CA942429A - Method and apparatus for controlling an electron beam - Google Patents

Method and apparatus for controlling an electron beam

Info

Publication number
CA942429A
CA942429A CA099,714A CA99714A CA942429A CA 942429 A CA942429 A CA 942429A CA 99714 A CA99714 A CA 99714A CA 942429 A CA942429 A CA 942429A
Authority
CA
Canada
Prior art keywords
controlling
electron beam
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA099,714A
Other languages
English (en)
Other versions
CA99714S (en
Inventor
Robert W. Kruppa
Edward V. Weber
Ollie C. Woodard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA942429A publication Critical patent/CA942429A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
    • G05B19/39—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using a combination of the means covered by at least two of the preceding groups G05B19/21, G05B19/27 and G05B19/33
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/42—Servomotor, servo controller kind till VSS
    • G05B2219/42251—Control position of beam in coordination with xy slide

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
CA099,714A 1969-12-15 1970-12-03 Method and apparatus for controlling an electron beam Expired CA942429A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88490069A 1969-12-15 1969-12-15

Publications (1)

Publication Number Publication Date
CA942429A true CA942429A (en) 1974-02-19

Family

ID=25385667

Family Applications (1)

Application Number Title Priority Date Filing Date
CA099,714A Expired CA942429A (en) 1969-12-15 1970-12-03 Method and apparatus for controlling an electron beam

Country Status (6)

Country Link
US (1) US3644700A (de)
JP (1) JPS5148313B1 (de)
CA (1) CA942429A (de)
DE (1) DE2056620B2 (de)
FR (1) FR2071763A5 (de)
GB (1) GB1329559A (de)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
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US3857041A (en) * 1969-07-03 1974-12-24 Texas Instruments Inc Electron beam patterning system for use in production of semiconductor devices
US3842236A (en) * 1970-03-28 1974-10-15 Steigerwald Strahltech Process to control the movement of a workpiece with respect to a beam of a stock processing machine operating by means of controllable power irradiation
FR2220073B1 (de) * 1973-03-02 1983-04-15 Thomson Csf
US3924113A (en) * 1973-06-08 1975-12-02 Ibm Electron beam registration system
US3875414A (en) * 1973-08-20 1975-04-01 Secr Defence Brit Methods suitable for use in or in connection with the production of microelectronic devices
US3894271A (en) * 1973-08-31 1975-07-08 Ibm Method and apparatus for aligning electron beams
US4019015A (en) * 1973-09-10 1977-04-19 International Business Machines Corporation Precision tool and workpiece positioning apparatus with ringout detection
US3849659A (en) * 1973-09-10 1974-11-19 Westinghouse Electric Corp Alignment of a patterned electron beam with a member by electron backscatter
US3866013A (en) * 1973-09-19 1975-02-11 Ibm Method and apparatus for controlling movable means such as an electron beam
US3949228A (en) * 1973-09-19 1976-04-06 Ibm Corporation Method for controlling an electron beam
US3914608A (en) * 1973-12-19 1975-10-21 Westinghouse Electric Corp Rapid exposure of micropatterns with a scanning electron microscope
US3900736A (en) * 1974-01-28 1975-08-19 Ibm Method and apparatus for positioning a beam of charged particles
US3875415A (en) * 1974-01-28 1975-04-01 Ibm Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system
US4066863A (en) * 1974-06-26 1978-01-03 International Business Machines Corporation Method and system for automatically correcting aberrations of a beam of charged particles
US3901814A (en) * 1974-06-27 1975-08-26 Ibm Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer
US4000440A (en) * 1974-07-26 1976-12-28 International Business Machines Corporation Method and apparatus for controlling brightness and alignment of a beam of charged particles
FR2294489A1 (fr) * 1974-12-13 1976-07-09 Thomson Csf Dispositif pour le trace programme de dessins par bombardement de particules
US3984687A (en) * 1975-03-17 1976-10-05 International Business Machines Corporation Shielded magnetic lens and deflection yoke structure for electron beam column
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
JPS52151568A (en) * 1976-06-11 1977-12-16 Jeol Ltd Electron beam exposure apparatus
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
JPS5350978A (en) * 1976-10-20 1978-05-09 Fujitsu Ltd Electron beam exposure method
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
DE2726173C2 (de) * 1977-06-08 1982-05-27 Siemens AG, 1000 Berlin und 8000 München Verfahren und Schaltung zur automatischen Positionierung eines Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske, sowie Verwendung des Verfahrens
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5472980A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Electron-beam drawing unit
US4149085A (en) * 1978-01-16 1979-04-10 International Business Machines Corporation Automatic overlay measurements using an electronic beam system as a measurement tool
US4137459A (en) * 1978-02-13 1979-01-30 International Business Machines Corporation Method and apparatus for applying focus correction in E-beam system
DE2837590A1 (de) * 1978-08-29 1980-03-13 Ibm Deutschland Verfahren zur schattenwurfbelichtung
US4420691A (en) * 1978-12-28 1983-12-13 Fujitsu Limited Method of aligning electron beam apparatus
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
US4310743A (en) * 1979-09-24 1982-01-12 Hughes Aircraft Company Ion beam lithography process and apparatus using step-and-repeat exposure
JPS56124234A (en) * 1980-03-05 1981-09-29 Hitachi Ltd Correcting method for electron beam deflection
JPS5740927A (en) * 1980-08-26 1982-03-06 Fujitsu Ltd Exposing method of electron beam
US4543512A (en) * 1980-10-15 1985-09-24 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam exposure system
US4387433A (en) * 1980-12-24 1983-06-07 International Business Machines Corporation High speed data interface buffer for digitally controlled electron beam exposure system
JPS57209786A (en) * 1981-06-17 1982-12-23 Hitachi Ltd Electron beam machining device
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
US4567369A (en) * 1982-06-18 1986-01-28 National Research Development Corporation Correction of astigmatism in electron beam instruments
GB2123582B (en) * 1982-06-18 1986-01-29 Nat Res Dev Correction of astigmatism in electron beam instruments
JPS59114818A (ja) * 1982-12-21 1984-07-03 Toshiba Corp 電子ビ−ムパタ−ン描画方法
DE3410885A1 (de) * 1984-03-24 1985-10-03 Ibm Deutschland Gmbh, 7000 Stuttgart Fehlerkorrigierte korpuskularstrahllithographie
US4705954A (en) * 1984-09-04 1987-11-10 Siemens Aktiengesellschaft Method and apparatus for automatically positioning a particle beam
DE4024084A1 (de) * 1989-11-29 1991-06-06 Daimler Benz Ag Verfahren zum herstellen von hohlen gaswechselventilen fuer hubkolbenmaschinen
US5546319A (en) * 1994-01-28 1996-08-13 Fujitsu Limited Method of and system for charged particle beam exposure
US5798528A (en) * 1997-03-11 1998-08-25 International Business Machines Corporation Correction of pattern dependent position errors in electron beam lithography
JP2000003847A (ja) * 1998-06-15 2000-01-07 Canon Inc 荷電粒子線縮小転写装置及びデバイス製造方法
US6291819B1 (en) 1999-09-09 2001-09-18 International Business Machines Corporation Method of calibrating an electron beam system for lithography
JP4220209B2 (ja) * 2002-09-27 2009-02-04 株式会社アドバンテスト 電子ビーム露光装置、偏向装置、及び電子ビーム露光方法
AU2003304322A1 (en) * 2003-07-15 2005-01-28 Mimaki Engineering Co., Ltd. Register mark reader for cutting plotter and register mark reading method
US7244953B2 (en) * 2005-10-03 2007-07-17 Applied Materials, Inc. Beam exposure writing strategy system and method
DE102015210941B9 (de) * 2015-06-15 2019-09-19 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät und Verfahren zum Betrieb eines Teilchenstrahlgeräts

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL246011A (de) * 1959-01-14
DE1439900A1 (de) * 1964-12-07 1968-12-19 Elektromat Werk Fuer Automatis Verfahren und Einrichtung zum Zentrieren des Elektronenstrahles bei Elektronenstrahl-Bearbeitungsgeraeten
FR1533755A (fr) * 1966-08-16 1968-07-19 Jeol Ltd Dispositif pour le réglage du point de traitement dans un appareil à faisceau électrique ou analogue
US3519788A (en) * 1967-01-13 1970-07-07 Ibm Automatic registration of an electron beam

Also Published As

Publication number Publication date
FR2071763A5 (de) 1971-09-17
US3644700A (en) 1972-02-22
JPS5148313B1 (de) 1976-12-20
DE2056620A1 (de) 1971-06-16
GB1329559A (en) 1973-09-12
DE2056620B2 (de) 1977-11-10

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