CH588066A5 - - Google Patents

Info

Publication number
CH588066A5
CH588066A5 CH739475A CH739475A CH588066A5 CH 588066 A5 CH588066 A5 CH 588066A5 CH 739475 A CH739475 A CH 739475A CH 739475 A CH739475 A CH 739475A CH 588066 A5 CH588066 A5 CH 588066A5
Authority
CH
Switzerland
Application number
CH739475A
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of CH588066A5 publication Critical patent/CH588066A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
CH739475A 1974-06-27 1975-06-09 CH588066A5 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US483509A US3901814A (en) 1974-06-27 1974-06-27 Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer

Publications (1)

Publication Number Publication Date
CH588066A5 true CH588066A5 (ja) 1977-05-31

Family

ID=23920345

Family Applications (1)

Application Number Title Priority Date Filing Date
CH739475A CH588066A5 (ja) 1974-06-27 1975-06-09

Country Status (12)

Country Link
US (1) US3901814A (ja)
JP (1) JPS5114272A (ja)
BR (1) BR7504006A (ja)
CA (1) CA1027255A (ja)
CH (1) CH588066A5 (ja)
DE (1) DE2525235C2 (ja)
ES (1) ES438877A1 (ja)
FR (1) FR2276689A1 (ja)
GB (1) GB1508903A (ja)
IT (1) IT1038109B (ja)
NL (1) NL7506590A (ja)
SE (1) SE408483B (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
DE2726173C2 (de) * 1977-06-08 1982-05-27 Siemens AG, 1000 Berlin und 8000 München Verfahren und Schaltung zur automatischen Positionierung eines Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske, sowie Verwendung des Verfahrens
JPS5585028A (en) * 1978-12-22 1980-06-26 Hitachi Ltd Mark detecting signal amplifier
US4357540A (en) * 1980-12-19 1982-11-02 International Business Machines Corporation Semiconductor device array mask inspection method and apparatus
EP0054710B1 (de) * 1980-12-19 1986-02-05 International Business Machines Corporation Verfahren zum Ausrichten und Prüfen eines mit Mustern versehenen Werkstücks, z.B. einer Maske für die Herstellung von Halbleiterelementen
JPS5946025A (ja) * 1982-09-09 1984-03-15 Hitachi Ltd パタ−ンエツジの検出方法及び装置
JPS6066428A (ja) * 1983-09-21 1985-04-16 Fujitsu Ltd 電子ビ−ム露光方法
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
US4977328A (en) * 1989-03-02 1990-12-11 U.S. Philips Corporation Method of detecting a marker provided on a specimen
JP3453009B2 (ja) * 1995-07-20 2003-10-06 富士通株式会社 電子ビーム露光装置及びこの装置に於けるマーク位置検出方法
US5734594A (en) * 1996-09-25 1998-03-31 Chartered Semiconductor Manufacturing Pte Ltd. Method and system for enhancement of wafer alignment accuracy
US5838013A (en) * 1996-11-13 1998-11-17 International Business Machines Corporation Method for monitoring resist charging in a charged particle system
US7823817B1 (en) 2008-11-28 2010-11-02 Masashi Yamasaki Desktop electric stirrer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (de) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München Korpuskularstrahl-bearbeitungsgeraet
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3832561A (en) * 1973-10-01 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Also Published As

Publication number Publication date
FR2276689A1 (fr) 1976-01-23
FR2276689B1 (ja) 1977-04-15
US3901814A (en) 1975-08-26
CA1027255A (en) 1978-02-28
SE7507110L (sv) 1975-12-29
DE2525235A1 (de) 1976-01-15
JPS5114272A (en) 1976-02-04
IT1038109B (it) 1979-11-20
DE2525235C2 (de) 1984-06-28
BR7504006A (pt) 1976-07-06
JPS5333474B2 (ja) 1978-09-14
ES438877A1 (es) 1977-01-16
GB1508903A (en) 1978-04-26
NL7506590A (nl) 1975-12-30
SE408483B (sv) 1979-06-11

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Legal Events

Date Code Title Description
PL Patent ceased