CH560463A5 - - Google Patents

Info

Publication number
CH560463A5
CH560463A5 CH1098873A CH1098873A CH560463A5 CH 560463 A5 CH560463 A5 CH 560463A5 CH 1098873 A CH1098873 A CH 1098873A CH 1098873 A CH1098873 A CH 1098873A CH 560463 A5 CH560463 A5 CH 560463A5
Authority
CH
Switzerland
Application number
CH1098873A
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19722247183 external-priority patent/DE2247183C3/de
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH560463A5 publication Critical patent/CH560463A5/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0727Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
    • H01L27/0738Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors in combination with resistors only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
CH1098873A 1972-09-26 1973-07-27 CH560463A5 ( )

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722247183 DE2247183C3 (de) 1972-09-26 Verfahren zur Herstellung von Schaltungen mit wenigstens einem Feldeffekttransistor mit einer Source-, einer Drain- und einer Gateelektrode und mit mindestens einem ohmschen > Schichtwiderstand auf einem gemeinsamen Substrat

Publications (1)

Publication Number Publication Date
CH560463A5 true CH560463A5 ( ) 1975-03-27

Family

ID=5857423

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1098873A CH560463A5 ( ) 1972-09-26 1973-07-27

Country Status (11)

Country Link
US (1) US3889358A ( )
JP (1) JPS4973086A ( )
BE (1) BE805346A ( )
CA (1) CA1004373A ( )
CH (1) CH560463A5 ( )
FR (1) FR2200624B1 ( )
GB (1) GB1447236A ( )
IT (1) IT993410B ( )
LU (1) LU68478A1 ( )
NL (1) NL7313070A ( )
SE (1) SE390085B ( )

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138990A (en) * 1974-09-30 1976-03-31 Suwa Seikosha Kk Handotaisochino seizohoho
JPS51103780A (ja) * 1975-03-10 1976-09-13 Tokyo Shibaura Electric Co Handotaisoshi
JPS5267532A (en) * 1975-12-03 1977-06-04 Nippon Telegr & Teleph Corp <Ntt> Semiconductor memory unit
US4295264A (en) * 1975-12-29 1981-10-20 Texas Instruments Incorporated Method of making integrated circuit MOS capacitor using implanted region to change threshold
US4212083A (en) * 1976-05-28 1980-07-08 Texas Instruments Incorporated MOS Integrated with implanted resistor elements
US4246692A (en) * 1976-05-28 1981-01-27 Texas Instruments Incorporated MOS Integrated circuits with implanted resistor elements
US4114255A (en) * 1976-08-16 1978-09-19 Intel Corporation Floating gate storage device and method of fabrication
US4187602A (en) * 1976-12-27 1980-02-12 Texas Instruments Incorporated Static memory cell using field implanted resistance
US4228451A (en) * 1978-07-21 1980-10-14 Monolithic Memories, Inc. High resistivity semiconductor resistor device
US4212684A (en) * 1978-11-20 1980-07-15 Ncr Corporation CISFET Processing including simultaneous doping of silicon components and FET channels
US4210465A (en) * 1978-11-20 1980-07-01 Ncr Corporation CISFET Processing including simultaneous implantation of spaced polycrystalline silicon regions and non-memory FET channel
US4468857A (en) * 1983-06-27 1984-09-04 Teletype Corporation Method of manufacturing an integrated circuit device
US4485553A (en) * 1983-06-27 1984-12-04 Teletype Corporation Method for manufacturing an integrated circuit device
US4472875A (en) * 1983-06-27 1984-09-25 Teletype Corporation Method for manufacturing an integrated circuit device
JPS6097659A (ja) * 1983-11-01 1985-05-31 Matsushita Electronics Corp 半導体集積回路
JPS61113269A (ja) * 1984-11-08 1986-05-31 Rohm Co Ltd 半導体装置
KR940005293B1 (ko) * 1991-05-23 1994-06-15 삼성전자 주식회사 게이트와 드레인이 중첩된 모오스 트랜지스터의 제조방법 및 그 구조
JP2919379B2 (ja) * 1996-08-29 1999-07-12 九州日本電気株式会社 半導体装置およびその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6713666A ( ) * 1967-10-07 1969-04-09
US3655457A (en) * 1968-08-06 1972-04-11 Ibm Method of making or modifying a pn-junction by ion implantation
US3679492A (en) * 1970-03-23 1972-07-25 Ibm Process for making mosfet's
US3789504A (en) * 1971-10-12 1974-02-05 Gte Laboratories Inc Method of manufacturing an n-channel mos field-effect transistor

Also Published As

Publication number Publication date
BE805346A (fr) 1974-01-16
FR2200624B1 ( ) 1977-09-09
SE390085B (sv) 1976-11-29
JPS4973086A ( ) 1974-07-15
LU68478A1 ( ) 1973-12-07
DE2247183B2 (de) 1977-02-10
FR2200624A1 ( ) 1974-04-19
US3889358A (en) 1975-06-17
IT993410B (it) 1975-09-30
CA1004373A (en) 1977-01-25
DE2247183A1 (de) 1974-04-25
GB1447236A (en) 1976-08-25
NL7313070A ( ) 1974-03-28

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Legal Events

Date Code Title Description
PL Patent ceased