CH472505A - Bain de nickelage - Google Patents
Bain de nickelageInfo
- Publication number
- CH472505A CH472505A CH79467A CH79467A CH472505A CH 472505 A CH472505 A CH 472505A CH 79467 A CH79467 A CH 79467A CH 79467 A CH79467 A CH 79467A CH 472505 A CH472505 A CH 472505A
- Authority
- CH
- Switzerland
- Prior art keywords
- plating bath
- nickel plating
- nickel
- bath
- plating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/04—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Pyridine Compounds (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR48289A FR1497474A (fr) | 1966-02-03 | 1966-02-03 | Perfectionnements aux bains de nickelage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH472505A true CH472505A (fr) | 1969-05-15 |
Family
ID=8600458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH79467A CH472505A (fr) | 1966-02-03 | 1967-01-19 | Bain de nickelage |
Country Status (6)
| Country | Link |
|---|---|
| CH (1) | CH472505A (xx) |
| DE (1) | DE1521008B2 (xx) |
| ES (1) | ES336281A1 (xx) |
| FR (1) | FR1497474A (xx) |
| GB (1) | GB1179153A (xx) |
| SE (1) | SE349063B (xx) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102703935B (zh) * | 2012-06-12 | 2014-08-13 | 宁波华楷汽车零部件有限公司 | 一种新型微裂纹镍电镀的电镀液及采用该电镀液的塑料件电镀工艺 |
-
1966
- 1966-02-03 FR FR48289A patent/FR1497474A/fr not_active Expired
- 1966-04-07 DE DE19661521008 patent/DE1521008B2/de active Pending
-
1967
- 1967-01-19 CH CH79467A patent/CH472505A/fr not_active IP Right Cessation
- 1967-01-31 ES ES336281A patent/ES336281A1/es not_active Expired
- 1967-02-02 SE SE148767A patent/SE349063B/xx unknown
- 1967-02-03 GB GB537567A patent/GB1179153A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| ES336281A1 (es) | 1968-04-01 |
| FR1497474A (fr) | 1967-10-13 |
| DE1521008B2 (de) | 1971-01-07 |
| GB1179153A (en) | 1970-01-28 |
| SE349063B (xx) | 1972-09-18 |
| DE1521008A1 (de) | 1969-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |