CL2014002909A1 - Aparato para el revestimiento de artículos de vidrio con un compuesto químico, comprende una sección de campana de revestimiento que define una cámara interna que tiene una entrada y salida, un soplador posicionado en la cámara interna, y un inyector que suministra compuesto químico en la cámara interna. - Google Patents
Aparato para el revestimiento de artículos de vidrio con un compuesto químico, comprende una sección de campana de revestimiento que define una cámara interna que tiene una entrada y salida, un soplador posicionado en la cámara interna, y un inyector que suministra compuesto químico en la cámara interna.Info
- Publication number
- CL2014002909A1 CL2014002909A1 CL2014002909A CL2014002909A CL2014002909A1 CL 2014002909 A1 CL2014002909 A1 CL 2014002909A1 CL 2014002909 A CL2014002909 A CL 2014002909A CL 2014002909 A CL2014002909 A CL 2014002909A CL 2014002909 A1 CL2014002909 A1 CL 2014002909A1
- Authority
- CL
- Chile
- Prior art keywords
- chamber
- internal
- chemical compound
- internal chamber
- injector
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/005—Coating the outside
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45589—Movable means, e.g. fans
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Supercharger (AREA)
- Drying Of Solid Materials (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261639164P | 2012-04-27 | 2012-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CL2014002909A1 true CL2014002909A1 (es) | 2015-03-06 |
Family
ID=49483795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CL2014002909A CL2014002909A1 (es) | 2012-04-27 | 2014-10-27 | Aparato para el revestimiento de artículos de vidrio con un compuesto químico, comprende una sección de campana de revestimiento que define una cámara interna que tiene una entrada y salida, un soplador posicionado en la cámara interna, y un inyector que suministra compuesto químico en la cámara interna. |
Country Status (23)
| Country | Link |
|---|---|
| US (1) | US20150101537A1 (es) |
| EP (1) | EP2841620B1 (es) |
| JP (2) | JP6383722B2 (es) |
| KR (1) | KR20150013139A (es) |
| CN (1) | CN104254636B (es) |
| AP (1) | AP2014008016A0 (es) |
| AR (1) | AR094433A1 (es) |
| AU (1) | AU2013252635B2 (es) |
| BR (1) | BR112014026734A2 (es) |
| CA (1) | CA2871621A1 (es) |
| CL (1) | CL2014002909A1 (es) |
| CO (1) | CO7121333A2 (es) |
| ES (1) | ES2705031T3 (es) |
| IN (1) | IN2014DN08741A (es) |
| MX (1) | MX356138B (es) |
| PH (1) | PH12014502302A1 (es) |
| PL (1) | PL2841620T3 (es) |
| PT (1) | PT2841620T (es) |
| RU (1) | RU2633121C2 (es) |
| SG (1) | SG11201406575VA (es) |
| UA (1) | UA113760C2 (es) |
| WO (1) | WO2013163055A1 (es) |
| ZA (1) | ZA201407437B (es) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2799405B8 (en) * | 2013-04-30 | 2019-10-23 | Arkema B.V. | Coating apparatus with half open loop |
| EP3380253B1 (en) | 2015-11-24 | 2021-12-22 | Arkema, Inc. | Interchangable center section for glass coating hood |
| BR112019020441A2 (pt) * | 2017-03-31 | 2020-04-28 | Arkema Inc | capela modular para revestimento de recipientes de vidro |
| US11131017B2 (en) | 2018-08-17 | 2021-09-28 | Owens-Brockway Glass Container Inc. | Vaporized metal application hood |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3819404A (en) * | 1972-04-04 | 1974-06-25 | Ball Corp | Method for treating vitreous surfaces |
| US3951100A (en) * | 1972-12-15 | 1976-04-20 | Ppg Industries, Inc. | Chemical vapor deposition of coatings |
| CA1172918A (en) * | 1980-02-15 | 1984-08-21 | William E. Hofmann | Process for making glass surfaces abrasion-resistant and article produced thereby |
| US5140940A (en) * | 1991-01-08 | 1992-08-25 | Atochem North America, Inc. | Apparatus for depositing a metal-oxide coating on glass articles |
| US5599369A (en) * | 1994-04-29 | 1997-02-04 | Owens-Brockway Glass Container Inc. | Hood for metal-oxide vapor coating glass containers |
| US5454873A (en) * | 1994-05-20 | 1995-10-03 | Scholes; Addison B. | Cold end glassware coating apparatus |
| DE4446217C2 (de) * | 1994-12-23 | 1997-10-09 | Gewerk Keramchemie | Vorrichtung zur Oberflächenbehandlung von Hohlglaskörpern |
| US6010969A (en) * | 1996-10-02 | 2000-01-04 | Micron Technology, Inc. | Method of depositing films on semiconductor devices by using carboxylate complexes |
| JP3555826B2 (ja) * | 1997-09-24 | 2004-08-18 | 麒麟麦酒株式会社 | 壜のコーティングチャンバー |
| FR2776540B1 (fr) * | 1998-03-27 | 2000-06-02 | Sidel Sa | Recipient en matiere a effet barriere et procede et appareil pour sa fabrication |
| US20100022097A1 (en) * | 2006-02-27 | 2010-01-28 | Youtec Co., Ltd. | Vaporizer, semiconductor production apparatus and process of semiconductor production |
| EP2481082B1 (en) * | 2009-09-25 | 2017-06-21 | Ferrotec (USA) Corporation | Hybrid gas injector |
-
2013
- 2013-04-22 ES ES13782210T patent/ES2705031T3/es active Active
- 2013-04-22 AU AU2013252635A patent/AU2013252635B2/en not_active Ceased
- 2013-04-22 MX MX2014013037A patent/MX356138B/es active IP Right Grant
- 2013-04-22 CN CN201380022308.XA patent/CN104254636B/zh not_active Expired - Fee Related
- 2013-04-22 PL PL13782210T patent/PL2841620T3/pl unknown
- 2013-04-22 WO PCT/US2013/037520 patent/WO2013163055A1/en active Application Filing
- 2013-04-22 JP JP2015509055A patent/JP6383722B2/ja not_active Expired - Fee Related
- 2013-04-22 PT PT13782210T patent/PT2841620T/pt unknown
- 2013-04-22 US US14/396,766 patent/US20150101537A1/en not_active Abandoned
- 2013-04-22 SG SG11201406575VA patent/SG11201406575VA/en unknown
- 2013-04-22 RU RU2014147695A patent/RU2633121C2/ru not_active IP Right Cessation
- 2013-04-22 BR BR112014026734A patent/BR112014026734A2/pt not_active Application Discontinuation
- 2013-04-22 AP AP2014008016A patent/AP2014008016A0/xx unknown
- 2013-04-22 KR KR1020147030077A patent/KR20150013139A/ko not_active Application Discontinuation
- 2013-04-22 EP EP13782210.2A patent/EP2841620B1/en not_active Not-in-force
- 2013-04-22 UA UAA201412713A patent/UA113760C2/uk unknown
- 2013-04-22 CA CA 2871621 patent/CA2871621A1/en not_active Abandoned
- 2013-04-26 AR ARP130101434A patent/AR094433A1/es unknown
-
2014
- 2014-10-13 PH PH12014502302A patent/PH12014502302A1/en unknown
- 2014-10-14 ZA ZA2014/07437A patent/ZA201407437B/en unknown
- 2014-10-17 IN IN8741DEN2014 patent/IN2014DN08741A/en unknown
- 2014-10-27 CL CL2014002909A patent/CL2014002909A1/es unknown
- 2014-11-05 CO CO14244423A patent/CO7121333A2/es unknown
-
2017
- 2017-09-29 JP JP2017191362A patent/JP2018024579A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| AR094433A1 (es) | 2015-08-05 |
| CN104254636A (zh) | 2014-12-31 |
| SG11201406575VA (en) | 2014-11-27 |
| EP2841620A1 (en) | 2015-03-04 |
| RU2633121C2 (ru) | 2017-10-11 |
| JP6383722B2 (ja) | 2018-08-29 |
| JP2018024579A (ja) | 2018-02-15 |
| CN104254636B (zh) | 2017-07-25 |
| AP2014008016A0 (en) | 2014-10-31 |
| BR112014026734A2 (pt) | 2017-06-27 |
| AU2013252635A1 (en) | 2014-11-06 |
| PT2841620T (pt) | 2019-01-22 |
| CO7121333A2 (es) | 2014-11-20 |
| ZA201407437B (en) | 2015-11-25 |
| EP2841620B1 (en) | 2018-12-05 |
| IN2014DN08741A (es) | 2015-05-22 |
| PH12014502302A1 (en) | 2014-12-22 |
| WO2013163055A1 (en) | 2013-10-31 |
| JP2015520720A (ja) | 2015-07-23 |
| US20150101537A1 (en) | 2015-04-16 |
| PL2841620T3 (pl) | 2019-05-31 |
| CA2871621A1 (en) | 2013-10-31 |
| EP2841620A4 (en) | 2015-12-09 |
| KR20150013139A (ko) | 2015-02-04 |
| MX356138B (es) | 2018-05-16 |
| RU2014147695A (ru) | 2016-06-20 |
| MX2014013037A (es) | 2015-02-04 |
| ES2705031T3 (es) | 2019-03-21 |
| AU2013252635B2 (en) | 2017-06-01 |
| UA113760C2 (xx) | 2017-03-10 |
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