CH476767A - Verfahren zur Polymerisation von Vinylmonomeren unter Strahlungseinwirkung - Google Patents

Verfahren zur Polymerisation von Vinylmonomeren unter Strahlungseinwirkung

Info

Publication number
CH476767A
CH476767A CH860967A CH860967A CH476767A CH 476767 A CH476767 A CH 476767A CH 860967 A CH860967 A CH 860967A CH 860967 A CH860967 A CH 860967A CH 476767 A CH476767 A CH 476767A
Authority
CH
Switzerland
Prior art keywords
polymerization
radiation
action
vinyl monomers
monomers under
Prior art date
Application number
CH860967A
Other languages
English (en)
Inventor
Beckman Rust John
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to GB2725267A priority Critical patent/GB1153813A/en
Priority to DE19671720906 priority patent/DE1720906C3/de
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Priority to NL6708459A priority patent/NL148331B/xx
Priority to CH860967A priority patent/CH476767A/de
Priority to FR113445A priority patent/FR1539051A/fr
Priority to BE701241D priority patent/BE701241A/xx
Publication of CH476767A publication Critical patent/CH476767A/de
Priority to NL7506973A priority patent/NL156712B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
CH860967A 1967-06-13 1967-06-16 Verfahren zur Polymerisation von Vinylmonomeren unter Strahlungseinwirkung CH476767A (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB2725267A GB1153813A (en) 1967-06-13 1967-06-13 Photopolymers and the process of making same
DE19671720906 DE1720906C3 (de) 1967-06-13 1967-06-15 Photopolymerisierbares Gemisch
NL6708459A NL148331B (nl) 1967-06-13 1967-06-16 Werkwijze ter bereiding van fotopolymeren, werkwijze ter bereiding van daarvoor geschikte katalysatorsystemen en aldus vervaardigde voorwerpen.
CH860967A CH476767A (de) 1967-06-13 1967-06-16 Verfahren zur Polymerisation von Vinylmonomeren unter Strahlungseinwirkung
FR113445A FR1539051A (fr) 1967-06-13 1967-07-06 Procédé de fabrication de photopolymères de composés vinyliques
BE701241D BE701241A (de) 1967-06-13 1967-07-12
NL7506973A NL156712B (nl) 1967-06-13 1975-06-11 Werkwijze ter bereiding van fotopolymeren, werkwijze ter bereiding van daarvoor geschikte katalysatorsystemen en aldus vervaardigde voorwerpen.

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
GB2725267A GB1153813A (en) 1967-06-13 1967-06-13 Photopolymers and the process of making same
DEH0063019 1967-06-15
NL6708459A NL148331B (nl) 1967-06-13 1967-06-16 Werkwijze ter bereiding van fotopolymeren, werkwijze ter bereiding van daarvoor geschikte katalysatorsystemen en aldus vervaardigde voorwerpen.
CH860967A CH476767A (de) 1967-06-13 1967-06-16 Verfahren zur Polymerisation von Vinylmonomeren unter Strahlungseinwirkung
BE701241 1967-07-12
NL7506973A NL156712B (nl) 1967-06-13 1975-06-11 Werkwijze ter bereiding van fotopolymeren, werkwijze ter bereiding van daarvoor geschikte katalysatorsystemen en aldus vervaardigde voorwerpen.

Publications (1)

Publication Number Publication Date
CH476767A true CH476767A (de) 1969-08-15

Family

ID=27543083

Family Applications (1)

Application Number Title Priority Date Filing Date
CH860967A CH476767A (de) 1967-06-13 1967-06-16 Verfahren zur Polymerisation von Vinylmonomeren unter Strahlungseinwirkung

Country Status (5)

Country Link
BE (1) BE701241A (de)
CH (1) CH476767A (de)
DE (1) DE1720906C3 (de)
GB (1) GB1153813A (de)
NL (2) NL148331B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53109703A (en) * 1977-03-08 1978-09-25 Teijin Ltd Improved supporting plate
GB8414705D0 (en) * 1984-06-08 1984-07-11 Wiggins Teape Group Ltd Coating substrates
DE3724838A1 (de) * 1987-07-27 1989-02-09 Henkel Kgaa Verwendung von lichtinduziert vernetzbaren monomer-zusammensetzungen als dunkelhaertende klebstoffe

Also Published As

Publication number Publication date
BE701241A (de) 1967-12-18
DE1720906B2 (de) 1973-05-30
DE1720906A1 (de) 1972-01-20
DE1720906C3 (de) 1973-12-13
NL156712B (nl) 1978-05-16
NL148331B (nl) 1976-01-15
NL7506973A (nl) 1975-09-30
GB1153813A (en) 1969-05-29
NL6708459A (de) 1968-12-17

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Legal Events

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PL Patent ceased