CH612217A5 - - Google Patents

Info

Publication number
CH612217A5
CH612217A5 CH483578A CH483578A CH612217A5 CH 612217 A5 CH612217 A5 CH 612217A5 CH 483578 A CH483578 A CH 483578A CH 483578 A CH483578 A CH 483578A CH 612217 A5 CH612217 A5 CH 612217A5
Authority
CH
Switzerland
Application number
CH483578A
Inventor
Harry Middleton
Paul Cedric Hydes
Original Assignee
Johnson Matthey Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB1845077A external-priority patent/GB1603632A/en
Application filed by Johnson Matthey Co Ltd filed Critical Johnson Matthey Co Ltd
Publication of CH612217A5 publication Critical patent/CH612217A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/48—Electroplating: Baths therefor from solutions of gold
CH483578A 1977-05-03 1978-05-03 CH612217A5 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB1845077A GB1603632A (en) 1977-05-03 1977-05-03 Electroplating of gold alloy
GB1331678 1978-04-05

Publications (1)

Publication Number Publication Date
CH612217A5 true CH612217A5 (zh) 1979-07-13

Family

ID=26249705

Family Applications (1)

Application Number Title Priority Date Filing Date
CH483578A CH612217A5 (zh) 1977-05-03 1978-05-03

Country Status (6)

Country Link
US (1) US4199416A (zh)
CH (1) CH612217A5 (zh)
DE (1) DE2819537A1 (zh)
FR (1) FR2389690A1 (zh)
IT (1) IT1109483B (zh)
NL (1) NL7804728A (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4366035A (en) * 1979-04-24 1982-12-28 Engelhard Corporation Electrodeposition of gold alloys
US4435253A (en) 1983-01-28 1984-03-06 Omi International Corporation Gold sulphite electroplating solutions and methods
DE3319772A1 (de) * 1983-05-27 1984-11-29 Schering AG, 1000 Berlin und 4709 Bergkamen Bad fuer die galvanische abscheidung von goldlegierungen
US4717459A (en) * 1985-05-30 1988-01-05 Shinko Electric Industries Co., Ltd. Electrolytic gold plating solution
US6150262A (en) * 1996-03-27 2000-11-21 Texas Instruments Incorporated Silver-gold wire for wire bonding
EP1013799A1 (en) * 1998-12-23 2000-06-28 Half Tone Ltd. Solution and process for the electrodeposition of gold and gold alloys
DE10110743A1 (de) * 2001-02-28 2002-09-05 Wieland Dental & Technik Gmbh Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung
US20050092616A1 (en) * 2003-11-03 2005-05-05 Semitool, Inc. Baths, methods, and tools for superconformal deposition of conductive materials other than copper
US7615255B2 (en) * 2005-09-07 2009-11-10 Rohm And Haas Electronic Materials Llc Metal duplex method
US7507321B2 (en) * 2006-01-06 2009-03-24 Solopower, Inc. Efficient gallium thin film electroplating methods and chemistries
US7892413B2 (en) * 2006-09-27 2011-02-22 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US8066865B2 (en) * 2008-05-19 2011-11-29 Solopower, Inc. Electroplating methods and chemistries for deposition of group IIIA-group via thin films
US20090009281A1 (en) * 2007-07-06 2009-01-08 Cyntec Company Fuse element and manufacturing method thereof
US8425753B2 (en) * 2008-05-19 2013-04-23 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
ITFI20120208A1 (it) * 2012-10-12 2014-04-13 Bluclad S R L Soluzione per l'elettrodeposizione di una lega di oro e la lega da essa derivante.
US11674235B2 (en) * 2018-04-11 2023-06-13 Hutchinson Technology Incorporated Plating method to reduce or eliminate voids in solder applied without flux

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2090049A (en) * 1935-10-17 1937-08-17 Du Pont Cadmium plating
US2469727A (en) * 1944-03-30 1949-05-10 Du Pont Electrodeposition of nickel
US3475292A (en) * 1966-02-10 1969-10-28 Technic Gold plating bath and process
US3981782A (en) * 1972-07-28 1976-09-21 Johnson Matthey & Co., Limited Electroplating of gold and gold compounds therefor

Also Published As

Publication number Publication date
US4199416A (en) 1980-04-22
IT7822998A0 (it) 1978-05-03
IT1109483B (it) 1985-12-16
DE2819537A1 (de) 1978-11-09
NL7804728A (nl) 1978-11-07
FR2389690A1 (zh) 1978-12-01

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Legal Events

Date Code Title Description
PL Patent ceased