises the 3rd stream portion by the interval defined of shutter 134 and filter element 133, the 3rd stream portion set into, make to be communicated with the first stream portion and the second stream portion.In this case, preferred, constitute, by forming the 3rd stream portion, the mist or the solid content that enter from the first stream portion can not enter the second stream portion of arrival by straight line.

＜execution mode 2 〉

Fig. 3 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 2.Fig. 3 A, B are that expression uses unloading part 150 to replace the figure of the unloading part 130 of gasifier shown in Figure 1, and other parts are identical with execution mode 1.

In the present embodiment, unloading part 150 has sidewall 151, forms inner space 150A on the gasification space side concavity ground of sidewall 151.The inside of space 150A protuberance shape set from the outstanding heat transfer part 155,157 of sidewall 151.At the inside of this sidewall (accepting hole 151a) configuration and above-mentioned same heater block 152.Inner space 150A with send path 150S and be communicated with.Configuration and above-mentioned same filter element 153 in the 150A of inner space.Filter element 153 and heat transfer part 155,157 thermo-contacts of identical overshooting shape that are provided with at the inner face of sidewall 151 with execution mode 1.Heat transfer part 155 is the cylindrical portion with cross sectional shape that elliptical shape etc. prolongs.Heat transfer part 157 is the cylindrical portion with circular cross sectional shape.This cylindrical portion can be and filter element 153 or 154 of shutters such shape that contacts, conducts heat easily.For example, the shape of cylindrical portion can be rhombus, triangle, star, rectangle, circle.The outer edge of filter element 153 is fixed on the sidewall 151 by hold-down screw 158 grades.Set the number and the configuration of heat transfer part 155,157, make relative filter element 153 can conduct heat equably.

On heat transfer part 155,157,, utilize hold-down screw 156a to install and fix shutter 154 by liner 156.Between shutter 154 and filter element 153, whole that spreads all over filter element 153 forms spatial portion 150D.Shutter 154 is configured in the position of the contiguous vaporizer of unloading part 150.Shutter 154 has circular flat shape.Shutter 154 constitutes, and makes the whole filter element 153 that covers outwardly, and set circle-shaped gap between the outer rim of shutter 154 and the sidewall 151 around it becomes the 150B of flow-through opening portion.Like this, constitute shutter 154, make integral planar ground cover filter element 153, can suppress vaporific raw material thus and directly enter filter element 153, cause that mesh stops up or the concentration of local of deposit.By like this, the pressure that can suppress vaporizer rises, and prolongs filter life simultaneously, and prevented residual mist or particulate downstream side send.

More than Shuo Ming various piece basic comprising is identical with above-mentioned execution mode 1.Therefore, filter element 153 constitutes, and not only directly receives the heat of heater block 152 from sidewall 151 in its outer edge, and receives the heat of heater block 152 by the heat transfer part 155,157 that contacts with outer edge portion of hot in addition.Shutter 154 is heated by filter element 153 and heat transfer part 155,157 by liner 156.

In the present embodiment, constitute, the gas raw material that gasifies at vaporizer passes through the 150B of flow-through opening portion, imports in the inner space 150A of unloading part 150, behind filter element 153, sends to supply lines from sending path 150S.

Here, the above-mentioned flow-through opening 150B of portion constitutes, and is forming when the vaporizer side circulates any imaginary line of peristome 150B, and imaginary line can not arrive filter element 153 arbitrarily.That is, constitute, even residual mist utilizes arbitrary linearity flight path to enter unloading part 150 in the vaporizer, this residual mist directly is not attached on the filter element 153 yet.In addition, constitute, vaporific raw material does not directly arrive filter element 153.Specifically, set the diametric A/F of the flow-through opening 150B of portion, the feasible filter part that can not arrive filter element 153 by the linearity flight path of the 150B of flow-through opening portion.

And the parameter of the various piece of unloading part 150 is identical with execution mode 1.For example, the A/F of the radial direction of the 150B of flow-through opening portion is 2mm, the axis direction of the outer edge of shutter 154 and filter element 153 be 2mm at interval, the axis direction of the filtration fraction of shutter 154 and filter element 153 be 5mm at interval, the width of the radial direction of the outer edge of filter element 153 is 4mm, and the distance of the radial direction between the essence outer fringe position of the outer fringe position of shutter 154 and filter element 153 (being the outer fringe position of filtration fraction) is 2mm.By like this, can reduce the amount of the deposit on the filter element 153, can suppress concentrating of mesh obstruction or deposit.Particularly, the outer peripheral portion that also can be suppressed at filter element 153 is concentrated the phenomenon of adhering to deposit.

In the present embodiment, in the inside of the heat transfer part 155 of the flat shape with prolongation, configuration imports the test point of the temperature sensor (for example thermocouple) 159 of the hole 151b that is provided with on sidewall 151.By like this, can detect the temperature of heat transfer part 155, promptly very approaching temperature with the temperature of filter element 153.And the output of temperature sensor 159 is connected with temperature-control circuit CONT etc., and this temperature-control circuit CONT constitutes, and controls heater block 152 based on the output of temperature sensor 159.Preferably, this temperature control is such, based on the output of temperature sensor 159, is controlled to be the identical temperature of other heater block (parts of heating and gasifying chamber) with gasifier.And, also can constitute, control independently with other heater block 112 of relative vaporizer, make the temperature of heat transfer part 155, filter element 153, framework wall 111 become identical temperature.By such formation, the temperature of controlled filter parts 153 or shutter 154 critically.For this reason, the mesh that can reduce filter element 153 stops up, and the pressure that can suppress vaporizer rises.In addition, reduce residue or particulate and become possibility.

In the present embodiment, detect the temperature of heat transfer part 155, promptly the temperature of filter element 153 or shutter 154 is controlled heater block 152, so compare with execution mode 1, the temperature that can improve shutter 154 is controlled.Therefore, compare with the situation of execution mode 1, the temperature that can reduce shutter 154 descends.In this case, preferred, the design temperature of heater block 152 is identical with the design temperature of relative vaporizer.

Above-mentioned filter element 153 also can be configured near the position of sending path 150S side of shutter 154.For example, generally, filter element 153 and shutter 154 be in the scope of 1～100mm at interval, particularly preferred, be in the scope of 1～50mm, preferred, be in the scope of 2～10mm.Typically, most preferably above-mentioned distance is about 5mm.If above-mentioned distance is also littler than above-mentioned scope, the conductibility of gas raw material reduces, and in addition, the actual adhering range of the relative filter element 153 of residual mist also narrows down.In this case, have solid content and concentrate worry on the part be stacked into filter element 153.In addition, big if above-mentioned distance becomes, just improved the conductibility of gas raw material, the local solid content of filter element 153 adheres to and also obtains relaxing, but can cause the maximization of gasifier.And, also be identical in illustrated below each execution mode in above aspect.

Preferably, as the outer rim of shutter 154 with at the A/F of the above-mentioned flow-through opening 150B of portion at the interval of the sidewall 151 of its outer circumferential side configuration, guaranteeing on the conductive basis of gas raw material, is below the above 10mm of 0.5mm, more preferably more than the 1mm.But big if above-mentioned A/F becomes, the danger that mist directly arrives filter element 153 increases, so, most preferably be about about 2mm.And, also be identical in illustrated below each execution mode of this point.

In addition, preferably, the outer rim of shutter 154 and be in the scope of 0.5mm～100mm, in addition in the gap (flow path width of inner space 150A) of the outer edge of the filter element 153 of this inner space 150A side configuration, preferred, be in the scope of 0.5mm～10mm.In addition, most preferably this is about about 2mm at interval.If this diminishes at interval, the conductibility of gas raw material reduces, and on the contrary, if become big at interval, the mist that enters from the 150B of flow-through opening portion directly arrives filter element 153 easily.And, also identical in illustrated below each execution mode of this point.

The stream of 150 gas raw material from the vaporizer to the unloading part comprises: by the first stream portion of the A/F defined of the above-mentioned open communication 150B of portion; The second stream portion (spatial portion 150D) that is communicated with this first stream portion by the interval defined of filter element 153 and shutter 154.In this case, preferred, constitute, the mist or the solid content that enter from the first stream portion can not enter the second stream portion of arrival by straight line.Under the fixing situation in the outer edge of filter element 153, the stream of above-mentioned gas raw material comprises the 3rd stream portion by the gap defined of the outer edge of shutter 154 and filter element 153, dispose the 3rd stream portion, the feasible first stream portion and the second stream portion of being communicated with.In this case, preferred, constitute, by setting the 3rd stream portion, the mist or the solid content that enter from the first stream portion can not enter the second stream portion of arrival by straight line.And, also be identical in each execution mode that this point illustrates below.

＜execution mode 3 〉

Fig. 4 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 3.Fig. 4 A, B are that expression uses unloading part 150 ' to replace the figure of the unloading part 130 of gasifier shown in Figure 1, and other parts are identical with execution mode 1.Giving identical symbol for part identical with execution mode 2 in this unloading part 150 ' represents.

In this embodiment, sidewall 151 ' go up with make supply lines from its inner space 150A to reaction treating device was communicated with sends path 150S independently, form the exhaust pathway 150C that inner space 150A is communicated with outside (for example exhaust lay out of reaction treating device).This exhaust pathway 150C, promptly forms in the diagram lower end in the position of leaving farthest from nozzle.Discharge path 150C with without the reaction treatment portion of reaction treating device described later and the bypass line pumping-out lines such as (exhaust lay out (evacuation line)) of exhaust is connected.Discharge path 150C is used for gas raw material not being imported reaction treatment portion and exhaust, and is stable up to the supply condition of gas raw material.

In the present embodiment, in the plan position approach of the above-mentioned discharge path 150C of correspondence, go up formation peristome 153a ' at filter element 153 '.The edge of opening portion of peristome 153 ' is as the part of the outer edge of filter element 153 ' and be provided with, and hold-down screw 158 ' by fixing filter element 153 ' etc. is connected with discharge path 150C very close to each otherly.

In the present embodiment, avoid shutter 154 and invade the gas raw material of inner space 150A by the 150B of flow-through opening portion, with pumping-out line that discharge path 150C is connected in the state opened of set valve V2, directly discharge by above-mentioned peristome 153a ' and discharge path 150C.At this moment, with the valve V1 locking of sending the supply lines that path 150S is connected.Therefore, do not deliver to the gas raw material of reaction treatment portion not by filter element 153 ', so can prolong the life-span of filter element 153 '.

And under the situation of supply lines flowing gas raw material, the valve V2 of the pumping-out line that locking is connected with discharge path 150C opens the valve V1 of supply lines.By like this, so far make the gas raw material of discharging pass through filter 153 ', from sending path 150S guiding supply lines from discharge path 150C.

＜execution mode 4 〉

Fig. 5 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 4.Fig. 5 A, B are that " figure that replaces the unloading part 130 of gasifier shown in Figure 1, other parts are identical with execution mode 1 for expression use unloading part 150.For this unloading part 150 " in the part identical with execution mode 2 give identical symbol and represent.

In this embodiment, at the state that the front end of heat transfer part 157 " with heater block 152 " combines, insert sidewall 151 " inside (accepting hole 151a ").Heat transfer part 157 " inner outstanding to inner space 150A, with the respective embodiments described above in the same manner with filter element 153 and shutter 154 thermo-contacts.Heater block 152 " is for example shaft-like heater, constitutes, directly " combine, can " carry out the heating of filter element 153 and shutter 154 effectively by heat transfer part 157 thus with heat transfer part 157.

Also similarly set the heat transfer part 155 of flat shape in the present embodiment " with prolongation with above-mentioned each execution mode.Its part is such state, and above-mentioned heat transfer part 157 " from sidewall 151 " inserts, and is outstanding to inner space 150A.That is, one form of heat transfer part 155 " to comprise heat transfer part 157 " constitutes.

In the present embodiment, at heat transfer part 157 " front end form screw hole.At heat transfer part 157 " the overlapping filter element 153 of front end order, liner 156 and shutter 154.At this state,, filter element 153 and shutter 154 can be fixed to heat transfer part 157 by hold-down screw 156a is screwed in above-mentioned screw hole " on.

Fig. 5 C is that the above-mentioned heater block 152 of expression is " with the figure of the modification of the parts that are connected therewith.Heater block 152S shown in Fig. 5 C ", bolt is imbedded the leading section of shaft-like heater.Replace above-mentioned liner 156, prepare nut 152T with above-mentioned screw threaded ", in addition, prepare and nut 152T " the hold-down screw 152U that screws togather ".Configurating filtered parts 153 between heater block 152S " and nut 152T ", in addition, configuration shutter 154 between nut 152T " and hold-down screw 152U ".Under this state, " fix heater block 152S " and hold-down screw 152U " by nut 152T.

Like this, in the present embodiment, can be by heater block 152 " a part constitute heat transfer part 157.By like this, more effectively heating and filtering parts 153 or shutter 154.Therefore, can further reduce the situation of the temperature reduction of shutter 154.In this case, preferred, heater block 152 " design temperature identical with design temperature to vaporizer.

＜execution mode 5 〉

Fig. 6 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 5.Fig. 6 A, B are that expression uses unloading part 160 to replace the figure of the unloading part 130 of gasifier shown in Figure 1, and other parts are identical with execution mode 1.

The heater block 162 that unloading part 160 has sidewall 161, disposed in the inside of sidewall 161 (accepting hole 161a).On sidewall 161, from the fixing shutter 164 of inboard (vaporizer side) driving fit.Inner space 160A forms between sidewall 161 and shutter 164, and sends path 160S and is communicated with.At inner space 160A, by the fixing outer edge of filter element 163 of hold-down screw 168 grades.Position beyond the outer edge of filter element 163, thermo-contact be the outstanding a plurality of heat transfer parts 165,167 that are provided with on the inner face of sidewall 161.Between filter element 163 and shutter 164,, utilize hold-down screw 166a to fix heat transfer part 165,167, filter element 163 and shutter 164 by liner 166.Between filter element 163 and shutter 164, whole that spreads all over filter element 163 forms spatial portion 160D.And, between filter element 163 and shutter 164, forming space by the gas of gasification, the gas by this space flows to sending path 160S by behind the filter 163.

And heat transfer part 165 has the flat shape of prolongation, in the inside of heat transfer part 165, disposes the temperature detecting point of the temperature sensor 169 identical with the respective embodiments described above.

On shutter 164, form the 164A of flow-through opening portion that a plurality of flat shapes constitute incision-like.The 164A of these flow-through opening portions has the shape of the thickness direction complications (bending that the typical case is tortuous) at shutter 164, constitutes, and the residual mist that enters from the vaporizer side does not directly arrive filter element 163.That is, the 164A of flow-through opening portion constitutes, from the vaporizer side circulate whole imaginary lines of peristome 164A can not former state ground arrive filter element 163.By like this, constitute, residual mist contacts once with shutter 164 basically at least, to enter in the 160A of inner space.For this reason, can guarantee the circulation of gas raw material, also can promote the gasification of the residual mist that caused by shutter, the mesh that can reduce filter element 163 stops up or the concentrating of deposit.The above-mentioned flow-through opening 164A of portion also can form a plurality of in the plane of shutter 164 abreast, also can form a plurality of in concentric circles ground.

As above-mentioned, can on shutter, form flow-through opening portion.And above-mentioned flow-through opening portion can constitute, and does not have the imaginary line that directly arrives filter element from the vaporizer side by flow-through opening portion.Therefore, even be not tortuous hole shape as described above, as long as the perforation direction of the relative shutter of flow-through opening portion promptly towards from the outside orientation of filter element, just can access and top same effect not towards filter element.

＜execution mode 6 〉

Fig. 7 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 6.Fig. 7 A, B are that unloading part 160 ' replace the figure of the unloading part 130 of gasifier shown in Figure 1 is used in expression, and other parts are identical with execution mode 1.For unloading part 150 ' in the part identical with execution mode 5 give identical symbol and represent.

In this embodiment, shutter 164 ' on form the flow-through opening 164A ' of portion.The 164A ' of flow-through opening portion is formed on and sees the regional outside zone that overlaps with filter element 163 from the plane, promptly compare with filter element 163 to the periphery lateral deviation from the position.By like this, constitute, can not arrive filter element 163 from circulate whole imaginary lines of peristome 164A ' of vaporizer side.In illustrated embodiment, the 164A ' of flow-through opening portion has circular-arc kerf.And, also a plurality of flow-through opening 164A ' of portion equally spaced can be formed concentric circles.Under the situation that forms a plurality of flow-through opening 164A ' of portion, but also zigzag (staggered) formation.And constitute, control heater block 162 based on the output of temperature sensor 169, can control shutter 164 ' temperature, this point is identical with the execution mode of front.

In the present embodiment, to shutter 164 ' inside insert the heater block 164H ' that constitutes by wire heater etc., directly heat shutter 164 '.Heater block 164H ' crawl shape ground insert shutter 164 '.In illustrated embodiment, also can be with heater block 164H ' from the outside to shutter 164 ' importing, but also heater block 164H ' can be imbedded shutter 164 ' in.Also the heater block 164H ' of wire can be set and be clathrate or helical form.In addition, also can with a plurality of heater block 164H ' importing shutters 164 ' in.

Shutter 164 ' inside, also dispose the temperature detecting point of temperature sensor 164TC '.By temperature-control circuit CONT, based on the detected temperatures of temperature sensor 164TC ', control heater block 164H ' is to shutter 164 ' carry out directly, independently temperature control.By like this, can with shutter 164 ' temperature critically set suitable temperature for, so can stablize vaporized state by the mist of shutter 164 ' cause.In this case, preferred, the design temperature of heater block 164H ' is identical with design temperature to vaporizer.

As above-mentioned, by the internal configurations heater block at shutter, the temperature that can improve shutter is controlled.For this reason, the gasification of raw material can be more effectively carried out, the reduction of residual mist or particulate can be realized.

＜execution mode 7 〉

Fig. 8 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 7.Fig. 8 A, B are the figure that expression can replace the unloading part 130 employed unloading part 150X of gasifier shown in Figure 1, and other parts are identical with execution mode 1.Giving identical symbol to part identical with execution mode 2 among the unloading part 150X represents.

In this embodiment, have the essential structure identical with execution mode 2, but difference is, identical with the execution mode 2 heat conduction post that is made of heat transfer part 155,157, liner 156 and hold-down screw 156a is set more, and their decentralized configuration are in the 150A of inner space.These heat conduction posts are identical with execution mode 2, with filter element 153X and shutter 154X thermo-contact.The heat conduction post is and the inner face of sidewall 151X and the state of shutter 154X thermo-contact simultaneously.

In the present embodiment, disperse a plurality of above-mentioned heat conduction posts of configuration, thus, contact with the heat conduction post easily with the residual mist that gas raw material enters simultaneously by the 150B of flow-through opening portion from vaporizer at unloading part.Residual mist is by the heating of heat conduction post, and gasification becomes gas raw material, so can improve gasification efficiency.

＜execution mode 8 〉

Fig. 9 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 8.Fig. 9 A, B are the figure that expression can replace the unloading part 130 employed unloading part 150Y of gasifier shown in Figure 1, and other parts are identical with execution mode 1.Giving identical symbol to part identical with execution mode 2 among the unloading part 150Y represents.

In the present embodiment, on sidewall 151Y, form the heat transfer part 157Y of a plurality of columns, shutter 154Y is fixed on the heat transfer part 157Y by hold-down screw 156a.In this embodiment, filter element is not set, replaces, the heat conduction post decentralized configuration that is made of a plurality of heat transfer part 157Y is between the inner face and shutter 154Y of sidewall 151Y.In the present embodiment, the heat conduction post has and the filter identical functions, is constructed such that the residual mist and the particulate that enter inner space 150A from the 150B of flow-through opening portion are captured, gasification once more.

Promptly, set shutter 154Y, make to cover to mouthful (gas vent) 150SO that sends that sends path 150S, at shutter 154Y with send between the 150S of path, form the gas passage portion (further going back gasified raw material) that connects vaporizer 110 (with reference to Fig. 1) and send mouthful 150SO.In this gas passage portion, the heat conduction post of heat transfer part 157Y has the function as fluid baffles, and it replaces the function of filter.And, except this constitutes, can also set filter element.

In this embodiment, heat transfer part 157Y does not directly arrange to the form of sending path 150S outflow with the residual mist that enters from the 150B of flow-through opening portion.Be that heat transfer part 157Y constitutes, the feasible whole imaginary lines arrival heat transfer part 157Y that enter inner space 150A from the 150B of flow-through opening portion.Particularly, the flow direction of unstrpped gas is roughly arranged a plurality of heat transfer part 157Y orthogonally relatively, the peripheral part of the 150B of the flow-through opening portion side in the feasible space 150A internally can not be drawn the imaginary line that does not pass through heat transfer part 157Y towards the interior perimembranous of sending path 150S side.For example, heat transfer part 157Y is configured to zigzag.

＜execution mode 9 〉

Figure 10 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 9.Figure 10 A, B are the figure that expression can replace the unloading part 150Z that the unloading part 130 of gasifier shown in Figure 1 uses, and other parts are identical with execution mode 1.Giving identical symbol for part identical with execution mode 2 among the unloading part 150Z represents.

In this embodiment, on sidewall 151Z, install and fix heat transfer frame 157Z from inboard (vaporizer side).Heat transfer frame 157Z has: the outer frame that contacts with sidewall 151Z direct heat; The a plurality of beam 157Za of portion that stretch out to the inside from this outer frame.The relative outer frame in the outer edge of filter element 153Z is fixed.Position and a plurality of beam 157Za of portion thermo-contact beyond the outer edge of filter element 153Z.Shutter 154Z utilizes hold-down screw 156a to be fixed on the filter element 153Z by liner 156.In the present embodiment, by the 157Za of beam portion, liner 156 and hold-down screw 156a, filter element 153Z and the shutter 154Z position beyond in the outer edge interconnects fixing.

Between the inner face of above-mentioned sidewall 151Z and the 157Za of beam portion, the gap is set.By like this, constitute, make that by the 150B of flow-through opening portion the 157Za of beam portion does not send to supply lines with not hindering after the gas raw material that inner space 150A imports is passing through filter element 153Z.

Inside at above-mentioned heat transfer frame 157Z imports heater block 157H, and heater block 157H is by the inside of the 157Za of beam portion.In illustrated embodiment, the heater block 157H of wire constitutes, and makes order crawl shape by a plurality of beam 157Za of portion.Self-evident, also can constitute, make a plurality of heater block 157H insert the 157Za of each beam portion respectively, also can be at built-in each heater block in the inside of each 157Za of beam portion.

In the inside of heat transfer frame 157Z, the inside of the 157Za of beam portion particularly, the temperature detecting point of configuration temperature sensor 157TC.And temperature-control circuit CONT controls the caloric value of above-mentioned heater block 157H based on the detected temperatures of temperature sensor 157TC.By like this, be different from sidewall 151Z, the temperature control of the frame 157Z that can independently conduct heat.Like this, by the temperature that temperature sensor 157TC can detect heat transfer part 157Za, control heater block 157H, so it is controlled to improve the temperature of shutter 154Z.Therefore, can reduce the situation of the temperature reduction of shutter 154Z.In this case, preferred, the design temperature of heater block 157H is identical with the design temperature of relative vaporizer.

And in this embodiment, the above-mentioned beam 157Za of portion also can be made of heater blocks such as rod shaped heater.Also can constitute, in the outer frame of heat transfer frame 157, dispose heater block.

As above, also heat transfer part can be constituted the beam shape, in addition, also can be at the internal configurations heater block of this heat transfer part, in addition, also can be with heat transfer part itself as heater block.

＜execution mode 10 〉

Figure 11 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 10.Figure 11 A, B are the figure that expression can replace the unloading part 170 that the unloading part 130 of gasifier shown in Figure 1 uses, and other parts are identical with execution mode 1.

This unloading part 170 has such structure, in the inboard of sidewall 171, and the chimeric plate member 172 that fixedly has heating function from the inboard.The contiguous vaporizer of the inner face 172a of plate member 172 has the function same with above-mentioned shutter.And set gap becomes the 170B of flow-through opening portion between inner face 172a and the sidewall 171 around it.On plate member 172, on the opposition side that is in its inner face 172a, relative part, arrange the heat transfer part 172p of a plurality of columns with sidewall 171.The inner face thermo-contact of these heat transfer parts 172p and sidewall 171.

In the inside of plate member 172, the temperature detecting part of configuration heating part 172H such as heater and temperature sensor 172TC.The part of plate member 172 is outstanding to the outside of sidewall 171,, sets the power supply terminal 172e that is connected with heating part 172H and the detection terminal 172f of temperature sensor 172TC here.The inner space 170A of unloading part 170 as by sidewall 171 and 172 area surrounded of plate member, and sends path 170S and is communicated with.Inner space 170A constitutes ring-type (ring-type).

In the 170A of inner space, relatively the flow direction of unstrpped gas a plurality of heat transfer part 172p of decentralized configuration orthogonally roughly constitute, by these heat transfer parts 172p, and have the function same with filter, promptly have the residual mist that seizure can enter from vaporizer or the function of particulate.These heat transfer parts 172p is such state, between the part of the plate member 172 of the inner face 172a of the inner face of sidewall 171 and the function that formation has and shutter is same, as the thermo-contact of heat conduction post.By like this, residual mist contacts, gasifies with heat transfer part 172p, has improved gasification efficiency, can suppress the generation of particulate simultaneously.In the 170A of inner space, also can set the filter element of ring-type,, can remove solid contents such as residual mist or particulate by like this.

That is, has function equally as the gasification face of gasified liquid raw material in the face of other inner face of the surface of the plate member 172 of vaporizer 110 (with reference to Fig. 1) and vaporizer 110.In addition, set plate member 172, make to cover, in plate member 172 with send between the 170S of path, form the gas passage portion that connects vaporizer 110 and send mouthful 170SO to mouthful (gas vent) 170SO that sends that sends path 170S.Utilize this gas passage portion, the heat conduction post of heat transfer part 172p has the function as fluid baffles, and it has replaced filtering function.

In the present embodiment, above-mentioned heat transfer part 172p is configured to, and makes must just arrive by heat transfer part 172p and send path 170S from circulate whole imaginary lines of peristome 170B of vaporizer side.Arrange a plurality of heat transfer part 172p, make not form the 170B of flow-through opening portion side (diagram outer circumferential side) in the inner space 170A that disposes them to sending the imaginary line by heat transfer part 172p of path 170S side (interior all sides).By like this, constitute, make the major part of residual mist contact once with heat transfer part 172p at least, enter afterwards and send path 170S.For this reason, can guarantee the circulation of gas raw material, prevent the discharge of particulate again, and can promote the gasification of residual mist.In addition, owing to do not use filter element, the pressure rising phenomenon in the vaporizer that does not have to be caused by the mesh obstruction can be used for a long time.

The temperature control of plate member 172, is carried out with the temperature control of vaporizer based on the detected temperatures of temperature sensor 172TC independently by temperature-control circuit CONT.Therefore, can reduce the phenomenon of the temperature reduction of the inner face 172a that is equivalent to shutter.In this case, preferred, the design temperature of plate member 172 is identical with design temperature to the heater block of vaporizer.And also it doesn't matter in the inside of sidewall 171 other heater block to be set.

＜execution mode 11 〉

Figure 12 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 11.Figure 12 A, B be the expression unloading part 170 that can replace the unloading part 130 of gasifier shown in Figure 1 and use ' figure, other parts are identical with execution mode 1.To unloading part 170 ' in the part identical with execution mode 10 give identical symbol and represent.

In this embodiment, have opposing sidewalls 171 ' chimeric fixed plate part 172 from the inboard ' structure.Plate member 172 ' inner face 172a and the sidewall 171 around it ' between form the flow-through opening 170B ' of portion.Sidewall 171 ' and plate member 172 ' between the inner space 170A ' of the ring-type (ring-type) that is communicated with the above-mentioned flow-through opening 170B ' of portion is set, also with send path 170S ' and be communicated with.

In this embodiment, in the 170A ' of inner space, the filter element 173 that the configuration ring-type constitutes.The outer edge opposing sidewalls 171 of filter element 173 ' inner face fix.Position beyond the outer edge of filter element 173 is and from the column heat transfer part 171p ' of sidewall 171 ' outstanding with from plate member 172 ' outstanding column heat transfer part 172p ' thermo-contact.Specifically, become state by heat transfer part 171p ' and 172p ' clamping filter element 173.

In this embodiment, sidewall 171 ' inside (accepting hole 171a ') also dispose other heater block 172 ".Therefore, constitute filter element 173, make by each heat transfer part 171p ' and 172p ' from plate member 172 ' heating part 172H and heater block 172 " both receive heat.Therefore, filter element 173 can receive a large amount of heats by these heat transfer parts.In this case, can more effectively gasify, simultaneously, can remove solid contents such as residual mist or particulate by filter element.

＜execution mode 12 〉

Figure 13 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 12.Figure 13 A, B are the figure that expression can replace the unloading part 180 that the unloading part 130 of gasifier shown in Figure 1 uses, and other parts are identical with execution mode 1.

In this embodiment, on sidewall 181, a plurality of heater blocks 182 are installed with the state that inserts from the outside.At the front end of these heater blocks 182, respectively in conjunction with the column heat transfer part of giving prominence to from the inner face of sidewall 181 185.

Make with send path 180S be communicated with constituted, in the inner space 180A of the inside of sidewall 181 formation, dispose the container-like filter element 183 that open its inboard (vaporizer side).The outer edge of filter element 183 is fixed on the inner face of sidewall 181 by hold-down screw 188 grades.Part beyond the outer edge of filter element 183 is supported projection 181c or 185 thermo-contacts of above-mentioned heat transfer part with column set on sidewall 181.

(than filter element 183 also be positioned at inboard position) configuration shutter 184 in the position of the contiguous vaporizer of inner space 180A.Shutter 184 becomes the state of relative filter element 183 by liner 186 thermo-contacts, fixes by the relative heat transfer part 185 of hold-down screw 186a.At shutter 184 be between sidewall 181 parts around it gap is set, this gap becomes the 180B of flow-through opening portion.

In this embodiment, filter element 183 constitutes the container shapes that axis direction is made as depth direction.For this reason, on filter element 183, also there is the lateral parts that stretches out along axis direction, so can strengthen this filter area.The result can prolong the life-span of filter element 183.The above-mentioned heat transfer part 185, liner 186 and the hold-down screw 186a that constitute the heat conduction post contact with heater block 182 direct heat.For this reason, heating and filtering parts 183 and shutter 184 effectively.

＜execution mode 13 〉

Figure 14 A, B are the summary inner side figure and the summary longitudinal sections of major part of the gasifier of expression embodiments of the present invention 13.Figure 14 A, B are the figure that expression can replace the unloading part 130 employed unloading parts 190 of gasifier shown in Figure 1, and other parts are identical with execution mode 1.

In this embodiment, at the inside of sidewall 191 (accepting hole 191a) configuration heater block 192.On sidewall 191, constitute the inner space 190A that inboard (vaporizer side) opened, its with send path 190S and be communicated with.

At the configurating filtered parts 193 of inner space 190A, its outer edge is fixed on the sidewall 191 by hold-down screw 198 grades.Position beyond the outer edge of filter element 193 is with a plurality of heat transfer part 197 thermo-contacts of giving prominence to from the inner face of sidewall 191 of column.In the inboard of filter element 193, the shutter 194 of contiguous vaporizer is fixed on the heat transfer part 197 by hold-down screw 196a by liner 196.Around shutter 194, and sidewall 191 between the gap is set, this gap becomes the 190B of flow-through opening portion.Between shutter 194 and filter element 193, go up formation spatial portion 190D for whole that spreads all over filter element 193.

Hole 191b is set, configuration temperature sensor 199 in the 191b of hole on sidewall 191.The temperature detecting point of temperature sensor 199 is configured near the of above-mentioned heat transfer part 197 or it is inner.

In this embodiment, at the internal configurations heater block 193H of filter element 193.Specifically, heater block 193H is the heater of wire, its inside by filter element 193, shape ground of crawling.Inside at filter element 193 also disposes temperature sensor 193TC.And, by temperature-control circuit CONT,, control the caloric value of heater block 193H based on the detected temperatures of temperature sensor 193TC, filter element 193 constitutes, and directly carries out temperature control independently.

In this embodiment, at the internal configurations heater block 193H of filter element 193, so direct heating and filtering parts 193, temperature controlled filter parts 193 independently simultaneously.Therefore, critically the temperature of controlled filter parts 193 can improve its temperature homogeneity simultaneously.For this reason, can suppress the mesh obstruction of filter element 193 or the concentration of local of deposit, the pressure that can suppress in the vaporizer rises, and prolongs filter life simultaneously.

＜execution mode 14 〉

Figure 15 is the summary longitudinal section of the gasifier of expression embodiments of the present invention 14.Figure 16 is the cross-sectional view of expression along the gasifier of the execution mode 14 of the A-A line of Figure 15.The gasifier of this execution mode has formation gasification face 210B identical with above-mentioned execution mode 1 and the vaporizer 210 of gasification space 210A.For to gasification space 210A spraying liquid raw material, set aerosolizing part 120.Vaporizer 210 is releasably installed the unloading part 220 of the second gasification portion that is equivalent to relatively.Here, the sidewall 211 and the heater block 212 of the formation of above-mentioned aerosolizing part 120 (raw material supplying pipe 121, spraying with gas supply pipe 122 and spray nozzle 123), vaporizer 210 are identical with above-mentioned execution mode 1.At unloading part 220, sidewall 221, heater block 222, filter element 223, shutter 224, heat transfer part 225, liner 226 and hold-down screw 226a have and execution mode 1 identical functions.About the inner space 220A that is provided with at unloading part 220, around shutter 224 the set 22B of flow-through opening portion, send path 220S, also identical with execution mode 1.

In the present embodiment, as shown in Figure 16, vaporizer 210 has the interior shape in the axis bent around of spray nozzle 123.Specifically, vaporizer 210 constitutes cylindric.Here, the shape of vaporizer 210 also can be that the axis with spray nozzle 123 is the taper shape at center, or is a sphere of diameter with the axis of spray nozzle 123.And above-mentioned filter element 223 and shutter 224 have along above-mentioned like that at the curved shape of the inner face of the axis bent around of spray nozzle 123.Here, the outer edge of filter element 223 is fixed on the sidewall 221 by hold-down screw 228 grades.Between filter element 223 and shutter 224, form spatial portion 220D.

As above-mentioned, in the present embodiment, shutter 224 has along the shape of the interior shape of vaporizer 210.For this reason, filter area can be greatly guaranteed, gasifier can be constituted compactly simultaneously.In the present embodiment, be constructed such that the mist in the vaporizer 210 or mobile being difficult to of gas raw material are affected owing to the existence of unloading part 220.In illustrated embodiment, vaporizer 210 is the shape (rotary body shape) of approximate equality around the axis of spray nozzle 123.By like this, can stablize the Temperature Distribution of the inner face of the Temperature Distribution in the vaporizer 210 or gasify face 210B and shutter 224.For this reason, can prevent the concentrated accumulation to privileged site of solid content.By filter element 223 being made as the face shape that has along shutter 224, the interval of filter element 223 and shutter 224 can be constituted necessarily.For this reason, can effectively use filter element 223 whole, can catch residual mist or solid content effectively.

In the present embodiment, as above-mentioned, vaporizer 210 forms the shape that has at the inner face of the axis bent around of spray nozzle 123, but the shape of vaporizer is without any qualification.Therefore, the shape of vaporizer is that polyhedron-shaped also it doesn't matter for cube (6 bodies) etc.In this case, preferred, above-mentioned shutter and/or filter element with above-mentioned the same, form along the shape of the inner face of vaporizer, make to constitute a polyhedron-shaped part.In this case, also can form shutter and/or filter element, make to constitute above-mentioned in polyhedron-shaped more than 2.In addition, vaporizer also can have the interior shape of curved surface and tabular surface combination.

In the present embodiment, identical with execution mode 1, form the peristome that is communicated with pipe arrangement 219 with the detection of setting pressure table (not shown), feasible contiguous vaporizer 210A.And, at this peristome, set filter element 213, at the shutter 214 of the vaporizer 210A of filter element 213 side configuration.Filter element 213 contacts with the heat transfer part of giving prominence to from the inner face of sidewall 211 215.The shutter 214 that heat transfer part 215 is fixed by hold-down screw 216a by liner 216 relatively is by these liners 216 and hold-down screw 216a thermo-contact.Between shutter 213 and sidewall 211 peristome is set, by this peristome, vaporizer 210A is communicated with the configuration space of filter element 213 relatively.In addition, this peristome is by the inside of filter element 213 communication with detection with pipe arrangement 219.

Implementing shutter 214 makes the residual mist or the solid content of invading from vaporizer 210A be difficult to arrive filter element 213.For this reason, the mesh that can relax filter element 213 stops up, and realizes the long lifetime of filter element 213.Filter element 213 and shutter 214 is by the part and sidewall 211 thermo-contacts of heat transfer part 215 beyond in its outer edge.This residual mist, can heat substantially, so when adhering to residual mist, can gasify with the inner face of vaporizer 210A the samely for this reason.

＜execution mode 15 〉

Figure 17 A is the summary longitudinal section of the gasifier of expression embodiments of the present invention 15.Here, the formation beyond the unloading part 230 is identical with execution mode shown in Figure 1.Unloading part 230 has: sidewall 231; The cellular filter element 232 that between sidewall 231 and gasification space 110A, disposes; The heater blocks such as heater 233 that disposed in filter element 232 inside.On sidewall 231, the gas raw material that formation is sent gas raw material to supply lines is sent path 231a.Here, in order to prevent to reduce, also can utilize other method to be provided for heating the heater block of sidewall 231 by the gas temperature behind the filter element 232.It is first-class that this heater block can be arranged on the inside or the outer surface of sidewall 231.

Filter element 232 can be made of board-like material, and it is made of potteries such as the good metal of heat conductivity (for example stainless steel etc.) or AlN, SiC.In the inside of filter element 232, is intersecting the direction of (being quadrature) with the path direction of gas raw material (diagram is to right) in illustrated embodiment, formation accepting hole (perhaps host cavity, below identical) 232a.In accepting hole 232a, accommodate above-mentioned heater block 233.Here, heater block 233 inner body that also can spread all over filter element 232 disposes.In this case, can further improve the heat efficiency.On filter element 232, form the small pore 232b of a plurality of perforations substantially parallel with the path direction of gas raw material.And pore 232b is roughly formation orthogonally of the flow direction of unstrpped gas relatively also, makes residual mist or solid content run into filter element and gasify.

These pores 232b constitutes it and connects distance (length) the big shape of comparing with diameter.The length of the pore 232b consistency of thickness of filter element 232 (in the illustrative example with) is designed to make that the catch rate of the small residual mist that takes place is fully high in gasification space 110A.Specifically, the diameter of pore 232b is about 0.01～1.0mm, and connecting distance is about 5～15mm.

And, can be constructed such that also the accepting hole 232a and a part of pore 232b that accommodate heater block 233 intersect.Perhaps be constructed such that in the position that intersects with accepting hole 232a and do not form pore 232b.

＜execution mode 16 〉

Figure 17 B is the summary longitudinal section of the gasifier of expression embodiments of the present invention 16.In this execution mode 16, between sidewall 231 and cellular filter element 232, configurating filtered parts 234.Filter element 234 opposing sidewalls 231 are connected and fixed by fixed part 235.Between filter element 232 and filter element 234, spread all over these filtering surface integral body and form spatial portion 230D.In addition, promptly about filter element 232 and heater block 233, identical with the execution mode 15 shown in Figure 17 A.

Constitute in the example at this, by the configurating filtered parts 234 in the downstream of cellular filter element 232, obtain such effect, the mist or the particulate loading that import supply lines can further reduce.And preferred, filter element 234 is constructed such that to compare with filter element 234 can catch more tiny residual mist.For example, can use the filter element identical with the filter element 133 shown in the execution mode 1.In illustrative example, filter element 234 is by sidewall 231, and the radiant heat that perhaps is used to inherent filtration parts 232 heats indirectly.Same with the filter element 133 of execution mode shown in Figure 1, by heat transfer part 235 (liner) heat of heater block is transmitted to filter element 234.And, use fixed part 235a, filter element 234 is fixed on heat transfer part 235 and the sidewall 231.Here, can be same with the filter element 232 of execution mode 15, the heater block of portion's configuration within it.Also can in sidewall 231, heater block be set.Preferably, in either case, the filter element 234 of this heating is controlled to be the identical temperature of gasification face (inner face) with vaporizer.

In this embodiment, be constructed such that by filter element 232 and catch the bigger residual mist of gasification, catch smaller residual mist by filter element 234.Therefore, can improve the efficient of removing of mist, simultaneously, the mesh that can reduce each filter element 232,234 stops up.

＜execution mode 17 〉

Figure 18 A is the summary longitudinal section of the gasifier of expression embodiments of the present invention 17.In this execution mode 17, the structure beyond the unloading part 330 is also identical with above-mentioned execution mode 1.

In this embodiment, at unloading part 330, have outer wall 331, at the medial surface of outer wall 331 inwall 332 to gasification space 110A.On outer wall 331, form gas raw material and send path 331a.On inwall 332, form the intercommunicating pore 332a of the inner space 330A connection that makes gasification space 110A, unloading part 330.In the inside of inwall 332, heater blocks 333 such as configuration heater.

Inner space 330A is formed by outer wall 331 and inwall 332.Configurating filtered parts 334 in the 330A of inner space.Filter element 334 comes the state of thermo-contact for the position beyond in its outer edge by heat transfer part 335.Heat transfer part 335 constitutes, and makes to receive the heat that is taken place by heater block 333 from inwall 332, is sent to the position in addition, outer edge of filter element 334.Filter element 334 is affixed to respectively on the inwall 332 by heat transfer part 335.More particularly, by fixed part 335a filter element 334 is fixed on heat transfer part 335 and the inwall 332.That is, heat transfer part 335 also has the function as the holding components of supporting filter element 334.

In this embodiment, the gas raw material that is generated in gasification space 110A imports to inner space 330A by intercommunicating pore 332a.Import to the gas raw material among the 330A of inner space,, send path 331a from gas raw material and send by filter element 334.Here, filter element 334 is heated by heater block 333 by heat transfer part 335, so even adhere to the trickle residual mist that exists in the gas raw material, also can positively gasify.In illustrative example, on filter element 334, a plurality of heat transfer parts 335 and outer edge decentralized configuration position thermo-contact in addition.For this reason,, can reduce the deviation of temperature, prevent local mesh obstruction etc. by heating and filtering parts 334 integral body more equably.In this case, preferred, the filter element 334 of this heating is controlled to be the identical temperature of gasification face (inner face) with vaporizer.

In this embodiment, the inwall 332 of unloading part 330 is configured to the gasification space 110A in the face of vaporizer 110.And, owing to internal configurations heater block 333, so heater block 333 also helps the gasification of the raw material in the gasification space 110A at inwall 332.

And, the above-mentioned intercommunicating pore 332a that on inwall 332, is provided with to aerosolizing part (spray nozzle: not shown) lateral deviation from the position form.By like this, can reduce this situation, directly catch by filter element 334 at the mist of gasification space 110A spraying by intercommunicating pore 332a.

＜execution mode 18 〉

Figure 18 B is the summary longitudinal section of the gasifier of expression embodiments of the present invention 18.In the unloading part 430 of this execution mode, accommodate configuration heater block 432 in the inside of sidewall 431.And, at the inboard configurating filtered parts 433 of sidewall 431.Filter element 433 is the position and the state of giving prominence to heat transfer part 434 (liner) thermo-contact that forms on sidewall 431 beyond its outer edge.Heat transfer part 434 is affixed to respectively on filter element 433 and the sidewall 431.More particularly, by fixed part 434a filter element 433 is fixed on heat transfer part 434 and the sidewall 431.That is, heat transfer part 434 also has the function as the holding components of supporting filter element 433.In this case, preferred, the filter element 434 of this heating also is controlled to be the identical temperature of gasification face (inner face) with vaporizer.

＜execution mode 19 〉

Figure 19 is the summary longitudinal section of the gasifier of expression embodiments of the present invention 19.The gasifier 500 of this execution mode has: material gasification portion 510; Aerosolizing part 520; Unloading part 530.Material gasification portion 510 has: sidewall 511; Form the gasification face 511A of the inner face of sidewall 510; The heater blocks such as heater 512 of portion's configuration within it.On aerosolizing part 520, set: raw material supplying pipe 521; Spraying gas supply pipe 522; Spray nozzle 523.

Spray nozzle 523 with spraying with the pressure of the gas raw material of spraying.Be constructed such that and utilize spray nozzle 523, import raw material respectively and gas is used in spraying to its inside, this raw material from a plurality of (being 3 illustrative example) nozzle 523a by the spraying gas atomization.More particularly, the raw material of importing is shunted to a plurality of raw material supplyings path 523v by raw material diffuser chamber 523s.These raw material supplying paths 523v is communicated with above-mentioned nozzle 523a.Spraying is shunted to the path of raw material supplying path 523v and coaxial formation with the 523t of gas diffusion chamber by spraying with gas, will be sprayed at nozzle 523a by the raw material that each raw material supplying path 523v supplies with.Like this,, can increase the raw material supplying amount thus, increase the mist amount by a plurality of nozzle 523a spraying raw materials.In addition, increase spray amount, the mist of the homogeneous diameter of also can spraying even make.Therefore, the gasification efficiency of raw material can be improved, residual mist or particulate can be reduced simultaneously.

And, in illustrated embodiment, only described a raw material supplying pipe 521, but a plurality of raw material supplying pipes 521 can be set as required to spray nozzle 523 base feeds.In this case, in spray nozzle 523, before being about to spraying, mix, this mixture and spraying are shared spray (matrix spraying) by a plurality of nozzle 523a simultaneously with gas by the plurality of raw materials that a plurality of raw material supplying pipes 521 are supplied with.

Gasification face 511A at the inner face of the above-mentioned sidewall 511 of conduct of the spray direction of above-mentioned spray nozzle 523 configuration constitutes roughly sphere (hemisphere) shape.By like this, regardless of the spray direction of mist, the distance from nozzle 523a to gasification face 511A is certain basically.Because the mist amount on this gasification face 511A of being sprayed onto is reason such as roughly even on sphere, the mist that can gasify effectively and spray from spray nozzle 523.

Unloading part 530 in present embodiment sets: sidewall 531; Cellular filter element 532 in the configuration of the inboard of sidewall 531.On sidewall 531, form gas raw material and send path 531a.On filter element 532, be arranged on the formed accepting hole of the direction of intersecting (perhaps host cavity, below identical) 532a with the path direction of gas raw material.And accepting hole 532a is roughly formation orthogonally of the flow direction of unstrpped gas relatively also, makes residual mist or solid content run into filter element and gasify once more.In accepting hole 532a, the heater block 533 that is made of heater etc. is configured in outer circumferential side.On filter element 532, form a plurality of pore 532b that connect along the path direction of gas raw material.These pores 532b is communicated with the inner space 530A of gasification space 510A and unloading part 530.

In the present embodiment, filter element 532 relative gasification space 510A are provided in spray nozzle 523 sides.More particularly, configurating filtered parts 532 around spray nozzle 523 make and the relative spray nozzle 523 that surrounds of gasification face 511A.Forming the inner space 530A of unloading part 530 with the opposite side of spray direction (behind) of spray nozzle 523.In addition, gas raw material unloading part 531a also forms behind at it.By such formation, can prevent from directly to be attached on the filter element 523 from the mist of spray nozzle 523 sprayings.In this case, needn't resemble and shutter 134 is set the execution mode 1.

Filter element 532 heats by the heater block 533 of portion's configuration within it much the samely.Therefore, the trickle residual mist with the gas raw material that generates in gasification space 510A by gasification face 511A flows simultaneously is attached on the filter element 532, here gasification once more.Gas raw material imports among the 530A of inner space by pore 532b, finally sends path 531a by gas raw material and sends.The pore 532b that forms in filter element 532 is designed to the size same with execution mode 2.

In the present embodiment, preferred, inner space 530A (filter element 532 and gas raw material are sent between the 531a of path), the filter element of being represented by dotted line among the figure 534 is set.Filter element 534 can similarly use with the filter element of execution mode 1 or execution mode 15.Preferably, the same with execution mode 1, the position beyond the outer edge of thermo-contact filter element 534 is fixed to from the sidewall 531 outstanding heat transfer parts that form.In this case, constitute this heat transfer part, make from filter element 532 to filter element 534 conduction heats.And, also can be in sidewall 531 built-in heater block, opposing sidewalls 531 is installed heat transfer parts, makes this heat transfer part and filter element 534 thermo-contacts.

Figure 20 A, B are the general positive map and the summary lateral views of the modification of expression aerosolizing part.On this aerosolizing part 620, set a plurality of (being 3) raw material supplying pipe 621, spraying gas supply pipe 622, spray nozzle 623 in illustrative example.Each raw material from these a plurality of raw material supplying pipes 621 are supplied with mixes each spray nozzle 623 in advance, from a plurality of nozzle 623a each with spray simultaneously with gas with each corresponding respectively spraying.This formation is applicable to for example 3 kinds of gas raw materials (dielectric of Pb, Zr and Ti (organo-metallic compound)) of supply, forms the situation of PZT (lead zirconate titanate).In this case, import these 3 kinds of raw materials in above-mentioned aerosolizing part 620, each raw material mixes in spray nozzle 623 thus.Then, 3 kinds of raw materials and with from each special-purpose nozzle 623a, spray simultaneously with gas with the corresponding spraying of each nozzle 623a.

Aerosolizing part 620 has the effect same with the aerosolizing part 520 of above-mentioned execution mode 19.In addition, by every kind of raw material being formed special-purpose nozzle 623a, has the advantage of the Sprayable (spray amount of raw material, the spraying of mixing gas flow, atomisation pressure etc.) that can adjust raw material respectively.

Figure 20 C, D are the general positive map and the summary lateral views of other modification of expression aerosolizing part.On this aerosolizing part 720, set: a plurality of raw material supplying pipes 721; Spraying gas supply pipe 722; Spray nozzle 723.On spray nozzle 23, set with the gas raw material of a plurality of raw material supplying pipe 721 corresponding connections and import piece 723B～D.Raw material from a plurality of raw material supplying pipes 721 are supplied with respectively in the inside of spray nozzle 723, imports in the pipeline that order imports with nozzle 723a is communicated with among piece 723D, 723C, the 723B and mixing at gas raw material.Then, plurality of raw materials is sprayed from nozzle 723a with gas simultaneously with the spraying of passing through to spray with the coaxial importing of the 723A of gas diffusion chamber.

In aerosolizing part 720, can mix plurality of raw materials equably.For this reason, the mixed material that gasifies in gasification space is supplied with in the film forming room, thus, has the effect of the reproducibility of the ratio of components that improves film.

Figure 21 is the summary pie graph of the reaction treating device (semiconductor processing device) of expression embodiments of the present invention.This reaction treating device is for example to be used for the using gases raw material to come film forming CVD device.This reaction treating device has: raw material supplying portion 200; Gasification is by the gasifier 100 (500) of the raw material of raw material supplying portion 200 supplies; The reaction treatment portion 300 that the gas raw material that use is generated by gasifier is handled.

Figure 22 is the summary pie graph that the inside of expression raw material supplying portion 200 constitutes.In raw material supplying portion 200, the material container 202A～202C that accommodates raw material A～C is set, raw material A～C, supplies with to gasifier 100 (500) with the flow of control by transmission lines 204A～204C from material container 202A～202C.In material container 202A～202C, material as semiconductor device, for example use Pb, Zr, Ti (PZT) or Pb, Zr, Ti, the Nb (PZTN) of film forming ferroelectric thin film respectively, organo-metallic compounds such as the Ba of film forming highly dielectric thin film, Sr, Ti also use Bi, Sr, Cu of film forming superconducting thin film etc.Here, the number of raw material and material container is not limited to illustrative example, and any number is set as required.Solvent container 202D is set, and the solvent of preparing in this container is supplied with by liquor charging circuit 204D.In addition, the drain line 203 that is connected with each liquor charging circuit 204A～204D of each material container 202A～202C and solvent container 202D is set, sets the discharging container 202E that is connected with drain line 203.

Liquor charging circuit 204A～204D is provided in the one end and invades position in the liquid of each material container 202A～202C and solvent container 202D.In extending to the way in each downstream, set fluid flow regulation parts (for example flow control meter such as mass flowmenter) 205A～205D.Liquor charging circuit 204A～204D carries each raw material from the also side extension downstream of fluid flow regulation parts to gasifier 100 (500).Fluid flow regulation parts 205A～205D receives control signal from each controller (not shown), regulates flow.

Raw material supplying portion 200 has the gas supply lines 206A～206D that imports circuit 206 branches from the gas that imports non-active gas etc.Supply with the pressure that is produced by the gas that is undertaken by gas supply lines 206A～206D, raw material A～C and solvent are sent to each liquor charging circuit 204A～204D.Between each liquor charging circuit 202A～202C and gas supply lines 206A～206C of the liquor charging circuit 204D of donor solvent and base feed, connect solvent supply lines 207.In addition, the vacuum line 208 that is connected with exhaust apparatus (not shown) is connected with discharging container 202E.

In gas supply lines 206A～206D, insert non-return valve CH, in addition, all inserting open and close valve DV (diaphragm valve) in the such appropriate location of diagram in the circuit.In addition, preferred, insert separator (separator) (degasser: not shown) at the upstream position of the fluid flow adjustment component 205A～205D of raw material supplying circuit.

Turn back to Figure 21 again, in gasifier 100 (500), the raw material of gasification in vaporizer 110 (510), by unloading part 130 (150,150 ', 150 ", 160,160 ', 150X, 150Y, 150Z, 170,170 ', 180,190,230,330,430,530) deliver to raw material supplying circuit 140.

In raw material supplying circuit 140, set raw material supplying path 141 and the exhaust pathway 143,144 that is connected with gas extraction system (for example vacuum pump).In raw material supplying path 141, set and have above-mentioned filter element (133,153,153 ', 163,153X, 153Z, 173,183,193,232,334,433,532) gas raw material evaporating filter 142 again.These again evaporating filter 142 have with above-mentioned unloading part (130,150,150 ', 150 ", 160,160 ', 150X, 150Y, 150Z, 170,170 ', 180,190,230,330,430,530) same structure.That is, the part that above-mentioned gas raw material supplying portion can be used as any gasifier sets, and is relative therewith, although evaporating filter 142 has the formation identical with above-mentioned unloading part again, is different disposing this point individually with gasifier.Here, as the supply of gasified raw material structure, above-mentioned unloading part and again evaporating filter 142 no one only be set concern.

For at processed substrates such as handling part 300 mounting semiconductor wafers, it has the reative cell 301 that sets pedestal 304.In reative cell 301, pedestal 304 sets gas introduction part (spray head) 303 relatively.From spray head 303, import in the reative cell 301 by gasifier 100 (500) gas supplied raw materials (importing simultaneously) with suitable carrier gas.And the reacting gas that will supply with from the gas introduction tube 305 of other approach from spray head 303 oxidizing gas such as (for example) oxygen imports in the reative cell 301.In reative cell 301,, connect blast pipe 306 for to exhaust in the reative cell 301.

In above-mentioned reaction treating device, unloading part by gasifier (130,150,150 ', 150 ", 160,160 ', 150X, 150Y, 150Z, 170,170 ', 180,190,230,330,430,530) or evaporating filter 142 again, can significantly reduce the mist that imports in the reative cell 301 or the amount of particulate.For this reason, can improve the quality of the processing of in reative cell 301, carrying out (for example film forming processing).At above-mentioned unloading part or again in the evaporating filter, the filter element of portion's configuration within it can heat more equably, can improve gasification efficiency thus, prevents that mesh from stopping up.For this reason, can keep the conductibility of supply lines, reduce frequency of maintenance.

Figure 23 is the summary pie graph of the reaction treating device (semiconductor processing device) of expression other execution mode of the present invention.Constitute in the example at this, to gasifier 100 (500) base feeds, to raw material supplying path 141 supply gas raw materials, supply to handling part 300 from gasifier 100 (500) from raw material supplying portion 200, this point is same as described above.But difference is, imports purge line 145 from non-active gas such as Ar gas to raw material supplying path 141 that supply with, this point difference.Constitute in the example at this, evaporating filter 142 and exhaust pathway 143 are not set again.

Constitute in the example at this, shorten as far as possible, reduce gasifying gas amount residual in the raw material supplying path thus from gasifier 100 (500) distances (length in raw material supplying path 141) to reative cell 301.By like this, can suppress the generation of particulate in the raw material supplying system, so can improve the quality of the film of film forming in the reative cell 301.

Figure 24 represents that the gasifier of execution mode 2 and the interior pressure about vaporizer that existing gasifier (gasifier of filter element is set separately in existing mode) compares change the curve chart of (the raw material supplying time dependence of interior pressure) in time.

In existing gasifier, shown in line L2, like that, before reaching 100 hours, the raw material supplying time just surpassed upper limit pressure.For this reason, simultaneously heat the N that simultaneously flows ₂Deng the purified treatment of non-active gas, press in temporarily reducing, but after surpass the upper limit (and, omitted purified treatment in the drawings during represent) in the short time once more.Consider that this is owing to adhere to solid content in a large number on filter element, the reason that conductibility reduces.

In contrast, in the gasifier of execution mode 2, shown in line L1,, also be far from reaching upper limit pressure, can understand, compare, can significantly suppress convective reduction with there is something special even the raw material supplying time surpasses 600 hours.And, in execution mode 2, convective reduction as described above takes place hardly, filter element has necessarily been brought into play function.In execution mode 2, experimental verification is compared with existing structure, and the particulate loading that flows in the reative cell is reduced to below half on the contrary.

Particularly, under the situation of existing structure, by the in-line filter that connects in the downstream, can significantly reduce the particulate loading that flows in the reative cell, but under the situation of execution mode 2, know that even unload the in-line filter (pot strainer) that connects in the downstream, the particulate loading that arrives reative cell does not change basically yet.Think that this this result has shown that the particulate loading that is taken place reduces to the degree that the variation that causes because of having or not of in-line filter does not have appearance basically in the gasifier of execution mode 2.

For this reason, in the measurement that interior pressure shown in Figure 24 changes, approximately reach 170 hours the moment (illustrated dotted line), unload the filter of the series connection that connects in the downstream, proceed to measure in the raw material supplying time.As a result, the interior pressure value of curve reduced later on a little at 170 hours.Like this, proved in execution mode 2, can suppress significantly to stop up the conductibility reduction that causes, reduced the particulate of side flow downstream simultaneously significantly by the mesh of filter element.

And supply structure, gasifier and the reaction treating device of gasified raw material of the present invention are not limited only to above-mentioned illustrative example, can also carry out various changes in the scope that does not break away from aim of the present invention, and this much less.For example, each characteristic point of sidewall shown in above-mentioned any one execution mode, inner space, heater block, filter element, shutter, heat transfer part (heat conduction post), flow-through opening portion, can be used for other execution mode respectively independently, other formation shown in each execution mode and combination do not limit yet.

Utilizability on the industry

As according to the present invention, can provide a kind of mist in the gas raw material or particulate of reducing Gasifier.

Claims (20)

1. gasifier is characterized in that having:

Vaporizer, the gasified liquid raw material forms gas raw material;

Spraying portion is to the described vaporizer described liquid charging stock of spraying;

Unloading part is sent described gas raw material from described vaporizer to gas vent; With

Described gasifier is heated in the heating part,

Described unloading part has:

Filter element covers described gas vent according to the mode that described gas raw material is passed through; With

Heat transfer component is transmitted to described filter element with the heat of described heating part.

2. gasifier according to claim 1 is characterized in that,

Also have control assembly, its temperature based on described heat transfer component or described filter element is carried out the temperature control of described heating part.

3. gasifier according to claim 1 is characterized in that,

Described heat transfer component has a plurality of heat transfer components.

4. gasifier according to claim 1 is characterized in that,

Also has the heater that is installed in the described heat transfer component.

5. gasifier according to claim 1 is characterized in that,

Position thermo-contact beyond the outer edge of described heat transfer component and described filter element.

6. gasifier has:

Vaporizer, the gasified liquid raw material forms gas raw material;

Spraying portion is to the described vaporizer described liquid charging stock of spraying;

Unloading part is sent described gas raw material from described vaporizer to gas vent; With

Described gasifier is heated in the heating part,

Described unloading part has:

Filter element covers described gas vent according to the mode that described gas raw material is passed through; With

Shutter, in a side opposite with described gas vent, according to and described filter element between form the space the mode plane earth cover described filter element.

7. gasifier according to claim 6 is characterized in that,

Described shutter set into, make that the described gas raw material in the described vaporizer can not directly arrive described filter element and be imported into described gas vent along arbitrary straight line.

8. gasifier according to claim 6 is characterized in that,

Between described filter element and described shutter, form described gas raw material to heated gas passage portion that described gas vent is sent.

9. gasifier according to claim 8 is characterized in that,

The peristome that is communicated with described vaporizer and described gas passage portion forms around described shutter.

10. gasifier according to claim 8 is characterized in that,

The peristome that is communicated with described vaporizer and described gas passage portion originally forms on one's body at described shutter.

11. gasifier according to claim 10 is characterized in that,

Described peristome comprises: have the otch to the shape of the thickness direction bending of described shutter.

12. gasifier according to claim 6 is characterized in that,

Also have control assembly, carry out the temperature control of described heating part based on the temperature of described filter element or described shutter.

13. gasifier according to claim 12 is characterized in that,

The temperature of described filter element or described shutter is set at identical with the temperature of described heating part.

14. gasifier according to claim 12 is characterized in that,

Also have the temperature sensor that sets in described shutter, described control assembly carries out the temperature control of described heating part based on the detection signal of described transducer.

15. gasifier according to claim 6 is characterized in that,

Also has the heater that is installed in the described shutter.

16. gasifier according to claim 6 is characterized in that,

Described heating part has: the interior heater of wall of imbedding described vaporizer.

17. a gasifier is characterized in that having:

Vaporizer, the gasified liquid raw material forms gas raw material;

Spraying portion is to the described vaporizer described liquid charging stock of spraying;

Unloading part is sent described gas raw material from described vaporizer to gas vent; With

Described gasifier is heated in the heating part,

Described unloading part has:

Filter element covers described gas vent according to the mode that described gas raw material is passed through;

Heat transfer component is transmitted to described filter element with the heat of described heating part; With

Shutter, in a side opposite with described gas vent, according to and described filter element between form the space the mode plane earth cover described filter element.

18. one kind is carried out the device of semiconductor processes to processed substrate, it is characterized in that having:

Accommodate the process chamber of described processed substrate; With

In described process chamber, supply with the gas supply system of handling gas,

Described gas supply system has the described gasifier of claim 1.

19. one kind is carried out the device of semiconductor processes to processed substrate, has:

Accommodate the process chamber of described processed substrate; With

In described process chamber, supply with the gas supply system of handling gas,

Described gas supply system has the described gasifier of claim 6.

20. one kind is carried out the device of semiconductor processes to processed substrate, it is characterized in that having:

Accommodate the process chamber of described processed substrate; With

In described process chamber, supply with the gas supply system of handling gas,

Described gas supply system has the described gasifier of claim 17.

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