CH565500A5 - - Google Patents
Info
- Publication number
- CH565500A5 CH565500A5 CH539372A CH539372A CH565500A5 CH 565500 A5 CH565500 A5 CH 565500A5 CH 539372 A CH539372 A CH 539372A CH 539372 A CH539372 A CH 539372A CH 565500 A5 CH565500 A5 CH 565500A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Compounds Of Iron (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH539372A CH565500A5 (fr) | 1972-04-11 | 1972-04-11 | |
GB5260672A GB1359250A (en) | 1972-04-11 | 1972-11-14 | Semi-transparent iron oxide layer on a substrate |
JP12728272A JPS4915961A (fr) | 1972-04-11 | 1972-12-20 | |
NL7300287A NL7300287A (fr) | 1972-04-11 | 1973-01-09 | |
DE19732308627 DE2308627A1 (de) | 1972-04-11 | 1973-02-21 | Semitransparente, aetzbare duenne schicht auf einem substrat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH539372A CH565500A5 (fr) | 1972-04-11 | 1972-04-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH565500A5 true CH565500A5 (fr) | 1975-08-15 |
Family
ID=4292810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH539372A CH565500A5 (fr) | 1972-04-11 | 1972-04-11 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS4915961A (fr) |
CH (1) | CH565500A5 (fr) |
DE (1) | DE2308627A1 (fr) |
GB (1) | GB1359250A (fr) |
NL (1) | NL7300287A (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH071389B2 (ja) * | 1985-11-22 | 1995-01-11 | シャープ株式会社 | フオトマスクの製造方法 |
JPS63121054A (ja) * | 1986-11-10 | 1988-05-25 | Nec Corp | フオトマスク |
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1972
- 1972-04-11 CH CH539372A patent/CH565500A5/xx not_active IP Right Cessation
- 1972-11-14 GB GB5260672A patent/GB1359250A/en not_active Expired
- 1972-12-20 JP JP12728272A patent/JPS4915961A/ja active Pending
-
1973
- 1973-01-09 NL NL7300287A patent/NL7300287A/xx unknown
- 1973-02-21 DE DE19732308627 patent/DE2308627A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
NL7300287A (fr) | 1973-10-15 |
JPS4915961A (fr) | 1974-02-12 |
GB1359250A (en) | 1974-07-10 |
DE2308627A1 (de) | 1973-10-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |