CH562460A5CH1303371ACH1303371ACH562460A5CH 562460 A5CH562460 A5CH 562460A5CH 1303371 ACH1303371 ACH 1303371ACH 1303371 ACH1303371 ACH 1303371ACH 562460 A5CH562460 A5CH 562460A5
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CH
Switzerland
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CH1303371A
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Basf Ag
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Publication of CH562460A5publicationCriticalpatent/CH562460A5/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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Physics & Mathematics
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Chemical & Material Sciences
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Chemical Kinetics & Catalysis
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Spectroscopy & Molecular Physics
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General Physics & Mathematics
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications
(AREA)