CH607836A5 - - Google Patents

Info

Publication number
CH607836A5
CH607836A5 CH1634276A CH1634276A CH607836A5 CH 607836 A5 CH607836 A5 CH 607836A5 CH 1634276 A CH1634276 A CH 1634276A CH 1634276 A CH1634276 A CH 1634276A CH 607836 A5 CH607836 A5 CH 607836A5
Authority
CH
Switzerland
Application number
CH1634276A
Inventor
Martin Maerk
Original Assignee
Balzers Hochvakuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Hochvakuum filed Critical Balzers Hochvakuum
Priority to CH1634276A priority Critical patent/CH607836A5/xx
Priority to NLAANVRAGE7700799,A priority patent/NL173218C/xx
Priority to GB51559/77A priority patent/GB1592589A/en
Priority to DE2755852A priority patent/DE2755852C2/de
Priority to US05/862,683 priority patent/US4155011A/en
Priority to FR7739201A priority patent/FR2375716A1/fr
Publication of CH607836A5 publication Critical patent/CH607836A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
CH1634276A 1976-12-27 1976-12-27 CH607836A5 (xx)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CH1634276A CH607836A5 (xx) 1976-12-27 1976-12-27
NLAANVRAGE7700799,A NL173218C (nl) 1976-12-27 1977-01-26 Inrichting voor het met een ionenstraal behandelen van substraten.
GB51559/77A GB1592589A (en) 1976-12-27 1977-12-12 Apparatus for the treatment of substrates by means of an ion beam
DE2755852A DE2755852C2 (de) 1976-12-27 1977-12-15 Anlage zum Behandeln von Substraten mittels eines Ionenstrahls
US05/862,683 US4155011A (en) 1976-12-27 1977-12-21 Apparatus for treating substrates with an ion beam
FR7739201A FR2375716A1 (fr) 1976-12-27 1977-12-26 Installation pour le traitement de substrats au moyen d'un faisceau d'ions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1634276A CH607836A5 (xx) 1976-12-27 1976-12-27

Publications (1)

Publication Number Publication Date
CH607836A5 true CH607836A5 (xx) 1978-11-15

Family

ID=4416485

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1634276A CH607836A5 (xx) 1976-12-27 1976-12-27

Country Status (6)

Country Link
US (1) US4155011A (xx)
CH (1) CH607836A5 (xx)
DE (1) DE2755852C2 (xx)
FR (1) FR2375716A1 (xx)
GB (1) GB1592589A (xx)
NL (1) NL173218C (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
US4247781A (en) * 1979-06-29 1981-01-27 International Business Machines Corporation Cooled target disc for high current ion implantation method and apparatus
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
US4261762A (en) * 1979-09-14 1981-04-14 Eaton Corporation Method for conducting heat to or from an article being treated under vacuum
US4743570A (en) * 1979-12-21 1988-05-10 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
US4680061A (en) * 1979-12-21 1987-07-14 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
US4909314A (en) * 1979-12-21 1990-03-20 Varian Associates, Inc. Apparatus for thermal treatment of a wafer in an evacuated environment
US4453080A (en) * 1981-07-20 1984-06-05 Varian Associates, Inc. Temperature control of a workpiece under ion implantation
US5389793A (en) * 1983-08-15 1995-02-14 Applied Materials, Inc. Apparatus and methods for ion implantation
GB8417040D0 (en) * 1984-07-04 1984-08-08 Salford University Of Modifying properties of material
GB8418063D0 (en) * 1984-07-16 1984-08-22 Atomic Energy Authority Uk Temperature control in vacuum
US4733091A (en) * 1984-09-19 1988-03-22 Applied Materials, Inc. Systems and methods for ion implantation of semiconductor wafers
US4672210A (en) * 1985-09-03 1987-06-09 Eaton Corporation Ion implanter target chamber
JPS63150848A (ja) * 1986-12-12 1988-06-23 Jeol Ltd 二次イオン質量分析装置用試料ホルダ
FR2660106B1 (fr) * 1990-03-23 1994-05-13 Commissariat A Energie Atomique Dispositif pour rendre homogene l'implantation d'ions sur la surface d'echantillons plans.
US7000418B2 (en) * 2004-05-14 2006-02-21 Intevac, Inc. Capacitance sensing for substrate cooling
US8378317B1 (en) 2011-09-07 2013-02-19 Gtat Corporation Ion implant apparatus and method of ion implantation
US8633458B2 (en) 2011-11-15 2014-01-21 Gtat Corporation Ion implant apparatus and a method of implanting ions

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT227797B (de) * 1961-04-13 1963-06-10 Hans Dipl Ing Dr Techn List Einrichtung zum Einstellen und Verändern der Raumlage von in einer Behandlungskammer zu behandelnden Gegenständen
GB1280013A (en) * 1969-09-05 1972-07-05 Atomic Energy Authority Uk Improvements in or relating to apparatus bombarding a target with ions
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation
US3930163A (en) * 1974-03-22 1975-12-30 Varian Associates Ion beam apparatus with separately replaceable elements
US3920233A (en) * 1974-06-11 1975-11-18 Ibm Spherical support and translation device for wafers

Also Published As

Publication number Publication date
GB1592589A (en) 1981-07-08
NL173218C (nl) 1983-12-16
DE2755852A1 (de) 1978-06-29
FR2375716B1 (xx) 1983-07-01
NL173218B (nl) 1983-07-18
DE2755852C2 (de) 1983-05-11
FR2375716A1 (fr) 1978-07-21
US4155011A (en) 1979-05-15
NL7700799A (nl) 1977-07-29

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Legal Events

Date Code Title Description
PL Patent ceased