CH494415A - Procédé de préparation d'une couche photosensible - Google Patents
Procédé de préparation d'une couche photosensibleInfo
- Publication number
- CH494415A CH494415A CH1736868A CH1736868A CH494415A CH 494415 A CH494415 A CH 494415A CH 1736868 A CH1736868 A CH 1736868A CH 1736868 A CH1736868 A CH 1736868A CH 494415 A CH494415 A CH 494415A
- Authority
- CH
- Switzerland
- Prior art keywords
- preparing
- photosensitive layer
- photosensitive
- layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68463667A | 1967-11-21 | 1967-11-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH494415A true CH494415A (fr) | 1970-07-31 |
Family
ID=24748898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1736868A CH494415A (fr) | 1967-11-21 | 1968-11-21 | Procédé de préparation d'une couche photosensible |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4934681B1 (de) |
BE (1) | BE723556A (de) |
BR (1) | BR6804157D0 (de) |
CH (1) | CH494415A (de) |
DE (1) | DE1807644A1 (de) |
FR (1) | FR1592375A (de) |
GB (1) | GB1251345A (de) |
SU (1) | SU379110A3 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
JPS51483B2 (de) * | 1972-08-18 | 1976-01-08 | ||
GB1482921A (en) | 1973-07-31 | 1977-08-17 | Glaxo Lab Ltd | Polymers |
US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
JP2623309B2 (ja) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | レジストパターンを得る方法 |
JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
JP3290316B2 (ja) | 1994-11-18 | 2002-06-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
JP3506295B2 (ja) | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
US6511790B2 (en) | 2000-08-25 | 2003-01-28 | Fuji Photo Film Co., Ltd. | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
ATE497882T1 (de) | 2000-11-30 | 2011-02-15 | Fujifilm Corp | Flachdruckplattenvorläufer |
US20040067435A1 (en) | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
JP4404734B2 (ja) | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4474296B2 (ja) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4404792B2 (ja) | 2005-03-22 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
JP2009085984A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版原版 |
JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
JP4890403B2 (ja) | 2007-09-27 | 2012-03-07 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4790682B2 (ja) | 2007-09-28 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版原版 |
JP4994175B2 (ja) | 2007-09-28 | 2012-08-08 | 富士フイルム株式会社 | 平版印刷版原版、及びそれに用いる共重合体の製造方法 |
CN101855026A (zh) | 2007-11-14 | 2010-10-06 | 富士胶片株式会社 | 干燥涂布膜的方法和制造平版印刷版前体的方法 |
JP2009236355A (ja) | 2008-03-26 | 2009-10-15 | Fujifilm Corp | 乾燥方法及び装置 |
JP5164640B2 (ja) | 2008-04-02 | 2013-03-21 | 富士フイルム株式会社 | 平版印刷版原版 |
JP5183380B2 (ja) | 2008-09-09 | 2013-04-17 | 富士フイルム株式会社 | 赤外線レーザ用感光性平版印刷版原版 |
JP2010237435A (ja) | 2009-03-31 | 2010-10-21 | Fujifilm Corp | 平版印刷版原版 |
EP2481603A4 (de) | 2009-09-24 | 2015-11-18 | Fujifilm Corp | Lithografische originaldruckplatte |
JP5490168B2 (ja) | 2012-03-23 | 2014-05-14 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
JP5512730B2 (ja) | 2012-03-30 | 2014-06-04 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
-
1968
- 1968-11-07 BE BE723556D patent/BE723556A/xx unknown
- 1968-11-07 DE DE19681807644 patent/DE1807644A1/de not_active Withdrawn
- 1968-11-20 BR BR20415768A patent/BR6804157D0/pt unknown
- 1968-11-20 SU SU1284438A patent/SU379110A3/ru active
- 1968-11-20 FR FR1592375D patent/FR1592375A/fr not_active Expired
- 1968-11-21 JP JP43084909A patent/JPS4934681B1/ja active Pending
- 1968-11-21 CH CH1736868A patent/CH494415A/fr not_active IP Right Cessation
- 1968-11-21 GB GB1251345D patent/GB1251345A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR1592375A (de) | 1970-05-11 |
BE723556A (de) | 1969-04-16 |
GB1251345A (de) | 1971-10-27 |
JPS4934681B1 (de) | 1974-09-17 |
DE1807644A1 (de) | 1969-08-28 |
SU379110A3 (de) | 1973-04-18 |
BR6804157D0 (pt) | 1973-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |