CH588066A5 - - Google Patents
Info
- Publication number
- CH588066A5 CH588066A5 CH739475A CH739475A CH588066A5 CH 588066 A5 CH588066 A5 CH 588066A5 CH 739475 A CH739475 A CH 739475A CH 739475 A CH739475 A CH 739475A CH 588066 A5 CH588066 A5 CH 588066A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US483509A US3901814A (en) | 1974-06-27 | 1974-06-27 | Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH588066A5 true CH588066A5 (es) | 1977-05-31 |
Family
ID=23920345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH739475A CH588066A5 (es) | 1974-06-27 | 1975-06-09 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US3901814A (es) |
| JP (1) | JPS5114272A (es) |
| BR (1) | BR7504006A (es) |
| CA (1) | CA1027255A (es) |
| CH (1) | CH588066A5 (es) |
| DE (1) | DE2525235C2 (es) |
| ES (1) | ES438877A1 (es) |
| FR (1) | FR2276689A1 (es) |
| GB (1) | GB1508903A (es) |
| IT (1) | IT1038109B (es) |
| NL (1) | NL7506590A (es) |
| SE (1) | SE408483B (es) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4039810A (en) * | 1976-06-30 | 1977-08-02 | International Business Machines Corporation | Electron projection microfabrication system |
| US4056730A (en) * | 1976-07-12 | 1977-11-01 | International Business Machines Corporation | Apparatus for detecting registration marks on a target such as a semiconductor wafer |
| DE2726173C2 (de) * | 1977-06-08 | 1982-05-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und Schaltung zur automatischen Positionierung eines Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske, sowie Verwendung des Verfahrens |
| JPS5585028A (en) * | 1978-12-22 | 1980-06-26 | Hitachi Ltd | Mark detecting signal amplifier |
| US4357540A (en) * | 1980-12-19 | 1982-11-02 | International Business Machines Corporation | Semiconductor device array mask inspection method and apparatus |
| EP0054710B1 (de) * | 1980-12-19 | 1986-02-05 | International Business Machines Corporation | Verfahren zum Ausrichten und Prüfen eines mit Mustern versehenen Werkstücks, z.B. einer Maske für die Herstellung von Halbleiterelementen |
| JPS5946025A (ja) * | 1982-09-09 | 1984-03-15 | Hitachi Ltd | パタ−ンエツジの検出方法及び装置 |
| JPS6066428A (ja) * | 1983-09-21 | 1985-04-16 | Fujitsu Ltd | 電子ビ−ム露光方法 |
| US4803644A (en) * | 1985-09-20 | 1989-02-07 | Hughes Aircraft Company | Alignment mark detector for electron beam lithography |
| US4977328A (en) * | 1989-03-02 | 1990-12-11 | U.S. Philips Corporation | Method of detecting a marker provided on a specimen |
| JP3453009B2 (ja) * | 1995-07-20 | 2003-10-06 | 富士通株式会社 | 電子ビーム露光装置及びこの装置に於けるマーク位置検出方法 |
| US5734594A (en) * | 1996-09-25 | 1998-03-31 | Chartered Semiconductor Manufacturing Pte Ltd. | Method and system for enhancement of wafer alignment accuracy |
| US5838013A (en) * | 1996-11-13 | 1998-11-17 | International Business Machines Corporation | Method for monitoring resist charging in a charged particle system |
| US7823817B1 (en) | 2008-11-28 | 2010-11-02 | Masashi Yamasaki | Desktop electric stirrer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1804646B2 (de) * | 1968-10-18 | 1973-03-22 | Siemens AG, 1000 Berlin u. 8000 München | Korpuskularstrahl-bearbeitungsgeraet |
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3745358A (en) * | 1971-05-10 | 1973-07-10 | Radiant Energy Systems | Alignment method and apparatus for electron projection systems |
| US3832561A (en) * | 1973-10-01 | 1974-08-27 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts |
-
1974
- 1974-06-27 US US483509A patent/US3901814A/en not_active Expired - Lifetime
-
1975
- 1975-05-13 IT IT23254/75A patent/IT1038109B/it active
- 1975-05-21 FR FR7516538A patent/FR2276689A1/fr active Granted
- 1975-05-23 GB GB22919/75A patent/GB1508903A/en not_active Expired
- 1975-06-04 NL NL7506590A patent/NL7506590A/xx not_active Application Discontinuation
- 1975-06-06 DE DE2525235A patent/DE2525235C2/de not_active Expired
- 1975-06-09 CH CH739475A patent/CH588066A5/xx not_active IP Right Cessation
- 1975-06-17 JP JP50072783A patent/JPS5114272A/ja active Granted
- 1975-06-19 SE SE7507110A patent/SE408483B/xx not_active IP Right Cessation
- 1975-06-23 CA CA229,878A patent/CA1027255A/en not_active Expired
- 1975-06-26 BR BR5151/75D patent/BR7504006A/pt unknown
- 1975-06-26 ES ES438877A patent/ES438877A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2276689A1 (fr) | 1976-01-23 |
| FR2276689B1 (es) | 1977-04-15 |
| US3901814A (en) | 1975-08-26 |
| CA1027255A (en) | 1978-02-28 |
| SE7507110L (sv) | 1975-12-29 |
| DE2525235A1 (de) | 1976-01-15 |
| JPS5114272A (en) | 1976-02-04 |
| IT1038109B (it) | 1979-11-20 |
| DE2525235C2 (de) | 1984-06-28 |
| BR7504006A (pt) | 1976-07-06 |
| JPS5333474B2 (es) | 1978-09-14 |
| ES438877A1 (es) | 1977-01-16 |
| GB1508903A (en) | 1978-04-26 |
| NL7506590A (nl) | 1975-12-30 |
| SE408483B (sv) | 1979-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |