CH522951A - Multi-beam ion sputtering device for the production of thin, uniform or alloyed layers - Google Patents

Multi-beam ion sputtering device for the production of thin, uniform or alloyed layers

Info

Publication number
CH522951A
CH522951A CH1512669A CH1512669A CH522951A CH 522951 A CH522951 A CH 522951A CH 1512669 A CH1512669 A CH 1512669A CH 1512669 A CH1512669 A CH 1512669A CH 522951 A CH522951 A CH 522951A
Authority
CH
Switzerland
Prior art keywords
uniform
thin
production
sputtering device
ion sputtering
Prior art date
Application number
CH1512669A
Other languages
German (de)
Inventor
Otto Dr Fiedler
Guenter Dipl Phys Reisse
Weissmantel Christian Dr Prof
Original Assignee
Inst Elektronische Bauelemente
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inst Elektronische Bauelemente filed Critical Inst Elektronische Bauelemente
Publication of CH522951A publication Critical patent/CH522951A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
    • B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
    • B23B31/16—Chucks with simultaneously-acting jaws, whether or not also individually adjustable moving radially
    • B23B31/16158—Jaws movement actuated by coaxial conical surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
    • B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
    • B23B31/16—Chucks with simultaneously-acting jaws, whether or not also individually adjustable moving radially
    • B23B31/16233—Jaws movement actuated by oblique surfaces of a coaxial control rod
    • B23B31/16254—Jaws movement actuated by oblique surfaces of a coaxial control rod using fluid-pressure means to actuate the gripping means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
    • B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
    • B23B31/20—Longitudinally-split sleeves, e.g. collet chucks
    • B23B31/201—Characterized by features relating primarily to remote control of the gripping means
    • B23B31/204—Characterized by features relating primarily to remote control of the gripping means using fluid-pressure means to actuate the gripping means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/24—Chucks characterised by features relating primarily to remote control of the gripping means
    • B23B31/28—Chucks characterised by features relating primarily to remote control of the gripping means using electric or magnetic means in the chuck
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2270/00—Details of turning, boring or drilling machines, processes or tools not otherwise provided for
    • B23B2270/38—Using magnetic fields

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Gripping On Spindles (AREA)
CH1512669A 1968-10-17 1969-10-08 Multi-beam ion sputtering device for the production of thin, uniform or alloyed layers CH522951A (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DD13543168 1968-10-17
DD13774469 1969-02-10
DE19691934320 DE1934320A1 (en) 1968-10-17 1969-07-07 Power chucks for clamping workpieces on machines
FR6930469A FR2063256A5 (en) 1968-10-17 1969-09-08
FR6931339A FR2064480A5 (en) 1968-10-17 1969-09-15
GB5503769A GB1294697A (en) 1968-10-17 1969-11-11 Apparatus for the selective sputtering of solid substances by means of ion bombardment according to the plasma or to the ion-beam process

Publications (1)

Publication Number Publication Date
CH522951A true CH522951A (en) 1972-05-15

Family

ID=27543993

Family Applications (2)

Application Number Title Priority Date Filing Date
CH1512569A CH516226A (en) 1968-10-17 1969-10-08 Device for the optional atomization of solid substances by ion bombardment using the plasma or ion beam method
CH1512669A CH522951A (en) 1968-10-17 1969-10-08 Multi-beam ion sputtering device for the production of thin, uniform or alloyed layers

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CH1512569A CH516226A (en) 1968-10-17 1969-10-08 Device for the optional atomization of solid substances by ion bombardment using the plasma or ion beam method

Country Status (4)

Country Link
CH (2) CH516226A (en)
DE (3) DE1934326A1 (en)
FR (2) FR2063256A5 (en)
GB (1) GB1294697A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0282677A1 (en) * 1987-03-13 1988-09-21 Ian Gordon Brown Multi-cathode metal arc ion source

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998718A (en) * 1976-02-18 1976-12-21 Bell Telephone Laboratories, Incorporated Ion milling apparatus
FR2410360A1 (en) * 1977-11-28 1979-06-22 Anvar SOURCE OF ION, ESPECIALLY FOR ION IMPLANTER
DE2853251C2 (en) * 1978-12-09 1983-07-28 Willy 5222 Morsbach Klein Dismountable and transportable material hut
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
AU566986B2 (en) * 1984-09-04 1987-11-05 Standard Oil Company, The Deposition of passivated amorphous semi-conductor films by sputtering
DE102010007542A1 (en) 2010-02-08 2011-08-11 KHS Corpoplast GmbH, 22145 Method and apparatus for blow molding containers
CN115188648B (en) * 2022-09-08 2022-12-23 合肥中科离子医学技术装备有限公司 Internal penning source structure and cyclotron

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0282677A1 (en) * 1987-03-13 1988-09-21 Ian Gordon Brown Multi-cathode metal arc ion source

Also Published As

Publication number Publication date
GB1294697A (en) 1972-11-01
FR2063256A5 (en) 1971-07-09
DE1934326A1 (en) 1970-08-06
DE1934320A1 (en) 1971-05-13
FR2064480A5 (en) 1971-07-23
DE1934328A1 (en) 1970-04-30
CH516226A (en) 1971-11-30

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Legal Events

Date Code Title Description
PL Patent ceased