CH552470A - METHOD OF MANUFACTURING A COLORED REPRODUCTION MASK. - Google Patents

METHOD OF MANUFACTURING A COLORED REPRODUCTION MASK.

Info

Publication number
CH552470A
CH552470A CH1155868A CH1155868A CH552470A CH 552470 A CH552470 A CH 552470A CH 1155868 A CH1155868 A CH 1155868A CH 1155868 A CH1155868 A CH 1155868A CH 552470 A CH552470 A CH 552470A
Authority
CH
Switzerland
Prior art keywords
manufacturing
colored reproduction
reproduction mask
mask
colored
Prior art date
Application number
CH1155868A
Other languages
German (de)
Original Assignee
Pigur Karl August
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19671622385 external-priority patent/DE1622385C3/en
Application filed by Pigur Karl August filed Critical Pigur Karl August
Publication of CH552470A publication Critical patent/CH552470A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Methods (AREA)
CH1155868A 1967-08-30 1968-08-01 METHOD OF MANUFACTURING A COLORED REPRODUCTION MASK. CH552470A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19671622385 DE1622385C3 (en) 1967-08-30 1967-08-30 Process for the production of reflective or transparent originals

Publications (1)

Publication Number Publication Date
CH552470A true CH552470A (en) 1974-08-15

Family

ID=5682640

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1155868A CH552470A (en) 1967-08-30 1968-08-01 METHOD OF MANUFACTURING A COLORED REPRODUCTION MASK.

Country Status (3)

Country Link
CH (1) CH552470A (en)
FR (1) FR1577813A (en)
GB (1) GB1245474A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2132789A (en) * 1982-11-24 1984-07-11 Western Electric Co Method of pattern generation

Also Published As

Publication number Publication date
GB1245474A (en) 1971-09-08
FR1577813A (en) 1969-08-08

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Legal Events

Date Code Title Description
PL Patent ceased