CH516826A - Verfahren zur Herstellung von Reliefformen - Google Patents

Verfahren zur Herstellung von Reliefformen

Info

Publication number
CH516826A
CH516826A CH122270A CH122270A CH516826A CH 516826 A CH516826 A CH 516826A CH 122270 A CH122270 A CH 122270A CH 122270 A CH122270 A CH 122270A CH 516826 A CH516826 A CH 516826A
Authority
CH
Switzerland
Prior art keywords
production
relief forms
relief
forms
Prior art date
Application number
CH122270A
Other languages
English (en)
Inventor
Horst Dr Hoffmann
Heinrich Dr Krauch Carl
Hans-Werner Dr Otto
Otto Dr Volkert
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH516826A publication Critical patent/CH516826A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/83—Organic dyestuffs therefor
    • G03C1/833—Dyes containing a metal atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CH122270A 1969-02-01 1970-01-28 Verfahren zur Herstellung von Reliefformen CH516826A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1905012A DE1905012C3 (de) 1969-02-01 1969-02-01 Photopolymerisierbares Aufzeichnungsmaterial zum Herstellen von Reliefs

Publications (1)

Publication Number Publication Date
CH516826A true CH516826A (de) 1971-12-15

Family

ID=5724044

Family Applications (1)

Application Number Title Priority Date Filing Date
CH122270A CH516826A (de) 1969-02-01 1970-01-28 Verfahren zur Herstellung von Reliefformen

Country Status (10)

Country Link
US (1) US3674494A (de)
AT (1) AT297047B (de)
BE (1) BE745236A (de)
CA (1) CA929402A (de)
CH (1) CH516826A (de)
DE (1) DE1905012C3 (de)
FR (1) FR2032657A5 (de)
GB (1) GB1287216A (de)
NL (2) NL168054B (de)
SE (1) SE356614B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3871885A (en) * 1971-05-18 1975-03-18 Du Pont Crystalline photo-polymerizable composition
US3787211A (en) * 1971-12-10 1974-01-22 Basf Ag Makeready foil for relief printing
US3883351A (en) * 1972-02-09 1975-05-13 Horizons Inc Method of making a photoresist
US4297945A (en) * 1972-12-28 1981-11-03 Sumitomo Chemical Company, Ltd. Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPH06103391B2 (ja) * 1985-09-20 1994-12-14 富士写真フイルム株式会社 感光性記録材料
FR2690255A1 (fr) * 1992-04-17 1993-10-22 Digipress Sa Composition photosensible, notamment pour application au stockage d'informations ou à la réalisation d'éléments optiques holographiques.
DE4311540A1 (de) * 1993-04-07 1994-10-13 Du Pont Deutschland Photopolymerisierbare Druckschicht für Flexo-Druckplatten
US6726755B2 (en) 2002-02-08 2004-04-27 Xerox Corporation Ink compositions containing phthalocyanines
US6476219B1 (en) 2002-02-08 2002-11-05 Xerox Corporation Methods for preparing phthalocyanine compositions
US6472523B1 (en) 2002-02-08 2002-10-29 Xerox Corporation Phthalocyanine compositions
KR20220008168A (ko) 2020-07-13 2022-01-20 삼성전자주식회사 반도체 패키지

Also Published As

Publication number Publication date
NL7001140A (de) 1970-08-04
NL168054C (nl)
BE745236A (fr) 1970-07-30
AT297047B (de) 1972-03-10
GB1287216A (en) 1972-08-31
DE1905012C3 (de) 1980-03-06
DE1905012B2 (de) 1979-07-12
US3674494A (en) 1972-07-04
FR2032657A5 (de) 1970-11-27
NL168054B (nl) 1981-09-16
SE356614B (de) 1973-05-28
DE1905012A1 (de) 1970-08-06
CA929402A (en) 1973-07-03

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Legal Events

Date Code Title Description
PL Patent ceased